EP0791084A1 - Anordnung und verfahren zum elektrophoretischen emaillieren nach dem 2 schichten-1 brand-verfahren - Google Patents
Anordnung und verfahren zum elektrophoretischen emaillieren nach dem 2 schichten-1 brand-verfahrenInfo
- Publication number
- EP0791084A1 EP0791084A1 EP96931069A EP96931069A EP0791084A1 EP 0791084 A1 EP0791084 A1 EP 0791084A1 EP 96931069 A EP96931069 A EP 96931069A EP 96931069 A EP96931069 A EP 96931069A EP 0791084 A1 EP0791084 A1 EP 0791084A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- bath
- enamel
- process bath
- rinsing
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 91
- 210000003298 dental enamel Anatomy 0.000 claims abstract description 65
- 239000000126 substance Substances 0.000 claims abstract description 17
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- -1 aluminium ions Chemical class 0.000 claims abstract description 8
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 3
- 230000000536 complexating effect Effects 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 3
- 239000000706 filtrate Substances 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 239000003929 acidic solution Substances 0.000 claims 1
- 239000012670 alkaline solution Substances 0.000 claims 1
- 230000001419 dependent effect Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 4
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 abstract 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 229910002114 biscuit porcelain Inorganic materials 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000009189 diving Effects 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/02—Electrophoretic coating characterised by the process with inorganic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
Definitions
- the invention relates to an arrangement for electrophoretic enamelling according to the 2-layer, 1-fire method with a process bath for applying basic enamel, at least one subsequent rinsing bath before a process bath for covering enamel with at least one subsequent rinsing bath and a stoving oven.
- the invention further relates to a method for enamelling in the above. Arrangement.
- ETE electrophoretic enamelling system
- 2-layer-1-firing method It is generally known to enamel metallic parts in an electrophoretic enamelling system (ETE) using the 2-layer-1-firing method.
- ETE electrophoretic enamelling system
- Such a system is usually equipped with two process baths, several rinsing baths and a process furnace.
- the basic email order is placed in the first process bath.
- two rinsing baths with physically adhering slip being rinsed off in the first rinsing bath.
- This can be fed back to the first process bath via an enamel recovery plant.
- the top mai After rinsing again in a second rinsing bath, the top mai is applied in a further process bath. This is usually followed by at least one rinsing bath before the two enamel layers applied are baked together in the process furnace.
- the slip component that adjusts the wrap is also separated.
- the amount of the email order is proportional to the current strength and thus also to the current density.
- the current density is not constant over the entire surface. It is therefore difficult to separate the cover enamel, preferably at the points with the greatest current density (edges and curves), and there are increasing enamelling errors.
- DE-PS 36 26 424 discloses a process for the electrophoretic enamelling of AI-free enamel layers.
- the basic May! is applied with a layer thickness of 80 - 120 ⁇ m and the specific conductivity of the cover enamel is set to a value below 2000 ⁇ S / cnr 1 .
- this process can only be used for catalytic cover enamel, because in contrast to white enamel, this only represents an unmelted raw material mixture. This makes the cover mail order easier.
- the invention is therefore based on the object of developing a device and a method for electrophoretic enamelling according to the 2-layer-1 firing method in which, regardless of the frit compositions of the base and top enamel and the shape of the workpieces, uniform deposition of the cover email.
- the advantages which can be achieved with the invention are, in particular, that if the frits used up to now are retained, an enamelled workpiece is produced which no longer has any enamelling defects.
- This is achieved in particular in that an additional process bath is arranged between the basic and the cover enamel application.
- This process bath contains a solution with a chemical substance which has a high affinity for aluminum ions. This substance preferably attacks aluminum hydroxide and / or forms an undissociated connection with aluminum ions.
- Aluminum is part of the basic enamel and so one is able to improve the wrap through the process that takes place in an additional process basin.
