EP0900652A2 - Weisslicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck - Google Patents
Weisslicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck Download PDFInfo
- Publication number
- EP0900652A2 EP0900652A2 EP98116561A EP98116561A EP0900652A2 EP 0900652 A2 EP0900652 A2 EP 0900652A2 EP 98116561 A EP98116561 A EP 98116561A EP 98116561 A EP98116561 A EP 98116561A EP 0900652 A2 EP0900652 A2 EP 0900652A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- recording material
- radiation
- material according
- layer
- vis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/14—Multiple imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
Definitions
- the invention relates to a recording material with a substrate and a radiation-sensitive layer that absorbs IR radiation Component contains and after exposure to infrared radiation in one aqueous-alkaline developer becomes soluble or at least swellable.
- the Material is insensitive to white light. It is particularly suitable for Manufacture of printing forms for offset printing.
- the radiation-sensitive layer in the ultraviolet and / or visible range is sensitive.
- the layer with radiation of the corresponding wavelength passes through it illustrated and then developed. Newer procedures come without such a film template.
- infrared lasers especially infrared laser diodes
- recording materials are needed, which in IR range, i.e. in the range from about 700 to 1,100 nm.
- the present invention thus relates to a recording material with a substrate and a radiation-sensitive, water-insoluble Layer containing an IR radiation absorbing component and after Exposure to infrared radiation soluble in an aqueous alkaline developer or at least becomes swellable.
- the recording material is characterized in that that there is a cover layer on the radiation-sensitive layer located that is opaque to white light, but to radiation in the IR range is permeable and can be removed with water or an aqueous solution.
- the cover layer also makes the scratch-sensitive of the radiation-sensitive Layer greatly reduced.
- the Top layer that are components of the radiation-sensitive layer, the possibly detached under the influence of the IR laser beams in the Remove the radiation device.
- IR laser beams in the Remove the radiation device.
- "White light” means daylight or light from incandescent lamps, fluorescent tubes and others Illuminants that emit ordinary white light. Under “Radiation in the IR range” is intended here - as is generally the case - radiation with a Wavelength of 700 to 1,100 nm can be understood.
- the top layer generally contains at least one water-soluble, organic, polymeric binder and at least one component, the radiation absorbed in the UV / VIS range.
- This component preferably has one Absorption maximum in the range from 300 to 500 nm, especially in the range of 350 to 450 nm.
- UV / VIS absorbers can also be used, but must first be dispersed with a water-soluble binder. That to disperse
- the binder used is preferably identical to the rest Binder in the top layer.
- the proportion of UV / VIS absorber is generally 5 to 50 wt .-%, preferably 20 to 30 wt .-%, each based on the total weight of the non-volatile components of the top layer.
- the optical density of the cover layer is preferably 2.2 to 2.5.
- suitable binders for the top layer are polyvinyl alcohols, polyvinyl pyrrolidones, partially saponified polyvinyl acetates, which also contain vinyl ether or may contain vinyl acetal units, gelatin, carbohydrates, Cellulose derivatives (e.g. hydroxyethyl cellulose), gum arabic, polyethylene oxides, Polyvinyl ether, poly (meth) acrylates and corresponding mixed polymers. Polyvinyl alcohols are particularly preferred.
- the top layer still minor amounts of surfactants, surfactants, inert Contain particles and / or plasticizers.
- the thickness of the top layer is generally up to 5 ⁇ m, preferably 0.5 to 2.5 ⁇ m. It should be chosen in such a way that the IR-sensitive layer underneath can still be imaged without problems.
- a top layer was also known from EP-A 0 354 475, which protects the underlying photopolymerizable layer from oxygen and at the same time acts as an optical filter. It contains a dye that Absorbs light with a wavelength of 300 to 700 nm, but within this area has an absorption gap. The gap is chosen that they are the emission range of the light source used for imaging corresponds. The well-known top layer is then together with the non-irradiated areas of the photopolymerizable layer through the Developer solution removed.
