EP1036615B1 - Procédé pour le moussage d'articles métalliques - Google Patents
Procédé pour le moussage d'articles métalliques Download PDFInfo
- Publication number
- EP1036615B1 EP1036615B1 EP00105235A EP00105235A EP1036615B1 EP 1036615 B1 EP1036615 B1 EP 1036615B1 EP 00105235 A EP00105235 A EP 00105235A EP 00105235 A EP00105235 A EP 00105235A EP 1036615 B1 EP1036615 B1 EP 1036615B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- protective layer
- space
- wall
- radiation
- pressed part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005187 foaming Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 19
- 230000005855 radiation Effects 0.000 claims abstract description 30
- 239000011241 protective layer Substances 0.000 claims abstract description 27
- 239000010410 layer Substances 0.000 claims abstract description 20
- 239000000843 powder Substances 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 25
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 239000003380 propellant Substances 0.000 claims description 6
- 239000006260 foam Substances 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000005566 electron beam evaporation Methods 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 238000005240 physical vapour deposition Methods 0.000 claims description 4
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 238000007654 immersion Methods 0.000 claims description 3
- 238000005468 ion implantation Methods 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000009832 plasma treatment Methods 0.000 claims description 2
- 229910052593 corundum Inorganic materials 0.000 claims 4
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 4
- 229910052681 coesite Inorganic materials 0.000 claims 3
- 229910052906 cristobalite Inorganic materials 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- 229910052682 stishovite Inorganic materials 0.000 claims 3
- 229910052905 tridymite Inorganic materials 0.000 claims 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 239000004411 aluminium Substances 0.000 claims 1
- 238000005234 chemical deposition Methods 0.000 claims 1
- 238000005289 physical deposition Methods 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 239000011265 semifinished product Substances 0.000 abstract description 4
- 239000004604 Blowing Agent Substances 0.000 abstract 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 7
- 239000002131 composite material Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000029087 digestion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000006262 metallic foam Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- -1 titanium hydride Chemical compound 0.000 description 1
- 229910000048 titanium hydride Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
- B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
- B22F3/11—Making porous workpieces or articles
- B22F3/1121—Making porous workpieces or articles by using decomposable, meltable or sublimatable fillers
- B22F3/1125—Making porous workpieces or articles by using decomposable, meltable or sublimatable fillers involving a foaming process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0001—Heating elements or systems
- F27D99/0006—Electric heating elements or system
- F27D2099/0028—Microwave heating
Definitions
- the invention relates to a method for foaming one of at least a metal powder and at least one gas-releasing propellant powder existing Pressings, which is optionally connected to at least one cover layer, wherein the Pressling is placed in a room and heated to foaming. Further
- the invention relates to the use of a device for foaming a Compact.
- From DE 44 26 627 C2 discloses a method and an apparatus for the production of metallic Composite materials of one or more cover layers of solid material and from a core located between them, known by compression a mixture of at least one metal powder and at least one gas-releasing Propellant powder is formed. A composite thus formed is then placed in a chamber furnace introduced at a temperature of 850 ° C. At this temperature foams the Pressling to the extent necessary without melting the outer layers.
- the heating is thus carried out by heat transfer such that initially over indirectly transfer the heat to the pellet via a foaming tool becomes.
- a foaming tool becomes.
- A1 relates to a device for the digestion of substances.
- a substance to be analyzed can be placed in a quartz glass vessel be introduced, the substance side with a protective layer z.
- the present invention is based on the problem with high efficiency and energetic low-foaming compacts, with the additional possibility to be given is intended to heat different areas of the compact different or, where appropriate to observe the foaming in order to be able to intervene in a targeted manner.
- the problem is essentially solved by the fact that the compact is foamed by externally injected into the room radiation energy, wherein the space of a transparent, semitransparent or translucent wall is limited, at least the space inside with one opposite the foamable compact and the optional topcoat chemically inert, permeable to the coupled radiation energy or substantially permeable protective layer is provided.
- quartz glass material or such containing is in question.
- Al 2 O 3 and / or Si 3 N 4 and / or BN and / or SiO 2 / Al 2 O 3 and / or mixtures thereof may be used as the protective layer.
- the protective layer can be applied to the inner surfaces of the wall, optionally via a bonding agent layer, by PVD methods.
- electron beam evaporation, magnetron sputtering, cathodic arc evaporation or plasma immersion ion implantation come into question.
