EP0978376B1 - Strahlungsempfindlisches Aufzeichnungsmaterial mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial - Google Patents
Strahlungsempfindlisches Aufzeichnungsmaterial mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial Download PDFInfo
- Publication number
- EP0978376B1 EP0978376B1 EP99114554A EP99114554A EP0978376B1 EP 0978376 B1 EP0978376 B1 EP 0978376B1 EP 99114554 A EP99114554 A EP 99114554A EP 99114554 A EP99114554 A EP 99114554A EP 0978376 B1 EP0978376 B1 EP 0978376B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- recording material
- radiation
- sensitive recording
- material according
- betaine structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims description 57
- 239000000975 dye Substances 0.000 title claims description 51
- 230000005855 radiation Effects 0.000 title claims description 30
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 title claims description 17
- 150000001450 anions Chemical class 0.000 title claims 5
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical group C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 title 2
- 239000000203 mixture Substances 0.000 claims description 34
- -1 nitro, amino Chemical group 0.000 claims description 31
- 239000011230 binding agent Substances 0.000 claims description 18
- 125000003282 alkyl amino group Chemical group 0.000 claims description 16
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical group C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 16
- 229920003986 novolac Polymers 0.000 claims description 13
- 239000000049 pigment Substances 0.000 claims description 11
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims description 10
- 239000006229 carbon black Substances 0.000 claims description 10
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 150000007942 carboxylates Chemical class 0.000 claims description 8
- 125000000041 C6-C10 aryl group Chemical group 0.000 claims description 6
- 239000012670 alkaline solution Substances 0.000 claims description 6
- 229940118056 cresol / formaldehyde Drugs 0.000 claims description 6
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 claims description 6
- 230000002378 acidificating effect Effects 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 4
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 3
- RKJUIXBNRJVNHR-UHFFFAOYSA-N 3H-indole Chemical compound C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 150000001299 aldehydes Chemical class 0.000 claims description 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 150000001721 carbon Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 229930003836 cresol Natural products 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- SMWDFEZZVXVKRB-UHFFFAOYSA-O hydron;quinoline Chemical compound [NH+]1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-O 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 2
- 108010010803 Gelatin Proteins 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims description 2
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims description 2
- 150000003926 acrylamides Chemical class 0.000 claims description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 2
- 150000001720 carbohydrates Chemical class 0.000 claims description 2
- 150000001925 cycloalkenes Chemical class 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 claims description 2
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 claims description 2
- 229920000159 gelatin Polymers 0.000 claims description 2
- 239000008273 gelatin Substances 0.000 claims description 2
- 235000019322 gelatine Nutrition 0.000 claims description 2
- 235000011852 gelatine desserts Nutrition 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 230000005660 hydrophilic surface Effects 0.000 claims description 2
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 claims description 2
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 claims 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 239000005030 aluminium foil Substances 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 150000004985 diamines Chemical class 0.000 claims 1
- 125000005442 diisocyanate group Chemical group 0.000 claims 1
- 150000002009 diols Chemical class 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 239000011118 polyvinyl acetate Substances 0.000 claims 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 claims 1
- 238000011161 development Methods 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 230000002401 inhibitory effect Effects 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 239000006096 absorbing agent Substances 0.000 description 10
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 10
- 238000003303 reheating Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000654 additive Substances 0.000 description 9
- 238000001035 drying Methods 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- 125000002091 cationic group Chemical group 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 239000005643 Pelargonic acid Substances 0.000 description 5
- 239000004111 Potassium silicate Substances 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 125000000129 anionic group Chemical group 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 229920002523 polyethylene Glycol 1000 Polymers 0.000 description 5
- 229940113116 polyethylene glycol 1000 Drugs 0.000 description 5
- 229910052913 potassium silicate Inorganic materials 0.000 description 5
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 5
- 235000019353 potassium silicate Nutrition 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 4
- 229960003237 betaine Drugs 0.000 description 4
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- HNYOPLTXPVRDBG-UHFFFAOYSA-N barbituric acid Chemical group O=C1CC(=O)NC(=O)N1 HNYOPLTXPVRDBG-UHFFFAOYSA-N 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- VISOTGQYFFULBK-UHFFFAOYSA-N 3-hydroxy-4-phenylpyrrole-2,5-dione Chemical class O=C1C(=O)NC(O)=C1C1=CC=CC=C1 VISOTGQYFFULBK-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
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- 239000000523 sample Substances 0.000 description 2
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- 239000011734 sodium Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 150000003739 xylenols Chemical class 0.000 description 2
- HZBSQYSUONRRMW-UHFFFAOYSA-N (2-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1O HZBSQYSUONRRMW-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- XRUGBBIQLIVCSI-UHFFFAOYSA-N 2,3,4-trimethylphenol Chemical compound CC1=CC=C(O)C(C)=C1C XRUGBBIQLIVCSI-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
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- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
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- 125000003277 amino group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 150000001768 cations Chemical class 0.000 description 1
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- 125000004663 dialkyl amino group Chemical group 0.000 description 1
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- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical class NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000003752 hydrotrope Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical class C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920003226 polyurethane urea Polymers 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical compound C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- 125000005208 trialkylammonium group Chemical group 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Definitions
- the invention relates to a positive-working, radiation-sensitive The recording material Mixture, wherein the mixture is a water-insoluble, in aqueous alkaline solution against it soluble, organic, polymeric binder and an IR-absorbing Contains dye or pigment.