- At least one rinse bath should preferably be arranged, in which entrained basic enamel slip or the chemical substance contained in the second process basin are rinsed off again in a subsequent process bath. the cover email order is placed. It is particularly advantageous if a filter device is coupled to the first rinsing bath after the basic enamel application, in which entrained slip can be separated out as a solid. This slip is either returned directly to the process bath for the basic enamel order or disposed of separately. This saves valuable raw materials and the environment is less polluted. It proves to be particularly advantageous if the process bath temperature is kept constant and the substance for reducing the sheet resistance of the base enamel is present in a defined constant concentration in the additional process bath.
- Figure 1 is a schematic representation of the arrangement for electrophoretic enamelling according to the 2-layer-1 fire method
- FIG. 3 shows a workpiece coated with base and cover enamel while reducing the electrical resistance in the base enamel on average
- Figure 4 is a schematically illustrated process bath with lifting device.
- FIG. 1 a device for electrophoretic enamelling according to the 2-layer 1 firing process is shown schematically.
- process baths and rinsing baths are alternately arranged in a certain order in a known order.
- Each process bath (1; 3; 5) should preferably be followed by at least 1 rinsing bath (2; 4; 6; 7).
- the process bath (1) there is the base enamel slip (10) with which the workpiece (9) to be enamelled is coated. Then loosely adhering base enamel (10) is rinsed off in the first sink (2).
- a filter device (12) is advantageously coupled to this sink (2), which separates entrained basic enamel slip (10) as a solid. This can be completely fed back into the first process bath (1).
- a conventional filter device (12) Solid filter or a settling tower can be used.
- Such filter devices (12) allow both the collected basic enamel slip (10) and the filtrate to be returned to the corresponding baths (1 or 2) of the arrangement or to be disposed of separately.
- a process bath (3) adjoins the sink (2), in which there is an addition of at least one substance which attacks the aluminum hydroxide and / or forms compounds which are not dissociated with aluminum ions.
- the chemical substance added to the process bath (3) reduces the electrical resistance of the deposited enamel bisque. It is rinsed off the workpiece (9) in a subsequent rinsing bath (4).
- a cover enamel application (11) takes place, which can be carried out very evenly by the appropriately pretreated workpiece (9).
- This process bath (5) is followed by at least one, but preferably two rinsing baths (6, 7) before the two enamel layers (10, 11) are baked together in the process furnace (8).
- Chemical substances capable of attacking the aluminum hydroxide or of forming a stable compound with aluminum ions can be added to the process bath (3).
- substances that react acidic or basic and / or complexing, such as citric acid meet the requirements.
- the pH of the bath (3) can vary from the acidic to the alkaline range.
- the total phosphate content should be greater than 100 mg / l according to ISO 6878 T1 from 1986 (or according to DIN 38405 - Part 11).
- the substance in order to reduce the sheet resistance in the process bath (3) in a defined constant concentration tion is present. Since the process bath temperature should also be kept constant, only the dipping time in this process bath (3) defines the treatment intensity. The dipping times should be empirically determined beforehand for each new shape of a workpiece (9). It is then possible to send the differently shaped workpieces (9) into the enamelling arrangement in an arbitrary order. The diving times are assigned to the respective workpiece (9) in accordance with a previously made determination. As a result, the enamelling results are equally good for all shapes of the workpieces (9).
- FIG. 2 shows a coated workpiece (9) in which the layer resistance of the base enamel (10) is not reduced. At the ends of the workpiece (9), less cover email (11) is applied (h 1 ⁇ h 2 ) due to the increased application of base enamel (10), so that the cover email is not sufficiently covered.
- the layer thickness of the cover enamel (11) in the edge regions is designated by h
- the layer thickness of the cover enamel (11) on the straight surfaces is designated by h 2 .
- FIG. 3 shows an enamelled workpiece (9) in which the layer resistance of the base enamel (10) was reduced in a process bath (3) arranged after the process bath (1).
- the electrical layer resistance was reduced by a chemical attack on the enamel bisque.
- the process bath (3) contains substances which react both acid-base-buffer-like or complexing and / or form compounds which are undissociated with aluminum ions.
- Citric acid or phosphates are particularly suitable as additives in this process bath (3).