- the protective layer such as aluminum oxide layer is coupled via at least one graded intermediate layer in particular of silicon and aluminum oxide to the wall as the quartz glass component, in particular the protective layer such as aluminum oxide layer by physical vapor deposition and / or chemical vapor deposition is deposited and preferably the alumina is formed by post-oxidation of an aluminum layer by means of plasma treatment and / or thermal oxidation or reaction with SiO 2 .
- the invention relates to the use of a device with one of a wall limited space and a radiant energy einkoppelnden in the room Energy source, wherein the wall opposite to the input radiation energy is transparent or at least translucent and at least room inside with a chemically inert to the foamable material and to the radiant energy transparent or translucent protective layer is covered, for foaming a arranged in the space consisting of at least one metal powder and at least one gas-releasing propellant powder consisting of existing compact.
- the thickness D of the wall itself should be in the range between 5 and 25 mm in particular about 15 mm.
- the heat source itself is preferably IR emitters, the Radiation energy is coupled in such a way that in the foaming body Heat sinks can form. This allows a targeted foaming geometry and targeted density gradient can be achieved.
- the thickness thereof should be in the range between 20 nm and 2 ⁇ m.
- the quartz glass By the use of quartz glass material to form the walls, the Surrounded by frothing to press, arrive mechanically durable long-term stable Materials are used that are manufactured and used inexpensively can.
- the quartz glass ensures that heat radiation, especially in the Infrared range up to 2 microns and in the range between 3 and 3.5 microns with a transmission coefficient between 0.8 and 0.9 can be coupled. Furthermore, results in the Use of quartz glass the possibility of visual observation during foaming, so that a controlling intervention during foaming is possible.
- the wall can consist of quartz glass components. Quartz glass is because of its high melting point and high transparency in the infrared and in the visible spectral range for coupling heat radiation into hot, liquid and gaseous media and for the observation of the processes themselves suitable. When contact However, reactions occur with chemically aggressive media such as liquid aluminum on, the quartz glass parts or components made therefrom within a short time to destroy.
- the invention proposes that the transparent glass block on its facing the material Side chemically passivated and provided with a protective layer of aluminum oxide. This may have a thickness between 20 nm and 2 microns.
- the alumina layer is made up of a graded interlayer Silicon and / or alumina is coupled to the base material.
- a device 10 in which a compact 12, on opposite Provided with metal cover layers 14, 16, foamed to a metallic composite of light weight, However, to produce high strength.
- Appropriate composites form efficient Lightweight structures, the z. B. in traffic engineering used. Such composites are characterized by low density at relatively high Stiffness out.
- the compact 12 may consist of a mixture of aluminum powder and z. B. 12% by weight Silicon powder and 0.8% by weight of titanium hydride powder as gas-releasing Propellant powder be composed, which then mixed precompacted into a billet become. This can be open or closed pore. Then the compact 12 has been covered with the cover layers 14, 16 by rollers. If the compact 12 was open-pored, this step becomes a necessary closed porosity achieved.
- the temperature during rolling itself is about 400 ° C.
- the sandwich body thus formed is then introduced into a space 18, which a wall 20 is limited, which consists of quartz glass material.
- a wall 20 which consists of quartz glass material.
- the space of a cup-shaped lower part 22 and this final Cover part 24 is formed.
- the walls with a Protective layer 26, 28 provided the radiation to be coupled into the space 18 is permeable.
- the thickness of the wall 20 itself is also chosen so that this is transparent or translucent with respect to a radiation that can be coupled in.
- the receptacle is circumferentially surrounded in the embodiment of infrared radiators, exemplified by reference numerals 30, 32.
- the protective layer 26 is preferably one of Al 2 O 3 , Si 3 N 4 , BN or SiO 2 / Al 2 O 3 or containing these materials.
- the protective layer is compared to the aggressive material of the compact, so in particular when using aluminum powder against this chemically inert, so that the otherwise vulnerable to aluminum quartz material is protected.
- the thickness of the protective layer 26, 28, however, is selected such that it is also transparent or translucent with respect to the radiation to be coupled in.
- radiation can be coupled in from the outside into the space 18 to the extent necessary to heat the compact 12 to a temperature that allows foaming.
- the infrared radiators 30, 32 can be arranged around the space 18 in such a way that heat sinks can form in the pressed body 12, whereby targeted geometry formation and / or density gradients can be achieved during foaming.
- the space 18 may further have an internal geometry, that of the final geometry should correspond to the foamed workpiece.
- the walls 20 can be modular, so that with simple measures a change is possible.
