EP0995805B9 - Wärmebehandlungsanlage für eine Charge metallischer Werkstücke - Google Patents

Wärmebehandlungsanlage für eine Charge metallischer Werkstücke Download PDF

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Publication number
EP0995805B9
EP0995805B9 EP98811062A EP98811062A EP0995805B9 EP 0995805 B9 EP0995805 B9 EP 0995805B9 EP 98811062 A EP98811062 A EP 98811062A EP 98811062 A EP98811062 A EP 98811062A EP 0995805 B9 EP0995805 B9 EP 0995805B9
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EP
European Patent Office
Prior art keywords
furnace
installation according
tank
charge
installation
Prior art date
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Expired - Lifetime
Application number
EP98811062A
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English (en)
French (fr)
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EP0995805B1 (de
EP0995805A1 (de
Inventor
Pierre Beuret
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Individual
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Individual
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Filing date
Publication date
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Priority to EP98811062A priority Critical patent/EP0995805B9/de
Priority to DE69815108T priority patent/DE69815108T2/de
Priority to ES98811062T priority patent/ES2199416T3/es
Priority to AT98811062T priority patent/ATE241705T1/de
Publication of EP0995805A1 publication Critical patent/EP0995805A1/de
Application granted granted Critical
Publication of EP0995805B1 publication Critical patent/EP0995805B1/de
Publication of EP0995805B9 publication Critical patent/EP0995805B9/de
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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0073—Seals
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/0037—Rotary furnaces with vertical axis; Furnaces with rotating floor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B2017/0091—Series of chambers, e.g. associated in their use
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/16—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a circular or arcuate path
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00—Charging; Discharging; Manipulation of charge
    • F27D2003/0034—Means for moving, conveying, transporting the charge in the furnace or in the charging facilities
    • F27D2003/0036—Means for moving, conveying, transporting the charge in the furnace or in the charging facilities comprising inflatable or extendable parts
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00—Charging; Discharging; Manipulation of charge
    • F27D2003/0034—Means for moving, conveying, transporting the charge in the furnace or in the charging facilities
    • F27D2003/0075—Charging or discharging vertically, e.g. through a bottom opening
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00—Cooling of furnaces or of charges therein
    • F27D2009/007—Cooling of charges therein
    • F27D2009/0089—Quenching
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/06—Forming or maintaining special atmospheres or vacuum within heating chambers

Definitions

  • the present invention refers to an installation for the heat treatment of a load of metal parts, this installation comprising at least one oven under gas protection or under vacuum and at least one quenching tank according to the introduction of claim 1.
  • a heat treatment plant is known from EP-A-806 485. This document discloses a installation with an airlock and joints to perform the Waterproof transfer of the oven load into a bin or vice versa. Apart from having to use an airlock, this installation does not prevent the oxidation of the surface of the parts of the charge, the pollution and the Oven cooling during the complete work cycle.
  • EP-A-893 510 which does not constitute a published prior art before the filing date, discloses an installation for the automatic heat treatment, including seals. However, both sets of this installation are stationary and it is therefore not possible to put any tray next to an oven. In addition, this construction does not maintain the watertightness of ovens and bins during a work cycle.
  • an aim of the The present invention is to provide an installation of heat treatment does not need to cool the oven, and to treat the parts including their transfer without surface oxidation and without gas pollution Oven treatment or without pollution of the oven vacuum during the entire work cycle.
  • another aim of the present invention is to substantially reduce as well the length of such an installation that the time of treatment.
  • FIGS 1 and 2 schematically show a first embodiment of an installation according to the invention with a treatment furnace for a maximum temperature of 1100 ° C and two bins mounted on a rotary table.
  • This installation allows, for example, austenitization treatment, annealing, tempering, sintering or brazing.
  • the oven 1 includes a heating chamber 2 with a turbine of circulation of atmospheres 3, a plug 4 as a support for the batch to be treated 5 and two trays, that is to say. two loading or cooling chambers 6 and 7.
  • the plug load support is moved vertically by both lift pistons 8 and 9, as indicated by both double arrows.
