EP0949479B1 - Halbleiterzünder - Google Patents
Halbleiterzünder Download PDFInfo
- Publication number
- EP0949479B1 EP0949479B1 EP99106969A EP99106969A EP0949479B1 EP 0949479 B1 EP0949479 B1 EP 0949479B1 EP 99106969 A EP99106969 A EP 99106969A EP 99106969 A EP99106969 A EP 99106969A EP 0949479 B1 EP0949479 B1 EP 0949479B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- semiconductor
- ignition
- igniter according
- semiconductor layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B3/00—Blasting cartridges, i.e. case and explosive
- F42B3/10—Initiators therefor
- F42B3/12—Bridge initiators
- F42B3/13—Bridge initiators with semiconductive bridge
Definitions
- the invention relates to a semiconductor igniter, in particular for the Gas generator of a protection system for vehicle occupants, according to the generic term of claim 1.
- Semiconductor fuses of this type which are mainly due to hot wire fuses their much lower susceptibility to interference more and more spread find are known from EP 0 762 073 A1 or US 5,309,841 and consist of a heavily p-doped or n-doped semiconductor layer between end contact pieces on an electrically insulated or non-conductive Carrier is arranged and during the passage of current to produce a ionized semiconductor plasma suddenly heated or evaporated and thereby the ignition - usually by way of a primary ignition charge - is triggered. Out Due to a high ignition efficiency, it is necessary to use a thermal Insert insulation layer between the semiconductor layer and the carrier.
- the patent specification DE 197 02 118 C1 shows for example a squib for triggering a Airbags, with a carrier and a chip, the lightly doped silicon and two electrodes having.
- the two electrodes are separated by a highly doped silicon area, which is intended as a heating zone.
- a free space is as thermal insulation to the wearer intended.
- the object of the invention is to design a semiconductor igniter of the type mentioned in the introduction, that in a simple manner in terms of production and while maintaining high ignition efficiency great structural strength is achieved.
- the semiconductor igniter according to the invention is especially for a gas generator Protection system suitable for vehicle occupants and has a bridge-like semiconductor layer, the end portions and an intermediate ignition gap area, wherein the semiconductor layer is connected at the end to electrical contact areas to heat in an ignition-triggering manner during the passage of current in the area of the ignition, and continue to do so a carrier is provided on which the semiconductor layer is applied at the end sections and is firmly connected to the carrier, as well as a thermal insulation layer that is trench-shaped is incorporated into the carrier.
- the thermal insulation layer lies between the firing range and the carrier and it is local to the firing range limited.
- the semiconductor layer is at the end sections molded integrally to the carrier according to claim 2, whereby an even safer Bond between the semiconductor layer and carrier is achieved.
- the thermal insulation layer from a porous, the semiconductor layer in the ignition gap area to produce supporting material, namely according to claim 4 on production simple way in that the carrier material itself, for example is locally porosized electrochemically.
- the carrier material itself, for example is locally porosized electrochemically.
- porous Material according to claim 5 preferably oxidized to the thermal conductivity to further reduce the insulation layer.
- the semiconductor layer as claimed 6 preferred to be designed as a free-standing bridge structure in the ignition zone area, namely according to claim 7 expediently such that the first porosified insulation material is removed by etching, so that as thermal Insulation layer an air-filled under the ignition gap area and, if desired, evacuable cavity through which the thermal ignition energy losses can be reduced even more.
- the semiconductor layer is im Ignition zone range from an explosive combustion when heated Ignition enhancer surrounded, which after reaching a relative low temperature levels of non-electrically generated heat for the ignition process is made available.
- the ignition enhancer expediently in the form of a with regard to one low ignition delay thin coating applied to the semiconductor layer.
- porous insulation layer it is for reinforcement of the ignition pulse either optionally or additionally also possible porous insulation material according to claim 10 with a gaseous or to impregnate metal-containing ignition reinforcing agents.
- the semiconductor layer is preferably in several to each other parallel and mutually insulated bridge bridges to the beam divided, whereby with a comparatively large bridge width, which create large contact areas for those above the semiconductor layer ignition charge located is advantageous on the way between the Bridges existing gaps a thermal easily Formation of insulation layer on the underside of the bridge.
