EP0873435B1 - Verfahren zur aufrechterhaltung konstanter konzentrationen von in einem galvanotechnischen behandlungsbad enthaltenen stoffen - Google Patents
Verfahren zur aufrechterhaltung konstanter konzentrationen von in einem galvanotechnischen behandlungsbad enthaltenen stoffen Download PDFInfo
- Publication number
- EP0873435B1 EP0873435B1 EP97900996A EP97900996A EP0873435B1 EP 0873435 B1 EP0873435 B1 EP 0873435B1 EP 97900996 A EP97900996 A EP 97900996A EP 97900996 A EP97900996 A EP 97900996A EP 0873435 B1 EP0873435 B1 EP 0873435B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- bath
- treatment
- substances
- treatment fluid
- fresh
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 39
- 239000000126 substance Substances 0.000 title claims abstract description 35
- 238000009713 electroplating Methods 0.000 title claims description 6
- 238000001704 evaporation Methods 0.000 claims abstract description 11
- 230000008020 evaporation Effects 0.000 claims abstract description 11
- 239000012530 fluid Substances 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 abstract description 34
- 239000012141 concentrate Substances 0.000 abstract description 8
- 239000007864 aqueous solution Substances 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 description 39
- 238000007792 addition Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000004480 active ingredient Substances 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000007857 degradation product Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
Definitions
- the invention relates to a method for maintaining constant Concentrations of in an electroplating treatment bath contained substances, preferably baths with aqueous solutions.
- the method is universally applicable.
- a preferred area of application dosing chemicals in electroplating baths and others wet chemical baths for the production of printed circuit boards, preferably in Horizontal continuous lines,
- the substances are usually added automatically.
- the publication DE 40 15 141 A1 describes that a continuous exchange of the treatment liquid the disadvantages of Avoid adding concentrate.
- the chemical consumption will decrease after this publication by sufficient quantities, continuously for Treatment solution added fresh bath solution that already contains the substances contains their working concentration, and with a simultaneous bath overflow balanced.
- Two alternative procedures are described: One is the concentration of a key component analytical methods recorded and the supply of fresh treatment solution regulated in accordance with this measured variable. After the other The procedure is to add fresh treatment solution after In accordance with the enforced per unit of time in the bathroom Treatment surface controlled.
- the addition of the fresh bath solution has to the parameters bath overflow influencing the bath volume, Introduction, removal and evaporation can be coordinated. This succeeds in particular because of the imprecise overflow technology unsatisfactory. For example, evaporation losses and the Towing if this does not involve liquid towing faces the bath overflow; the immersed material to be treated In contrast, bath solution displaces into the overflow. Admitting Treatment solution and the uncontrolled drainage of the solution from the Process bath leads to the fact that the substance concentrations in the Treatment solution can not be maintained exactly. Therefore the process solution was completely replaced after a very short time become. In systems of printed circuit board technology, this means a service life of only reached about a month.
- the present invention is therefore based on the problem that To avoid disadvantages of the known methods and in particular one To provide methods that have a much longer service life Treatment liquid allows and during which the Concentrations of substances in the process liquid are kept constant can.
- the task is solved by a method for maintaining constant Concentrations of in an electroplating treatment bath contained substances by continually adding fresh Treatment liquid to the treatment bath at which continuously or intermittently a set volume flow of Treatment liquid (liquid volume per unit of time) by means of suitable devices are removed from the treatment bath without the liquid overflowing due to an increase in volume in the bath, and this volume flow in a constant ratio to the volume flow added fresh treatment liquid is set.
- the amount of fresh treatment solution supplied is independent on the evaporation quantity of the treatment liquid and on the and amount of treatment liquid carried out by the Treated goods per unit of time. Such fluid loss will be regardless of the liquid exchange according to the invention additionally balanced.
- the exchange quantity per unit of time is freely selectable, provided it is one not less than the consumption-dependent minimum size. Below this Degradation products accumulate too much in the treatment solution or cannot maintain active ingredient concentrations become.
