EP0906635B1 - Procede de mise en oeuvre d'un getter non evaporable - Google Patents
Procede de mise en oeuvre d'un getter non evaporable Download PDFInfo
- Publication number
- EP0906635B1 EP0906635B1 EP97929213A EP97929213A EP0906635B1 EP 0906635 B1 EP0906635 B1 EP 0906635B1 EP 97929213 A EP97929213 A EP 97929213A EP 97929213 A EP97929213 A EP 97929213A EP 0906635 B1 EP0906635 B1 EP 0906635B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- getter
- temperature
- vacuum
- chamber
- enclosure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- 230000004913 activation Effects 0.000 claims description 14
- 229910000986 non-evaporable getter Inorganic materials 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 2
- 229910002065 alloy metal Inorganic materials 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 238000005086 pumping Methods 0.000 abstract description 19
- 239000000463 material Substances 0.000 description 14
- 238000001994 activation Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 238000007872 degassing Methods 0.000 description 7
- 229910002091 carbon monoxide Inorganic materials 0.000 description 6
- 238000009434 installation Methods 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000010025 steaming Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
- H01J7/183—Composition or manufacture of getters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/14—Vacuum chambers
Definitions
- the present invention relates to improvements brought in the field of non evaporable getter pumping (NEG) for create a very deep vacuum in an enclosure defined by a metal wall likely to release gas at its surface, said getter being deposited on at least the largest part from the surface of the enclosure wall.
- NOG non evaporable getter pumping
- the metal walls of the vacuum enclosure constitute an inexhaustible source of gas.
- the hydrogen contained in the construction metal diffuses freely in the thickness of the metal and is released on the surface defining the enclosure.
- the vacuum level obtained in the enclosure is therefore defined by the dynamic balance between degassing at surface defining the enclosure and the pumping speed of pumps used. Obtaining a high vacuum implies times a great cleanliness of the surface of the enclosure reducing gas emission and pumping speed high. For vacuum systems of accelerators particles whose chambers are usually small section, the pumps must be close to each other others or else a continuous pumping must be implemented, in order to overcome the conductance limitation.
- this material is capable to produce chemically stable compounds by reaction with the gases present in a vacuum enclosure (in particular H 2 , O 2 , CO, CO 2 , N 2 ) and this reaction gives rise to the disappearance of the molecular species concerned, which corresponds to a pumping effect.
- the surface of the getter must be clean, i.e. free from any passivation layer formed when the getter is exposed to ambient air.
- This passivation layer can in particular be eliminated by diffusing the surface gases (mainly O 2 ) inside the getter by heating (activation process of the getter which is then called non-evaporable getter: NEG).
- the non-evaporable getters have the advantage of being able to be produced in the form of a ribbon which can then be put in place all along the vacuum enclosure so that a distributed pumping effect results.
- the vacuum level likely to be obtained in the enclosure remains defined by the dynamic balance between the pumping speed (whatever the means used work) and the degassing speed of the metal surface the enclosure (whatever the cause); in other words for a given pumping speed, the vacuum level remains dependent on the degassing rate in the enclosure.
- Deposits on the walls of a vacuum enclosure have already been proposed in the past to improve the pressure of a vacuum system, for example as described in document DE-A-38 14 389.
- the deposition of a boron and carbon layer obtained by radiofrequency plasma from a mixture of borane and of hydrocarbons, is proposed mainly to reduce the partial pressure of water vapor in the enclosure.
- the object of the invention is therefore to propose a solution which solves this problem and which, due to the degassing rate occurring in the enclosure, significantly increases the efficiency of the pumping means used implement and lead to an improvement of several orders of magnitudes of the vacuum level likely to be created in the enclosure.
- the non-evaporable getter layer forms a screen which inhibits the degassing of the metal from the wall of the enclosure, without produce in turn.
- this layer is subjected to the impacts of moving particles and which, forming screen, prevents release of susceptible molecular species to pollute the vacuum in the enclosure. It follows that, by this means we prevent, at least to a great extent, degassing, whatever the cause, in the enclosure.
- a getter implemented in the form of a such a layer retains the advantage of a distributed pumping of uniformly and. is less likely than a deposit by powder pressed to release solid particles including the effect may be harmful for certain applications.