- the composition of the IR-sensitive layer is not particularly critical. However, it must be insoluble in water at least to the extent that it is removed the top layer is practically not attacked.
- Carbon black pigments such as those described in WO 96/20429, are particularly suitable as IR-absorbing components, because they absorb over a wide IR wavelength range. When used, therefore, both Nd-YAG lasers, which operate at a wavelength of 1064 nm, and inexpensive laser diodes, which operate at 830 nm, can be used. Carbon black pigments with an average primary particle diameter of less than 80 nm are preferred. According to DIN 53206, the term “primary particles” refers to the smallest particles (individual particles) from which pulverulent substances are built up. They are recognizable as individual individuals by electron microscopy. Suitable carbon blacks are flame, furnace or channel blacks.
- the surface determined by the method of Brunauer, Emmett and Teller is generally more than 10 m 2 / g.
- Particularly suitable carbon blacks are oxidized on their surface, which creates acidic units.
- the soot particles can be dispersed with a binder in generally known devices.
- the mixture of pigment and binder can be predispersed in a dissolver and then finely dispersed in a ball mill.
- the organic solvents used can differ from the actual coating solvents, but they are preferably identical.
- Particularly suitable solvents are propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), ethyl lactate, butanone, ⁇ -butyrolactone, tetrahydrofuran and mixtures thereof.
- PGME propylene glycol monomethyl ether
- PMEA propylene glycol monomethyl ether acetate
- ethyl lactate butanone
- ⁇ -butyrolactone tetrahydrofuran and mixtures thereof.
- surfactants and thickeners which are soluble in aqueous alkaline solutions are particularly preferred.
- other heat-absorbing substances such as squarylium, cyanine, merocyanine or pyrylium compounds, can also be present in the layer sensitive to IR radiation.
- the proportion of the IR-absorbing component is generally 0.5 to 30% by weight, preferably 2 to 15% by weight, in each case based on the total weight of the nonvolatile constituents of the
- the IR radiation-sensitive layer also contains a polymeric binder.
- binders having acidic groups whose pK a value is less than. 13 include, for example, polycondensates as obtained from the reaction of phenols or sulfamoyl- or carbamoyl-substituted aromatics with aldehydes or ketones.
- phenols can also be substituted phenols, such as resorcinol, cresol, xylenol or trimethylphenol, in addition to phenol.
- the aldehyde is preferably formaldehyde. Reaction products of diisocyanates with diols or diamines are also suitable as long as they have acidic units of the type mentioned.
- polymers with units of vinyl aromatics, N-aryl- (meth) acrylamides or aryl- (meth) acrylates these units each also having one or more carboxyl groups, phenolic hydroxyl groups, sulfamoyl or carbamoyl groups.
- the polymers can additionally contain units from other monomers which have no acidic groups.
- (meth) acrylate stands for "acrylate and / or methacrylate”.
- the proportion of the binder is generally 2 to 98% by weight, preferably 50 to 85% by weight, in each case based on the total weight of the nonvolatile constituents of the layer.
- the UV / VIS-sensitive component is preferably an onium salt.
- a combination of an acid-forming compound and a compound which can be cleaved by the acid thermally or photochemically generated from this compound is also particularly suitable.
- Preferred acid-cleavable compounds are polymers with hydrophilic, acidic groups (especially carboxy and phenolic hydroxyl groups), some or all of which are masked with hydrophobic, acid-labile groups. After the acid-catalyzed elimination of the hydrophobic groups, the solubility of the polymer in aqueous alkaline developers is again greatly increased.
- the hydrophobic, acid-labile groups are, for example, tert -alkoxycarbonyloxy, benzyloxycarbonyloxy and alkoxyalkyl ester groups of the formula -CO-O-CR 1 R 2 -OR 3 , in which R 3 is a (C 1 -C 18 ) alkyl group and R 1 and R 2 independently of one another represent a hydrogen atom or a (C 1 -C 18 ) alkyl group with the proviso that at least one of the radicals R 1 and R 2 is a hydrogen atom.