- the mixture concerns a procedure for the production of lithographic printing plates using a recording material with a Carrier and a layer of this mixture.
- the layer has a high Photosensitivity in the IR range, so that the recording material for direct imaging using the computer-to-plate (CTP) method is.
- the recording material according to WO 96/20429 comprises a layer with IR-absorbing carbon black pigments, 1,2-naphthoquinone-2-diazide-sulfonic acid ester or -carboxylic acid ester and a phenolic resin.
- the 1,2-naphthoquinone-2-diazide-sulfonic acid or carboxylic acid may also be directly linked to the hydroxy groups be esterified of phenolic resin.
- the layer is initially full surface exposed with UV rays and then imagewise with IR laser beams. Due to the influence of the IR rays, certain areas of the the UV radiation solubilized layer again insoluble. It is about So a negative working system. The processing of the material is thus relatively expensive.
- EP-A 0 784 233 likewise describes a negative-working mixture, a) novolac and / or polyvinylphenol, b) amino compounds for Hardening of component a), c) a cyanine and / or polymethine dye, the absorbed in the near IR region, and d) photochemical acid generator contains.
- EP-A 908 307 a process for the preparation of a described positive lithographic printing plate, after which a picture generating element is imagewise exposed to IR rays, wherein the image forming element comprises a lithographic support a hydrophilic surface comprises and the support with a a polymer-containing first layer and a second IR-sensitive Cover layer is provided.
- WO 97/39894 describes layers which are solution-inhibiting Supplements included. Such additives reduce the solubility of the unexposed areas of the layer during development in aqueous-alkaline Solutions.
- the additives are next to various pigments in particular cationic compounds, especially dyes and cationic IR absorbers such as quinoline cyanine dyes, benzothiazole cyanine dyes or merocyanines.
- these layers become 5 to 20 seconds long heated to 50 to 100 ° C, the additives lose their inhibiting again Effect.
- the positive working mixture disclosed in EP-A 0 823 327 contains as IR absorbers cyanine, polymethine, squarylium, croconium, pyrylium or Thiopyrylium dyes. Most of these dyes are cationic and show an inhibiting effect. In addition, many of them are halogen-containing. Under unfavorable conditions it can cause environmentally harmful decomposition products arise. Also disclosed are some betaine dyes and an anionic dye (Compound S-9 on page 7). After However, layer drying causes this anionic dye due to its high number of sulfonate groups usually crystallize or Failures of coating components, resulting in significantly worse properties the IR-sensitive layer leads and a lack of layer cosmetics causes.
- the disadvantage of the layer compositions known from the prior art is that the increase in solubility caused by reheating is reached, is reversible after storage at room temperature. Will one Pressure plate not immediately after heating (e.g. further processed, so the development characteristics, what to change Reproduction problems in the processing of the recording materials can lead. As already mentioned, can be at unfavorable Conditions even by halogen-containing cationic additives environmentally harmful decomposition products arise.
- the object of the invention was a radiation-sensitive recording material of the above to provide the type described which contains neither diazonium compounds, still heat or acid curing amino compounds, but also no Contains silver halide compounds and in addition to an imagewise exposure and development no additional work such as reheating or Burning required.
- the chain with the conjugated double bonds is generally 3 to 15 carbon atoms long.
- a delocalized ⁇ -electron system extends usually also between the two bicyclic ring systems.
- Preferred are dyes of symmetrical construction, i. those in which substituted the (partially) aromatic radicals in the formula (I) in the same way and where n m. They are synthetically also more accessible.
- the said (C 1 -C 4 ) alkoxy group is preferably a methoxy or ethoxy group, while the (C 7 -C 16 ) aralkyl group is preferably a benzyl group.
- the halogen atoms are generally chlorine, bromine or iodine atoms.
- R 11 and R 12 are preferably methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec- butyl, tert- butyl, phenyl or naphthalene-1 or 2-yl groups, where the two radicals are particularly preferably identical and likewise particularly preferably methyl groups.
- betainic refers to the compounds of the formula (I) because, in addition to the quaternary nitrogen atom of the 3H-indolium, quinolinium or benzothiazolium ring, they contain the pyrimidine-2,4,6-trione enolate group represented in the formula.
- carboxylate, sulfonate and / or phosphonate groups may be present, so that the compounds may be anionic-betainic as a whole. The number of these anionic groups should generally not exceed 5.
- the counterions of these anionic groups are generally alkali or alkaline earth cations, especially sodium or potassium ions, but also ammonium ions or mono-, di-, tri- or tetraalkylammonium ions.
- the number thereof is less than or at most as great as that of the carboxylate, sulfonate and / or phosphonate groups, so that the dye remains betainic-anionic or betainic.
- the ring formed to include Q is preferably a (C 4 -C 7 ) cycloalkene, more preferably cyclopentene.
- the said 4- to 7-membered ring may also be substituted, especially with halogen atoms, hydroxy groups, alkoxy groups, nitro groups, amino groups, alkylamino groups, dialkylamino groups, carboxy groups, sulfo groups, phosphonic acid groups.
- the heteroatoms are in particular nitrogen, oxygen and / or sulfur atoms. There may also be several heteroatoms in the ring.
- IR-absorbing betainic or betainic-anionic cyanine dyes F1 to F3 listed below the cationic dye F4 * was used for comparison purposes and is therefore marked with *.
- the anionic betainic IR-absorbing Additions no solubility-inhibiting effect on the layer exercise, but usually the dissolution or swelling rate in aqueous-alkaline Promote developers.