  • the oven furthermore comprises a heating body 10 and an insulated double jacket 11 according to the art of the known art.
  • the oven 1 is fixed on a top table 12 while bins, that is to say the loading chambers or cooling 6 and 7 with the lift pistons 8 and 9 are fixed to a rotary table 13.
  • the fixed table 12 is mounted on a support 14.
  • the rotary table 13 is driven in rotation by a motor 15.
  • Between the fixed table and the rotary table are two sets of joints, a joint 16 to establish gas and vacuum tightness and two inner seals 17 and 18, which form a first sealing barrier between the bins and the fixed table higher.
  • All seals are inflatable seals, known per se in the prior art, and are partially deflated in the case where the rotary table is set rotation, and then inflated to seal.
  • Each charging or cooling chamber 6 and 7 comprises a circulation turbine of atmospheres 19 and 20, a common vacuum pump 21 which is connected by means of valves 22 and 23 at said loading chambers or cooling.
  • Each tray 6 and 7 comprises a feed 24 and 25 and the furnace comprises a gas supply 26.
  • the upper table comprises a door 27 which has a seal 28 and which allows the introduction of the load in a bins.
  • a filling with nitrogen for example or another gas can transfer the load to be treated in the oven under protective gas or under vacuum.
  • the remaining oven always at temperature allows to perform a treatment supra.
  • the load is evacuated in one of the two rooms for cooling. Before the rotation for transfer and cooling we will have prepared a new charge to be processed in the free tank of any charge. It is thus possible to treat, by alternation, parts without surface oxidation and without cooling of the oven as well as without gas pollution of treatment or oven vacuum.
  • Figures 3A - 3L schematically show a cycle of job.
  • Figure 3A shows the preparation of the charge 5 and we see that the door 27 is open.
  • Figure B shows conditioning the load by vacuum and figure C the descent of the left plug 4 for opening the oven.
  • the Figure D shows the rotation of the bins to put the load 5 under the oven, before being introduced into it (figure E), to start the treatment cycle.
  • Figure F shows preparing a second charge 5A during the cycle of treatment of the first, and figure G the conditioning of this charge 5A by vacuum.
  • Figure H shows the opening of the oven and the descent of the load 5, and the figure I the rotation of the bins with immediate cooling 5.
  • Figure K shows the introduction of the charge 5A in the oven to perform the treatment cycle during the cooling of the charge 5.
  • the figure L shows the load 5A during the treatment cycle in course and evacuation of the load 5, as well as the place a new load 5B.
  • This cycle of operations shows the great advantage of this installation according to the invention, allowing on the one hand prepare one load while the other is in the oven and, especially, to bring and evacuate the load of the oven without vacuum or gas pollution in the furnace and without oxidation charges. All the operations described are carried out in a leakproof way to the outside by the seal Outside 16 is the inner seals 17 and 18.
  • FIGS 4 and 5 show a second embodiment of the installation according to the invention with an oven and three trays.
  • the oven 29 is similar to oven 1 of the example previous with the same elements such as chamber of heater, turbine, plug 4 which supports the load 5.
  • the fixed upper table system 12 and its support 14 are also the same as in the previous example, while the rotary table 30 is arranged to carry three bins and includes three interior gaskets 31, 32 and 33.
  • the outer seal 16 is similar to that of the execution described above as well as the door 27 with its attached 28.
  • the first bin is a loading chamber 34, similar to room 6, the second bin is a room of gas cooling 35 and the third tray is a cooling chamber with a liquid 36, for example 37.
  • the loading chamber and the chamber of gas cooling include turbines 38 and 39 while the oil-cooled chamber includes an oil pump 40 for the circulation of the oil.
  • This installation also includes a vacuum pump with valves to be able to evacuate the loading and cooling under gas, as well as gas feeds for the rooms and for the oven.
  • Each room includes in addition to a lift piston 41, resp. 42, resp. 43.
  • FIGS. 6A to 6K An example of a work cycle with this installation is described with reference to FIGS. 6A to 6K.
  • Figure 6A shows the preparing the charge 5 above the chamber of loading 34 with the door 27 open.
