Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
  • H01J9/02—Manufacture of electrodes or electrode systems
  • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
  • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J31/00—Cathode ray tubes; Electron beam tubes
  • H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
  • H01J31/10—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes
  • H01J31/12—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes with luminescent screen
  • H01J31/123—Flat display tubes
  • H01J31/125—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection
  • H01J31/127—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection using large area or array sources, i.e. essentially a source for each pixel group

Definitions

• the present invention relates to a display device by cathodolummescence excited by field emission, or cold emission, and more precisely a display screen comprising a source of electron microtips (“microtips”) and observable through the support of the microtips thus than a manufacturing process from this source.
• microtips a source of electron microtips
• the invention applies in particular to the production of matrix displays allowing the viewing of fixed or animated images.
• a screen according to the invention comprises a partially transparent cathode structure.
• VFDs Vacuum Fluorescent Displays
• FIG. 1 of the accompanying drawings schematically shows the structure of a VFD.
• an electrically insulating substrate PI and a glass plate P2 delimit a zone Z in which a vacuum has been created and which is closed on its periphery by a waterproof material M.
• Zone Z contains heating filaments
• cathode conductors C of aluminum are formed on the substrate PI and covered with phosphors P.
• the light L emitted by the latter is observed at 0 through the glass plate P2.
• a grid G placed between the heating filaments F and the cathode conductors C, makes it possible to modulate the electronic current.
• the structure described in this document (2) consists of lines and metal columns which are sufficiently spaced that the cathode transmits light 801.
• the area covered by the microtips represents only 1% of the area of the cathode, which considerably reduces the average effect and requires higher addressing voltages to obtain the necessary electronic current.
• this cathode has neither a mesh structure nor a resistive layer.
• a partially transparent cathode display screen provided with a resistive and mesh structure is known from the following document:
• the partially transparent cathode described in this document (3) is based on an openwork grid structure associated with a transparent resistive layer.
• Such a structure requires the development of a resistive material which must both have a suitable resistivity (of the order of 10 3 to
• This material is difficult to produce and above all to reproduce in a controlled and uniform manner over large areas.
• the object of the present invention is to remedy the above drawbacks by proposing a microtip display screen which can be observed through the support of the microtips, this screen having cathode conductors and grids with a mesh structure as well as a resistive layer which is meshed according to the pattern of the grids.
• the present invention thus makes it possible to use a resistive layer which is not necessarily transparent.
• the present invention relates to a display screen characterized in that it comprises:
• a cathodolummescent anode comprising: - a first support, - at least one anode conductor formed on this first support,
• - a second support one face of which is placed facing the cathodoluminescent material and which is transparent to the light liable to be emitted by this cathodoluminescent material, - cathode conductors formed on said face of this second support and meshed according to a first pattern comprising openings,
• a resistive layer formed on said face of this second support, meshed in a second pattern and comprising solid areas arranged in openings of the first pattern
• the resistive layer may be transparent to said light or may, on the contrary, be opaque to it.
• This resistive layer is for example made of amorphous silicon, of Cr 2 0 3 or of silicon carbide Sic or also of CrSiO.
• a layer capable of preventing the reflection of light arriving from the outside of the screen on said layer is interposed between the second support and the conductors cathodic and between this second support and the resistive layer.
• This layer capable of preventing reflection can be placed entirely under the resistive layer or only under the solid areas thereof, which allows in the latter case to use an electrically conductive material otherwise it must be more resistive than that of the resistive layer.
• the anode conductor comprises electrically conductive tracks which are parallel to the cathode conductors.
• the anode conductor may include a light reflecting material, for example aluminum.
• the present invention also relates to a method of manufacturing the microtip electron source forming part of the ob ⁇ display screen and of the invention, characterized in that the cathode conductors are meshed according to the first pattern, form the resistive mesh layer according to the second pattern, we form the insulating layer, we form a grid layer on this insulating layer, we form the holes intended to contain the microtips in this grid layer and the insulating layer, we form these microtips and the mesh grids are formed according to the second pattern from the grid layer.
• FIG. 1, already described is a schematic view of a VFD
• Figure 2 is a schematic sectional view of a display screen according to the invention
• Figure 3A is a schematic top view of the microtip electron source forming part of the screen of Figure 2
• FIG. 3B is a schematic sectional view along DD of FIG. 3A, • FIG. 4 schematically illustrates a process for manufacturing a source of microtip electrons in accordance with the invention, and
• a display screen in accordance with the invention comprises a cathescolu anode which is downward and, opposite the latter, a source of microtip electrons which is partially transparent to the light capable of being emitted by the cathodoluminescent anode.
• This source of microtip electrons comprises a meshed resistive structure of the kind described in document (3) but using, as resistive material, a material which does not need to be transparent and which can therefore be opaque, such as amorphous silicon.