- the exchange quantity is therefore technically simple to the Customizable process parameters. An exact bath guidance is also over possible for a long time without the characterizing of the method Parameter ranges are exited.
- the amount of treatment solution removed is in a constant ratio to the amount of treatment solution supplied.
- the ratio is preferably set to 1: 1.
- a constant withdrawal the bath solution preferably corresponds to a negative dosage of amount of liquid added.
- the throughput-dependent supplementary quantities for the liquid losses due to the drag-out must be determined separately.
- a suitable computer control can freshen the volumes to be supplemented Treatment solution depending on the throughput of the Treated goods are tracked.
- concentrations of the active ingredients in the fresh treatment liquid are preferably higher than their corresponding concentrations in Treatment bath. This can result in the additional loss of substances in the Treatment liquid by dragging and by the consumption of substances the treatment of the material to be treated is balanced.
- the places where the treatment fluid from which the bath containing treatment container is removed and fed are preferably provided at different locations of the bath container to to prevent the liquid supplied without further mixing with the liquid in the container is removed immediately.
- a Another way to prevent this is to use the liquid to be removed and fed in cycles, the time cycles of the removal and which follow the feed in time. As a result, the supplied liquid before the subsequent extraction cycle with the Mix the treatment liquid in the bath tank.
- the evaporation losses are separated by adding pure Solvent, in most cases water, balanced.
- the an initially fresh treatment solution depending on the Volume flow of liquid withdrawal added. Then it can Liquid level in the treatment tank through the addition of water to the Compensation for evaporation losses can be kept constant.
- Another One possibility is to make evaporation losses through separate experiments to investigate. Pure water is then determined according to that Loss rates added.
- the volume losses due to towage are usually caused by the Introduction compensated.
- the material to be treated becomes dry in the aqueous Solution brought in, the towage losses, for example, with fresh treatment liquid balanced.
- the known metering methods are used to implement the invention applicable. This means that one metering pump each can be used for dispensing and adding be used.
- the dosing amounts are preferably exactly the same set large.
- the quantities enforced per unit of time are themselves depending on consumption. Other ratios of the withdrawal quantity and the The addition amount is adjustable.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Automation & Control Theory (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Devices For Medical Bathing And Washing (AREA)
- Electroplating Methods And Accessories (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
Claims (7)
- Verfahren zur Aufrechterhaltung konstanter Konzentrationen von in einem galvanotechnischen Behandlungsbad enthaltenen Stoffen durch fortwährende Zugabe frischer Behandlungsflüssigkeit zu dem Behandlungsbad, bei dem ununterbrochen oder taktweise ein eingestellter Volumenstrom der Behandlungsflüssigkeit mittels geeigneter Einrichtungen aus dem Behandlungsbad entnommen wird. ohne daß die Flüssigkeit durch Volumenzunahme im Bad überläuft, und dieser Volumenstrom in einem konstanten Verhältnis zum Volumenstrom der zugegebenen frischen Behandlungsflüssigkeit eingestellt wird.
- Verfahren nach Anspruch 1 dadurch gekennzeichnet, daß die Volumenströme der entnommenen Behandlungsflüssigkeit und der dem Behandlungsbad zugegebenen frischen Behandlungsflüssigkeit gleich groß eingestellt wird.
- Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß eine durch Verdunstung aus dem Behandlungsbad eingetretene Volumenabnahme des Bades durch Zugabe eines in der Behandlungsflüssigkeit enthaltenen Lösungsmittels ohne gelöste Stoffe ausgeglichen wird.
- Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß die Konzentration der Stoffe in der frischen Behandlungsflüssigkeit höher eingestellt wird als deren Konzentration im Behandlungsbad.
- Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß die frische Behandlungsflüssigkeit in den Behandlungsbehälter gegeben und die Behandlungsflüssigkeit aus dem Behälter wieder entnommen wird, wobei die Flüssigkeit an unterschiedlichen Orten des Behälters zugeführt und entnommen wird.
- Verfahren nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, daß der Volumenstrom der zugegebenen frischen Behandlungsflüssigkeit um den Betrag eines zusätzlichen Volumenstroms vergrößert wird, der einem Verlust der Behandlungsflüssigkeit durch Verschleppung aus dem Behandlungsbad durch ein durch die Behandlungsflüssigkeit hindurchgeführtes Behandlungsgut entspricht.
- Verfahren nach einem der verstehenden Ansprüche, dadurch gekennzeichnet, daß zur Entnahme und zur Zugabe der Behandlungsflüssigkeit Dosierpumpen verwendet werden.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19600857A DE19600857A1 (de) | 1996-01-12 | 1996-01-12 | Verfahren zur Dosierung von Prozeßbädern |
DE19600857 | 1996-01-12 | ||
PCT/EP1997/000097 WO1997025456A1 (de) | 1996-01-12 | 1997-01-10 | Verfahren zur aufrechterhaltung konstanter konzentrationen von in einem galvanotechnischen behandlungsbad enthaltenen stoffen |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0873435A1 EP0873435A1 (de) | 1998-10-28 |
EP0873435B1 true EP0873435B1 (de) | 2000-03-29 |
Family
ID=7782563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97900996A Expired - Lifetime EP0873435B1 (de) | 1996-01-12 | 1997-01-10 | Verfahren zur aufrechterhaltung konstanter konzentrationen von in einem galvanotechnischen behandlungsbad enthaltenen stoffen |
Country Status (8)
Country | Link |
---|---|
US (1) | US6083374A (de) |
EP (1) | EP0873435B1 (de) |
JP (1) | JP2000503071A (de) |
AT (1) | ATE191243T1 (de) |
DE (2) | DE19600857A1 (de) |
ES (1) | ES2144840T3 (de) |
HK (1) | HK1015421A1 (de) |
WO (1) | WO1997025456A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6322687B1 (en) | 1997-01-31 | 2001-11-27 | Elisha Technologies Co Llc | Electrolytic process for forming a mineral |
CA2277067C (en) | 1997-01-31 | 2010-01-26 | Robert L. Heimann | An electrolytic process for forming a mineral containing coating |
US6599643B2 (en) | 1997-01-31 | 2003-07-29 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
US6592738B2 (en) | 1997-01-31 | 2003-07-15 | Elisha Holding Llc | Electrolytic process for treating a conductive surface and products formed thereby |
CN1692178A (zh) * | 2002-02-05 | 2005-11-02 | 以利沙控股有限公司 | 一种处理金属表面的方法以及由此形成的产品 |
US20040188262A1 (en) * | 2002-02-05 | 2004-09-30 | Heimann Robert L. | Method for treating metallic surfaces and products formed thereby |
US7166203B2 (en) * | 2002-09-12 | 2007-01-23 | Teck Cominco Metals Ltd. | Controlled concentration electrolysis system |
DE10314279A1 (de) * | 2003-03-29 | 2004-10-14 | Daimlerchrysler Ag | Verfahren und Vorrichtung zum Steuern mindestens einer Betriebsgröße eines elektrolytischen Bades |
US7678258B2 (en) * | 2003-07-10 | 2010-03-16 | International Business Machines Corporation | Void-free damascene copper deposition process and means of monitoring thereof |
JP2007051362A (ja) * | 2005-07-19 | 2007-03-01 | Ebara Corp | めっき装置及びめっき液の管理方法 |
US20070089990A1 (en) * | 2005-10-20 | 2007-04-26 | Behnke Joseph F | Adjustable dosing algorithm for control of a copper electroplating bath |
EP1816237A1 (de) * | 2006-02-02 | 2007-08-08 | Enthone, Inc. | Verfahren und Vorrichtung zur Beschichtung von Substratoberflächen |
US9157165B2 (en) * | 2010-04-22 | 2015-10-13 | Nippon Steel & Sumitomo Metal Corporation | Method of production of chemically treated steel sheet |
US20110272289A1 (en) * | 2010-05-10 | 2011-11-10 | Eci Technology, Inc. | Boric acid replenishment in electroplating baths |