  • Figure 6B shows the conditioning of the load, possibly by vacuum, with the door 27 closed and figure C shows the situation after rotating the chambers with a stroke of 120 ° for bring the load 5 under the oven.
  • Figure D the charge is introduced into the oven and the treatment cycle in the oven begins.
  • the plugs are upgraded with rotary table after treatment to rotate as shown in Figure F. During this rotation, the load slides on the table and after, the oil chamber is under the load, that is to say under the oven.
  • Figure G shows the descent of the charge and the immediate cooling of it in oil.
  • FIG H we see the preparation of the second load 5A, this being possibly conditioned by the vacuum, as well as the cooling of the first charge 5 in the oil.
  • Figure I shows a new rotation of the rooms to bring the second load 5A under the oven before introducing it.
  • Figure 6K finally shows the situation where the treatment cycle is performed for the second load 5A while the first load 5 is evacuated, to return to the situation of the Figure 6E.
  • Figure 7 shows a third example of execution of a according to the invention with a vacuum oven 44 to hot wall with 45 graphite heating, insulation 46, a circulation turbine 3 for the bass processing temperatures and caps 49, 49A supporting the load 5.
  • the upper fixed table system 12 with its door 27 and seal 28, the rotary table 13 driven by the motor 15 and the two joint systems with outer seal 16 and inner seals 17 and 18, is the same as before.
  • the bins hanging at the table rotary are two loading and unloading chambers 47 and 48 with built-in cooler, including both turbines 19 and 20 according to the first embodiment.
  • FIGS. 8A to 8L illustrating an exemplary cycle of work done by the installation of Figure 7.
  • the Figure 8A shows the preparation of the load 5 with the door open and Figure 8B shows the packaging of the charge by vacuum.
  • Figure C shows the descent of the cap 49 and the opening of the oven followed by the rotation of chambers according to Figure D to bring the load 5 under the oven.
  • Figure E shows the introduction of the load into the oven initiating the treatment cycle.
  • the second load 5A is prepared and conditioned by the vacuum according to Figure G.
  • Figure H shows the opening of the oven and the descent of the first charge followed by a rotation of rooms with immediate cooling of the first charge in the cooling chamber 47 (Figure I) and then, at the Figure K, the introduction of the second load 5A into the oven for the treatment cycle, while the first charge is still cooled.
  • Figure 8L shows that while the second charge is being treatment, the first charge is evacuated and the third load 5B is amended on the cap, to be then packaged and processed.
  • the vacuum oven has a cold wall and graphite insulation.
  • Figure 9 shows a variant of the installation according to Figure 7 with an oven 50 similar to the previous oven but possessing in addition four mechanical stops 51 with their commands 52 to hold or release the load 5A, as this will be apparent from the description according to FIGS. 10A to 10L.
  • the top fixed table 12 is similar to the previous case with the door 27 and its seals 28 as well as the support of the 14. Between the fixed table 12 and the rotary table 13 is find the same system of joints as described before and the rotary table is driven by the engine 15. At the table rotating are suspended at least one oil chamber 53 with its pump system 40 and at least one tank of gas cooling 54 with the turbine 20.
  • the tank 54 is a pressure chamber and that is why the lift piston provided for the other bins is here replaced by an elevator 55 comprising a load support 56, linked to a bearing column 57 with a screw 58 which is rotated by a motor 59 with transmission by chain, to move up or down the elevator. All the device of the elevator is in the enclosure of the pressure chamber. Up, the pressure chamber is closed by a lower door 60, seals 61 sealing. Loading and unloading parts can be done by this pressure chamber, or so the installation includes, in addition to this pressure chamber and the oil chamber, a loading chamber described in the previous examples.
  • FIGS. 10A to 10L schematically show a cycle of possible treatment with the installation of Figure 9.
  • the Figure 10A shows the preparation of the charge 5, always with the door open, and Figure 10B the conditioning of the vacuum charge, with the door 27 closed, followed by the rotation of the chambers to put the load under the oven (Figure 10C).
  • Figure D the load is introduced into the oven to begin the treatment cycle and, at the end of the cycle in Figure E, the load is down and the hooks 51 are closed to retain it during the down the cap by the elevator 55.
