EP0703847A4 - Dispositifs et procedes de polissage magnetorheologique - Google Patents

Dispositifs et procedes de polissage magnetorheologique

Info

Publication number
EP0703847A4
EP0703847A4 EP94919329A EP94919329A EP0703847A4 EP 0703847 A4 EP0703847 A4 EP 0703847A4 EP 94919329 A EP94919329 A EP 94919329A EP 94919329 A EP94919329 A EP 94919329A EP 0703847 A4 EP0703847 A4 EP 0703847A4
Authority
EP
European Patent Office
Prior art keywords
fluid
polishing
methods
polishing devices
magnetorheological polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP94919329A
Other languages
German (de)
English (en)
Other versions
EP0703847A1 (fr
EP0703847B1 (fr
Inventor
William I Kordonsky
Igor V Prokhorov
Sergei R Gorodkin
Gennaadii R Gorodkin
Leonid K Gleb
Bronislav E Kashevsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
QED Technologies International LLC
Original Assignee
Byelocorp Scientific Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/071,813 external-priority patent/US5449313A/en
Application filed by Byelocorp Scientific Inc filed Critical Byelocorp Scientific Inc
Publication of EP0703847A1 publication Critical patent/EP0703847A1/fr
Publication of EP0703847A4 publication Critical patent/EP0703847A4/fr
Application granted granted Critical
Publication of EP0703847B1 publication Critical patent/EP0703847B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B39/00—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor
    • B24B39/02—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor designed for working internal surfaces of revolution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
EP94919329A 1993-06-04 1994-06-03 Dispositifs et procedes de polissage magnetorheologique Expired - Lifetime EP0703847B1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US08/071,813 US5449313A (en) 1992-04-14 1993-06-04 Magnetorheological polishing devices and methods
US71813 1993-06-04
BY8630193 1993-12-09
BY863 1993-12-09
PCT/US1994/006209 WO1994029077A1 (fr) 1993-06-04 1994-06-03 Dispositifs et procedes de polissage magnetorheologique

Publications (3)

Publication Number Publication Date
EP0703847A1 EP0703847A1 (fr) 1996-04-03
EP0703847A4 true EP0703847A4 (fr) 1997-07-09
EP0703847B1 EP0703847B1 (fr) 2002-04-10

Family

ID=25665737

Family Applications (1)

Application Number Title Priority Date Filing Date
EP94919329A Expired - Lifetime EP0703847B1 (fr) 1993-06-04 1994-06-03 Dispositifs et procedes de polissage magnetorheologique

Country Status (7)