US8425751B1 (en) * | 2011-02-03 | 2013-04-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Systems and methods for the electrodeposition of a nickel-cobalt alloy |
WO2013048834A1 (en) | 2011-09-30 | 2013-04-04 | 3M Innovative Properties Company | Methods of continuously wet etching a patterned substrate |
US20130087463A1 (en) * | 2011-10-05 | 2013-04-11 | Globalfoundries Inc. | Method and System for Metal Deposition in Semiconductor Processing |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4015141A1 (de) * | 1990-05-11 | 1991-11-14 | Lpw Anlagen Gmbh | Verfahren zum betreiben einer galvanotechnischen anlage |
DE4200774C2 (de) * | 1992-01-15 | 1993-11-25 | Rene Leutwyler | Verfahren zum Entfernen von Carbonaten aus galvanischen Bädern |
US5352350A (en) * | 1992-02-14 | 1994-10-04 | International Business Machines Corporation | Method for controlling chemical species concentration |
US5858196A (en) * | 1996-01-31 | 1999-01-12 | Kawasaki Steel Corporation | Method of controlling component concentration of plating solution in continuous electroplating |
-
1996
- 1996-01-12 DE DE19600857A patent/DE19600857A1/de not_active Ceased
-
1997
- 1997-01-10 ES ES97900996T patent/ES2144840T3/es not_active Expired - Lifetime
- 1997-01-10 AT AT97900996T patent/ATE191243T1/de not_active IP Right Cessation
- 1997-01-10 WO PCT/EP1997/000097 patent/WO1997025456A1/de active IP Right Grant
- 1997-01-10 JP JP9524865A patent/JP2000503071A/ja active Pending
- 1997-01-10 US US09/091,560 patent/US6083374A/en not_active Expired - Lifetime
- 1997-01-10 EP EP97900996A patent/EP0873435B1/de not_active Expired - Lifetime
- 1997-01-10 DE DE59701358T patent/DE59701358D1/de not_active Expired - Lifetime
-
1999
- 1999-01-19 HK HK99100252A patent/HK1015421A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO1997025456A1 (de) | 1997-07-17 |
EP0873435A1 (de) | 1998-10-28 |
HK1015421A1 (en) | 1999-10-15 |
DE19600857A1 (de) | 1997-07-17 |
US6083374A (en) | 2000-07-04 |
ES2144840T3 (es) | 2000-06-16 |
JP2000503071A (ja) | 2000-03-14 |
ATE191243T1 (de) | 2000-04-15 |
DE59701358D1 (de) | 2000-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0873435B1 (de) | Verfahren zur aufrechterhaltung konstanter konzentrationen von in einem galvanotechnischen behandlungsbad enthaltenen stoffen | |
EP0580643B1 (de) | Verfahren zum waschen und vorrichtung zum durchführen des verfahrens | |
EP0611400B1 (de) | Verfahren zum entfetten und reinigen metallischer oberflächen | |
EP0032530A1 (de) | Verwendung einer Vorrichtung zum Behandeln eines plattenförmigen Gegenstandes mittels einer Flüssigkeit | |
EP0478650B1 (de) | Verfahren zum betrieb einer geschirrspülmaschine und vorrichtung zum durchführen des verfahrens | |
DE69213677T2 (de) | Photographisches entwicklungsgeraet | |
DE102006014464B3 (de) | Vorrichtung zum Reinigen von Geschirr und dergleichen sowie Verfahren zum Betreiben der Vorrichtung | |
EP0222347A2 (de) | Verfahren und Vorrichtung zum Ätzen eines zumindest teilweise aus Metall, vorzugsweise Kupfer, bestehenden Ätzguts | |
EP0746640B1 (de) | Verfahren zur elektrolytischen abscheidung von metallen aus elektrolyten mit prozessorganik | |
EP0302219B1 (de) | Verfahren und Vorrichtung zur kontinuierlichen Nass-in-Nass-Behandlung | |
DE2239266A1 (de) | Verfahren und vorrichtung zur erzeugung von gasfoermigem formaldehyd aus polymerem formaldehyd | |
DE4015141A1 (de) | Verfahren zum betreiben einer galvanotechnischen anlage | |
EP0434994A1 (de) | Verfahren zum Abspülen der Oberfläche von in wässriger Aktivbadlösung behandelter Gegenstände, sowie Anordnung zur Durchführung des Verfahrens | |
EP0406344A1 (de) | Verfahren zum ätzen von kupferhaltigen werkstücken sowie ätzanlage zur durchführung des verfahrens | |
