EP0874385A1 - Procédé de fabrication d'une anode pour tubes à rayons x - Google Patents

Procédé de fabrication d'une anode pour tubes à rayons x Download PDF

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Publication number
EP0874385A1
EP0874385A1 EP98201236A EP98201236A EP0874385A1 EP 0874385 A1 EP0874385 A1 EP 0874385A1 EP 98201236 A EP98201236 A EP 98201236A EP 98201236 A EP98201236 A EP 98201236A EP 0874385 A1 EP0874385 A1 EP 0874385A1
Authority
EP
European Patent Office
Prior art keywords
anode
coating
ray tubes
base body
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP98201236A
Other languages
German (de)
English (en)
Other versions
EP0874385B1 (fr
Inventor
Peter Dr. Rödhammer
Dietmar Sprenger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plansee SE
Original Assignee
Plansee SE
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Filing date
Publication date
Application filed by Plansee SE filed Critical Plansee SE
Publication of EP0874385A1 publication Critical patent/EP0874385A1/fr
Application granted granted Critical
Publication of EP0874385B1 publication Critical patent/EP0874385B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/083—Bonding or fixing with the support or substrate

Definitions

  • the invention relates to a method for producing an anode for X-ray tubes consisting of a base body and one of these different X-ray emitting coating.
  • Such materials are used to generate X-rays, when subjected to a focused electron beam Emit x-rays.
  • the refractory metals tungsten and Molybdenum and its alloys are, for example, such materials that depending on the desired type of X-ray radiation.
  • rotating anodes are often used for X-ray tubes in the form of axially symmetrical blanks for the production of X-rays used.
  • the so-called focal path in area directly affected by the electron beam from the X-ray generating material as a comparatively thin coating executed while the main body of the rotating anode made of others high-melting materials.
  • the focal track covering is mainly made using powder metallurgy Process made by pressing, sintering and forging.
  • metallic He is preferably materials for the base body in one operation produced with the base body by layering the powder mixtures, with which Density values from 96% to 98% of theoretical density achieved as standard will.
  • Such a manufacturing process for the focal track covering is inexpensive, but leads to properties, particularly with regard to his fatigue crack behavior are not yet optimal.
  • the object of the invention is therefore to provide a method for producing anodes for X-ray tubes, by means of which the cost-effective production of the X-ray-emitting coating is made possible, the coating with regard to its usage behavior, in particular its fatigue crack resistance, at least fully corresponds to the standard which is still common today or even exceeds it. According to the invention this is achieved in that the X-ray emitting coating is applied by inductive plasma spraying.
  • the coating emitting X-rays passes through repeated overlaying of individual spray layers with a total thickness between 0.4 mm and 0.7 mm is applied. As a rule, this is a 20 - 50 overlaying of individual layers of the spray layer is recommended be.
  • a particularly favorable variant of the method according to the invention is reached when emitting X-rays before application Covering in the area of this covering in the base body of the anode Recess of a little more than the depth of the desired covering thickness is incorporated. In this way, the surface of the covering can simple smoothing to a level with the adjacent surface of the Anode body are brought.
  • the Separation under an inductively coupled power between 50 kW and 100 kW and under a delivery rate of the wettable powder between 10 g / min and 50 g / min takes place. Under these conditions there is a total Melting and sufficient overheating of the melt droplets.
  • the plasma jet and the base body are used to produce rotating anodes the rotating anode moves against each other in such a way that the central point of impact of the plasma particle stream on the anode surface and the Rotating anode axis concentric center line of the active Focal path area coincide at least approximately, the Particle flow of the plasma jet is set so that the within the particle stream of the plasma jet that only hits the active focal path region includes that area which is within the half-width of the Gaussian Particle distribution of the generated complete plasma jet lies.
  • the edge region of the layer which is less favorable for the layer construction Plasma rays largely shifted to areas of the anode surface that are outside the active focal path area.
  • the focal path area is that for the generation of X-rays directly from Understand the electron beam area.
  • the rotating anode is finally one Is subjected to annealing treatment.
  • the purpose of this annealing is both one further improvement of the structural properties through diffusion processes as also degassing the anode.