- An orthophosphate, for example, must have at least a PO 4 3 - content of 100 mg / l in the solution in the process bath (3) in accordance with existing standards (ISO, DIN). By reducing the resistance, an almost even cover enamel application (11) is possible on the entire workpiece.
- This equally thick layer (11) (h 1 «h 2 ) prevents the base enamel (10) from shimmering through, which is mostly dark due to the adhesive oxides necessarily contained therein.
- the cover enamel (11) adapts continuously to the shape of the base enamel (10). With such an enamelling arrangement, it is irrelevant which shape the workpiece (9) has, whether there are curved edge regions or not.
- FIG. 4 shows a lifting device (13) which can be coupled, for example, to the process bath (3).
- a lifting device (13) With constant concentration in this process bath (3) allows such a lifting device (13) to leave workpieces (9) of the most varied shape in accordance with variably arranged diving times in the bath (3). Treatment times are empirically determined beforehand for the different workpiece shapes, and compliance with these is ensured by a correspondingly controlled actuation of the lifting device (13).
- an air cylinder can be used, for example, which is controlled in such a way that it raises or lowers the carrying device with the workpiece (9) located thereon accordingly.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Chemical Treatment Of Metals (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19533668A DE19533668A1 (de) | 1995-09-13 | 1995-09-13 | Anordnung und Verfahren zum elektrophoretischen Emaillieren nach dem 2-Schichten-1 Brand-Verfahren |
| DE19533668 | 1995-09-13 | ||
| PCT/EP1996/003974 WO1997010371A1 (de) | 1995-09-13 | 1996-09-11 | Anordnung und verfahren zum elektrophoretischen emaillieren nach dem 2 schichten-1 brand-verfahren |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0791084A1 true EP0791084A1 (de) | 1997-08-27 |
| EP0791084B1 EP0791084B1 (de) | 2000-03-15 |
Family
ID=7771900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP96931069A Expired - Lifetime EP0791084B1 (de) | 1995-09-13 | 1996-09-11 | Anordnung und verfahren zum elektrophoretischen emaillieren nach dem 2 schichten-1 brand-verfahren |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5855754A (de) |
| EP (1) | EP0791084B1 (de) |
| DE (2) | DE19533668A1 (de) |
| WO (1) | WO1997010371A1 (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7704895B2 (en) * | 2008-04-02 | 2010-04-27 | Intel Corporation | Deposition method for high-k dielectric materials |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4208262A (en) * | 1978-05-11 | 1980-06-17 | Shinto Paint Co., Ltd. | Electrodeposition coating |
| DE3203101A1 (de) * | 1982-01-30 | 1983-08-04 | Bayer Ag, 5090 Leverkusen | Emailschlicker und verfahren zur zwei- und mehrschichtemaillierung in einem brand |
| JPH0686674B2 (ja) * | 1985-12-04 | 1994-11-02 | 関西ペイント株式会社 | 電着塗装方法 |
| DE3707401A1 (de) * | 1987-03-07 | 1988-09-15 | Bayer Ag | Verfahren zur elektrophoretischen weiss- und farbemaillierung |
| US4904365A (en) * | 1988-02-29 | 1990-02-27 | Trinity Industrial Corporation | Electrodeposition coating facility |
-
1995
- 1995-09-13 DE DE19533668A patent/DE19533668A1/de not_active Withdrawn
-
1996
- 1996-09-11 EP EP96931069A patent/EP0791084B1/de not_active Expired - Lifetime
- 1996-09-11 DE DE59604682T patent/DE59604682D1/de not_active Expired - Fee Related
- 1996-09-11 US US08/817,281 patent/US5855754A/en not_active Expired - Fee Related
- 1996-09-11 WO PCT/EP1996/003974 patent/WO1997010371A1/de not_active Ceased
Non-Patent Citations (1)
| Title |
|---|
| See references of WO9710371A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US5855754A (en) | 1999-01-05 |
| DE19533668A1 (de) | 1997-03-20 |
| EP0791084B1 (de) | 2000-03-15 |
| DE59604682D1 (de) | 2000-04-20 |
| WO1997010371A1 (de) | 1997-03-20 |
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