- R 3 is a (C 1 -C 18 ) alkyl group
- R 1 and R 2 independently of one another represent a hydrogen atom or a (C 1 -C 18 ) alkyl group with the proviso that at least one of the radicals R 1 and R 2 is a hydrogen atom.
- Tert -butoxycarbonyloxy and tetrahydropyranyloxycarbonyl groups are particularly preferred.
- polyhydroxystyrenes the hydroxyl groups of which are partially or completely converted into acid-cleavable groups, such as tert -butoxycarbonyloxy groups.
- acid-cleavable groups such as tert -butoxycarbonyloxy groups.
- acid-labile groups gaseous decomposition products can be formed when they are split off.
- the cleavage of the tert -butoxycarbonyloxy group produces, for example, CO 2 and isobutene.
- Particularly suitable acid generators are diazonium, phosphonium, sulfonium and iodonium salts of strong acids.
- the counter ion in these salts is preferably hexafluorophosphate, hexafluoroantimonate or perfluoroalkanesulfonate.
- Diazo compounds especially esters or amides of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid. These include in particular esters of 1,2-naphthoquinone-2-diazid-4- or -5-sulfonic acid and a compound with at least one, preferably at least three phenolic hydroxyl groups.
- Hydroxyl groups such as 2,3,4-trihydroxy-benzophenone, 2,3,4-trihydroxy-3'-methyl-, propyl or isopropyl benzophenone, 2,3,4,4'-tetrahydroxy benzophenone, 2,3,4,2 ', 4'-pentahydroxy-benzophenone, 2,3,4,2', 3 ', 4'-hexahydroxybenzophenone and 5,5'-diacyl-2,3,4,2 ', 3', 4'-hexahydroxy-diphenylmethane.
- Hydroxy components that can be used for the esterification are also condensation products from pyrogallol and aldehydes or ketones as well as condensation products from alkylated phenols and formaldehyde.
- the layer can also contain a mixture of several radiation-sensitive components.
- the proportion of the component sensitive to UV / VIS is generally 1 to 50% by weight, preferably 5 to 30% by weight, in each case based on the total weight of the non-volatile components of the layer.
- the radiation-sensitive layer can also have further, in such layers contain common additives in minor amounts.
- common additives include indicator dyes (e.g. dialkylaminoazobenzenes), photochemical acid generators (e.g. trifluoromethanesulfonates or hexafluorophosphates of diazodiphenylamines), surfactants (preferred fluorine-containing surfactants or silicone surfactants), polyalkylene oxides for control the acidity of the acidic groups and / or low molecular weight compounds with acidic units to increase the development speed.
- indicator dyes e.g. dialkylaminoazobenzenes
- photochemical acid generators e.g. trifluoromethanesulfonates or hexafluorophosphates of diazodiphenylamines
- surfactants preferred fluorine-containing surfactants or silicone surfactants
- polyalkylene oxides for control the acidity of the acidic groups and / or low molecular weight
- the support in the recording material according to the invention is preferably an aluminum foil or plate.
- a composite of is also suitable an aluminum and a polyester film.
- the aluminum surface is preferred mechanically and / or electrochemically roughened and anodically oxidized.
- You can also with a suitable, usually polymeric Compound, be hydrophilized. Connections are well suited for this purpose with phosphonic acid or phosphonate units, especially polyvinylphosphonic acid.
- the actual roughening can be degreased, optionally also a further mechanical and / or chemical roughening be upstream.
- Suitable coating solvents are the above-mentioned, generally customary organic solvents, as can also be used in the dispersion of the carbon black.
- the IR radiation-sensitive layer generally has a layer weight of 0.5 to 5.0 g / m 2 , preferably 1.0 to 3.0 g / m 2 , corresponding to about 0.5 to 5.0 ⁇ m, preferred about 1.0 to 3.0 ⁇ m.
- the top layer is then applied from an aqueous solution or dispersion, which may also contain small amounts of organic solvents, ie less than 5% by weight, based on the total weight of the coating solvents for the top layer.