  • the rooms are rotated to bring the room to under the oven and, according to G, the load support is mounted and the hooks are open.
  • the load on the support of charge went down to be immersed in the oil (figure H) for immediate cooling, intensified by a forced flow channel in the oil chamber.
  • the second charge 5A is prepared and packaged by the vacuum, then rotated according to FIG K for bring it under the oven for a treatment cycle according to the Figure L, while the first load is evacuated after draining to enchaine a new cycle from the situation shown in Figure D.
  • Figure 11 shows another embodiment of a the installation according to the invention with a similar oven 62 in oven 29 of Figure 4, but having in addition two half-drawers 63 and 63A, forming the plug, which are controlled by mechanical elements 64.
  • Everything is fixed on the upper fixed table 12 which is similar to that previous performances and attached to the supports 14.
  • Under the fixed table is a rotary table similar to that previous executions, with both joint systems exterior and interior.
  • the bins that is to say the room oil and the cooling chamber (s), are the same as in the embodiment according to Figure 4.
  • Figures 12A through 12P show a work cycle with the installation according to Figure 11 and make it easier to understand the role of the two half-drawers 63, 63A.
  • Figure 12A shows preparing the charge 5
  • figure B is conditioning by vacuum
  • figure C the rotation of chambers for placing said charge under the oven.
  • D the half-drawers are moved to open the oven, before the charge is introduced into it and that the half-drawers are slightly closed, like this Figure E shows the load support in Figure F 56 is lowered to deposit the load on the cap 63, 63A.
  • the oven is closed and the treatment cycle start. Meanwhile, the rooms are set rotation and the oil pan is brought under the oven and simultaneously according to I the second load 5A is prepared and conditioned by the vacuum.
  • a pre-opening plug that is to say half-drawers is performed, and the load support is moved upwards.
  • the oven is completely open and in figure M, the load is immersed and cooled immediately into the oil chamber with forced flow channel.
  • the chambers are again rotated, and the second load 5A is under the oven.
  • the charge 5A is introduced into the oven according to the figures C to G, the cycle of treatment in the oven begins, while after draining, the first charge 5 is evacuated.
  • the chambers are rotated to take the oil pan under the oven while a new charge 5B is prepared to undergo the cycle according to the figures 12A and following.
  • the plug which presents the shape of two half-drawers 63 and 63A is not moved vertically, as in the first executions, but is pulled or pushed horizontally.
  • FIGS 13 and 14 schematically show a variant of execution with, for example an oven and four bins hanging on the rotary table.
  • the oven can be of the kind of one of the ovens described previously, while two bins are provided for loading / unloading and two bins for the cooling, either by gas or by liquid, for example oil. All combinations are possible, that is to say that the number and kind of ovens, nor the number and the kind bins is in principle limited in an installation according to the invention.
  • FIGS. 1 to 14 are installations with a fixed table and a rotary table comprising seals.
  • the furnace (s) are attached to the fixed table and the hanging bins connected to the rotary table.
  • an inverse montage that is to say according to which the furnace (s) are attached to the rotary table and where the bins are hanging at a table fixed, is also possible.
  • the sealing between the fixed table and the rotary table is provided by an inflatable outer seal and joints, depending on the number of bins, interiors inflatable, all ensuring a perfect seal of so as to allow a treatment of parts, on the one hand, without surface oxidation and without pollution of treatment gases oven or without pollution of the oven vacuum and, on the other hand, without cooling the oven during operations.
  • FIGS 15 to 17 show a first embodiment of such a linear displacement installation with an oven and two bins.
  • the oven corresponds to the oven 1 of the execution according to Figure 1, with the same elements, such as chamber heating, turbine and cap, this oven being fixed on a upper table 65 supported by a support 66.
  • a translation table 67 is located below the upper table, the translation table carrying two bins 68 and 69 arranged in loading chambers and cooling and each provided with a piston 8 and 9 lift and gas supply and connected to a pump empty to evacuate the rooms.
  • an outer seal 70 and two inner seals 71 and 72 are provided, these seals being inflatable like the others joints mentioned above.