- the semiconductor layer is as operated in the reverse direction, when the breakdown voltage is exceeded ignition-triggering heating semiconductor element with at least one p-n transition, thus approximately as a pair of anti-parallel diodes. hereby the susceptibility to interference of the semiconductor igniter is further reduced and received a distinctly short, sharp ignition pulse.
- the carrier and the semiconductor layer expediently made of differently doped silicon, for example in the form of a Silicon wafers.
- the semiconductor igniter shown in FIGS. 1 and 2 contains a carrier 2 in Form of a weakly p-doped silicon wafer, one in the carrier 2 trench-shaped thermal insulation layer 4, a semiconductor bridge 6, also made of silicon, but heavily n-doped, which is in the ignition gap area 8 supported on the thermal insulation layer 4 and on the bridge end sections 10, 12 under the same material, mechanically stronger Connection is applied directly to the carrier 2, as well as electrical Bridge end sections 10, 12 contact pieces 14, 16 covering a large area the via connection elements 18, 20 with the - not shown - ignition electronics stay in contact.
- the thermal insulation layer 4 is made of the carrier material itself in the Made that the carrier 2 in electro- or photochemical way one limited locally to the ignition gap area 8 of the semiconductor bridge 6 Zone is porosized.
- the thermal insulation layer 4 ensures that the electrically generated Heat is largely converted into ignition energy, so that the ignition gap material abruptly heated and thereby the ignition in the above of the semiconductor bridge 6 arranged primary ignition charge (not shown).
- those kept free by the thermal insulation layer 4 End sections 10, 12 is the semiconductor bridge 6 with regard to the acting thermal and mechanical loads securely anchored to the carrier 2.
- the porous silicon layer can improve the thermal protective effect 4 at least on the area areas adjoining the ignition section area 8 be oxidized.
- the semiconductor bridge 106 at its end portions 110 and 112 integrally formed on the carrier 102 the semiconductor bridge 106 from the carrier 102 by different doping, namely on the semiconductor bridge 106 a strong n- and in the area of the carrier 102 a weak p-silicon doping, is delimited.
- the Thermal insulation layer in this embodiment from an air-filled and, if desired, evacuable, trench-shaped in the carrier material incorporated cavity 104.
- the semiconductor bridge 206 in the ignition gap area 208 into a plurality of bridge webs 24 parallel to one another divided to a wide bridge width for a large area Initiation of the primary ignition charge located above the semiconductor bridge 206 is advantageous, the electrochemical etching process for porosizing the Insulation layer 204 over the spaces between the bridge webs 24 without problems, ie without an excessively high driving depth and thus the thickness of the Insulation layer 206 to be able to perform.
- the semiconductor bridge 206 can also have parallel bridge webs 24 with a large number be provided by etching holes or slots, via which the etching process to produce the thermal insulation layer 204.
- the semiconductor bridge 206 is also on the bridge webs 24 kind of a semiconductor element provided with several p-n junctions, that is about - as shown - designed as an antipolar diode pair 26, which is operated in the reverse direction and changes when the Breakdown voltage heated to generate an ignition pulse. This will reduce the sensitivity to interference the semiconductor igniter further reduced and an even steeper Receive ignition pulse.
- the semiconductor bridge typically has a wall thickness between 1 and 10 ⁇ m, a length between 20 and 1000 ⁇ m and a width between 20 and 300 microns (according to FIG. 4, the bridge length is about 100 microns and the Bridge width about 200 ⁇ m), the thickness of the thermal insulation layer corresponds to approximately half the bridge or web width and is approx. 30 ⁇ m, that of the metallic ignition reinforcement layer 22 at approximately 0.5 ⁇ m and the Semiconductor detonators have a total height of around 500 ⁇ m.
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Air Bags (AREA)
- Carpets (AREA)
Description
- Fig. 1
- die Aufsicht eines erfindungsgemäßen Halbleiterzünders in stark vergrößertem Maßstab;
- Fig. 2
- einen Schnitt des Halbleiterzünders nach Fig. 1 längs der Linie I-I;
- Fig. 3
- ein zweites Ausführungsbeispiel eines Halbleiterzünders mit einstückig angeformter Halbleiterbrücke in einer der Fig. 2 entsprechenden Darstellung; und
- Fig. 4
- ein weiteres Ausführungsbeispiel eines Halbleiterzünders mit einer mehrteiligen Halbleiterbrücke in der Aufsicht.