- the protective layers 26, 28 are preferably by PVD method, in particular by electron beam evaporation, magnetron sputtering, arc evaporation or Plasma immersion ion implantation applied.
- the protective layer 26, 28 sufficiently protects the quartz glass material, its Thickness between 5 and 25 nm, in particular in the range of 10 nm.
- the wall itself has a thickness D of 15 mm.
- the emitters 30, 32 preferably emit light in the mid-infrared range. Regardless, however, the wavelength should be based on the material of the wall and the Be matched protective layer to ensure a high degree of transmission.
- Fig. 2 is purely in principle a z. B. for a Kokillenan angel particular bottom plate 34 made of quartz glass, the z. B. dimensions of 180x80x5 mm 3 has.
- the plate 34 has on its kokilleninnen compounder surface 36 in an approximately 1 micron thick and adherent layer 38 of Al 2 O 3 .
- the electron beam evaporation of an Al 2 O 3 melt can be used. The coating is carried out at a residual gas pressure of about 1 x 10 -4 mbar.
- the corresponding plate 34 may be in a mold, not shown, with the layer 38 be used facing the interior. Both when pouring liquid aluminum as well as the melting of an aluminum sheet by means of infrared radiation, the was coupled through the transparent plate 36, a reaction with the Quartz glass plate 34 liquid aluminum can not be determined. After cooling could a solidified aluminum part without difficulty from the coated quartz glass plate 34 are removed.
- the mold itself may be arranged in a carrier receptacle for transport to facilitate a heat source such as infrared radiators or away from them. hereby There is a simplification of the charging or the handling of the foaming or foamed materials.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Engineering & Computer Science (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
Claims (12)
- Procédé pour le moussage d'une pièce moulée composée d'au moins une poudre métallique et d'au moins une poudre moussante divisant par gaz, cette même pièce moulée étant le cas échéant reliée à au moins une couche de surface, sachant que la pièce moulée est placée dans une chambre et chauffée pour le moussage,
caractérisé en ce que
le moussage de la pièce moulée est réalisé par énergie radiante introduite de l'extérieur dans la chambre, sachant que la chambre est limitée par une paroi transparente, semi-transparente et/ou translucide qui présente au moins sur le côté intérieur de la chambre une couche protectrice chimiquement inerte par rapport à la pièce moulée à faire mousser, et perméable ou en grande partie perméable à l'énergie radiante introduite. - Procédé selon la revendication 1,
caractérisé en ce que
est utilisée une couche protectrice chimiquement inerte par rapport à la couche de surface éventuellement présente. - Procédé selon au moins la revendication 1 ou 2,
caractérisé en ce que
la pièce moulée est chauffée par un rayonnement d'une longueur d'ondes λ de 700 nm < λ < 4 µm, en particulier de 3,0 < λ < 3,5 µm, ou par un rayonnement infrarouge moyen ou par un rayonnement infrarouge lointain ou par un rayonnement hyperfréquence. - Procédé selon au moins une des revendications précédentes,
caractérisé en ce que
est utilisé, en tant que paroi de la chambre abritant la pièce moulée, un matériau moulé transparent ou semi-transparent par rapport au rayonnement introduit, tel qu'un matériau en verre de silice ou en contenant. - Procédé selon au moins une des revendications précédentes,
caractérisé en ce que
est utilisé, en tant que couche protectrice, de l'Al2O3 et/ou du Si3N4 et/ou de l'Al2O3/SiO2 et/ou du BN ou un matériau en comprenant, sachant que de préférence la couche protectrice présente une épaisseur d de 8 nm ≤ d ≤ 2 µm, en particulier d d'environ 20 nm à 500 nm. - Procédé selon au moins une des revendications précédentes,
caractérisé en ce que
la couche protectrice est déposée par un procédé en phase vapeur, par évaporation par faisceau d'électrons, pulvérisation par magnétron, évaporation par arc électrique ou implantation ionique par immersion plasma. - Procédé selon au moins une des revendications précédentes,
caractérisé en ce que
l'énergie radiante est introduite de telle manière que des puits de chaleur se forment dans la pièce moulée. - Procédé selon au moins une des revendications précédentes,
caractérisé en ce que
la couche protectrice, telle qu'une couche d'oxyde d'aluminium (38), est couplée à la paroi telle que la pièce en verre de silice (34) au moyen d'au moins une couche intermédiaire concentrée par évaporation en particulier en oxyde de silicium et d'aluminium, qu'en particulier la couche protectrice telle qu'une couche d'oxyde d'aluminium est appliquée par déposition physique issue de la phase vapeur et/ou par déposition chimique issue de la phase gazeuse et que de préférence l'oxyde d'aluminium est formé par oxydation subséquente d'une couche d'aluminium au moyen d'un traitement plasma et/ou d'une oxydation thermique ou d'une réaction avec du SiO2. - Utilisation d'un dispositif avec une chambre limitée par une paroi ainsi qu'une source d'énergie introduisant une énergie radiante dans la chambre, sachant que la paroi est transparente ou au moins translucide par rapport à l'énergie radiante devant être introduite et est recouverte au moins sur le côté intérieur de la chambre d'une couche protectrice chimiquement inerte par rapport au matériau à faire mousser et transparente ou translucide par rapport à l'énergie radiante, pour le moussage d'une pièce moulée placée dans la chambre et constituée d'au moins une poudre métallique et d'au moins une poudre moussante divisant par gaz.