- the present invention finally also relates to a method for producing a printing form for offset printing from the recording material according to the invention.
- the recording material is first irradiated imagewise with infrared radiation and then developed in a conventional aqueous alkaline developer at a temperature of 20 to 40 ° C.
- the water-soluble top layer is also removed during development.
- the cover layer is removed with water before or after imaging with IR rays, but before development.
- External or inner drum imagesetters with laser diodes (emission maximum 830 nm) or Nd-YAG lasers (emission maximum 1064 nm) are particularly suitable for imaging with infrared rays.
- the developer generally has a ratio of SiO 2 to alkali oxide of at least 1. This ensures that the aluminum oxide layer of the carrier is not damaged.
- Preferred alkali oxides are Na 2 O and K 2 O, and mixtures thereof.
- the developer can contain further components, such as buffer substances, complexing agents, defoamers, organic solvents in small amounts, corrosion inhibitors, dyes, surfactants and / or hydrotropes. The development mostly takes place in machine processing plants.
- UV / VIS and IR sensitized recording material UV sensitization with Diazo compound
- the coating solution was roughened into a hydrochloric acid solution Anodized sulfuric acid and hydrophilized with polyvinylphosphonic acid Aluminum foil applied. After drying at 100 ° C. for 2 minutes, the Layer thickness 2 ⁇ m.
- the development was the same for both imagewise irradiated recording materials. It was carried out in a conventional processing plant at a throughput speed of 0.4 m / min at a temperature of 28 ° C. using an aqueous potassium silicate developer containing K 2 SiO 3 (normality: 0.8 mol / l in water) and 0.2% by weight .-% O, O'-bis-carboxymethyl-polyethylene glycol-1000 and 0.4 wt .-% pelargonic acid contained. A point resolution of 2 to 98% of a 60s grid was achieved with both recording materials. The background of the picture was free of fog. With the offset printing plates produced in this way, more than 100,000 flawless prints could be produced.
- Samples of the recording material were used to determine the daylight sensitivity before or after thermal imaging, but in any case before development, exposed to (UV-containing) daylight for different lengths of time. With a photometer (spectral sensitivity: 300 to 450 nm) the energy was determined which acted on the material. It was cheating about 2 mJ per square centimeter per minute. If only the material 1 min in daylight was already evident after the development Losses in the peak area, after 4 minutes in daylight the material had no more resistance and was also in the unirradiated areas of Developers attacked.
- UV / VIS and IR sensitized recording material UV sensitization by combining acid generator and polymer with acid-cleavable Groups, without top layer:
- the layer weight was 1.8 to 2.2 g / m 2 .
- the recording material thus produced was thermally imaged with an Nd-YAG laser (wavelength 1064 nm; power: 10 mW). In the irradiated areas, parts of the layer were detached by the gas evolution, which led to contamination of the irradiation device.
- Example 3 (as example 1, but with a top layer)
- the top layers thus obtained were each applied to the recording material from Example 1 and dried at 100 ° C. for 2 minutes. The weight of the dried cover layer was then about 2 to 3 g / m 2 . The material thus obtained was then - as described in Example 1 a) - imaged with IR rays. The subsequent development was also carried out according to Example 1.
- the printing plates obtained in this way were equivalent to those from Example 1 in all their essential properties, particularly in terms of quality and durability.
- Example 1 b To carry out a conventional exposure - as described in Example 1 b) To be able to, the top layer was previously with ordinary tap water washed. The printing plates obtained after development showed practically no difference from those from Example 1 b).
- Example 4 (as example 2, but with a top layer)
- a coating solution according to Example 3c or 3f was applied to the recording material according to Example 2 and dried. After drying for 2 minutes at 100 ° C., the weight of the outer layers thus produced was again 2 to 3 g / m 2 . In contrast to comparative example 2, no constituents detached from the layer during IR irradiation.
- Example 1 without top layer
- Example 3c with top layer
- the size of the test disk was measured must be acting force so that after the development visible scratches in the image layer are recognizable.
