EP0861575B1 - Generateur de plasma a quatre buses pour la formation d'un jet active - Google Patents
Generateur de plasma a quatre buses pour la formation d'un jet active Download PDFInfo
- Publication number
- EP0861575B1 EP0861575B1 EP96934313A EP96934313A EP0861575B1 EP 0861575 B1 EP0861575 B1 EP 0861575B1 EP 96934313 A EP96934313 A EP 96934313A EP 96934313 A EP96934313 A EP 96934313A EP 0861575 B1 EP0861575 B1 EP 0861575B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma
- diaphragm
- electrode chambers
- enclosure
- generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
Definitions
- the invention relates to a plasma generator with four nozzles for the formation of an activated jet, according to the preamble of claim 1.
- This generator can be used in particular in surface treatment process (sterilization, cleaning, stripping, modification, deposit of recovery and films), of dispersed materials and monoliths, as well as for obtaining chemicals in electronics, automotive, food, medicine, chemistry, manufacture of machines and tools, etc.
- the object of the invention is to propose a generator for plasma with four nozzles to obtain a gas jet activated of controllable composition, stable form, long resource for continuous work and optimal action on objects to be treated.
- the invention relates to a plasma generator with four nozzles comprising two chambers with anode electrodes and two cathode electrode chambers, connected to sources of direct current and generating four plasma jets, the shape and trajectory are created using a system of external magnetic fields, so that the jets plasma form a single plasma flow with an area lowered temperature control unit in which is introduced the chemical component and / or the materials to treat, the electrode chambers of this generator being arranged in an enclosure into which a gas is introduced, this enclosure being composed of a concave flange to which are fixed the electrode chambers and a first flat diaphragm, water-cooled and provided with an orifice circular central arranged at the junction of the jets of plasma from the electrode chambers and crossed by the current.
- the generator comprises, in downstream of the first diaphragm, a second diaphragm, cooled to water, whose orifice with a variable diameter, less than that of the plasma flow, this diaphragm being fixed to the enclosure through a circular wall, allowing the evacuation of part of the plasma and gases introduced into the enclosure.
- the solution proposed by the present invention consists in modify the four nozzle plasma generator of art anterior, so as to create an activated composition flow controlled and effective action on the treated surface, while increasing the lifetime of the generator. Is equivalent to eliminate the disadvantages of the known four-nozzle generator described above, i.e. to suppress the flows of convection and reduce the radiation flux acting on the electrode chambers, their fasteners and while intensifying the action on the surface treated activated components of the flow created by the generator, reducing the amount of plasma reaching the surface to be treated.
- the four nozzle generators shown in the Figures 1 and 2 include, like the known prototype described above, four electrode chambers 1, a system magnetic for shape and trajectory control plasma jets 7, a tube for the introduction of chemical components and / or products to be activated in the plasma funnel.
- the new element of the construction of the generator is the enclosure, ventilated by a gas introduced by the nozzles 9, to which the chambers are fixed electrodes 1.
- the enclosure consists of a cooled concave flange 2 with water and the water-cooled diaphragm system.
- Figures 1a and 1b illustrate the case where the diaphragm includes a diaphragm in the form of a flange annular cooled 5, whose internal diameter is such that it allows the passage of the plasma flow inside which the products to be activated are introduced via the nozzle 3, and the peripheral flow of gas introduced into the enclosure by the nozzles 9.
- This gas stabilizes the plasma flow and prevents formation of vortices and their contact with the electrodes, their fixing and supply parts.
- the accompanying flow of gas, passing peripherally through the orifice of the diaphragm 5 stabilizes plasma flow, decreases mixing plasma with surrounding gases, decreases the transfer of radical heat of the plasma flow, which lengthens the jet resulting from plasma.
- the diaphragm 5 whose opening 8 is relatively small, greatly reduces radiation from plasma 6 directed towards the electrode chambers.
- Figures 2a and 2b illustrate the case where the diaphragms includes, in addition to diaphragm 5 whose functions are exposed above, a diaphragm 10 cooled with water, adjustable hole, the diameter of which is smaller than that of the plasma flow and which only allows the flow of gas activated.
- the diaphragm 10 is fixed to the enclosure by through a circular wall 11.
- the gas from nozzles (9) as well as the activating plasma are evacuated by through orifices 12.
- This diaphragm eliminates peripheral plasma gases and accompanying gases which are an obstacle to the diffusion of activated particles towards the surface to be treated.