- Utilisation du dispositif selon la revendication 9, sachant que la paroi est formée sur la base du verre de silice, en particulier sous forme d'élément de verre de silice, sachant que la paroi a le cas échéant une structure modulaire et que la paroi présente de préférence une épaisseur D de 5 mm ≤ D ≤ 25 mm, en particulier D d'environ 15 mm.
- Utilisation d'un dispositif selon la revendication 9, sachant que la couche protectrice est constituée d'Al2O3 et/ou de SiO2/Al2O3 et/ou de Si3N4 et/ou de BN ou en contient et présente de préférence une épaisseur d de 20 nm ≤ d ≤ 2 µm.
- Utilisation d'un dispositif selon une des revendications 9 à 11, sachant que la source de chaleur est en particulier au moins un projecteur infrarouge et que de préférence la source de chaleur est disposée à l'extérieur de la chambre de telle manière que des puits de chaleur puissent se former dans la pièce moulée.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19911228 | 1999-03-13 | ||
DE19911228 | 1999-03-13 | ||
DE1999154755 DE19954755A1 (de) | 1999-11-15 | 1999-11-15 | Verfahren und Vorrichtung zum Aufschäumen eines metallischen Werkstoffes |
DE19954755 | 1999-11-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1036615A1 EP1036615A1 (fr) | 2000-09-20 |
EP1036615B1 true EP1036615B1 (fr) | 2005-05-25 |
Family
ID=26052347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00105235A Expired - Lifetime EP1036615B1 (fr) | 1999-03-13 | 2000-03-13 | Procédé pour le moussage d'articles métalliques |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1036615B1 (fr) |
AT (1) | ATE296179T1 (fr) |
DE (1) | DE50010372D1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015118787A1 (de) * | 2015-11-03 | 2017-05-04 | HAVEL metal foam GmbH | Verfahren und Vorrichtung zur Herstellung von Metallschaumverbundkörpern und Metallschaumverbundkörper |
EP3653740A4 (fr) * | 2017-07-14 | 2020-12-30 | Japan Science and Technology Agency | Procédé de production de mousse métallique et dispositif de production de mousse métallique |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0234791B2 (ja) * | 1980-01-14 | 1990-08-06 | Maruzen Kk | Tenjitonokeiseihoho |
DE4413423A1 (de) * | 1994-04-18 | 1995-10-19 | Paar Anton Kg | Vorrichtung zum Aufschluß von Substanzen |
DE19503240C2 (de) * | 1995-02-02 | 1997-04-10 | Huels Chemische Werke Ag | Form zur Gelierung und Vulkanisation von geformten Artikeln aus Latexschaum mittels Mikrowellenenergie |
DE19734394C2 (de) * | 1996-08-13 | 2003-06-18 | Friedrich Wilhelm Bessel Inst | Verfahren und Vorrichtung zur Herstellung von Metallschaum |
AT406558B (de) * | 1998-05-27 | 2000-06-26 | Illichmann Gmbh Leichtmetallgu | Verfahren und vorrichtung zum herstellen von metallschaumteilen |
-
2000
- 2000-03-13 AT AT00105235T patent/ATE296179T1/de not_active IP Right Cessation
- 2000-03-13 DE DE50010372T patent/DE50010372D1/de not_active Expired - Fee Related
- 2000-03-13 EP EP00105235A patent/EP1036615B1/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ATE296179T1 (de) | 2005-06-15 |
EP1036615A1 (fr) | 2000-09-20 |
DE50010372D1 (de) | 2005-06-30 |
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