- a getter layer according to the invention does not occupy any sensitive space, and offers the advantage of provide a pumping effect under zero bulk, this which allows its implementation even in cases where the geometric constraints would prohibit the use of a getter in the form of a ribbon.
- the design of the vacuum chamber could be greatly simplified by eliminating the lateral pumping channel become useless.
- the material used has certain isolated characteristics or combined in whole or in part.
- the material must of course have a large adsorption capacity for chemically reactive gases present in the enclosure despite the barrier effect provided by the thin layer.
- the material must also have a high absorption power and a high diffusivity for hydrogen, with the capacity to form a hydride phase. It must, moreover, have a dissociation pressure of the hydride phase of less than 10 -13 Torr at approximately 20 ° C.
- the material must also have a temperature as low as possible, compatible with steaming temperatures of vacuum systems (about 400 ° C for stainless steel chambers, 200-250 ° C for copper and aluminum alloy chambers) and compatible with the stability of the material in air, at about 20 ° C; in these conditions, generally the activation temperature must not be more than 400 ° C.
- the material must finally have a high solubility, greater than 2%, for oxygen to allow absorption of the quantity of oxygen pumped to the surface during a large number of activation and exposure cycles to the air.
- a high solubility greater than 2%
- oxygen to allow absorption of the quantity of oxygen pumped to the surface during a large number of activation and exposure cycles to the air.
- titanium and / or zirconium and / or hafnium and / or vanadium and scandium which have a solubility limit, for oxygen, at room temperature, greater than 2% may constitute non-evaporable getter suitable for forming a layered coating thin in the context of the invention.
- titanium, zirconium and hafnium have a solubility for oxygen close to 20%, while vanadium and scandium have great diffusivity for gases.
- titanium can be activated at 400 ° C, zirconium at 300 ° C and the alloy Ti 50% - Zr 50% at 250 ° C. Activation at these temperatures for two hours reduces the desorption rate induced by electron bombardment with an energy of 500 eV by four orders of magnitude and produces pumping speeds for CO and CO 2 of the order of 1 ls -1 per cm 2 of surface.
- a getter in the form of a thin layer adhering to a metallic substrate makes it play the role of thermal stabilizer, able to limit the temperature in the thin layer.
- This provision is very advantageous because it makes it possible to use, as a getter, materials with high pyrophoricity without any security issues due to the stabilizing effect conferred by the substrate whose thermal capacity is large compared to the heat of combustion of the layer thin getter.
- a sputtering process allows multiple materials to be deposited simultaneously for form an alloy type getter combining materials having different optimal characteristics which one look for the cumulation, as indicated above.
- a cathode is formed, intended to be disposed centrally in the enclosure, which can be constituted by a twist of several (for example two or three) wires metallic materials of the respective alloy which wish to train.
- the use of a composite cathode as well constituted allows the simultaneous deposition of several metals and so to artificially create an alloy of materials thermodynamically unstable that it would not be possible to get by other traditional ways.
- the means proposed by the invention offer the unequaled possibility of producing high voids from 10 -10 to 10 -14 Torr for laboratory applications, for thermal and / or phonic insulation and for surface analysis systems, especially when used for reactive materials.
- the implementation of the invention in vacuum systems often exposed to the atmosphere or operating under low vacuum levels would very quickly lead to saturation of the surface of the getter in a thin layer and that the advantages mentioned above could not be achieved.
- a field of application particularly interesting of the invention is constituted by obtaining and maintaining over a long period of time of a high vacuum in the accelerators / accumulators of particles whose conditioning period by circulation of particle beam would then be erased and in which vacuum instability problems would be eliminated.