Claims (13)
- Halbleiterzünder, insbesondere für einen Gasgenerator eines Schutzsystems für Fahrzeuginsassen, mit
einer brückenartigen Halbleiterschicht (6; 106; 206), die Endabschnitte (10, 12; 110, 112; 210, 212) und einen dazwischen liegenden Zündstreckenbereich (8; 108; 208) umfasst, wobei die Halbleiterschicht (6; 106; 206) endseitig an elektrische Kontaktbereiche angeschlossen ist, um sich beim Stromdurchgang im Zündstreckenbereich (8; 108; 208) zündauslösend zu erhitzen,
einem Träger (2; 102; 202), auf dem die Halbleiterschicht (6; 106; 206) an den Endabschnitten (10, 12; 110, 112; 210, 212) aufgebracht und fest mit dem Träger (2; 102; 202) verbunden ist, und
einer thermischen Isolationsschicht (4; 104; 204),
dadurch gekennzeichnet, dass
die thermische Isolationsschicht (4; 104; 204) grabenförmig in den Träger (2; 102; 202) eingearbeitet ist, wobei die thermische Isolationsschicht (4; 104; 204) zwischen dem Zündstreckenbereich (8; 108; 208) und dem Träger (2; 102; 202) liegt und örtlich auf den Zündstreckenbereich (8; 108; 208) begrenzt ist. - Halbleiterzünder nach Anspruch 1,
dadurch gekennzeichnet, daß
die Halbleiterschicht (106; 206) an den Endabschnitten (110, 112; 210; 212) einstückig an den Träger (102; 202) angeformt ist. - Halbleiterzünder nach Anspruch 1 oder 2,
dadurch gekennzeichnet, daß
die thermische Isolationsschicht (4; 204) aus einem porösen, die Halbleiterschicht (6;206) im Zündstreckenbereich (8; 208) stützenden Material besteht. - Halbleiterzünder nach Anspruch 3,
dadurch gekennzeichnet, daß
das poröse Isolationsmaterial aus porosiziertem Trägermaterial besteht. - Halbleiterzünder nach Anspruch 3 oder 4,
dadurch gekennzeichnet, daß
das poröse Isolationsmaterial oxidiert ist. - Halbleiterzünder nach einem der vorhergehenden Ansprüche,
dadurch gekennzeichnet, daß
die thermische Isolationsschicht aus einem aus dem Trägermaterial herausgeätzten Hohlraum (104) besteht. - Halbleiterzünder nach Anspruch 6 in Verbindung mit einem der Ansprüche 3 bis 5,
dadurch gekennzeichnet, daß
der Hohlraum (104) durch Entfernen des porösen Isolationsmaterials gebildet ist. - Halbleiterzünder nach einem der vorhergehenden Ansprüche,
dadurch gekennzeichnet, daß
die Halbleiterschicht (6; 106; 206) im Zündstreckenbereich (8; 108; 208) von einem bei Erhitzung explosionsartig verbrennenden Zündverstärkungsmittel (22) umgeben ist. - Halbleiterzünder nach Anspruch 8,
dadurch gekennzeichnet, daß
das Zündverstärkungsmittel (22) aus einer auf die Halbleiterschicht (106) örtlich aufgebrachten Beschichtung besteht. - Halbleiterzünder nach Anspruch 8 in Verbindung mit einem der Ansprüche 3 bis 5,
gekennzeichnet durch
ein in das poröse Isolationsmaterial (4; 204) eingebrachtes, gasförmiges oder metallhaltiges Zündverstärkungsmittel. - Halbleiterzünder nach einem der vorhergehenden Ansprüche,
dadurch gekennzeichnet, daß
die Halbleiterschicht (206) in mehrere, zueinander parallele, gegenseitig und zum Träger (202) thermisch isolierte Brückenstege (24) unterteilt ist. - Halbleiterzünder nach einem der vorhergehenden Ansprüche,
dadurch gekennzeichnet, daß
die Halbleiterschicht (206) im Zündstreckenbereich (208) als in Sperrrichtung betriebenes, bei Überschreiten der Durchbruchspannung zündauslösend erhitztes Halbleiterelement (Diodenpaar 26) mit mindestens einem p-n Übergang ausgebildet ist. - Halbleiterzünder nach einem der vorhergehenden Ansprüche,
dadurch gekennzeichnet, daß
der Träger (2; 102; 202) und die Halbleiterschicht (6; 106; 206) aus unterschiedlich dotiertem Silizium bestehen.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19815928 | 1998-04-09 | ||