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
- 20,0 Gt
- eines Esters aus 1 mol 2,3,4-Trihydroxy-benzophenon und 1,5 mol 1,2-Naphthochinon-2-diazid-5-sulfonylchlorid,
- 20,0 Gt
- Rußdispersion der im folgenden angegebenen Zusammensetzung,
- 3,0 Gt
- 2,4-Dihydroxy-benzophenon,
- 57,0 Gt
- Cresol/Xylenol/Formaldehyd-Novolak (®Alnovol SPN 400, 43,5 %ig in Propylenglykol-monomethylether-acetat),
- 455,0 Gt
- Propylenglykol-monomethylether (PGME) und
- 455,0 Gt
- Tetrahydrofuran.
- 10,0 Gt
- Ruß (®Printex 25),
- 10,0 Gt
- Cresol/Xylenol/Formaldehyd-Novolak (®Alnovol SPN 400, 45,3 %ig in PGMEA),
- 28,8 Gt
- PGME und
- 0,01 Gt
- Silikonöl.
- 6,7 Gt
- Poly(4-hydroxy-styrol), in dem 30 % der Hydroxygruppen in tert.-Butoxycarbonyloxygruppen und 15 % in 2,3-Dihydroxy-propoxygruppen (wie in der nicht vorveröffentlichten DE 197 29 067.1 beschrieben) umgewandelt waren,
- 0 , 5 Gt
- 4-para-Toluolmercapto-2,5-diethoxy-benzoldiazonium-hexafluorophosphat,
- 0,01 Gt
- Silikonöl als Oberflächenverbesserer,
- 17,0 Gt
- Rußdispersion (wie im Beispiel 1),
- 42,0 Gt
- Propylenglykol-monomethylether und
- 34,0 Gt
- Tetrahydrofuran.
- 5,5 Gt
- Natriumsilikat-nonahydrat,
- 3,4 Gt
- Trinatriumphosphat-dodecahydrat,
- 0,4 Gt
- Mononatriumphosphat (wasserfrei) und
- 90,7 Gt
- vollentsalztem Wasser.
Beispiel Nr. | Additiv | C.I.-Bezeichnung | Menge [g] |
3a | Astrazongelb 3G | 48085 | 2,5 |
3b | Säureorange GG | 16230 | 2,5 |
3c | ®Vitasyn Tartrazin X90 | 19140 | 3,0 |
3d | Fluoreszenzgelb T | Acid Yellow 245 | 2,0 |
3e | ®Blankophor PSG | Fluorescent Brightener 113 | 0,4 |
3f | -- (kein Additiv) | -- | -- |
- 5,0 Gt
- Polyvinylpyrrolidon (®Luviskol K 30),
- 10,0 Gt
- eines Copolymers aus 70 % Vinylpyrrolidon-Einheiten und 30 % Vinylacetat-Einheiten; 50 %ig in Wasser (®Luviskol VA73 W),
- 5,0 Gt
- ®Duasyn Säuregelb XX (Acid Yellow 23, C.I. 19140) und
- 80,0 Gt
- VE-Wasser
Claims (16)
- Aufzeichnungsmaterial mit einem Schichtträger und einer strahlungsempfindlichen, wasserunlöslichen Schicht, die eine IR-Strahlung absorbierende Komponente enthält und nach Einwirkung von Infrarotstrahlung in einem wäßrig-alkalischen Entwickler löslich oder zumindest quellbar wird, dadurch gekennzeichnet, daß sich auf der strahlungsempfindlichen Schicht eine Deckschicht befindet, die für Weißlicht undurchlässig, für Strahlung im IR-Bereich dagegen durchlässig ist und sich mit Wasser oder einer wäßrigen Lösung entfernen läßt.
- Aufzeichnungsmaterial gemäß Anspruch 1, dadurch gekennzeichnet, daß die strahlungsempfindliche Schicht auch im UV/VIS-Bereich für eine bildmäßige Differenzierung ausreichend sensibiliert ist.