Landscapes
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
- Fats And Perfumes (AREA)
- Thermal Insulation (AREA)
- Physical Vapour Deposition (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Finger-Pressure Massage (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
Description
Claims (3)
- Procédé pour la mise en oeuvre d'un getter propre à créer, par action getter, un vide très poussé dans une enceinte définie par une paroi métallique susceptible de relâcher du gaz à sa surface, ledit getter étant déposé sur au moins la plus grande partie de la surface de la paroi de l'enceinte,
caractérisé par la succession des étapes qui suivent :a) on effectue par pulvérisation cathodique un dépôt d'une couche mince de getter non évaporable sur au moins la plus grande partie de la surface de la paroi de l'enceinte,b) on assemble l'enceinte avec un système à vide, on fait le vide à l'aide du système à vide, on effectue un étuvage du système à vide à une température donnée tout en maintenant l'enceinte à une température inférieure à la température d'activation du getter non évaporable,c) on arrête l'étuvage du système à vide, et simultanément on élève la température de l'enceinte jusqu'à la température d'activation, on maintient cette température pendant une durée prédéterminée appropriée pour rendre propre la couche de getter non évaporable, puis on abaisse la température jusqu'à la température ambiante. - Procédé selon la revendication 1, caractérisé en ce que le getter non évaporable est choisi parmi le titane et/ou le zirconium et/ou le hafnium et/ou le vanadium et/ou le scandium et/ou un alliage comprenant au moins un de ces derniers.
- Procédé selon la revendication 1 ou 2
caractérisé en ce qu'on utilise, pour déposer une couche de getter non évaporable constitué par un alliage de plusieurs matériaux, une cathode, disposée centralement dans l'enceinte, qui peut être constituée par plusieurs fils des matériaux respectifs de l'alliage torsadés les uns autour des autres.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9607625A FR2750248B1 (fr) | 1996-06-19 | 1996-06-19 | Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter |
FR9607625 | 1996-06-19 | ||
PCT/EP1997/003180 WO1997049109A1 (fr) | 1996-06-19 | 1997-06-18 | Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0906635A1 EP0906635A1 (fr) | 1999-04-07 |
EP0906635B1 true EP0906635B1 (fr) | 2003-03-05 |
Family
ID=9493210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97929213A Expired - Lifetime EP0906635B1 (fr) | 1996-06-19 | 1997-06-18 | Procede de mise en oeuvre d'un getter non evaporable |
Country Status (14)
Country | Link |
---|---|
US (1) | US6468043B1 (fr) |
EP (1) | EP0906635B1 (fr) |
JP (1) | JP4620187B2 (fr) |
AT (1) | ATE233946T1 (fr) |
AU (1) | AU3340497A (fr) |
CA (1) | CA2258118C (fr) |
DE (1) | DE69719507T2 (fr) |
DK (1) | DK0906635T3 (fr) |
ES (1) | ES2193382T3 (fr) |
FR (1) | FR2750248B1 (fr) |
NO (1) | NO317454B1 (fr) |
PT (1) | PT906635E (fr) |
RU (1) | RU2193254C2 (fr) |
WO (1) | WO1997049109A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2663813C2 (ru) * | 2014-06-26 | 2018-08-10 | Саес Геттерс С.П.А. | Геттерная насосная система |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1312248B1 (it) * | 1999-04-12 | 2002-04-09 | Getters Spa | Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la |