- Betaine IR-absorbing additives can have an inhibitory effect, but behave after a short-term Reheating almost inert, i. they do not experience any increase in solubility in aqueous-alkaline developers.
- the proportion of the IR absorbing dye is generally 0.2 to 30 wt .-%, preferably 0.5 to 20 wt .-%, particularly preferably 0.6 to 10 Wt .-%, each based on the total weight of the solids Mixture.
- suitable IR absorbing dyes Not only narrow IR areas can be used, but the whole Wavelength range of the near IR spectrum. To cover the IR range from 700 to 1200 nm, in particular from 800 to 1100 nm, are in usually requires at least two IR-absorbing dyes.
- the organic polymeric binder is preferably a binder having acidic groups whose pK s is less than 13. This ensures that the layer is soluble or at least swellable in aqueous-alkaline developers.
- the binder is a polymer or polycondensate, for example a polyester, polyamide, polyurethane or polyurea. Also particularly suitable are polycondensates and polymers having free phenolic hydroxyl groups, as obtained, for example, by reacting phenol, resorcinol, a cresol, a xylenol or a trimethylphenol with aldehydes - especially formaldehyde - or ketones.
- condensation products of sulfamoyl or carbamoyl-substituted aromatics and aldehydes or ketones are also suitable.
- Polymers of bis-methylol-substituted ureas, vinyl ethers, vinyl alcohols, vinyl acetals or vinyl amides and polymers of phenyl acrylates and copolymers of hydroxyphenyl maleimides are also suitable.
- polymers having vinyl aromatic units, N-aryl (meth) acrylamides or aryl (meth) acrylates may be mentioned, where these units may each have one or more carboxy groups, phenolic hydroxyl groups, sulfamoyl or carbamoyl groups.
- the polymers may additionally contain units of other monomers which do not have acidic units.
- Such units are vinylaromatics, methyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, methacrylamide or acrylonitrile.
- the proportion of the binder is generally 40 to 99.8 wt .-%, preferably 70 to 99.4% by weight, particularly preferably 80 to 99% by weight, each based on the total weight of the nonvolatile constituents of the Mixture.
- the polycondensation product is a Novolak, preferably a cresol / formaldehyde or a cresol / xylenol / formaldehyde novolak, the proportion of novolak being at least 50% by weight, preferably at least 80 wt .-%, is, in each case based on the Total weight of all binders.
- Recording material can finally also by soluble or finely divided, non-inhibiting, soluble or dispersible dyes, which practically do not absorb in the IR range, be influenced or controlled. Suitable for this purpose are in particular Triarylmethane, azine, oxazine, thiazine and xanthene dyes.
- the share of optionally additionally present in the mixture of dyes generally 0.01 to 30 wt .-%, preferably 0.05 to 10 wt .-%, respectively based on the total weight of the nonvolatile constituents of the Mixture.
- the mixture may contain other additives, the not layer-inhibiting, contain, e.g. Carbon black pigments as additional IR absorbers, surfactants (preferably fluorine-containing surfactants or silicone surfactants), Polyalkylene oxides for controlling the acidity of acidic units and Low molecular weight compounds with acidic units to increase the Development speed.
- the mixture contains no ingredients when exposed to radiation in the ultraviolet or visible region of the Spectrum could have an influence on the daylight sensitivity.
- Binders and IR-absorbing, betainic or betainic-anionic Cyanine dye are present as a mixture.
- the recording material with a support and a positive-working, IR-sensitive layer is characterized in that the layer of the described Mixture exists.
- the mixture can also be used for other purposes, e.g. as a photoresist.
- a solvent mixture containing the components of Mixture does not react irreversibly.
- the solvent is on the intended Coating method, the layer thickness, the composition of the layer, and to adjust the drying conditions.
- chlorinated Hydrocarbons such as trichlorethylene or 1,1,1-trichloroethane
- alcohols such as
- the support in the recording material according to the invention is preferably an aluminum foil or a composite of an aluminum and a polyester film.
- the aluminum surface is preferably roughened, anodized and hydrophilized with a compound containing at least one Phosphonic acid or phosphonate unit contains. Before the roughening can a degreasing and pickling with lyes and a mechanical and / or chemical pre-roughening done.
- the thickness of the IR-sensitive layer is generally 1.0 to 5.0 microns, preferably 1.5 to 3.0 microns.
- a cover layer In order to protect the surface of the recording material, in particular before mechanical action, can also applied a cover layer become. It generally consists of at least one water-soluble polymeric binders such as polyvinyl alcohol, polyvinylpyrrolidone, partially hydrolyzed Polyvinyl acetates, gelatin, carbohydrates or hydroxyethyl cellulose and is prepared from an aqueous solution or dispersion, optionally small amounts, i. less than 5 wt .-%, based on the Total weight of coating solvent for the topcoat may contain organic solvents.
- the thickness of the cover layer is up to 5.0 microns, preferably 0.1 to 3.0 microns, more preferably 0.15 to 1.0 microns.
- the subject matter of the present invention is a process for Production of a planographic printing plate in which the recording material according to the invention irradiated imagewise with infrared radiation and then in a conventional aqueous-alkaline developer at a temperature of 20 to 40 ° C is developed.
- aqueous-alkaline developer at a temperature of 20 to 40 ° C is developed.
- general-purpose developers can be used for positive plates.
- Preferred alkali oxides are Na 2 O and K 2 O, as well as mixtures thereof.