  • the linear solution requires, as shown in Figure 16, two watertight loading doors 73 and 74.
  • Figures 18 to 21 show an oven installation pushing long charge.
  • the load can be for example a load composed of tubes 6 m long, to be annealed under empty or under atmosphere, and it is obvious that the reduction important of the total length of such a facility where the oven must be the same length, has an advantage considerable.
  • the oven 75 of the type pushing long load is known per se and includes a sealed channel or carcass 76 and a heating chamber 77 and a circulation turbine atmosphere 78 and a supply of gas 79, the whole being placed in an enclosure 80.
  • Each of the two chambers of loading / unloading 81, 82 is provided with a cooler 83 and a gas circulation turbine 84.
  • the installation further comprises a fixed plate 85 attached to the oven and equipped with two loading doors 86 or unloading baskets or other objects, such as tubes. These doors are provided with seals.
  • the rooms Loading or unloading are secured to a platen mobile 87 mounted on slide. Waterproofness is ensured by a seal 88 around each loading chamber, these seals being inflatable like the previous seals.
  • Each loading or unloading chamber includes a system 89 allowing the introduction and the extraction of the charge 90 in the cooling channel and in the oven.
  • a vacuum pump can extract the chamber in position of loading or unloading the gases or oxygen. In this way, no trace of oxidation or pollution of the atmosphere is possible.
  • the arrangement of the elements of the installation allows reduce one or two load lengths congestion of the installation and, above all, not to immobilize the loading chamber during the cooling of the charge. This is clear if we compare this installation according to the invention with the installations known until now and sold by different houses.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Claims (14)

  1. Anlage zur thermischen Behandlung einer Charge von Metallstücken, welche eine erste Einheit mit mindestens einem Ofen und eine zweite Einheit mit mindestens einem Behälter aufweist, wobei die eine Einheit gegenüber der anderen verschiebbar ist, sowie mindestens eine zwischen den zwei Einheiten angeordnete Dichtung, wobei die eine Einheit an einer ortsfesten Struktur (12; 65, 85) und die andere Einheit an einer gegenüber der ortsfesten Struktur verschiebbaren Struktur (13, 30; 67, 87) befestigt ist, wobei die Struktur mindestens einen Behälter (6, 7; 34, 35, 36; 47, 48; 68, 69; 81, 82) enthält, der am Ort eines jeden Behälters mit einer inneren, um den Behälter verlaufenden Dichtung (17, 18; 31, 32, 33; 71, 72; 88A, 88B) versehen ist und zwischen den beiden Strukturen in der Nähe des Umfangs der Strukturen eine durchgehende äussere Dichtung (16, 70, 88C) angeordnet ist, die äusseren und inneren Dichtungen die wahlweise Platzierung einer der Behälter (6, 7; 34, 35, 36; 47, 48; 68, 69; 81, 82) gegenüber einem der Öfen (17, 18; 31, 32, 33; 70, 71, 72; 75) gestatten und gleichzeitig eine doppelte Abdichtung gewährleisten und die Oberflächenoxidation der Stücke der Charge (5, 5A, 5B), Verunreinigungen sowie die Abkühlung des Ofens während dem Arbeitszyklus vermeiden.
  2. Anlage nach Anspruch 1, dadurch gekennzeichnet, dass die jeweils um die Behälter verlaufende innere Dichtung (17, 18; 31, 32, 33; 71, 72; 88A, 88B) und/oder die äussere Dichtung (16, 70, 88C) aufblasbar ist bzw. sind.
  3. Anlage nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass der Ofen bzw. die Öfen (17, 18; 31, 32, 33; 70, 71, 72; 88) an der ortsfesten Struktur und die Behälter (6, 7; 34, 35, 36; 47, 48; 68, 69; 81, 82) an der verschiebbaren Struktur befestigt sind.
  4. Anlage nach Anspruch 3, dadurch gekennzeichnet, dass die ortsfeste Struktur ein Tisch (12) ist, der den Ofen bzw. die Öfen (1, 29, 44, 50) trägt und an einem Gestell (14) befestigt ist, und dass die verschiebbare Struktur ein drehbarer Tisch (13) ist, der die Behältern (6, 7; 34, 35, 36; 47, 48) trägt.