US7315115B1 (en) | 2000-10-27 | 2008-01-01 | Canon Kabushiki Kaisha | Light-emitting and electron-emitting devices having getter regions |
IT1319141B1 (it) * | 2000-11-28 | 2003-09-23 | Getters Spa | Unita' di accelerazione e focalizzazione, a vuoto migliorato, diimpiantatori ionici per la produzione di dispositivi a semiconduttore |
ITMI20012389A1 (it) * | 2001-11-12 | 2003-05-12 | Getters Spa | Catodo cavo con getter integrato per lampade a scarica e metodi per la sua realizzazione |
DE10209423A1 (de) * | 2002-03-05 | 2003-09-18 | Schwerionenforsch Gmbh | Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben |
ITMI20031178A1 (it) * | 2003-06-11 | 2004-12-12 | Getters Spa | Depositi multistrato getter non evaporabili ottenuti per |
WO2005075900A1 (fr) | 2004-01-22 | 2005-08-18 | European Organisation For Nuclear Research - Cern | Capteur solaire plan sous vide |
US7888891B2 (en) * | 2004-03-29 | 2011-02-15 | National Cerebral And Cardiovascular Center | Particle beam accelerator |
GB0523838D0 (en) * | 2005-11-23 | 2006-01-04 | Oxford Instr Analytical Ltd | X-Ray detector and method |
ITMI20070301A1 (it) * | 2007-02-16 | 2008-08-17 | Getters Spa | Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel |
EP1983548A1 (fr) * | 2007-04-20 | 2008-10-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Chambre d'émetteur, appareil à particule chargée et son procédé de fonctionnement |
EP2071188A1 (fr) | 2007-12-10 | 2009-06-17 | VARIAN S.p.A. | Dispositif pour le dépôt de getters non évaporables (NEGs) et procédé de dépôt utilisant un tel dispositif |
US20110146667A1 (en) * | 2008-06-11 | 2011-06-23 | Srb Energy Research Sarl | High efficiency evacuated solar panel |
CN102691640B (zh) * | 2012-05-29 | 2015-12-02 | 储琦 | 一种抽气系统及工艺 |
RU2513563C2 (ru) * | 2012-08-17 | 2014-04-20 | Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") | Спеченный неиспаряющийся геттер |
DE102016123146A1 (de) * | 2016-06-03 | 2017-12-07 | Movatec Gmbh | Vakuumgerät und Verfahren zur Beschichtung von Bauteilen |
KR102279327B1 (ko) * | 2016-11-28 | 2021-07-20 | 인터 유니버시티 리서치 인스티튜트 코포레이션 하이 에너지 엑셀레이터 리서치 오거나이제이션 | 비증발형 게터 코팅 부품, 용기, 제법, 장치 |
FR3072788B1 (fr) | 2017-10-24 | 2020-05-29 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Source de rayonnement infrarouge modulable |
JP2022178656A (ja) | 2021-05-20 | 2022-12-02 | 大学共同利用機関法人 高エネルギー加速器研究機構 | 非蒸発型ゲッタコーティング装置、非蒸発型ゲッタコーティング容器・配管の製造方法、非蒸発型ゲッタコーティング容器・配管 |
FR3128307A1 (fr) | 2021-10-14 | 2023-04-21 | Safran Electronics & Defense | Getter non evaporable activable a faible temperature, dispositif de pompage et enceinte contenant un tel getter |
CN116575005B (zh) * | 2023-05-10 | 2024-01-16 | 中国科学院近代物理研究所 | 一种TiZrCo真空吸气剂薄膜及其制备方法与应用 |
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CA622379A (en) * | 1961-06-20 | Union Carbide Corporation | Getters | |
NL52890C (fr) * | 1936-06-21 | |||
US2175695A (en) * | 1937-11-27 | 1939-10-10 | Gen Electric | Gettering |
NL68565C (fr) * | 1946-10-05 | |||
GB828982A (en) * | 1956-12-28 | 1960-02-24 | Gen Electric | Improvements in evacuated and gas-filled devices and methods of manufacturing |
US3544829A (en) * | 1968-02-03 | 1970-12-01 | Tokyo Shibaura Electric Co | Low pressure mercury vapour discharge lamp |
US4038738A (en) * | 1975-01-10 | 1977-08-02 | Uddeholms Aktiebolag | Method and means for the production of bar stock from metal powder |
US4097195A (en) * | 1975-02-12 | 1978-06-27 | Varian Associates, Inc. | High vacuum pump |