- the developer may contain other components, such as buffer substances, complexing agents, defoamers, organic solvents in small amounts, corrosion inhibitors, dyes, surfactants and / or hydrotropes.
- the development is preferred at temperatures of 20 to 40 ° C in mechanical processing equipment.
- Alkali silicate solutions used with alkali contents of 0.6 to 2.0 mol / l. These Solutions can have the same silica / alkali oxide ratio as the Developers own (but usually it is lower) and also others Supplements included.
- the required amounts of regenerate must be on the used development devices, daily plate throughputs, image parts etc. are tuned and are generally from 1 to 50 ml per Square meters of recording material.
- a scheme of addition can For example, via the Leitwerttul done, as in EP-A 0 556 690 described.
- the recording material of the present invention may be subsequently added, if necessary with a suitable correction agent or preservative be treated.
- the coating solutions thus prepared were roughened in hydrochloric acid, anodized in sulfuric acid and hydrophilized with polyvinylphosphonic acid Applied aluminum foils. After 2 min drying at 100 ° C was the Layer thickness at 1.9 +/- 0.1 microns.
- Table 1a shows that Examples 1b to 1e in some embodiments have a solubility-inhibiting effect on the layer, in each case Comparison to a layer without IR dyes (1a *).
- Tables 1b and 1c clearly show that only the comparative example 1b *, which contains a cationic IR-absorbing dye, after reheating a solubility increase in an aqueous-alkaline solution experiences.
- Coating solutions were prepared from 0.87 gt meta- / para- cresol / formaldehyde novolac, 0.10 Gt polyhydroxystyrene 4.50 gt tetrahydrofuran, 1,80 Gt ethylene glycol monoalkyl, 2,70 Gt Methanol and 0.03 Gt IR absorber (see Table 2).
- the development was carried out in a conventional processor at a flow rate of 0.8 m / min and a temperature of 23 ° C with a potassium silicate developer, the K 2 SiO 3 (normality 0.8 mol / l in water) and 0.2% O , O'-bis-carboxymethyl-polyethylene glycol-1000 and 0.4% pelargonic acid.
- Table 3 shows the image reproduction of halftone dots of a test wedge. example Reproduction of the percent center points) Playback of the open grid depths 2a * no development no development 2 B* 4 97 2c 3 98 2d 3 99 2e 2 98
- the development was carried out in a conventional processor at a flow rate of 0.8 m / min and a temperature of 23 ° C with a potassium silicate developer, the K 2 SiO 3 (normality 0.8 mol / l in water) and 0.2% O , O'-bis-carboxymethyl-polyethylene glycol-1000 and 0.4% pelargonic acid.
- Developmental behavior after exposure to daylight example 0 min exposure 1 h exposure 1 week exposure 3a By default By default By default By default 3b * By default total layer removal ----
- the table shows that the diazo-containing layer is completely removed during development was, if previously 1 hour (or less) of daylight on the Recording material had acted.
- the recording material according to the invention was insensitive to daylight and settled even if it is a week or more Daylight was exposed.
- This example demonstrates the advantage of IR dyes with and without indicator dyes in comparison to soot-sensitized recording materials in Reference to mechanical surface attack.
- Coating solutions were prepared from 0.72% meta / para- cresol / formaldehyde novolac, 0.10 Gt Copolymer of (2-hydroxy-phenyl) -methacrylate and methyl methacrylate (M w : 4,000) and 0.05 gt 2,4-dihydroxy-benzophenone as well 0.02% Flexoblue 630 from BASF (only in layers 4b and 4d *) or 0.08 Gt F 3 (only in layers 4a and 4b) or 0.04 Gt Carbon black pigment type HCC from Grolman (only in layers 4c * and 4d *).
- the recording materials were then placed in an external drum imagesetter exposed to infrared radiation. It was also in the previous Examples used Nd-YAG lasers with a power of 7.0 W, one Write speed of 120 rpm and a beam width of 10 ⁇ m used.
- the recording materials were in a hardness tester pretreated. This rolled a rubber wheel with a diameter of about 1 to 2 cm and a tread width of about 1 mm beyond that testing material. With the help of weights, the contact pressure was like from the Table visible.
- the development was carried out in a conventional processor at a flow rate of 0.8 m / min and a temperature of 23 ° C with a potassium silicate developer, the K 2 SiO 3 (normality 0.8 mol / l in water) and 0.2% O , O'-bis-carboxymethyl-polyethylene glycol-1000 and 0.4% pelargonic acid.
- Table 5 shows the results after treatment of the recording materials with the hardness tester. Corresponding to the mechanical sensitivity of the coating surface, imprint marks (referred to in the table as "traces") appear on the material. example Applying mass to an impeller [N] 0.5 1 2 5 4a - traces traces traces 4b - - - traces 4c * traces traces traces traces 4d * - - traces traces
- Recording materials with additional indicator dye are less sensitive to mechanical effects.
- the table also shows that IR-sensitized recording materials are less sensitive to footprints as soot-pigmented.
- Example 5 shows the influence of IR absorber mixtures on recording materials.
- a coating solution was prepared 0.85 Gt meta- / para- cresol / formaldehyde novolac, 0.06 Gt Styrene / acrylate copolymer (M w 6500, acid number 205), 4.50 gt tetrahydrofuran, 1,80 Gt ethylene glycol monoalkyl, 2,70 Gt Methanol.
- the respective coating solutions were applied to aluminum foils, previously roughened in hydrochloric acid, anodized in sulfuric acid and had been hydrophilized with polyvinylphosphonic acid. After drying for 2 min at 100 ° C, the layer thickness was 2 microns.
