EP0742282A4 - Reinigungsmittel und -verfahren - Google Patents

Reinigungsmittel und -verfahren

Info

Publication number
EP0742282A4
EP0742282A4 EP95906520A EP95906520A EP0742282A4 EP 0742282 A4 EP0742282 A4 EP 0742282A4 EP 95906520 A EP95906520 A EP 95906520A EP 95906520 A EP95906520 A EP 95906520A EP 0742282 A4 EP0742282 A4 EP 0742282A4
Authority
EP
European Patent Office
Prior art keywords
cleaning agent
cleaning
agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP95906520A
Other languages
English (en)
French (fr)
Other versions
EP0742282A1 (de
Inventor
Takehiko Kezuka
Mitsushi Itano
Motonobu Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Publication of EP0742282A1 publication Critical patent/EP0742282A1/de
Publication of EP0742282A4 publication Critical patent/EP0742282A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/004—Surface-active compounds containing F
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
EP95906520A 1994-01-26 1995-01-25 Reinigungsmittel und -verfahren Withdrawn EP0742282A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP24850/94 1994-01-26
JP6024850A JPH07216392A (ja) 1994-01-26 1994-01-26 洗浄剤及び洗浄方法
PCT/JP1995/000086 WO1995020642A1 (fr) 1994-01-26 1995-01-25 Agent nettoyant et procede de nettoyage

Publications (2)

Publication Number Publication Date
EP0742282A1 EP0742282A1 (de) 1996-11-13
EP0742282A4 true EP0742282A4 (de) 1999-04-28

Family

ID=12149696

Family Applications (1)

Application Number Title Priority Date Filing Date
EP95906520A Withdrawn EP0742282A4 (de) 1994-01-26 1995-01-25 Reinigungsmittel und -verfahren

Country Status (6)

Country Link
US (1) US5763375A (de)
EP (1) EP0742282A4 (de)
JP (1) JPH07216392A (de)
KR (1) KR0177568B1 (de)
CN (1) CN1076396C (de)
WO (1) WO1995020642A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08195369A (ja) * 1995-01-13 1996-07-30 Daikin Ind Ltd 基板の洗浄方法
US5879623A (en) * 1995-12-27 1999-03-09 Buckman Laboratories International Inc. Methods and compositions for controlling biofouling using fluorosurfactants
KR100248113B1 (ko) * 1997-01-21 2000-03-15 이기원 전자 표시 장치 및 기판용 세정 및 식각 조성물
JP3003684B1 (ja) 1998-09-07 2000-01-31 日本電気株式会社 基板洗浄方法および基板洗浄液
US6277203B1 (en) 1998-09-29 2001-08-21 Lam Research Corporation Method and apparatus for cleaning low K dielectric and metal wafer surfaces
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
KR100433059B1 (ko) * 2001-08-10 2004-05-31 조헌영 석조 문화재 세척용 세정제 제조방법
AU2003257636A1 (en) * 2002-08-22 2004-03-11 Daikin Industries, Ltd. Removing solution
US7267726B2 (en) * 2003-04-22 2007-09-11 Texas Instruments Incorporated Method and apparatus for removing polymer residue from semiconductor wafer edge and back side
JP4498726B2 (ja) 2003-11-25 2010-07-07 Ｋｉｓｃｏ株式会社 洗浄剤
KR100588217B1 (ko) * 2004-12-31 2006-06-08 동부일렉트로닉스 주식회사 반도체 소자의 게이트 산화막 형성 방법
WO2007010619A1 (ja) * 2005-07-22 2007-01-25 Sumco Corporation Ｓｉｍｏｘウェーハの製造方法及びその方法で製造されたｓｉｍｏｘウェーハ
KR100734274B1 (ko) * 2005-09-05 2007-07-02 삼성전자주식회사 기판 세정용 조성물을 이용한 게이트 형성 방법
JP5428200B2 (ja) 2007-05-18 2014-02-26 三菱化学株式会社 半導体デバイス用基板洗浄液、半導体デバイス用基板の洗浄方法及び半導体デバイス用基板の製造方法
JP2011517328A (ja) * 2008-03-07 2011-06-02 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 非選択性酸化物エッチング湿式洗浄組成物および使用方法
CN102969221A (zh) * 2011-08-31 2013-03-13 上海华力微电子有限公司 减少水痕缺陷的晶片清洗方法及半导体器件制造方法
CN104498912A (zh) * 2014-12-01 2015-04-08 中核(天津)科技发展有限公司 环保型薄壁异形管件表面处理液及管件处理工艺
CN104630776A (zh) * 2015-02-11 2015-05-20 佛山市顺德区宝铜金属科技有限公司 一种金属制品清洁光亮剂
CN105386066B (zh) * 2015-12-21 2018-07-06 黄志华 一种碳钢酸洗液及其应用
CN107164109A (zh) * 2017-03-31 2017-09-15 吴江创源新材料科技有限公司 一种蓝宝石晶片退火前清洗液及其制备方法和清洗工艺
CN109530374B (zh) * 2018-11-21 2021-07-27 上海超硅半导体有限公司 一种晶圆盒清洗方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0133584A1 (de) * 1983-08-10 1985-02-27 Daikin Industries, Limited Ätzmittel
EP0199288A2 (de) * 1985-04-19 1986-10-29 Robert Kaiser Verfahren und Einrichtung zur Beseitigung kleiner Teilchen von einer Oberfläche

