EP1043282A4 - Verre en quartz synthetique et procede de fabrication - Google Patents

Verre en quartz synthetique et procede de fabrication

Info

Publication number
EP1043282A4
EP1043282A4 EP99951132A EP99951132A EP1043282A4 EP 1043282 A4 EP1043282 A4 EP 1043282A4 EP 99951132 A EP99951132 A EP 99951132A EP 99951132 A EP99951132 A EP 99951132A EP 1043282 A4 EP1043282 A4 EP 1043282A4
Authority
EP
European Patent Office
Prior art keywords
production
quartz glass
synthetic quartz
synthetic
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99951132A
Other languages
German (de)
English (en)
Other versions
EP1043282A1 (fr
Inventor
Yoshiaki Ikuta
Shinya Kikugawa
Noriaki Shimodaira
Akio Masui
Shuhei Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of EP1043282A1 publication Critical patent/EP1043282A1/fr
Publication of EP1043282A4 publication Critical patent/EP1043282A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S501/00—Compositions: ceramic
    • Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
    • Y10S501/905—Ultraviolet transmitting or absorbing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/15—Nonoxygen containing chalogenides
    • Y10S65/16—Optical filament or fiber treatment with fluorine or incorporating fluorine in final product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Glass Compositions (AREA)
EP99951132A 1998-10-28 1999-10-28 Verre en quartz synthetique et procede de fabrication Withdrawn EP1043282A4 (fr)

Applications Claiming Priority (19)

Application Number Priority Date Filing Date Title
JP30747698 1998-10-28
JP30747698 1998-10-28
JP33863698 1998-11-30
JP33863698 1998-11-30
JP35011698 1998-12-09
JP35011698 1998-12-09
JP35335198 1998-12-11
JP35335198 1998-12-11
JP35333998 1998-12-11
JP35333998 1998-12-11
JP36767198 1998-12-24
JP36767198 1998-12-24
JP37001498 1998-12-25
JP37001498 1998-12-25
JP9361399 1999-03-31
JP9361399 1999-03-31
JP27503099 1999-09-28
JP27503099 1999-09-28
PCT/JP1999/005995 WO2000024685A1 (fr) 1998-10-28 1999-10-28 Verre en quartz synthetique et procede de fabrication

Publications (2)

Publication Number Publication Date
EP1043282A1 EP1043282A1 (fr) 2000-10-11
EP1043282A4 true EP1043282A4 (fr) 2004-03-31

Family

ID=27577279

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99951132A Withdrawn EP1043282A4 (fr) 1998-10-28 1999-10-28 Verre en quartz synthetique et procede de fabrication

Country Status (3)