DE19815928A DE19815928C2 (de) | 1998-04-09 | 1998-04-09 | Halbleiterzünder mit verbesserter konstruktiver Festigkeit |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0949479A1 EP0949479A1 (de) | 1999-10-13 |
EP0949479B1 true EP0949479B1 (de) | 2002-09-18 |
Family
ID=7864104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99106969A Expired - Lifetime EP0949479B1 (de) | 1998-04-09 | 1999-04-09 | Halbleiterzünder |
Country Status (6)
Country | Link |
---|---|
US (1) | US6220164B1 (de) |
EP (1) | EP0949479B1 (de) |
JP (1) | JP2000028298A (de) |
AT (1) | ATE224529T1 (de) |
DE (1) | DE19815928C2 (de) |
ES (1) | ES2181330T3 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10940341B2 (en) | 2013-03-06 | 2021-03-09 | Airbus Canada Limited Partnership | Interface between fire suppressant conduit and cargo compartment of an aircraft |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1222949A (zh) * | 1997-05-30 | 1999-07-14 | 日立造船株式会社 | 破坏装置和破坏方法以及该破坏方法使用的保持构件 |
DE10006528C2 (de) * | 2000-02-15 | 2001-12-06 | Infineon Technologies Ag | Fuseanordnung für eine Halbleitervorrichtung |
WO2002057705A2 (en) * | 2001-01-22 | 2002-07-25 | Smi Technology (Pty) Limited | An initiating device for an electronic detonator |
FR2827377B1 (fr) * | 2001-07-13 | 2003-12-05 | Poudres & Explosifs Ste Nale | Dispositif d'allumage pour microcharges pyrotechniques |
DE10162413B4 (de) * | 2001-12-19 | 2006-12-21 | Robert Bosch Gmbh | Integriertes Spreng- oder Zündelement und dessen Verwendung |
DE10204833B4 (de) | 2002-02-06 | 2005-11-10 | Trw Airbag Systems Gmbh & Co. Kg | Mikroelektronisch-Pyrotechnisches Bauteil |
US7951247B2 (en) * | 2002-10-01 | 2011-05-31 | Lawrence Livermore National Security, Llc | Nano-laminate-based ignitors |
DE10241363A1 (de) * | 2002-09-06 | 2004-03-18 | Flexiva Automation & Anlagenbau Gmbh | Pyrotechnisches Zündsystem |
US7942989B2 (en) * | 2002-12-10 | 2011-05-17 | The Regents Of The University Of California | Porous silicon-based explosive |
JP3803636B2 (ja) | 2002-12-26 | 2006-08-02 | 本田技研工業株式会社 | バス接続用点火装置 |
WO2006058349A1 (en) * | 2004-11-24 | 2006-06-01 | The University Of Pretoria | Detonator device |
JP4902542B2 (ja) | 2005-09-07 | 2012-03-21 | 日本化薬株式会社 | 半導体ブリッジ、点火具、及びガス発生器 |
IL210260A (en) * | 2010-12-26 | 2015-08-31 | Rafael Advanced Defense Sys | A tiny system for securing a shatter chain |
CN102278769A (zh) * | 2011-08-12 | 2011-12-14 | 南京理工大学 | 孔内嵌导电含能材料的点火器件及其制法 |
RU2522323C1 (ru) * | 2012-12-29 | 2014-07-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э. Баумана" (МГТУ им. Н.Э. Баумана) | Микроэлектромеханический взрыватель |
RU2522362C1 (ru) * | 2012-12-29 | 2014-07-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э. Баумана (МГТУ им. Н.Э. Баумана) | Микроэлектромеханический взрыватель изохорический |
US9500448B1 (en) * | 2015-06-09 | 2016-11-22 | Reynolds Systems, Inc. | Bursting switch |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5550989B2 (de) | 1973-03-26 | 1980-12-22 | ||
US3882324A (en) * | 1973-12-17 | 1975-05-06 | Us Navy | Method and apparatus for combustibly destroying microelectronic circuit board interconnections |
JPS5150587A (en) * | 1974-10-30 | 1976-05-04 | Nippon Telegraph & Telephone | Handotaisochino seizohoho |
GB2038548B (en) | 1978-10-27 | 1983-03-23 | Nippon Telegraph & Telephone | Isolating semiconductor device by porous silicon oxide |
JPS592185B2 (ja) * | 1980-02-04 | 1984-01-17 | 日本電信電話株式会社 | 半導体基体内への絶縁領域の形成法 |
US4484523A (en) | 1983-03-28 | 1984-11-27 | The United States Of America As Represented By The Secretary Of The Navy | Detonator, solid state type I film bridge |
JPH0792358B2 (ja) * | 1987-09-14 | 1995-10-09 | 日本工機株式会社 | 電気式点火装置用点火器 |