  5. Anlage nach Anspruch 3, dadurch gekennzeichnet, dass die ortsfeste Struktur ein fester Tisch (65) ist, der den Ofen bzw. die Öfen (17, 18; 31, 32, 33; 70, 71, 72; 88) trägt, und dass die verschiebbare Struktur ein linear verschiebbarer Tisch (67) ist, der die Behältern (68, 69) trägt.
  6. Anlage nach Anspruch 4, dadurch gekennzeichnet, dass der feste Tisch (12) eine Türe (27) mit einer Dichtung (28) zur Beschickung/Entnahme der Charge (5, 5A, 5B) aufweist.
  7. Anlage nach Anspruch 4 oder 6, dadurch gekennzeichnet, dass die Behälter (6, 7; 34, 35, 36; 47, 48) am drehbaren Tisch (13) aufgehängt sind, und dass die Behälter jeweils einen Hubkolben (8, 9; 41, 42, 43) zur Bewegung der Charge (5, 5A, 5B) aufweisen, wobei der Verschlusszapfen (4, 4A) des Ofens den Chargenträger bildet.
  8. Anlage nach einem der Ansprüche 1 bis 4 oder 6, dadurch gekennzeichnet, dass mindestens ein Behälter eine Kühlflüssigkeit (53) enthält, und dass ein anderee Behälter eine Druckbehälter (54) ist, welcher einen Heber (55) mit Chargenträger (56) und eine dichte untere Türe (64) aufweist.
  9. Anlage nach Anspruch 8, dadurch gekennzeichnet, dass der Ofen (50) mechanische Anschläge (51) aufweist, welche die Charge (5) während der Drehung des drehbaren Tischs (13) festhalten.
  10. Anlage nach einem der Ansprüche 1 bis 4, 6 oder 7, dadurch gekennzeichnet, dass der Ofen (1, 29, 44) einen Verschlusszapfen bestehend aus zwei Schieberhälften (63, 63A) aufweist, welche eine horizontale Bewegung ausführen.
  11. Anlage nach einem der Ansprüche 1 bis 4 und 6 bis 10, dadurch gekennzeichnet, dass die zweite Einheit mindestens einen Beschickungs- und Entnahmebehälter (6; 34; 47, 48), eine Abkühleinheit unter Gas (35, 54) und eine Abkühleinheit mit Flüssigkeit (36, 53) aufweist.
  12. Anlage nach Anspruch 5, dadurch gekennzeichnet, dass der Ofen bzw. die Öfen (64) auf einem oberen Tisch befestigt ist bzw. sind, und dass die Behälter (68, 69) an einem verschiebbaren Tisch (67) aufgehängt sind, wobei der obere Tisch auf beiden Seiten des Ofens eine Türe (73, 74) aufweist.
  13. Anlage nach Anspruch 5, dadurch gekennzeichnet, dass der Ofen ein Durchstossofen (75) für lange Chargen ist und eine Platine (85) mit zwei Beschickungs- bzw. Entnahmetüren aufweist, und dass zwei Beschickungs- bzw. Entnahmekammern (81, 82) an einer auf einer Schiene montierten beweglichen Platine befestigt sind, wobei die Kammern jeweils eine Dichtung (88) aufweisen.
  14. Anlage nach Anspruch 13, dadurch gekennzeichnet, dass die Kammern (81, 82) jeweils ein Antriebssystem (89) für die Charge (90) aufweisen.
EP98811062A 1998-10-23 1998-10-23 Wärmebehandlungsanlage für eine Charge metallischer Werkstücke Expired - Lifetime EP0995805B9 (de)

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EP98811062A EP0995805B9 (de) 1998-10-23 1998-10-23 Wärmebehandlungsanlage für eine Charge metallischer Werkstücke
DE69815108T DE69815108T2 (de) 1998-10-23 1998-10-23 Wärmebehandlungsanlage für eine Charge metallischer Werkstücke
ES98811062T ES2199416T3 (es) 1998-10-23 1998-10-23 Instalacion para el tratamiento termico de una carga de piezas metalicas.