US4050914A (en) * | 1976-07-26 | 1977-09-27 | S.A.E.S. Getters S.P.A. | Accelerator for charged particles |
JPS5459662A (en) * | 1977-10-20 | 1979-05-14 | Nippon Oxygen Co Ltd | Preparation of thermos in metal |
DE3814389A1 (de) * | 1988-04-28 | 1989-11-09 | Kernforschungsanlage Juelich | Verfahren zur restgasminderung in hochvakuumanlagen durch getterschichten und deren erzeugung sowie entsprechend beschichtete hochvakuumanlagen |
JPH03147298A (ja) * | 1989-11-01 | 1991-06-24 | Mitsubishi Electric Corp | 加速器用真空容器 |
JPH03239869A (ja) * | 1990-02-13 | 1991-10-25 | Japan Steel Works Ltd:The | 真空チャンバー |
JP2967785B2 (ja) * | 1990-04-24 | 1999-10-25 | 株式会社日本製鋼所 | ゲツターポンプ装置 |
JP2561570Y2 (ja) * | 1991-08-06 | 1998-01-28 | 株式会社日本製鋼所 | 高真空排気装置 |
JP2721602B2 (ja) * | 1991-08-26 | 1998-03-04 | 株式会社日本製鋼所 | 水素吸蔵合金による水素排気方法及び装置 |
EP0563465B1 (fr) * | 1991-12-10 | 1997-11-05 | Shell Internationale Researchmaatschappij B.V. | Procédé et dispositif pour créer le vide |
JP3290697B2 (ja) * | 1992-04-30 | 2002-06-10 | 株式会社東芝 | 真空排気装置 |
IT1255438B (it) * | 1992-07-17 | 1995-10-31 | Getters Spa | Pompa getter non evaporabile |
IT1255439B (it) * | 1992-07-17 | 1995-10-31 | Getters Spa | Pompa getter non evaporabile |
JPH07233785A (ja) * | 1994-02-23 | 1995-09-05 | Ishikawajima Harima Heavy Ind Co Ltd | 非蒸発型ゲッターポンプ |
JP3309193B2 (ja) * | 1994-03-17 | 2002-07-29 | 株式会社日立製作所 | 真空ダクト内表面処理方法および真空ダクト内表面処理装置 |
US5688708A (en) * | 1996-06-24 | 1997-11-18 | Motorola | Method of making an ultra-high vacuum field emission display |
-
1996
- 1996-06-19 FR FR9607625A patent/FR2750248B1/fr not_active Expired - Lifetime
-
1997
- 1997-06-18 US US09/202,668 patent/US6468043B1/en not_active Expired - Lifetime
- 1997-06-18 JP JP50227698A patent/JP4620187B2/ja not_active Expired - Lifetime
- 1997-06-18 DK DK97929213T patent/DK0906635T3/da active
- 1997-06-18 CA CA2258118A patent/CA2258118C/fr not_active Expired - Lifetime
- 1997-06-18 RU RU99100321/09A patent/RU2193254C2/ru active
- 1997-06-18 DE DE69719507T patent/DE69719507T2/de not_active Expired - Lifetime
- 1997-06-18 ES ES97929213T patent/ES2193382T3/es not_active Expired - Lifetime
- 1997-06-18 EP EP97929213A patent/EP0906635B1/fr not_active Expired - Lifetime
- 1997-06-18 PT PT97929213T patent/PT906635E/pt unknown
- 1997-06-18 AT AT97929213T patent/ATE233946T1/de active
- 1997-06-18 AU AU33404/97A patent/AU3340497A/en not_active Abandoned
- 1997-06-18 WO PCT/EP1997/003180 patent/WO1997049109A1/fr active IP Right Grant
-
1998
- 1998-12-17 NO NO19985927A patent/NO317454B1/no not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2663813C2 (ru) * | 2014-06-26 | 2018-08-10 | Саес Геттерс С.П.А. | Геттерная насосная система |
Also Published As
Publication number | Publication date |
---|---|
ATE233946T1 (de) | 2003-03-15 |
CA2258118C (fr) | 2010-08-17 |
FR2750248A1 (fr) | 1997-12-26 |
AU3340497A (en) | 1998-01-07 |
WO1997049109A1 (fr) | 1997-12-24 |
PT906635E (pt) | 2003-07-31 |
US6468043B1 (en) | 2002-10-22 |
DK0906635T3 (da) | 2003-06-23 |
CA2258118A1 (fr) | 1997-12-24 |
EP0906635A1 (fr) | 1999-04-07 |
NO985927L (no) | 1998-12-17 |
JP2001503830A (ja) | 2001-03-21 |
RU2193254C2 (ru) | 2002-11-20 |
JP4620187B2 (ja) | 2011-01-26 |
NO985927D0 (no) | 1998-12-17 |
NO317454B1 (no) | 2004-11-01 |
DE69719507T2 (de) | 2004-02-19 |
FR2750248B1 (fr) | 1998-08-28 |
ES2193382T3 (es) | 2003-11-01 |
DE69719507D1 (de) | 2003-04-10 |
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