US4831933A (en) * | 1988-04-18 | 1989-05-23 | Honeywell Inc. | Integrated silicon bridge detonator |
US4976200A (en) * | 1988-12-30 | 1990-12-11 | The United States Of America As Represented By The United States Department Of Energy | Tungsten bridge for the low energy ignition of explosive and energetic materials |
US5113764A (en) * | 1989-09-25 | 1992-05-19 | Olin Corporation | Semiconductor bridge (SCB) packaging system |
JPH0418371A (ja) * | 1990-05-11 | 1992-01-22 | Alps Electric Co Ltd | サーマルヘッドおよびその製造方法 |
US5088413A (en) * | 1990-09-24 | 1992-02-18 | Schlumberger Technology Corporation | Method and apparatus for safe transport handling arming and firing of perforating guns using a bubble activated detonator |
US5080016A (en) * | 1991-03-20 | 1992-01-14 | The United States Of America As Represented By The Department Of Energy | Hydrogen loaded metal for bridge-foils for enhanced electric gun/slapper detonator operation |
US5309841A (en) | 1991-10-08 | 1994-05-10 | Scb Technologies, Inc. | Zener diode for protection of integrated circuit explosive bridge |
US5285727A (en) * | 1992-04-02 | 1994-02-15 | The United States Of America As Represented By The Secretary Of The Army | Semiconductor ignitor |
US5327834A (en) * | 1992-05-28 | 1994-07-12 | Thiokol Corporation | Integrated field-effect initiator |
US5370054A (en) * | 1992-10-01 | 1994-12-06 | The United States Of America As Represented By The Secretary Of The Army | Semiconductor slapper |
IL109841A0 (en) * | 1994-05-31 | 1995-03-15 | Israel State | Monolithic semiconductor igniter for explosives and pyrotechnic mixtures and process for its manufacture |
FR2738334A1 (fr) * | 1995-09-05 | 1997-03-07 | Motorola Semiconducteurs | Dispositif allumeur a semiconducteur, pour declenchement pyrotechnique, et procede de formation d'un tel dispositif |
DE19702118C1 (de) * | 1997-01-22 | 1998-03-26 | Siemens Ag | Zündpille |
-
1998
- 1998-04-09 DE DE19815928A patent/DE19815928C2/de not_active Expired - Fee Related
-
1999
- 1999-04-08 JP JP11101728A patent/JP2000028298A/ja active Pending
- 1999-04-09 ES ES99106969T patent/ES2181330T3/es not_active Expired - Lifetime
- 1999-04-09 AT AT99106969T patent/ATE224529T1/de not_active IP Right Cessation
- 1999-04-09 US US09/288,615 patent/US6220164B1/en not_active Expired - Fee Related
- 1999-04-09 EP EP99106969A patent/EP0949479B1/de not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10940341B2 (en) | 2013-03-06 | 2021-03-09 | Airbus Canada Limited Partnership | Interface between fire suppressant conduit and cargo compartment of an aircraft |
Also Published As
Publication number | Publication date |
---|---|
JP2000028298A (ja) | 2000-01-28 |
DE19815928A1 (de) | 1999-11-04 |
ATE224529T1 (de) | 2002-10-15 |
ES2181330T3 (es) | 2003-02-16 |
DE19815928C2 (de) | 2000-05-11 |
EP0949479A1 (de) | 1999-10-13 |
US6220164B1 (en) | 2001-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0949479B1 (de) | Halbleiterzünder | |
DE19854269B4 (de) | Dünnschichtsolarzellenanordnung sowie Verfahren zur Herstellung derselben | |
DE2159530B2 (de) | Verfahren zum Herstellen einer Halbleiteranordnung | |
DE2633324C2 (de) | Verfahren zum Herstellen von Halbleiterbauelementen hoher Sperrspannungsbelastbarkeit | |
WO1997041583A1 (de) | Pyrotechnisches sicherungselement für stromkreise | |
EP0680064A2 (de) | Mikromechanisches Bauteil mit einem Schaltelement als beweglicher Struktur, Mikrosystem und Herstellverfahren | |
DE19934560B4 (de) | Photovoltaikmodul mit integriert serienverschalteten Zellen und Herstellungsverfahren hierfür | |
EP0135704B1 (de) | Widerstandsheizelement | |