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715250A (en) * 1971-03-29 1973-02-06 Gen Instrument Corp Aluminum etching solution
JPS5129264A (en) * 1974-06-28 1976-03-12 Nisshin Flour Milling Co Seika seipanyoreitokijino seizoho
JPS5138142A (de) * 1974-09-26 1976-03-30 Taiheiyo Kogyo Kk
US4140709A (en) * 1975-03-21 1979-02-20 Diamond Shamrock Corporation Anionic fluorochemical surfactants
ATE1428T1 (de) * 1978-08-04 1982-08-15 Cbs Records Aps Zusammensetzung fuer die reinigung und oberflaechenbehandlung von schallplatten und aehnlichen objekten und ihre anwendung.
US4302348A (en) * 1980-09-23 1981-11-24 The Drackett Company Hard surface cleaning compositions
US4752505A (en) * 1987-01-13 1988-06-21 Hewlett-Packard Company Pre-metal deposition cleaning for bipolar semiconductors
US5169680A (en) * 1987-05-07 1992-12-08 Intel Corporation Electroless deposition for IC fabrication
US5277835A (en) * 1989-06-26 1994-01-11 Hashimoto Chemical Industries Co., Ltd. Surface treatment agent for fine surface treatment
JPH0353083A (ja) * 1989-07-20 1991-03-07 Morita Kagaku Kogyo Kk 半導体素子の金属汚染を防止する方法
JP2524020B2 (ja) * 1990-08-20 1996-08-14 株式会社日立製作所 液中微粒子付着制御法
JPH05129264A (ja) * 1991-11-07 1993-05-25 Hitachi Ltd 洗浄液および洗浄方法
JPH0641770A (ja) * 1992-07-27 1994-02-15 Daikin Ind Ltd シリコンウエハ表面の処理方法
JPH0684866A (ja) * 1992-09-04 1994-03-25 Hitachi Ltd 異物付着防止方法
JP3256863B2 (ja) * 1993-02-04 2002-02-18 ステラケミファ株式会社 微細加工表面処理剤
TW274630B (de) * 1994-01-28 1996-04-21 Wako Zunyaku Kogyo Kk
US5681398A (en) * 1995-03-17 1997-10-28 Purex Co., Ltd. Silicone wafer cleaning method
JP3053083B2 (ja) * 1998-09-16 2000-06-19 株式会社クボタ 苗植付装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0133584A1 (de) * 1983-08-10 1985-02-27 Daikin Industries, Limited Ätzmittel
EP0199288A2 (de) * 1985-04-19 1986-10-29 Robert Kaiser Verfahren und Einrichtung zur Beseitigung kleiner Teilchen von einer Oberfläche

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO9520642A1 *

Also Published As

Publication number Publication date
US5763375A (en) 1998-06-09
WO1995020642A1 (fr) 1995-08-03
EP0742282A1 (de) 1996-11-13
CN1140467A (zh) 1997-01-15
KR0177568B1 (ko) 1999-03-20
CN1076396C (zh) 2001-12-19
JPH07216392A (ja) 1995-08-15

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