Country Link
US (2) US6499317B1 (fr)
EP (1) EP1043282A4 (fr)
WO (1) WO2000024685A1 (fr)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8402786B2 (en) * 1998-01-30 2013-03-26 Asahi Glass Company, Limited Synthetic silica glass optical component and process for its production
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6682859B2 (en) 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
JP2000264671A (ja) * 1999-03-12 2000-09-26 Shin Etsu Chem Co Ltd 合成石英ガラス部材
JP4051805B2 (ja) * 1999-03-25 2008-02-27 旭硝子株式会社 露光装置およびフォトマスク
JP4453939B2 (ja) * 1999-09-16 2010-04-21 信越石英株式会社 Ｆ２エキシマレーザー透過用光学シリカガラス部材及びその製造方法
JP3069562B1 (ja) * 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
US6410192B1 (en) * 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
JP3228732B2 (ja) * 1999-11-24 2001-11-12 信越石英株式会社 真空紫外線リソグラフィーに用いられる投影レンズ用シリカガラス光学材料の製造方法
US6990836B2 (en) 2000-02-23 2006-01-31 Shin-Etsu Chemical Co., Ltd. Method of producing fluorine-containing synthetic quartz glass
TW554260B (en) * 2001-02-24 2003-09-21 Corning Inc A below 193 nm UVU transmitting glass photomask, the method of making their blank, the method of making said glass and the method of making homogenous glass optical element
JP3582500B2 (ja) * 2001-05-23 2004-10-27 ウシオ電機株式会社 超高圧水銀ランプ
JP4466809B2 (ja) * 2001-07-18 2010-05-26 日本電気株式会社 シリコン絶縁膜とその製造方法ならびにシリコンダングリングボンドの終端方法
WO2003024879A1 (fr) * 2001-09-12 2003-03-27 Japan Science And Technology Agency Procede de recyclage du verre de recuperation et verre recycle
US8037717B2 (en) * 2001-10-26 2011-10-18 Corning Incorporated Methods and apparatus for pulsed doping or drying a soot preform
JP4104338B2 (ja) * 2002-01-31 2008-06-18 信越石英株式会社 ＡｒＦ露光装置用合成石英ガラス素材
EP1498394B1 (fr) * 2002-04-23 2009-10-14 Asahi Glass Company Ltd. Verre de quartz synthetique pour element optique, dispositif de projection et procede de projection
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
EP1547981A3 (fr) * 2003-12-25 2011-07-06 Sumitomo Electric Industries, Ltd. Procédé de fabrication d'un corp en verre de silice dopé par le flour, d'une préforme et d'une fibre optique anisi qu'une fibre optique obtenue par le procédé
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
US8614722B2 (en) * 2004-12-06 2013-12-24 Semiconductor Energy Laboratory Co., Ltd. Display device and driving method of the same
US7589039B2 (en) * 2004-12-29 2009-09-15 Corning Incorporated Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
US7506522B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High refractive index homogeneity fused silica glass and method of making same
TWI312768B (en) * 2004-12-30 2009-08-01 Corning Incorporate Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
DE102005017752B4 (de) * 2005-04-15 2016-08-04 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
WO2006136184A1 (fr) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag Objectif de projection pour microlithographie, et element de fermeture correspondant
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
US7592063B2 (en) * 2006-09-05 2009-09-22 Asahi Glass Company, Limited Quartz glass substrate and process for its production
JP2008063181A (ja) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法
EP2070883B2 (fr) * 2006-09-11 2017-04-19 Tosoh Corporation Verre de quartz et procédé pour produire celui-ci
JP2011225438A (ja) * 2010-04-01 2011-11-10 Asahi Glass Co Ltd 合成石英ガラスの製造方法
JP5786406B2 (ja) * 2010-04-01 2015-09-30 旭硝子株式会社 合成石英ガラスの製造方法
EP2508491B1 (fr) * 2011-04-05 2017-01-11 Heraeus Quarzglas GmbH & Co. KG Verre de silice synthétique, en particulier pour le gainage d'une fibre optique
DE102011120412B4 (de) 2011-12-08 2018-03-08 Heraeus Quarzglas Gmbh & Co. Kg Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor
WO2014073389A1 (fr) 2012-11-08 2014-05-15 Hoya株式会社 Procédé de production d'une ébauche de masque et procédé de production d'un masque de transfert
DE102013202256B3 (de) * 2013-02-12 2014-07-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Titan-dotiertem synthetischen Quarzglas und dessen Verwendung
CN105473518B (zh) * 2013-08-15 2019-11-05 Ａｇｃ株式会社 低散射石英玻璃和石英玻璃的热处理方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5567533A (en) * 1978-11-07 1980-05-21 Nippon Telegr & Teleph Corp <Ntt> Production of glass base material for light transmission
US4988162A (en) * 1988-06-29 1991-01-29 Mitsubishi Cable Industries, Ltd. Radiation resistant multiple fiber
EP0546196A1 (fr) * 1991-06-29 1993-06-16 Shin-Etsu Quartz Products Co., Ltd. Element optique en quartz de synthese pour laser a excimere et realisation de cet element
EP0590199A1 (fr) * 1991-04-04 1994-04-06 Shin-Etsu Chemical Co., Ltd. Fibre en verre de silice résistant à la radiation ultraviolette
US5364428A (en) * 1985-03-18 1994-11-15 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0813689B2 (ja) * 1989-06-06 1996-02-14 信越化学工業株式会社 光ファイバ用母材の製造方法
US5330941A (en) 1991-07-24 1994-07-19 Asahi Glass Company Ltd. Quartz glass substrate for polysilicon thin film transistor liquid crystal display
JP3368932B2 (ja) 1992-02-07 2003-01-20 旭硝子株式会社 透明石英ガラスとその製造方法
US5326729A (en) 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JPH0710548A (ja) * 1993-06-18 1995-01-13 Sumitomo Electric Ind Ltd フッ化物ガラスの製造方法
KR100298167B1 (ko) * 1994-07-07 2001-10-24 오노 시게오 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재
JP3125630B2 (ja) 1994-07-07 2001-01-22 株式会社ニコン 真空紫外用石英ガラスの製造方法および石英ガラス光学部材
JPH0867530A (ja) 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd 紫外光用光学ガラス
JPH1067526A (ja) * 1996-08-22 1998-03-10 Nikon Corp 石英ガラス光学部材
EP0835848A3 (fr) 1996-08-21 1998-06-10 Nikon Corporation Verre de silice contenant du fluor, son procédé de fabrication et un appareil d'exposition par projection contenant ce verre
JP2980094B2 (ja) * 1997-05-16 1999-11-22 住友電気工業株式会社 石英ガラス物品及びその製造方法
JPH11305419A (ja) * 1998-02-18 1999-11-05 Nikon Corp フォトマスク、収差補正板、及び露光装置
US8402786B2 (en) * 1998-01-30 2013-03-26 Asahi Glass Company, Limited Synthetic silica glass optical component and process for its production
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
KR100694554B1 (ko) * 1999-03-25 2007-03-13 아사히 가라스 가부시키가이샤 광학부재용 합성석영유리와 그 제조방법 및 사용방법
JP4051805B2 (ja) 1999-03-25 2008-02-27 旭硝子株式会社 露光装置およびフォトマスク
KR100667636B1 (ko) * 1999-06-10 2007-01-12 아사히 가라스 가부시키가이샤 합성석영유리와 그의 제조방법
WO2001020401A1 (fr) * 1999-09-13 2001-03-22 Asahi Glass Company, Limited Pellicule et son procede de fabrication