AT98811062T ATE241705T1 (de) 1998-10-23 1998-10-23 Wärmebehandlungsanlage für eine charge metallischer werkstücke

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US8974386B2 (en) 1998-04-30 2015-03-10 Abbott Diabetes Care Inc. Analyte monitoring device and methods of use
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DE102014008767A1 (de) * 2014-06-12 2015-12-17 Audi Ag Prozesssystem zur Bearbeitung eines Bauteils
US20190117131A1 (en) 2017-10-24 2019-04-25 Dexcom, Inc. Pre-connected analyte sensors
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Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2247770A (en) * 1940-07-27 1941-07-01 Gen Electric Heat treating apparatus
DE2924270C2 (de) * 1979-06-15 1986-10-16 Dr. Werner Herdieckerhoff, Nachf. Industrieöfen-Apparatebau, 4750 Unna Arbeitsverfahren zur Gefüge- und/oder Oberflächenveredelung von Metallen und Vorrichtung dafür
US4861000A (en) * 1987-06-03 1989-08-29 Pierre Beuret Installation having several elements for heat treatments
FR2644567A1 (fr) * 1989-03-17 1990-09-21 Etudes Const Mecaniques Dispositif pour l'execution de traitements thermiques enchaines en continu sous vide
EP0785402B1 (de) * 1996-01-17 2001-05-02 Pierre Beuret Wärmebehandlungsanlage für eine Ladung aus metallischen Stücken
EP0806485A1 (de) * 1996-05-06 1997-11-12 Patherm SA Wärmebehandlungsanlage
IT1293740B1 (it) * 1997-07-21 1999-03-10 Refrattari Brebbia S R L Impianto automatico per trattamenti termici di materiali metallici, in particolare acciai.

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US8346338B2 (en) 2003-08-22 2013-01-01 Dexcom, Inc. System and methods for replacing signal artifacts in a glucose sensor data stream
US8792955B2 (en) 2004-05-03 2014-07-29 Dexcom, Inc. Transcutaneous analyte sensor
US8231531B2 (en) 2004-07-13 2012-07-31 Dexcom, Inc. Analyte sensor
US8313434B2 (en) 2004-07-13 2012-11-20 Dexcom, Inc. Analyte sensor inserter system
US8452368B2 (en) 2004-07-13 2013-05-28 Dexcom, Inc. Transcutaneous analyte sensor
US7885697B2 (en) 2004-07-13 2011-02-08 Dexcom, Inc. Transcutaneous analyte sensor
US9414777B2 (en) 2004-07-13 2016-08-16 Dexcom, Inc. Transcutaneous analyte sensor
US8792953B2 (en) 2004-07-13 2014-07-29 Dexcom, Inc. Transcutaneous analyte sensor
US9078607B2 (en) 2005-11-01 2015-07-14 Abbott Diabetes Care Inc. Analyte monitoring device and methods of use
US8920319B2 (en) 2005-11-01 2014-12-30 Abbott Diabetes Care Inc. Analyte monitoring device and methods of use
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US9326716B2 (en) 2005-11-01 2016-05-03 Abbott Diabetes Care Inc. Analyte monitoring device and methods of use
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US9020572B2 (en) 2008-02-21 2015-04-28 Dexcom, Inc. Systems and methods for processing, transmitting and displaying sensor data
US8591455B2 (en) 2008-02-21 2013-11-26 Dexcom, Inc. Systems and methods for customizing delivery of sensor data
US8229535B2 (en) 2008-02-21 2012-07-24 Dexcom, Inc. Systems and methods for blood glucose monitoring and alert delivery
US9143569B2 (en) 2008-02-21 2015-09-22 Dexcom, Inc. Systems and methods for processing, transmitting and displaying sensor data

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ATE241705T1 (de) 2003-06-15
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ES2199416T3 (es) 2004-02-16
EP0995805A1 (de) 2000-04-26
DE69815108D1 (de) 2003-07-03

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