  • the type of annealing treatment is among others depending on the material from which the base body of the rotating anode is made has been. In the case of a base body made of high-melting metal, the Annealing treatment at temperatures between 1,200 ° C and 1,600 ° C during 1 to 20 hours while rotating anodes where graphite is used for the body was used, usually at temperatures up to 1,300 ° C is carried out for up to about 10 hours. in case of an Graphite base body is the possible formation of disadvantageous carbides in the border area by known diffusion barrier layers, e.g. Rhenium, advantageously delayed.
  • the method according to the invention can be used in a particularly advantageous manner be applied when the base body of the anode is made of graphite, molybdenum or a molybdenum alloy and the X-ray emitting coating consists of a tungsten-rhenium alloy.
  • the individual base bodies were coated by means of an inductively heated plasma cannon with an inner diameter of 50 mm and a power of 65 kW with spray powder made of a tungsten alloy with 5% rhenium in a powder fraction between 15 and 63 ⁇ m.
  • the wettable powder was introduced axially at a rate of 30 g / min using Ar carrier gas.
  • the base bodies were heated to 1500 ° C.
  • the speed of rotation of the base body was 10 rpm.
  • the plasma cannon was moved laterally to the center line of the focal track covering concentric to the rotating anode axis, in such a way that the axis of the plasma cannon continuously exceeded this center line alternately on both sides up to a maximum of 5 mm at a speed of 2 mm / sec.
  • a focal track covering with a total thickness of about 1 mm and a width of 25 mm was applied in this way through approximately 50 individual layers deposited one above the other.
  • the rotating anodes which had cooled to below 100 ° C., were removed from the vacuum chamber and then the focal track covering was ground to a thickness of 0.7 mm. Finally, the rotary anodes finished in this way were subjected to high vacuum annealing at a temperature of 1600 ° C. for 90 minutes.
  • the same disk-shaped base bodies as were used for the application of the method according to the invention were produced with a 0.8 mm thick focal track covering from a tungsten-5-rhenium alloy by powder metallurgy.
  • a layer of the TZM powder mixture for the base body on the one hand and the tungsten-rhenium alloy for the focal track coating on the other hand was produced and pressed, the compact was sintered and the final shape was produced by forging and mechanical processing. Finally, the rotating anodes were subjected to the same high vacuum annealing as those produced according to the invention.
  • the focal track coverings applied according to the invention had a Density of 97.2% of the theoretical density, while the Powder metallurgy produced focal track coverings a density of 97.4% had theoretical density.
  • a similar Rotating anode base body as in production example 1 in the area of Burning path incorporated an annular groove of 0.8 mm depth. After that was the rotating anode body with the substantially similar Coating conditions according to the inventive method coated according to production example 1.
  • the rotating anodes produced according to the invention or according to the prior art according to production example 1 were installed in a test bench for X-ray rotating anodes and cyclically tested under the usual conditions with the following parameters: Tube voltage 90 kV Tube current 400 mA Shot duration 2 sec break time 58 sec
  • the test was randomly interrupted at specified times the furrow roughening that had occurred up to that point as a measure of the Fatigue crack resistance and the associated reduction in X-ray dose yield to be determined.
  • the structure of the induction plasma-sprayed combustion path according to FIG. 3 shows one fundamentally different morphology than that of powder metallurgy produced focal path according to Figure 4.
  • the inductive plasma spraying striking enamel droplets crystallize transcrystalline as they solidify from, which in turn serve as a crystallization surface for the subsequent melting droplets. This will do it once present growth direction of the layer at least over many Maintain melt droplets largely and they do not form lamellar usually observed in conventional plasma spraying Structural structures with poorly bound grain boundaries as shown in FIG. 5 clearly using the example of one produced by conventional plasma spraying Focal path coating of a rotating anode can be seen.
  • Fatigue of the focal track covering at Rotary anode produced according to the invention occurs in the form of essentially microcracks running perpendicular to the surface appear however less harmful in terms of roughening the surface impact as those cracks in the powder metallurgically manufactured rotating anode.
  • the greater roughening and the destabilization of the surface structure in the case of the powder anode made rotating anode by failure of the Grain boundaries can be clearly seen in FIG. 4.
EP98201236A 1997-04-22 1998-04-17 Procédé de fabrication d'une anode pour tubes à rayons x Expired - Lifetime EP0874385B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
AT0024497U AT1984U1 (de) 1997-04-22 1997-04-22 Verfahren zur herstellung einer anode für röntgenröhren
AT24497U 1997-04-22
AT244/97U 1997-04-22