- the diaphragm 10 also makes it possible to obtain a uniform distribution of temperature and composition of the activated stream from the proposed generator.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Nozzles (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH3208/95 | 1995-11-13 | ||
CH320895 | 1995-11-13 | ||
CH320895 | 1995-11-13 | ||
PCT/CH1996/000401 WO1997018692A1 (fr) | 1995-11-13 | 1996-11-12 | Generateur de plasma a quatre buses pour la formation d'un jet active |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0861575A1 EP0861575A1 (fr) | 1998-09-02 |
EP0861575B1 true EP0861575B1 (fr) | 2000-07-05 |
Family
ID=4251004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP96934313A Expired - Lifetime EP0861575B1 (fr) | 1995-11-13 | 1996-11-12 | Generateur de plasma a quatre buses pour la formation d'un jet active |
Country Status (5)
Country | Link |
---|---|
US (1) | US6278241B1 (es) |
EP (1) | EP0861575B1 (es) |
DE (1) | DE69609191T2 (es) |
ES (1) | ES2150693T3 (es) |
WO (1) | WO1997018692A1 (es) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6287687B1 (en) | 1998-05-08 | 2001-09-11 | Asten, Inc. | Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
US6146462A (en) * | 1998-05-08 | 2000-11-14 | Astenjohnson, Inc. | Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
AU2002212616A1 (en) * | 2000-11-10 | 2002-05-21 | Apit Corp. Sa | Atmospheric plasma method for treating sheet electricity conducting materials and device therefor |
KR100464856B1 (ko) * | 2002-11-07 | 2005-01-05 | 삼성전자주식회사 | 표면 식각 방법 및 실리콘 기판 이면 식각 방법. |
SG114754A1 (en) * | 2004-02-25 | 2005-09-28 | Kulicke & Soffa Investments | Laser cleaning system for a wire bonding machine |
JP4449645B2 (ja) * | 2004-08-18 | 2010-04-14 | 島津工業有限会社 | プラズマ溶射装置 |
FR2879933B1 (fr) * | 2004-12-28 | 2007-03-30 | Satelec Soc | Dispositif de sterilisation par plasma gazeux forme a partir d'un melange d'azote et d'hydrogene |
US20060219754A1 (en) * | 2005-03-31 | 2006-10-05 | Horst Clauberg | Bonding wire cleaning unit and method of wire bonding using same |
US9472382B2 (en) * | 2007-04-23 | 2016-10-18 | Plasmology4, Inc. | Cold plasma annular array methods and apparatus |
GB0902784D0 (en) * | 2009-02-19 | 2009-04-08 | Gasplas As | Plasma reactor |
DE102009045200B4 (de) * | 2009-09-30 | 2021-02-11 | Inter-Consult Gmbh | Verfahren und Vorrichtung zum Bearbeiten von Bauteilen elektrischer Maschinen |
US8330069B2 (en) | 2010-09-16 | 2012-12-11 | General Electric Company | Apparatus and system for arc elmination and method of assembly |
US9036309B2 (en) | 2010-09-16 | 2015-05-19 | General Electric Company | Electrode and plasma gun configuration for use with a circuit protection device |
FR3074048A1 (fr) * | 2017-10-23 | 2019-05-31 | Societe Pour La Conception Des Applications Des Techniques Electroniques | Dispositif de sterilisation d’un objet avec deflecteur de flux |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4982067A (en) * | 1988-11-04 | 1991-01-01 | Marantz Daniel Richard | Plasma generating apparatus and method |
GB2271124B (en) | 1990-12-26 | 1995-09-27 | Opa | Method and apparatus for plasma treatment of a material |
GB2271044B (en) * | 1990-12-26 | 1995-06-21 | Opa | Apparatus for plasma-arc machining |
JP3166226B2 (ja) | 1991-07-10 | 2001-05-14 | 住友電気工業株式会社 | ダイヤモンドの製造法及び製造装置 |
WO1997046056A1 (en) * | 1996-05-31 | 1997-12-04 | Ipec Precision, Inc. | Apparatus for generating and deflecting a plasma jet |
-
1996
- 1996-11-12 EP EP96934313A patent/EP0861575B1/fr not_active Expired - Lifetime
- 1996-11-12 WO PCT/CH1996/000401 patent/WO1997018692A1/fr active IP Right Grant
- 1996-11-12 DE DE69609191T patent/DE69609191T2/de not_active Expired - Fee Related
- 1996-11-12 ES ES96934313T patent/ES2150693T3/es not_active Expired - Lifetime
- 1996-11-12 US US09/068,706 patent/US6278241B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69609191D1 (de) | 2000-08-10 |
US6278241B1 (en) | 2001-08-21 |
WO1997018692A1 (fr) | 1997-05-22 |
DE69609191T2 (de) | 2001-03-22 |
ES2150693T3 (es) | 2000-12-01 |
EP0861575A1 (fr) | 1998-09-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0861575B1 (fr) | Generateur de plasma a quatre buses pour la formation d'un jet active | |
US5622606A (en) | Gas inlet arrangement | |
EP1420876B1 (fr) | Procede de fabrication de poudre de grains composites et dispositif pour la mise en oeuvre du procede | |