- the development was carried out in a conventional processor at a flow rate of 1.0 m / min and a temperature of 23 ° C with a potassium silicate developer, the K 2 SiO 3 (normality 0.8 mol / l in water) and 0.2% O , O'-bis-carboxymethyl-polyethylene glycol-1000 and 0.4% pelargonic acid.
- K 2 SiO 3 normality 0.8 mol / l in water
- O O'-bis-carboxymethyl-polyethylene glycol-1000 and 0.4% pelargonic acid.
- the table shows that by suitable mixing of IR absorbers a Sensitization in the entire range of 830 nm to 1064 nm is possible.
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Description
- R1 bis R8
- unabhängig voneinander ein Wasserstoff- oder Halogenatom, eine Sulfonat-, Carboxylat-, Phosphonat-, Hydroxy-, (C1-C4)Alkoxy-, Nitro-, Amino-, (C1-C4)Alkylamino-, Di(C1-C4)alkylaminogruppe oder eine (C6-C10)Arylgruppe, die gegebenenfalls ihrerseits mit einem oder mehreren Halogenatomen und/oder einer oder mehreren Sulfonat-, Carboxylat-, Phosphonat-, Hydroxy-, (C1-C4)Alkoxy-, Nitro-, Amino-, (C1-C4)Alkylamino- und/oder Di(C1-C4)alkylaminogruppen substituiert ist, darstellen,
- R9 und R10
- unabhängig voneinander eine geradkettige oder verzweigte (C1-C6)Alkyl-, eine (C7-C16)Aralkyl- oder eine (C6-C10)Arylgruppe, die jeweils gegebenenfalls ihrerseits mit einem oder mehreren Halogenatomen und/oder einer oder mehreren Sulfonat-, Carboxylat-, Phosphonat-, Hydroxy-, (C1-C4)Alkoxy-, Nitro-, Amino-, (C1-C4)Alkylamino- und/oder Di(C1-C4)alkylaminogruppen substituiert ist, darstellen,
- R11 und R12
- unabhängig voneinander (C1-C4)Alkyl- oder (C6-C10)Arylgruppen darstellen, die ihrerseits substituiert sein können,
- Z1 und Z2
- unabhängig voneinander ein Schwefelatom, eine Di(C1-C4 )alkylmethylengruppe oder eine Ethen-1,2-diylgruppe darstellen und
- A
- ein Kohlenstoffatom oder eine Kette mit konjugierten Doppelbindungen darstellt, die die Bildung eines delokalisierten π-Elektronensystems zwischen dem quartären Stickstoffatom des 3H-Indolium-, Chinolinium- oder Benzothiazoliumrests und dem Enolat-Sauerstoffatom des Pyrimidin-2,4,6-trionrestes bewirkt.
- n und m
- ganze Zahlen von 1 bis 8 sind, mit der Maßgabe, daß n + m = 2 oder größer ist, und
- Q
- die zur Bildung eines 4- bis 7-gliedrigen, iso- oder heterocyclischen Ringes erforderlichen Glieder darstellt.
1a | 4,87 Gt | meta-/para-Kresol/Formaldehyd-Novolak, |
20,00 Gt | Ethylenglykol-monomethylether/Butanon (6:4) und | |
2,00 Gt | destilliertem Wasser, |
1b* | 0,04 Gt | Cyaninfarbstoff (kationisch) F4, |
1c | 0,04 Gt | Cyaninfarbstoff (betainisch) F1, |
1d | 0,04 Gt | Cyaninfarbstoff (betainisch) F2, |
1e | 0,04 Gt | Cyaninfarbstoff (betainisch) F3, |
1f* | 0,04 Gt | Flexoblau 630, ein kationischer Farbstoff der BASF AG |
Küvettenentwicklungszeit [s] | Abtragsraten ohne Nacherwärmung [g/m2] | |||||
1a* | 1b* | 1c | 1d | 1e | 1f* | |
30 | 0,02 | 0,01 | 0,11 | 0,09 | 0,06 | 0,05 |
60 | 0,11 | 0,05 | 0,12 | 0,10 | 0,13 | 0,07 |
120 | 0,34 | 0,23 | 0,25 | 0,24 | 0,27 | 0,18 |
240 | 0,59 | 0,43 | 0.67 | 0,59 | 0,61 | 0,60 |
360 | 0,96 | 0,61 | 0,85 | 0,84 | 0,85 | 0,81 |
Küvettenentwicklungszeit [s] | Abtragsrate nach 20 s Erwärmen auf 50°C [g/m2] | ||||
1b* | 1c | 1d | 1e | 1f* | |
30 | 0,05 | 0,02 | 0,05 | 0,01 | 0,02 |
60 | 0,15 | 0,04 | 0,08 | 0,02 | 0,03 |
120 | 0,44 | 0,12 | 0,12 | 0,17 | 0,18 |
240 | 0,85 | 0,41 | 0,49 | 0,51 | 0,52 |
360 | 1,21 | 0,77 | 0,75 | 0,86 | 0,75 |
[s] | Abtragsrate nach 5 s Erwärmen auf 160°C [g/m2] | Abtragsrate nach 20 s Erwärmen auf 160°C [g/m2] | ||||||||
1b* | 1c | 1d | 1e | 1f* | 1b* | 1c | 1d | 1e | 1f* | |
30 | 0,10 | 0,01 | 0,01 | 0,02 | 0,01 | 0,10 | 0,01 | 0,02 | 0,03 | 0,01 |
60 | 0,20 | 0,02 | 0,03 | 0,07 | 0,05 | 0,19 | 0,05 | 0,03 | 0,09 | 0,04 |
120 | 0,28 | 0,17 | 0,16 | 0,15 | 0,19 | 0,36 | 0,17 | 0,15 | 0,14 | 0,22 |
240 | 0,65 | 0,57 | 0,56 | 0,58 | 0,60 | 0,98 | 0,54 | 0,54 | 0,56 | 0,59 |
360 | 1,09 | 0,76 | 0,74 | 0,76 | 0,73 | 1,46 | 0,76 | 0,76 | 0,71 | 0,70 |