DE102022102681B4 (de) | Vorrichtung zur Erzeugung einer Plasma-aktivierten Flüssigkeit, Gerät und Verfahren zur Reinigung und/oder Sterilisation | |
DE3911735C2 (de) | ||
DE3419819A1 (de) | Einrichtung zur nassen behandlung von materialbaendern | |
DE4218843C2 (de) | Verfahren zur Regeneration eines ammoniakalischen Ätzmittels sowie Vorrichtung zur Durchführung dieses Verfahrens | |
EP0379666B1 (de) | Verfahren zum Ausspülen von Waschmittelresten aus einem Wäscheposten und Einrichtung zur Durchführung des Verfahrens | |
DE19834759C2 (de) | Verfahren und Vorrichtung zum Entfernen von Dendriten | |
DE19539760A1 (de) | Wasserdosiereinrichtung für Spülsysteme zur Reduzierung des Wasserverbrauchs bei Anlagen der Galvano- und Oberflächentechnik | |
EP0143186B1 (de) | Verfahren zur Oberflächenbehandlung von Metallen | |
EP2871469B1 (de) | Verfahren und Vorrichtung zur Bestimmung der Konzentration von Mizellen mittels Impedanzspektroskopie | |
DE102022005037A1 (de) | Vorrichtung zur Erzeugung einer Plasma-aktivierten Flüssigkeit, Gerät und Verfahren zur Reinigung und/oder Sterilisation | |
CH215066A (de) | Verfahren zur Herstellung eines kupferhaltigen Trisazofarbstoffes. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19980609 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT DE ES FR GB IT NL SE |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
17Q | First examination report despatched |
Effective date: 19981215 |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ATOTECH DEUTSCHLAND GMBH |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT DE ES FR GB IT NL SE |
|
REF | Corresponds to: |
Ref document number: 191243 Country of ref document: AT Date of ref document: 20000415 Kind code of ref document: T |
|
REF | Corresponds to: |
Ref document number: 59701358 Country of ref document: DE Date of ref document: 20000504 |
|
ITF | It: translation for a ep patent filed | ||
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2144840 Country of ref document: ES Kind code of ref document: T3 |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20000629 |
|
ET | Fr: translation filed | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed | ||
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20050110 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: ES Payment date: 20090122 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20090114 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20090122 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20090114 Year of fee payment: 13 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20090128 Year of fee payment: 13 |
|
PGRI | Patent reinstated in contracting state [announced from national office to epo] |
Ref country code: IT Effective date: 20091201 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20100223 Year of fee payment: 14 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20100114 Year of fee payment: 14 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20100801 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20100110 |
|
EUG | Se: european patent has lapsed | ||
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100801 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100110 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20110330 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100110 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110317 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100111 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20110930 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110110 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100111 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20160120 Year of fee payment: 20 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R071 Ref document number: 59701358 Country of ref document: DE |