- Aufzeichnungsmaterial gemäß Anspruch 1 oder 2, dadurch gekennzeichnet, daß die IR-Strahlung absorbierende Komponente ein Rußpigment ist.
- Aufzeichnungsmaterial gemäß Anspruch 3, dadurch gekennzeichnet, daß das Rußpigment mit einem Bindemittel dispergiert ist.
- Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß der Anteil der IR-absorbierenden Komponente 0,5 bis 30 Gew.-%, bevorzugt 2 bis 15 Gew.-%, beträgt, jeweils bezogen auf das Gesamtgewicht der nichtflüchtigen Bestandteile der Schicht.
- Aufzeichnungsmaterial gemäß Anspruch 1 oder 2, dadurch gekennzeichnet, daß die Deckschicht mindestens ein wasserlösliches, organisches, polymeres Bindemittel und mindestens eine Komponente, die Strahlung im UV/VIS-Bereich absorbiert, enthält.
- Aufzeichnungsmaterial gemäß Anspruch 6, dadurch gekennzeichnet, daß die Komponente, die UV/VIS-Strahlung absorbiert, ein Absorptionsmaximum im Bereich von 300 bis 500 nm, bevorzugt im Bereich von 350 bis 450 nm, aufweist.
- Aufzeichnungsmaterial gemäß Anspruch 7, dadurch gekennzeichnet, daß die UV/VIS-Strahlung absorbierende Komponente ein Farbstoff oder ein Pigment ist.
- Aufzeichnungsmaterial gemäß Anspruch 7 oder 8, dadurch gekennzeichnet, daß Anteil der UV/VIS-Strahlung absorbierenden Komponente 5 bis 50 Gew.-%, bevorzugt 20 bis 30 Gew.-%, beträgt, jeweils bezogen auf das Gesamtgewicht der nichtflüchtigen Bestandteile der Deckschicht.
- Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 9, dadurch gekennzeichnet, daß die Deckschicht eine optische Dichte von mindestens 2,0, bevorzugt 2,2 bis 2,5 aufweist, gemessen gegen weißes Papier als Referenzmaterial.
- Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 10, dadurch gekennzeichnet, daß die Dicke der Deckschicht bis zu 5 µm, bevorzugt 0,5 bis 2,5 µm, beträgt.
- Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 11, dadurch gekennzeichnet, daß der Schichtträger eine Aluminiumfolie oder -platte oder ein Verbund aus einer Aluminium- und einer Polyesterfolie ist.
- Aufzeichnungsmaterial gemäß Anspruch 12, dadurch gekennzeichnet, daß die Aluminiumoberfläche vorzugsweise mechanisch und/ oder elektrochemisch aufgerauht und anodisch oxidiert, bevorzugt zusätzlich auch noch hydrophiliert ist.
- Verfahren zur Herstellung einer Druckform für den Offsetdruck, dadurch gekennzeichnet, daß man ein Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 13 mit Infrarotstrahlung bildmäßig bestrahlt und anschließend in einem üblichen wäßrig-alkalischen Entwickler bei einer Temperatur von 20 bis 40 °C entwickelt.
- Verfahren gemäß Anspruch 14, dadurch gekennzeichnet, daß zur Bebilderung Infrarot-Laser eingesetzt werden.