• a resistive layer of iron oxide is etched between the cathode conductors of a display screen so as to better isolate these cathode conductors from one another.
• This engraving has no electrical role. We simply try, thanks to this etching, to give a certain transmission to the source of microtip electrons from the display screen.
• FIG. 3B of the accompanying drawings is section D-D of Figure 3A of the accompanying drawings.
• the display screen according to the invention shown schematically in these Figures 2, 3A and 3B of the accompanying drawings comprises a source of microtip electrons S and a cathodoluminescent anode A facing this source S.
• This microtip electron source S comprises a support 2 which is transparent to the light capable of being emitted by the cathodoluminescent material with which the anode A is provided.
• This support 2 is for example a glass substrate and this optionally comprises, on its face intended to be located opposite the cathodoluminescent anode, a thin layer of silica 4.
• Cathode conductors 5 are formed on this silica layer 4.
• each cathode conductor 5 is meshed according to a first pattern comprising openings.
• each cathode conductor has a lattice structure and thus comprises conductive tracks 5a which intersect.
• each cathode conductor has openings 6 which are delimited by these tracks 5a.
• a resistive layer 7 is formed on the silica layer 4 and on the cathode conductors.
• This resistive layer is meshed in a second pattern and includes solid areas arranged in openings of the first pattern corresponding to the cathode conductors 5.
• an electrically insulating and non-meshed layer 8 which is transparent to the light capable of being emitted by the anode A and which is, for example, made of silica, covers the cathode conductors and the resistive layer.
• Each of the grids 10g has substantially the structure of a trellis.
• each grid has, in top view (FIG. 3A of the appended drawings), a square surface 10a which is pierced by holes 14a and to which four tracks 10b which form part of the lattice of this grid end.
• the reference 11 corresponds to openings which make the grids openwork.
• the cathodoluminescent anode A comprises a support 44, one or a plurality of anode conductors 46 formed on this support 44 opposite the microtip electron source of the display screen and one or more cathodoluminescent materials 48 formed on this or these anode conductors 46 facing this source (depending on whether one wishes a black and white display or a color display).
• a space 30 in which a vacuum has been created separates the microtip source S from the cathodoluminescent anode A.
• a user 40 of the screen observes, through the transparent substrate 2, the light 50 emitted by the cathodoluminescent material or materials of the anode A when this or these materials are struck by the electrons emitted by the microtips 12 of the source S .
• FIG. 4 of the accompanying drawings we now explain how to make the microtip electron source for the display screen just described with reference to Figures 2, 3A and 3B of the accompanying drawings .
• a layer of niobium, molybdenum, tungsten, aluminum or copper for example and then the cathode conductors 5 are etched from this layer.
• a resistive layer 7, for example made of amorphous silicon, SiC or Cr 2 0 3 is deposited on the substrate 2 by sputtering for example.
• This resistive layer 7 is then etched according to the pattern chosen for it (which is identical to that of the perforated grids).
• the resistive layer is for example 1 ⁇ m thick and it is for example etched by reactive ion etching.
• the equipment sold by the company NEXTRAL under the reference NE550 is used for this purpose and the etching conditions are as follows:
• An electrically insulating layer 8 is then deposited, transparent to the light capable of being emitted by the anode of the screen and for example made of silica, above the cathode conductors 5 and the resistive layer.
• Holes 15 are then etched in this grid layer and in this insulating layer 8, these holes being intended to receive the microtips 12.
• microtips are then formed.
• the grid layer 10 is then etched according to the desired pattern to obtain the grids openwork 10g which are meshed in the same pattern as the resistive layer 7.
• This layer 52 is for example made of Cr 2 0 3 or CrSiO or oxidized molybdenum.
• Such a layer 52 is deposited on the layer 4 of silica and is then etched for example so that it only remains under the cathode conductors and under the resistive layer.
• layer 7 is made of CrSiO, it also plays the role of a layer capable of preventing reflection. The use of a layer 52 is then not necessary.
• EP0668604A discloses a method for manufacturing the cathode of a fluorescent microtip screen, a method which uses 3 masking levels and which also leads to obtaining a partially cathode structure. transparent. In it the insulating layer, the resistive layer and the grids are meshed in the same pattern.
• the present invention overcomes this drawback through the use of the non-meshed insulating layer (but of course comprising the holes necessary for producing the microtips and the openings necessary for the operation of the screen, for example peripheral openings for the sockets contact on the cathode conductors).
• the non-meshed insulating layer but of course comprising the holes necessary for producing the microtips and the openings necessary for the operation of the screen, for example peripheral openings for the sockets contact on the cathode conductors.

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• Engineering & Computer Science (AREA)
• Manufacturing & Machinery (AREA)
• Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Applications Claiming Priority (3)

Publications (1)

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ID=9498418

Family Applications (1)

Country Status (5)

Families Citing this family (7)

Family Cites Families (8)

• 1996
  • 1996-12-06 FR FR9615012A patent/FR2756969B1/fr not_active Expired - Fee Related
• 1997
  • 1997-12-05 EP EP97950234A patent/EP0943153A1/de not_active Withdrawn
  • 1997-12-05 WO PCT/FR1997/002216 patent/WO1998025291A1/fr not_active Application Discontinuation
  • 1997-12-05 JP JP52529698A patent/JP2001505355A/ja active Pending
  • 1997-12-05 US US09/319,240 patent/US6133690A/en not_active Expired - Fee Related

Non-Patent Citations (1)

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