EP1160799A4 - Dispositif de reaction a une projection de faisceau electronique - Google Patents

Dispositif de reaction a une projection de faisceau electronique

Info

Publication number
EP1160799A4
EP1160799A4 EP00900161A EP00900161A EP1160799A4 EP 1160799 A4 EP1160799 A4 EP 1160799A4 EP 00900161 A EP00900161 A EP 00900161A EP 00900161 A EP00900161 A EP 00900161A EP 1160799 A4 EP1160799 A4 EP 1160799A4
Authority
EP
European Patent Office
Prior art keywords
electron beam
reaction device
beam projection
projection reaction
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP00900161A
Other languages
German (de)
English (en)
Other versions
EP1160799A1 (fr
Inventor
Yoshitaka Doi
Masao Nomoto
Kazuaki Hayashi
Masahiro Izutsu
Yoshiharu Kageyama
Kyoichi Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of EP1160799A1 publication Critical patent/EP1160799A1/fr
Publication of EP1160799A4 publication Critical patent/EP1160799A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/04Irradiation devices with beam-forming means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/60Simultaneously removing sulfur oxides and nitrogen oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/812Electrons

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treating Waste Gases (AREA)
EP00900161A 1999-01-11 2000-01-11 Dispositif de reaction a une projection de faisceau electronique Withdrawn EP1160799A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP426899 1999-01-11
JP426899 1999-01-11
PCT/JP2000/000065 WO2000042620A1 (fr) 1999-01-11 2000-01-11 Dispositif de reaction a une projection de faisceau electronique

Publications (2)

Publication Number Publication Date
EP1160799A1 EP1160799A1 (fr) 2001-12-05
EP1160799A4 true EP1160799A4 (fr) 2003-02-26

Family

ID=11579807

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00900161A Withdrawn EP1160799A4 (fr) 1999-01-11 2000-01-11 Dispositif de reaction a une projection de faisceau electronique

Country Status (8)

Country Link
US (1) US6724003B1 (fr)
EP (1) EP1160799A4 (fr)
JP (1) JP3895927B2 (fr)
CN (1) CN1172319C (fr)
AU (1) AU1892400A (fr)
BG (1) BG64572B1 (fr)
BR (1) BR0007813A (fr)
WO (1) WO2000042620A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008025868A1 (de) * 2008-05-30 2009-12-03 Krones Ag Vorrichtung zum Sterilisieren von Behältnissen mittels Ladungsträgern
DE102012106555A1 (de) * 2012-07-19 2014-05-22 Krones Ag Verfahren und Vorrichtung zum Sterilisieren von Behältnissen mit Kühlluftentnahme aus dem Sterilraum
AU2013329153B2 (en) 2012-10-10 2017-09-14 Xyleco, Inc. Treating biomass
DE102012112368A1 (de) * 2012-12-17 2014-06-18 Krones Ag Vorrichtung und Verfahren zum Rinsen
CN103108484A (zh) * 2012-12-26 2013-05-15 江苏达胜加速器制造有限公司 一种高压型加速器
NZ743055A (en) * 2013-03-08 2020-03-27 Xyleco Inc Equipment protecting enclosures
MX2019001975A (es) 2016-08-20 2019-08-29 Buehler Ag Dispositivos y metodos para pasteurizar y/o esterilizar material en particulas y cartucho.
EP3528273B1 (fr) * 2018-02-20 2023-08-23 Bühler AG Dispositifs et procédé de pasteurisation et/ou de stérilisation de produits particulaires
RU2742712C1 (ru) * 2020-09-25 2021-02-10 Акционерное общество «Газпромнефть - Омский НПЗ» (АО «Газпромнефть - ОНПЗ») Окно для вывода пучка электронов из вакуумной камеры ускорителя в атмосферу и ввода в рабочую камеру радиационно-химического реактора

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3400776A1 (de) * 1984-01-12 1985-07-25 Erich Poehlmann Verfahren und vorrichtung zur verringerung von emissionen gefaehrlicher molekularer stoffe
DE4327081A1 (de) * 1993-08-12 1995-02-16 Univ Schiller Jena Durchflußreaktor für Flüssigkeiten und/oder Gase