Publications (2)

Publication Number Publication Date
EP0874385A1 true EP0874385A1 (fr) 1998-10-28
EP0874385B1 EP0874385B1 (fr) 2002-06-12

Family

ID=3485389

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98201236A Expired - Lifetime EP0874385B1 (fr) 1997-04-22 1998-04-17 Procédé de fabrication d'une anode pour tubes à rayons x

Country Status (5)

Country Link
US (1) US6132812A (fr)
EP (1) EP0874385B1 (fr)
JP (1) JPH10302624A (fr)
AT (2) AT1984U1 (fr)
DE (1) DE59804388D1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009039545A1 (fr) * 2007-09-28 2009-04-02 Plansee Metall Gmbh Anode à rayons x à dissipation thermique améliorée
DE102005033799B4 (de) * 2005-01-31 2010-01-07 Medicoat Ag Verfahren zur Herstellung eines Drehanodentellers für Röntgenröhren
DE102005049519B4 (de) * 2005-01-31 2014-10-30 Medicoat Ag Drehanodenteller für Röntgenröhren
WO2017004630A1 (fr) 2015-07-03 2017-01-12 Plansee Se Contenant en métal réfractaire

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070207338A1 (en) * 2006-03-01 2007-09-06 Plasma Processes, Inc. X-ray target and method for manufacturing same
US20080081122A1 (en) * 2006-10-03 2008-04-03 H.C. Starck Inc. Process for producing a rotary anode and the anode produced by such process
US7601399B2 (en) * 2007-01-31 2009-10-13 Surface Modification Systems, Inc. High density low pressure plasma sprayed focal tracks for X-ray anodes
CN101779266A (zh) * 2007-08-08 2010-07-14 皇家飞利浦电子股份有限公司 用于将材料涂抹到x射线源的阳极表面的方法和装置、阳极以及x射线源
US20090060139A1 (en) * 2007-08-28 2009-03-05 Subraya Madhusudhana T Tungsten coated x-ray tube frame and anode assembly
US9159523B2 (en) 2007-08-28 2015-10-13 General Electric Company Tungsten oxide coated X-ray tube frame and anode assembly
US8509386B2 (en) * 2010-06-15 2013-08-13 Varian Medical Systems, Inc. X-ray target and method of making same
EP2652767B1 (fr) * 2010-12-16 2017-03-15 Koninklijke Philips N.V. Élément de disque anodique comportant une intercouche réfractaire et une piste focale vps
CN113049616A (zh) * 2019-12-26 2021-06-29 北航（四川）西部国际创新港科技有限公司 一种热障涂层内部裂纹的无损检测方法及系统

Citations (9)

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Publication number Priority date Publication date Assignee Title
DE2108192A1 (en) * 1970-03-23 1971-10-14 Hermsdorf Keramik Veb Anode for high-output x-ray tubes
DE2358512A1 (de) * 1973-11-23 1975-06-05 Siemens Ag Verfahren zur herstellung von roentgenroehren-anoden
DE2400717A1 (de) * 1974-01-08 1975-07-10 Wsjesojusny Ni Pi Tugoplawkich Rotierende anode fuer hochleistungsroentgenroehren und verfahren zu ihrer herstellung
FR2315765A1 (fr) * 1975-06-23 1977-01-21 Plansee Metallwerk Anode pour rayons x revetue d'une couche de tio2 et al2o3
EP0116385A1 (fr) * 1983-01-25 1984-08-22 Koninklijke Philips Electronics N.V. Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode ainsi obtenue
EP0177079A1 (fr) * 1984-09-14 1986-04-09 Koninklijke Philips Electronics N.V. Procédé de fabrication d'une anode rotative pour tubes à rayons X et anode rotative fabriquée selon ce procédé
US4920012A (en) * 1989-06-09 1990-04-24 General Electric Company Articles having coatings of fine-grained and/or equiaxed grain structure
US4972449A (en) * 1990-03-19 1990-11-20 General Electric Company X-ray tube target
US5070228A (en) * 1990-06-18 1991-12-03 General Electric Company Method for plasma spray joining active metal substrates