0,87 Gt | meta-/para-Kresol/Formaldehyd-Novolak, |
0,10 Gt | Polyhydroxystyrol, |
4,50 Gt | Tetrahydrofuran, |
1,80 Gt | Ethylenglykolmonoalkylether, |
2,70 Gt | Methanol und |
0,03 Gt | IR-Absorber (siehe Tabelle 2). |
Beispiel | IR-Absorber |
2a* | Ohne Absorber |
2b* | Rußpigment, Typ HCC der Firma Grolman |
2c | F1 |
2d | F2 |
2e | F3 |
Beispiel | Wiedergabe der Prozentrasterpunkte) | Wiedergabe der offenen Rastertiefen |
2a* | keine Aufentwicklung | keine Aufentwicklung |
2b* | 4 | 97 |
2c | 3 | 98 |
2d | 3 | 99 |
2e | 2 | 98 |
0,60 Gt | meta-/para-Cresol-Formaldehyd-Novolak, |
0,10 Gt | F 2, |
6,00 Gt | Tetrahydrofuran und |
4,00 Gt | Ethylenglykol-monomethylether. |
Entwicklungsverhalten nach Einwirkung von Tageslicht | |||
Beispiel | 0 min Einwirkung | 1 h Einwirkung | 1 Woche Einwirkung |
3a | standardmäßig | standardmäßig | standardmäßig |
3b* | standardmäßig | totaler Schichtabtrag | ---- |
0,72 Gt | meta-/para-Cresol/Formaldehyd-Novolak, |
0,10 Gt | Copolymer aus (2-Hydroxy-phenyl)-methacrylat und Methylmethacrylat (Mw: 4.000) und |
0,05 Gt | 2,4-Dihydroxy-benzophenon sowie |
0,02 Gt | Flexoblau 630 der Fa. BASF (nur in den Schichten 4b und 4d*) bzw. |
0,08 Gt | F 3 (nur in den Schichten 4a und 4b) bzw. |
0,04 Gt | Rußpigment Typ HCC der Fa. Grolman (nur in den Schichten 4c* und 4d*). |
Beispiel | Einwirkende Masse auf ein Laufrad [N] | |||
0,5 | 1 | 2 | 5 | |
4a | - | Spuren | Spuren | Spuren |
4b | - | - | - | Spuren |
4c* | Spuren | Spuren | Spuren | Spuren |
4d* | - | - | Spuren | Spuren |
0,85 Gt | meta-/para-Cresol/Formaldehyd-Novolak, |
0,06 Gt | Styrol/Acrylat-Copolymer (Mw 6500; Säurezahl 205), |
4,50 Gt | Tetrahydrofuran, |
1,80 Gt | Ethylenglykolmonoalkylether, |
2,70 Gt | Methanol. |
a) | 0,04 Gt | F 1 oder |
b) | 0,04 Gt | F 1 und |
0,04 Gt | Rußpigment Typ HCC der Fa. Grolman oder | |
c) | 0,04 Gt | Rußpigment Typ HCC d.Fa. Grolman. |
Beispiel | Aufentwicklung bei Laserbelichtung 830 nm | Aufentwicktung bei Laserbelichtung 1064 nm |
5a | gerade Hintergrund frei | nicht entwickelbar |
5b | Hintergrund frei | Hintergrund frei |
5c | Hintergrund frei | Hintergrund frei |
Claims (15)
- Strahlungsempfindliches Aufzeichnungsmaterial, das ein Substrat mit einer hydrophilen Oberfläche und eine auf dieser Oberfläche befindliche strahlungsempfindliche Schicht aufweist, wobei diese Schicht ein Gemisch das ein in Wasser unlösliches, in wäßrig-alkalischer Lösung dagegen lösliches oder zumindest quellbares organisches polymeres Bindemittel und mindestens einen IR-absorbierenden Farbstoff enthält, dadurch gekennzeichnet, daß der IR-absorbierende Farbstoff ein betainischer oder betainisch-anionischer Cyaninfarbstoff der Formel (I) ist worin
- R1 bis R8
- unabhängig voneinander ein Wasserstoff- oder Halogenatom, eine Sulfonat-, Carboxylat-, Phosphonat-, Hydroxy-, (C1-C4)Alkoxy-, Nitro-, Amino-, (C1-C4)Akylamino-, Di(C1-C4)alkylamino- oder eine (C6-C10)Arylgruppe, die gegebenenfalls ihrerseits mit einem oder mehreren Halogenatomen und/oder einer oder mehreren Sulfonat-, Carboxylat-, Phosphonat-, Hydroxy-, (C1-C4)Alkoxy-, Nitro-, Amino-, (C1-C4)Alkylamino- und/oder Di(C1-C4)alkylaminogruppen substituiert ist, darstellen,
- R9 und R10
- unabhängig voneinander eine geradkettige oder ver zweigte (C1-C6)Alkyl-, eine (C7-C16)Aralkyl- oder eine (C6-C10)Arylgruppe, die jeweils gegebenenfalls ihrerseits mit einem oder mehreren Halogenatomen und/oder einer oder mehreren Sulfonat-, Carboxylat-, Phosphonat-, Hydroxy-, (C1-C4)Alkoxy-, Nitro-, Amino-, (C1-C4)Alkylamino- und/oder Di(C1-C4)alkylaminogruppen substituiert ist, darstellen,
- R11 und R12
- unabhängig voneinander (C1-C4)Alkyl- oder (C6-C10)Arylgruppen darstellen, die ihrerseits substituiert sein können,
- Z1 und Z2
- unabhängig voneinander ein Schwefelatom, eine Di(C1-C4)alkylmethylengruppe oder eine Ethen-1,2-diylgruppe darstellen und
- A