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5567533A (en) * 1978-11-07 1980-05-21 Nippon Telegr & Teleph Corp <Ntt> Production of glass base material for light transmission
US5364428A (en) * 1985-03-18 1994-11-15 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber
US4988162A (en) * 1988-06-29 1991-01-29 Mitsubishi Cable Industries, Ltd. Radiation resistant multiple fiber
EP0590199A1 (fr) * 1991-04-04 1994-04-06 Shin-Etsu Chemical Co., Ltd. Fibre en verre de silice résistant à la radiation ultraviolette
EP0546196A1 (fr) * 1991-06-29 1993-06-16 Shin-Etsu Quartz Products Co., Ltd. Element optique en quartz de synthese pour laser a excimere et realisation de cet element

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 004, no. 106 (C - 020) 30 July 1980 (1980-07-30) *
See also references of WO0024685A1 *

Also Published As

Publication number Publication date
US6499317B1 (en) 2002-12-31
EP1043282A1 (fr) 2000-10-11
US7022633B2 (en) 2006-04-04
WO2000024685A1 (fr) 2000-05-04
US20030195107A1 (en) 2003-10-16

Similar Documents

Publication Publication Date Title
EP1043282A4 (fr) Verre en quartz synthetique et procede de fabrication
EP1125897A4 (fr) Verre de silice synth tique et son proc d de pr paration
IL124497A0 (en) Quartz glass article and its manufacture
EP1094039A4 (fr) Procede de fabrication d&#39;un creuset en verre de quartz
EP1129998A4 (fr) Procede de production d&#39;un element de verre de quartz, et element en verre de quartz ainsi produit
PL348060A1 (en) Method for producing 3-alkanoylindoles and 3-alkylindoles
GB2329893B (en) A composition for manufacturing silica glass and method for manufacturing silica glass using the same
EP1256547A4 (fr) Procedes de production de particules de silice, de particules de quartz de synthese et de verre au quartz de synthese
AU8467398A (en) Fluorescent photosensitive glasses and process for the production thereof
GB2327428B (en) Photocatalytic glass article and method for producing same
HU9700279D0 (en) Method of making glass
GB9822824D0 (en) Decorative window and process for making same
GB2327670B (en) Method for fabricating silica glass
AU2321500A (en) Method and device for forming quartz glass
GB9819651D0 (en) Matrerial and process for its production
GB2328938B (en) Method for producing glass preform
GB2291370B (en) An article and method for its production
GB2328685B (en) Method for fabricating silica glass
EP1076064A4 (fr) Nouveau cristal de derive d&#39;aspartame et son procede de fabrication
GB9822837D0 (en) Improved carton and method for manufacture thereof
GB9814953D0 (en) Preform and production method therefor
HK1023559A1 (en) Process for producing dichloroacetoxypropane and derivatives thereof
EP1154313A4 (fr) Materiau a non linearite optique et son procede de production
IL120920A0 (en) Diamond and method for its production
HUP9900121A3 (en) Process for producing naphthyridones and intermediates

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20000720

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

A4 Supplementary search report drawn up and despatched

Effective date: 20040213

RIC1 Information provided on ipc code assigned before grant

Ipc: 7C 03B 37/018 B

Ipc: 7C 03B 37/014 B

Ipc: 7C 03C 3/06 B

Ipc: 7C 03B 19/14 A

17Q First examination report despatched

Effective date: 20050606

17Q First examination report despatched

Effective date: 20050606

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: ASAHI GLASS COMPANY, LIMITED

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20150430