EP0914587A1 (de) | Dünnschichtanzündelement für pyrotechnische wirkmassen und verfahren zu dessen herstellung | |
WO2001024274A1 (de) | Thyristor mit spannungsstossbelastbarkeit in der freiwerdezeit | |
DE19732380B4 (de) | Anzündelement für pyrotechnische Wirkmassen mit einer Dämmschicht | |
WO1999009597A1 (de) | Hochspannungsbauelement und verfahren zu seiner herstellung | |
DE1464880A1 (de) | Elektronische Schaltanordnung unter Verwendung von sperrschichtfreien Halbleiter-Schaltelementen | |
EP1042809B1 (de) | Integrierte schaltungsanordnung sowie verwendung einer solchen schaltungsanordnung | |
DE2903426C2 (de) | Elektromagnetische Lichtbogenlöscheinrichtung | |
EP1282145A1 (de) | Verfahren und Vorrichtung zum selbstgezündeten pyrotechnischen Kurzschliessen | |
DE102019209477B4 (de) | Blitzschutz-Funkenstrecke | |
DE2751485A1 (de) | Verfahren zum herstellen von halbleiterkoerpern mit definiertem, durch aetzen erzielten und mit einem glas abgedeckten randprofil | |
DE102013226026A1 (de) | Vorrichtung und Verfahren zum Trennen einer elektrischen Verbindung zwischen einem ersten Leiter und einem zweiten Leiter | |
DE2241217C3 (de) | Thyristor mit erhöhter Ein- und Durchschaltgeschwindigkeit | |
DE10244316A1 (de) | Pyrotechnischer Schalter | |
WO2004030107A1 (de) | Halbeleiterdiode und verfahren zur ihrer herstellung | |
DE2237086A1 (de) | Steuerbares halbleitergleichrichterelement | |
DE19931082B4 (de) | Abgleichbares Halbleiterbauelement | |
WO1986003340A1 (en) | Semiconductor device provided with a metal layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT ES FR GB IT SE |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
17P | Request for examination filed |
Effective date: 19991218 |
|
17Q | First examination report despatched |
Effective date: 20000306 |
|
AKX | Designation fees paid |
Free format text: AT ES FR GB IT SE |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: 8566 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: TRW AIRBAG SYSTEMS GMBH & CO. KG Owner name: EADS DEUTSCHLAND GMBH |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT ES FR GB IT SE |
|
REF | Corresponds to: |
Ref document number: 224529 Country of ref document: AT Date of ref document: 20021015 Kind code of ref document: T |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
ET | Fr: translation filed | ||
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20030110 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2181330 Country of ref document: ES Kind code of ref document: T3 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20030619 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20040312 Year of fee payment: 6 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20040402 Year of fee payment: 6 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: ES Payment date: 20040422 Year of fee payment: 6 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: TP |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20050314 Year of fee payment: 7 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050409 Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050409 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050410 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050411 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: 732E |
|
EUG | Se: european patent has lapsed | ||
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20060403 Year of fee payment: 8 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20060409 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20050411 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20060409 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070430 |