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JPS5588843A (en) * 1978-12-27 1980-07-04 Matsushita Electric Ind Co Ltd Production of amorphous body
US4573185A (en) * 1984-06-27 1986-02-25 General Electric Company X-Ray tube with low off-focal spot radiation
JPS62170138A (ja) * 1986-01-22 1987-07-27 Toshiba Corp Ｘ線管用陽極およびその製造方法
US4853250A (en) * 1988-05-11 1989-08-01 Universite De Sherbrooke Process of depositing particulate material on a substrate
AT394643B (de) * 1989-10-02 1992-05-25 Plansee Metallwerk Roentgenroehrenanode mit oxidbeschichtung
US5030517A (en) * 1990-01-18 1991-07-09 Allied-Signal, Inc. Plasma spraying of rapidly solidified aluminum base alloys
JP2716844B2 (ja) * 1990-06-11 1998-02-18 三菱重工業株式会社 溶射複合膜形成方法
US5126529A (en) * 1990-12-03 1992-06-30 Weiss Lee E Method and apparatus for fabrication of three-dimensional articles by thermal spray deposition
JP2975145B2 (ja) * 1991-04-04 1999-11-10 豊信 吉田 熱プラズマ成膜方法
JPH06299315A (ja) * 1993-04-14 1994-10-25 Sansha Electric Mfg Co Ltd アルミニウム及びチタニウムの表面改質方法
JPH07220630A (ja) * 1994-02-02 1995-08-18 Rigaku Corp Ｘ線発生装置のターゲット製造方法
JPH08279344A (ja) * 1994-12-22 1996-10-22 Toshiba Electron Eng Corp Ｘ線管及びその製造方法
JPH08199372A (ja) * 1995-01-26 1996-08-06 Nisshin Steel Co Ltd 傾斜機能材料の製法および装置
US5844192A (en) * 1996-05-09 1998-12-01 United Technologies Corporation Thermal spray coating method and apparatus

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2108192A1 (en) * 1970-03-23 1971-10-14 Hermsdorf Keramik Veb Anode for high-output x-ray tubes
DE2358512A1 (de) * 1973-11-23 1975-06-05 Siemens Ag Verfahren zur herstellung von roentgenroehren-anoden
DE2400717A1 (de) * 1974-01-08 1975-07-10 Wsjesojusny Ni Pi Tugoplawkich Rotierende anode fuer hochleistungsroentgenroehren und verfahren zu ihrer herstellung
FR2315765A1 (fr) * 1975-06-23 1977-01-21 Plansee Metallwerk Anode pour rayons x revetue d'une couche de tio2 et al2o3
EP0116385A1 (fr) * 1983-01-25 1984-08-22 Koninklijke Philips Electronics N.V. Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode ainsi obtenue
EP0177079A1 (fr) * 1984-09-14 1986-04-09 Koninklijke Philips Electronics N.V. Procédé de fabrication d'une anode rotative pour tubes à rayons X et anode rotative fabriquée selon ce procédé
US4920012A (en) * 1989-06-09 1990-04-24 General Electric Company Articles having coatings of fine-grained and/or equiaxed grain structure
US4972449A (en) * 1990-03-19 1990-11-20 General Electric Company X-ray tube target
US5070228A (en) * 1990-06-18 1991-12-03 General Electric Company Method for plasma spray joining active metal substrates

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005033799B4 (de) * 2005-01-31 2010-01-07 Medicoat Ag Verfahren zur Herstellung eines Drehanodentellers für Röntgenröhren
DE102005049519B4 (de) * 2005-01-31 2014-10-30 Medicoat Ag Drehanodenteller für Röntgenröhren
WO2009039545A1 (fr) * 2007-09-28 2009-04-02 Plansee Metall Gmbh Anode à rayons x à dissipation thermique améliorée
US8243884B2 (en) 2007-09-28 2012-08-14 Plansee Se X-ray anode having improved heat removal
WO2017004630A1 (fr) 2015-07-03 2017-01-12 Plansee Se Contenant en métal réfractaire
US10730111B2 (en) 2015-07-03 2020-08-04 Plansee Se Container of refractory metal

Also Published As

Publication number Publication date
JPH10302624A (ja) 1998-11-13
ATE219289T1 (de) 2002-06-15
AT1984U1 (de) 1998-02-25
EP0874385B1 (fr) 2002-06-12
DE59804388D1 (de) 2002-07-18
US6132812A (en) 2000-10-17

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