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2670440A (en) * 1952-11-26 1954-02-23 Carroll M Gordon Accelerator target holder
GB1166053A (en) * 1966-08-08 1969-10-01 Atomic Energy Authority Uk Improvements in or relating to Particle Accelerators
US3486060A (en) * 1967-09-06 1969-12-23 High Voltage Engineering Corp Cooling apparatus with laminar flow for electron permeable windows
US3867637A (en) * 1973-09-04 1975-02-18 Raytheon Co Extended monochromatic x-ray source
JPS5196998A (fr) 1975-02-24 1976-08-25
JPS5237553A (en) 1975-09-20 1977-03-23 Ebara Corp Method for improving the life time of irradiation window of a reactor for treating exhaust gas irradiated with radiation
JPS5839320B2 (ja) * 1976-06-07 1983-08-29 日新ハイボルテ−ジ株式会社 照射窓冷却方法
JPS5375163A (en) * 1976-12-15 1978-07-04 Ebara Corp Improving method for life of window foil of irradiataion window and incidencewindow in treating apparatus of radiation irradiating type for exhaust gas
DE2904171A1 (de) 1979-02-05 1980-08-14 Siemens Ag Verfahren zum herstellen von aus amorphem silizium bestehenden halbleiterkoerpern durch glimmentladung
CH658762A5 (en) * 1980-05-30 1986-11-28 Dmitriev Stanislav P Vacuum chamber of an accelerator for electrically charged particles
US4631444A (en) * 1982-09-29 1986-12-23 Tetra Pak Developpement Sa Readily attachable and detachable electron-beam permeable window assembly
JPS63168899A (ja) 1987-01-05 1988-07-12 Nec Corp ピ−クホ−ルド回路
JPS63168900A (ja) 1987-01-06 1988-07-12 Toshiba Corp 半導体記憶装置
US5416440A (en) * 1990-08-17 1995-05-16 Raychem Corporation Transmission window for particle accelerator
US5378898A (en) * 1992-09-08 1995-01-03 Zapit Technology, Inc. Electron beam system
US5319211A (en) * 1992-09-08 1994-06-07 Schonberg Radiation Corp. Toxic remediation
JP3569329B2 (ja) 1994-12-12 2004-09-22 日本原子力研究所 電子ビーム照射設備の照射窓装置
JP3488524B2 (ja) * 1994-12-12 2004-01-19 日本原子力研究所 電子ビーム照射設備の照射窓装置
JP3291437B2 (ja) * 1995-10-17 2002-06-10 株式会社荏原製作所 電子ビーム加速器の窓箔冷却方法および装置
JPH09133799A (ja) * 1995-11-07 1997-05-20 Nissin High Voltage Co Ltd 電子線照射装置の窓箔冷却装置
JPH09145900A (ja) * 1995-11-25 1997-06-06 Nissin High Voltage Co Ltd 電子線照射装置の窓箔冷却構造

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3400776A1 (de) * 1984-01-12 1985-07-25 Erich Poehlmann Verfahren und vorrichtung zur verringerung von emissionen gefaehrlicher molekularer stoffe
DE4327081A1 (de) * 1993-08-12 1995-02-16 Univ Schiller Jena Durchflußreaktor für Flüssigkeiten und/oder Gase

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO0042620A1 *

Also Published As

Publication number Publication date
EP1160799A1 (fr) 2001-12-05
WO2000042620A1 (fr) 2000-07-20
US6724003B1 (en) 2004-04-20
JP3895927B2 (ja) 2007-03-22
BG105694A (en) 2002-06-28
AU1892400A (en) 2000-08-01
CN1340200A (zh) 2002-03-13
CN1172319C (zh) 2004-10-20
BG64572B1 (bg) 2005-07-29
BR0007813A (pt) 2001-11-06

Similar Documents

Publication Publication Date Title
EP1152452A4 (fr) Dispositif a faisceau d'electrons
GB2363929B (en) Mechanically oscillated projection display
ZA200110077B (en) Implanter apparatus.
EP1220272A4 (fr) Source de faisceaux
EP1235251A4 (fr) Appareil a faisceau electronique
GB2349737B (en) Electron beam exposure apparatus
IL133320A0 (en) Shaped shadow projection for an electron beam column
GB9905132D0 (en) Electron emitting devices
GB9702348D0 (en) Electron emitter devices
EP1154457A4 (fr) Tube electronique
EP1160799A4 (fr) Dispositif de reaction a une projection de faisceau electronique
GB2345795B (en) Electron beam tube
EP1077463A4 (fr) Dispositif d'emission de faisceau electronique et dispositif de formation d'image
TW523165U (en) Electron beam exposure device
GB2331836B (en) Electron beam tubes
GB9828007D0 (en) Electron beam tubes
GB2335787B (en) Electron beam tubes
GB2349236B (en) Projection system
GB2359098B (en) Flexible beam
GB9901616D0 (en) Electron beam tubes
GB9702347D0 (en) Electron emitter devices
GB2368451B (en) Electron beam exposure apparatus
EP1152448A4 (fr) Tube electronique
GB2356928B (en) X-ray beam position monitors
GB2350891B (en) X-ray beam position monitors

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20010808

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

A4 Supplementary search report drawn up and despatched

Effective date: 20030110

RIC1 Information provided on ipc code assigned before grant

Ipc: 7B 01D 53/32 B

Ipc: 7B 01D 53/00 B

Ipc: 7B 01J 19/08 B

Ipc: 7B 01D 53/60 B

Ipc: 7G 21K 5/04 B

Ipc: 7G 21K 5/00 A

RBV Designated contracting states (corrected)

Designated state(s): DE FR GB IT

17Q First examination report despatched

Effective date: 20050302

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20050314