- ein Kohlenstoffatom oder eine Kette mit konjugierten Doppelbindungen darstellt, die die Bildung eines delokalisierten n-Elektronensystems zwischen dem quartären Stickstoffatom des 3H-Indolium-, Chinolinium- oder Benzothiazoliumrestes und dem Enolat-Sauerstoffatom des Pyrimidin-2,4,6-trionrestes bewirkt.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß Anspruch 1, dadurch gekennzeichnet, daß der IR-absorbierende Farbstoff ein einer der nachstehenden Formeln (II) bis (IV) entsprechender betainischer bzw. betainisch-anionischer Cyaninfarbstoff ist : worin
- n und m
- ganze Zahlen von 1 bis 8 sind, mit der Maßgabe, daß n + m = 2 oder größer ist, und
- Q
- die zur Bildung eines 4- bis 7-gliedrigen, iso- oder heterocyclischen Ringes erforderlichen Glieder darstellt
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß Anspruch 2, dadurch gekennzeichnet, daß der unter Einschluß von Q gebildete Ring ein (C4-C7)-Cycloalken, bevorzugt Cyclopenten, ist.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß das Bindemittel acide Gruppen mit einem pKs-Wert von weniger 13 enthält.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß Anspruch 4, dadurch gekennzeichnet, daß das Bindemittel ein Polykondensationsprodukt ist aus Phenolen oder sulfamoyl- oder carbamoyl-substituierten Aromaten mit Aldehyden oder Ketonen, ein Umsetzungsprodukt von Diisocyanaten mit Diolen oder Diaminen oder ein Polymer mit Einheiten aus Vinylaromaten, N-Aryl-(meth)acrylamiden oder Aryl-(meth)acrylaten, wobei diese Einheiten jeweils noch eine oder mehrere Carboxylgruppen, phenolische Hydroxygruppen, Sulfamoyl- oder Carbamoylgruppen enthalten.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß Anspruch 5, dadurch gekennzeichnet, daß das Polykondensationsprodukt ein Novolak ist, bevorzugt ein Cresol/Formaldehyd- oder ein Cresol/Xylenol/Formaldehyd-Novolak, wobei der Anteil an Novolak bevorzugt mindestens 50 Gew.-%, besonders bevorzugt mindestens 80 Gew.-%, bezogen auf das Gesamtgewicht aller Bindemittel, beträgt.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß der Anteil des Bindemittels 40 bis 99,8 Gew.-%, bevorzugt 70 bis 99,4 Gew.-%, besonders bevorzugt 80 bis 99 Gew.-%, beträgt, jeweils bezogen auf das Gesamtgewicht der nichtflüchtigen Bestandteile des Gemisches.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß Anspruch 1, dadurch gekennzeichnet, daß der IR-absorbierende Farbstoff nach einer kurzeitigen Nacherwärmung keinen Löslichkeitszuwachs erfährt.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 8, dadurch gekennzeichnet, daß der Anteil des IR-absorbierenden betainischen oder betainisch-anionischen Cyaninfarbstoffs der Formel (I) 0,2 bis 30 Gew.-%, bevorzugt 0,5 bis 20 Gew.-%, besonders bevorzugt 0,6 bis 10 Gew.-%, jeweils bezogen auf das Gesamtgewicht der Feststoffe des Gemisches, beträgt.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 9, dadurch gekennzeichnet, daß es zur Abdeckung des nahen IR-Bereichs, d.h. des IR-Bereiches von 700 bis 1100 nm, insbesondere von 800 bis 1100 nm, zwei oder mehr verschiedene betainische oder betainisch-anionische Farbstoffe der Formel I enthält.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 10, dadurch gekennzeichnet, daß es ein Rußpigment enthält, das bevorzugt vordispergiert ist, wobei das Dispergierungsmittel phenolische Hydroxygruppen enthält.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 11, dadurch gekennzeichnet, daß sich auf der strahlungsempfindlichen Schicht bzw. auf der Farbstoffschicht eine Deckschicht aus mindestens einem wasserlöslichen polymeren Bindemittel befindet.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß Anspruch 12, dadurch gekennzeichnet, daß das wasserlösliche polymere Bindemittel Polyvinylalkohol, Polyvinylpyrrolidon, teilverseiftes Polyvinylacetat, Gelatine, ein Kohlehydrat oder Hydroxyethylcellulose ist.
- Strahlungsempfindliches Aufzeichnungsmaterial gemäß einem oder mehreren der Ansprüche 1 bis 13, dadurch gekennzeichnet, daß der Träger aus einer Aluminiumfolie besteht.