- Verfahren gemäß Anspruch 14, dadurch gekennzeichnet, daß nach der Bebilderung, aber vor der Entwicklung, die Deckschicht mit Wasser entfernt wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19739299A DE19739299A1 (de) | 1997-09-08 | 1997-09-08 | Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck |
DE19739299 | 1997-09-08 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0900652A2 true EP0900652A2 (de) | 1999-03-10 |
EP0900652A3 EP0900652A3 (de) | 1999-03-17 |
EP0900652B1 EP0900652B1 (de) | 2002-07-24 |
Family
ID=7841596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98116561A Expired - Lifetime EP0900652B1 (de) | 1997-09-08 | 1998-09-02 | Weisslicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck |
Country Status (4)
Country | Link |
---|---|
US (1) | US6165685A (de) |
EP (1) | EP0900652B1 (de) |
JP (1) | JPH11149162A (de) |
DE (2) | DE19739299A1 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6969635B2 (en) * | 2000-12-07 | 2005-11-29 | Reflectivity, Inc. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
DE19729067A1 (de) * | 1997-07-08 | 1999-01-14 | Agfa Gevaert Ag | Infrarot-bebilderbares Aufzeichnungsmaterial und daraus hergestellte Offsetdruckplatte |
JP3775634B2 (ja) * | 1999-02-22 | 2006-05-17 | 富士写真フイルム株式会社 | 平版印刷版用原版 |
DE10022786B4 (de) * | 1999-05-12 | 2008-04-10 | Kodak Graphic Communications Gmbh | Auf der Druckmaschine entwickelbare Druckplatte |
JP3741353B2 (ja) * | 1999-12-22 | 2006-02-01 | 富士写真フイルム株式会社 | 感熱性平版印刷用原板 |
SG98433A1 (en) * | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
US6558787B1 (en) | 1999-12-27 | 2003-05-06 | Kodak Polychrome Graphics Llc | Relation to manufacture of masks and electronic parts |
JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
JP2004252285A (ja) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
JP2005225107A (ja) * | 2004-02-13 | 2005-08-25 | Fuji Photo Film Co Ltd | 平版印刷版原版およびそれを用いる平版印刷方法 |
ATE397529T1 (de) * | 2004-03-26 | 2008-06-15 | Presstek Inc | Druckglieder mit löslichkeitsübergangsschichten und verwandte verfahren |
JP2007272138A (ja) * | 2006-03-31 | 2007-10-18 | Nippon Zeon Co Ltd | レジストパターン形成方法及び感光性樹脂組成物 |
EP2562599B1 (de) | 2009-01-29 | 2014-12-10 | Digiflex Ltd. | Verfahren zur Herstellung einer Fotomaske auf einer Fotopolymeroberfläche |
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EP0867278A1 (de) * | 1997-03-24 | 1998-09-30 | Agfa-Gevaert AG | Strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial für Offsetdruckplatten |
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US6022667A (en) * | 1997-05-27 | 2000-02-08 | Agfa-Gevaert, N.V. | Heat sensitive imaging element and a method for producing lithographic plates therewith |
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- 1997-09-08 DE DE19739299A patent/DE19739299A1/de not_active Withdrawn
-
1998
- 1998-09-02 EP EP98116561A patent/EP0900652B1/de not_active Expired - Lifetime
- 1998-09-02 DE DE59804861T patent/DE59804861D1/de not_active Expired - Fee Related
- 1998-09-08 US US09/149,044 patent/US6165685A/en not_active Expired - Fee Related
- 1998-09-08 JP JP10254363A patent/JPH11149162A/ja not_active Withdrawn
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US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
US5273862A (en) * | 1988-07-29 | 1993-12-28 | Hoechst Aktiengesellschaft | Photopolymerizable recording material comprising a cover layer substantially impermeable to oxygen, binds oxygen and is soluble in water at 20°C. |
EP0354475A2 (de) * | 1988-08-11 | 1990-02-14 | Hoechst Aktiengesellschaft | Photopolymerisierbares Aufzeichnungsmaterial |
US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
US5663037A (en) * | 1994-03-14 | 1997-09-02 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin an infrared absorber and a triazine and use thereof in lithographic printing plates |
WO1996020429A1 (en) * | 1994-12-23 | 1996-07-04 | Horsell P.L.C. | Lithographic plate |
EP0867278A1 (de) * | 1997-03-24 | 1998-09-30 | Agfa-Gevaert AG | Strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial für Offsetdruckplatten |
Also Published As
Publication number | Publication date |
---|---|
EP0900652A3 (de) | 1999-03-17 |
DE19739299A1 (de) | 1999-03-11 |
DE59804861D1 (de) | 2002-08-29 |
EP0900652B1 (de) | 2002-07-24 |
JPH11149162A (ja) | 1999-06-02 |
US6165685A (en) | 2000-12-26 |
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