EP0718552B1 (fr) | Brûleur du type à mélange externe | |
JPH0534425B2 (es) | ||
WO2010110099A1 (ja) | プラズマ処理装置およびこれを用いたアモルファスシリコン薄膜の製造方法 | |
CA2592618A1 (fr) | Dispositif de sterilisation par plasma gazeux forme a partir d'un melange d'azote et d'hydrogene | |
JPH057861B2 (es) | ||
EP2567599B1 (fr) | Procede et dispositif pour la generation d'un jet de plasma non- isothermique | |
JPH0543785B2 (es) | ||
JP2005276618A (ja) | マイクロプラズマ生成装置および方法 | |
EP0914241B1 (fr) | Procede de traitement de surface par voie seche et dispositif pour la mise en oeuvre d'un tel procede | |
FR2732040A1 (fr) | Dispositif a microtete photo-ionique pour le traitement d'une surface de materiau par depot de poudre | |
FR2575938A1 (fr) | Procede et dispositif d'epuration de fumees soufrees et azotees | |
EP0815937B1 (fr) | Procédé pour augmenter l'anti-mouillabilité d'un corps, corps ainsi traité. | |
EP0815936A2 (fr) | Dispositif d'excitation de gaz | |
FR2631164A3 (fr) | Dispositif d'amenee et de derivation de gaz pour le traitement en phase gazeuse de pieces | |
EP2586276A1 (fr) | Dispositif pour la generation d'un jet de plasma | |
FR2639171A1 (fr) | Reacteur a plasma | |
EP3560299B1 (fr) | Réacteur plasma de dbd | |
FR2551615A1 (fr) | Source de rayons x mous utilisant un microcanal de plasma obtenu par photo-ionisation d'un gaz | |
EP0861576B1 (fr) | Generateur de flux de plasma d'arc de configuration fermee | |
EP2683258B1 (fr) | Dispositif pour le traitement par champ electrique pulse d'un produit | |
JPH0763034B2 (ja) | 軸供給型プラズマ加熱材料噴射装置 | |
JPS63207909A (ja) | 超音波燃料霧化器 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19980515 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): CH DE ES FR GB IT LI NL |
|
17Q | First examination report despatched |
Effective date: 19981021 |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): CH DE ES FR GB IT LI NL |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REF | Corresponds to: |
Ref document number: 69609191 Country of ref document: DE Date of ref document: 20000810 |
|
ITF | It: translation for a ep patent filed |
Owner name: ST. DR. CAVATTONI ING. A. RAIMONDI |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20001004 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: ABREMA AGENCE BREVETS ET MARQUES GANGUILLET & HUMP |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2150693 Country of ref document: ES Kind code of ref document: T3 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PUE Owner name: IST INSTANT SURFACE TECHNOLOGY S.A. TRANSFER- TEPL |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: 732E |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: ABREMA AGENCE BREVETS ET MARQUES GANGUILLET & HUMP |
|
NLS | Nl: assignments of ep-patents |
Owner name: TEPLA AG |
|
RAP2 | Party data changed (patent owner data changed or rights of a patent transferred) |
Owner name: TEPLA AG |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: TP |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
NLT2 | Nl: modifications (of names), taken from the european patent patent bulletin |
Owner name: TEPLA AG |
|
26N | No opposition filed | ||
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: ES Payment date: 20011106 Year of fee payment: 6 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20011109 Year of fee payment: 6 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20011129 Year of fee payment: 6 Ref country code: FR Payment date: 20011129 Year of fee payment: 6 Ref country code: CH Payment date: 20011129 Year of fee payment: 6 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20011221 Year of fee payment: 6 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20021112 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20021113 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20021130 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20021130 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030601 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030603 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee | ||
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030731 |
|
NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee |
Effective date: 20030601 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20031213 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20051112 |