- Verfahren zur Herstellung einer Druckform, wobei ein strahlungsempfindliches Aufzeichnungsmaterial mit Infrarotstrahlung bildmäßig bestrahlt und anschließend mit einer wäßrig-alkalischen Lösung entwickelt wird, dadurch gekennzeichnet, daß das Aufzeichnungsmaterial einem oder mehreren der Ansprüche 1 bis 14 entspricht.
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DE19834746A DE19834746A1 (de) | 1998-08-01 | 1998-08-01 | Strahlungsempfindliches Gemisch mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial |
DE19834746 | 1998-08-01 |
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EP0978376B1 true EP0978376B1 (de) | 2005-03-09 |
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BR112018068745A2 (pt) | 2016-03-16 | 2019-01-22 | Agfa Nv | processo e aparelho para processar uma chapa de impressão litográfica |
EP3239184A1 (de) | 2016-04-25 | 2017-11-01 | Agfa Graphics NV | Thermoplastische polymerpartikel und ein lithografiedruckplattenvorläufer |
EP3441223B1 (de) | 2017-08-07 | 2024-02-21 | Eco3 Bv | Lithographiedruckplattenvorläufer |
WO2019039074A1 (ja) | 2017-08-25 | 2019-02-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版、及び、平版印刷版の製版方法 |
EP3474073B1 (de) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | Methode zur herstellung einer druckplatte |
EP3637188A1 (de) | 2018-10-08 | 2020-04-15 | Agfa Nv | Sprudelnder entwicklervorläufer zur verarbeitung eines lithografischen druckplattenvorläufers |
EP3650938A1 (de) | 2018-11-09 | 2020-05-13 | Agfa Nv | Lithographiedruckplattenvorläufer |
EP3715140A1 (de) | 2019-03-29 | 2020-09-30 | Agfa Nv | Verfahren zum drucken |
US11589703B1 (en) | 2019-05-08 | 2023-02-28 | Microtrace, LLC. | Spectral signature systems that use encoded image data and encoded spectral signature data |
EP3778253A1 (de) | 2019-08-13 | 2021-02-17 | Agfa Nv | Verfahren zur verarbeitung einer lithografiedruckplatte |
EP3922462B1 (de) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithografischer photopolymerer druckplattenvorläufer mit verbesserter tageslichtstabilität |
WO2022040304A1 (en) | 2020-08-19 | 2022-02-24 | Microtace, Llc | Strategies and systems that use spectral signatures and a remote authentication authority to authenticate physical items and linked documents |
US20240100820A1 (en) | 2020-12-16 | 2024-03-28 | Agfa Offset Bv | Lithographic Printing Press Make-Ready Method |
EP4382306A1 (de) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Make-ready-verfahren für eine lithographische druckmaschine |
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DE1447963B2 (de) | 1965-11-24 | 1972-09-07 | KaIIe AG, 6202 Wiesbaden Biebnch | Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial |
US4264692A (en) * | 1978-01-23 | 1981-04-28 | E. I. Du Pont De Nemours And Company | Photopolymerized elements having selectively dye absorbed hydrophilic and oleophilic images |
DE3715790A1 (de) | 1987-05-12 | 1988-11-24 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial |
DE3810642A1 (de) | 1988-03-29 | 1989-10-12 | Basf Ag | Methinfarbstoffe sowie optisches aufzeichnungsmedium, enthaltend die neuen farbstoffe |
DE4204691A1 (de) | 1992-02-17 | 1993-09-02 | Hoechst Ag | Verfahren und vorrichtung zum entwickeln von strahlungsempfindlichen, belichteten druckformen |
GB9426206D0 (en) | 1994-12-23 | 1995-02-22 | Horsell Plc | Lithographic plate |
WO1997039894A1 (en) | 1996-04-23 | 1997-10-30 | Horsell Graphic Industries Limited | Heat-sensitive composition and method of making a lithographic printing form with it |
US5641608A (en) * | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
US5814431A (en) | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
JP3814961B2 (ja) * | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
EP0908307B1 (de) * | 1997-10-08 | 2003-11-26 | Agfa-Gevaert | Verfahren zur Herstellung einer positiv arbeitenden Druckplatte aus einem Wärmeempfindlichen Bildaufzeichnungsmaterial |
US6235451B1 (en) * | 1997-10-08 | 2001-05-22 | Agfa-Gevaert | Method for making positive working printing plates from a heat mode sensitive image element |
-
1998
- 1998-08-01 DE DE19834746A patent/DE19834746A1/de not_active Withdrawn
-
1999
- 1999-07-24 EP EP99114554A patent/EP0978376B1/de not_active Expired - Lifetime
- 1999-07-24 DE DE59911722T patent/DE59911722D1/de not_active Expired - Lifetime
- 1999-07-29 US US09/362,857 patent/US6492093B2/en not_active Expired - Lifetime
- 1999-08-02 JP JP21923899A patent/JP4259685B2/ja not_active Expired - Fee Related
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DE19834746A1 (de) | 2000-02-03 |
EP0978376A3 (de) | 2001-09-12 |
JP2000206687A (ja) | 2000-07-28 |
US20020006575A1 (en) | 2002-01-17 |
JP4259685B2 (ja) | 2009-04-30 |
EP0978376A2 (de) | 2000-02-09 |
DE59911722D1 (de) | 2005-04-14 |
US6492093B2 (en) | 2002-12-10 |
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