Country Link
EP (1) EP0703847B1 (fr)
JP (2) JPH08510695A (fr)
KR (1) KR100335219B1 (fr)
AT (1) ATE215869T1 (fr)
CA (3) CA2163671C (fr)
DE (1) DE69430370T2 (fr)
WO (1) WO1994029077A1 (fr)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0687525A1 (fr) * 1994-06-13 1995-12-20 Read-Rite Corporation Système à roder pour le contournage automatisé
JP4805640B2 (ja) * 2005-09-16 2011-11-02 株式会社リコー 表面処理装置
JP2007326183A (ja) * 2006-06-08 2007-12-20 Fdk Corp 磁気研磨液
US7364493B1 (en) 2006-07-06 2008-04-29 Itt Manufacturing Enterprises, Inc. Lap grinding and polishing machine
KR100788796B1 (ko) 2006-11-20 2007-12-27 연세대학교 산학협력단 집속이온빔과 ｍｒｆ를 이용한 나노 구조물의 제조방법
US8974268B2 (en) * 2010-06-25 2015-03-10 Corning Incorporated Method of preparing an edge-strengthened article
US9102030B2 (en) 2010-07-09 2015-08-11 Corning Incorporated Edge finishing apparatus
JP5124034B2 (ja) * 2011-06-14 2013-01-23 有限会社村松研磨工業 バレル研磨装置
CN102284890A (zh) * 2011-09-26 2011-12-21 厦门大学 面形自适应回转轴对称光学元件抛光装置
EA024869B1 (ru) * 2013-12-27 2016-10-31 Государственное Научное Учреждение "Институт Тепло- И Массообмена Имени А.В. Лыкова Национальной Академии Наук Беларуси" Способ магнитореологического формообразования и полирования поверхности сложной формы
CN104308671B (zh) * 2014-10-09 2017-01-11 东北大学 一种磁流变抛光装置与方法
CN105014484A (zh) * 2015-08-17 2015-11-04 宇环数控机床股份有限公司 磁流变抛光设备的磁场发生装置
CN107378651A (zh) * 2017-08-04 2017-11-24 北京交通大学 一种磁流变平面抛光装置
KR101932413B1 (ko) * 2017-08-29 2018-12-27 인하대학교 산학협력단 표면광택 생성장치
KR101994029B1 (ko) * 2018-01-02 2019-09-30 인하대학교 산학협력단 평면 연마 장치
US11440156B2 (en) * 2018-06-19 2022-09-13 Islamic Azad University of Najafabad Magnetic abrasive finishing of curved surfaces
CN108789117B (zh) * 2018-06-20 2020-05-05 中国科学院上海光学精密机械研究所 米级大口径光学元件高效抛光机及抛光方法
CN109623507A (zh) * 2019-01-02 2019-04-16 中国科学院上海光学精密机械研究所 Yag板条激光晶体反射面形加工方法
CN110421412A (zh) * 2019-09-05 2019-11-08 河北工业大学 一种小型磁流变平面抛光装置
CN112123029B (zh) * 2020-09-25 2022-09-06 山东理工大学 一种基于磁场辅助的微细结构振动光整装置及光整方法
CN112536649A (zh) * 2020-12-21 2021-03-23 浙江师范大学 一种基于磁性磨粒流的光学玻璃抛光方法及其装置
CN113561035B (zh) * 2021-07-30 2023-04-11 西安工业大学 一种点云交变磁流变抛光装置及方法
CN113752098B (zh) * 2021-09-29 2022-06-21 哈尔滨工业大学 一种基于水浴加热辅助的小球头磁流变抛光方法
CN113941904B (zh) * 2021-10-29 2022-07-29 哈尔滨工业大学 一种基于小型回转体零件旋转超声振动的小球头磁流变抛光工艺方法
CN113878413B (zh) * 2021-11-15 2022-12-13 华圭精密科技(东莞)有限公司 一种抛光防撞磁流变抛光机与控制方法
CN114055258B (zh) * 2021-11-19 2023-04-18 浙江师范大学 一种磁性抛光装置及磁性抛光控制方法
CN117428580B (zh) * 2023-12-15 2024-03-19 成都市凯林机械贸易有限责任公司 一种阀门加工用抛光装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2735231A (en) * 1953-05-22 1956-02-21 Reflectone Corp simjian
US3848363A (en) * 1973-02-20 1974-11-19 Minnesota Mining & Mfg Apparatus for treating objects with particles moved by magnetic force
US3897350A (en) * 1974-05-30 1975-07-29 Mobil Oil Corp Anti-rust compositions
US4186528A (en) * 1978-05-23 1980-02-05 Kosobutsky Alexandr A Machine for treating spherical surfaces of parts with magneto-abrasive powder
US4485024A (en) * 1982-04-07 1984-11-27 Nippon Seiko Kabushiki Kaisha Process for producing a ferrofluid, and a composition thereof
JPS6067057A (ja) * 1983-09-21 1985-04-17 Taihoo Kogyo Kk 研磨方法
JPS6173305A (ja) * 1984-09-18 1986-04-15 Tdk Corp 磁性流体
JPS6167045A (ja) * 1984-09-10 1986-04-07 Canon Inc トナ−塗布方法
DD227372A1 (de) * 1984-10-25 1985-09-18 Orsta Hydraulik Veb K Verfahren zur feinstbearbeitung von stahlrohren
SE464565B (sv) * 1987-02-09 1991-05-13 Jgc Corp Foerfarande foer slipning med anvaendning av ett magnetiskt fluidum och anordning daerfoer
JPS63232402A (ja) * 1987-03-20 1988-09-28 Nippon Seiko Kk 導電性磁性流体組成物とその製造方法
US4839074A (en) * 1987-05-22 1989-06-13 Exxon Chemical Patents Inc. Specified C14 -carboxylate/vinyl ester polymer-containing compositions for lubricating oil flow improvement
JPH01303446A (ja) * 1988-06-01 1989-12-07 Asahi Chem Ind Co Ltd 磁性粒子とその製造方法
JP2632943B2 (ja) * 1988-07-26 1997-07-23 戸田工業株式会社 磁気記録媒体
JP2949289B2 (ja) * 1989-03-28 1999-09-13 日本エクスラン工業株式会社 ポリマー被覆磁性粒子の製造法
US4992190A (en) * 1989-09-22 1991-02-12 Trw Inc. Fluid responsive to a magnetic field
JP3069612B2 (ja) * 1990-06-13 2000-07-24 科学技術庁金属材料技術研究所長 磁性流体及びその製造方法
JP2889664B2 (ja) * 1990-07-19 1999-05-10 株式会社リコー 回転量測定方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *

Also Published As

Publication number Publication date
CA2163671A1 (fr) 1994-12-22
JP4741212B2 (ja) 2011-08-03
WO1994029077A1 (fr) 1994-12-22
EP0703847A1 (fr) 1996-04-03
KR100335219B1 (ko) 2002-11-07
JP2005040944A (ja) 2005-02-17
CA2497732A1 (fr) 1994-12-22
DE69430370D1 (de) 2002-05-16
ATE215869T1 (de) 2002-04-15
JPH08510695A (ja) 1996-11-12
CA2163671C (fr) 2005-10-25
KR960702786A (ko) 1996-05-23
CA2497732C (fr) 2011-03-01
CA2497731C (fr) 2006-02-07
CA2497731A1 (fr) 1994-12-22
DE69430370T2 (de) 2002-12-12
EP0703847B1 (fr) 2002-04-10

Similar Documents

Publication Publication Date Title
EP0703847A4 (fr) Dispositifs et procedes de polissage magnetorheologique
US5104421B1 (en) Polishing method of goods and abrasive pad therefor
MY128249A (en) Composition and method for polishing rigid disks
SE8800380D0 (sv) A method for grinding using a magnetic fluid and an apparatus thereof
IL88055A0 (en) Apparatus for controlling fluid pressure in an ocular globe
MY119075A (en) Colloidal silica slurry for nip plated disk polishing
DE69419012D1 (de) Halbleiterscheibe polierverfahren und -vorrichtung
MY130639A (en) Method of rough polishing semiconductor wafers to reduce surface roughness
EP0628997A3 (fr) Dispositif semi-conducteur avec un support mince et méthode de sa fabrication.
EP0431553A3 (en) Microscopic grinding method and microscopic grinding device
HU9402034D0 (en) Method of polishing a surface of copper or an alloy comprising mainly copper, magnetic head obtainable by means of said method, x-ray radiation-collimating element, both having a surface polished by means of the method, and polishing means for use in the.
EP0894570A3 (fr) Procédé et dispositif de polissage
AU1974700A (en) Method and device for grinding workpieces with centers which comprise form variations
GB2239619B (en) Grinding method and grinding machine with controlled grinding force
AU7724794A (en) Apparatus and method for deep thermoelectric refrigeration
IT8249575A0 (it) Metodo e dispositivo per il controllo funzionale di macchine rettificatrici
DE3478289D1 (en) Magnetic attraction system grinding method
PL295535A1 (en) Glass globules, method of obtaining abrasive particles and method of making an abrasive tool
AU1398688A (en) Mixing apparatus and method
DE69323178T2 (de) Polierverfahren, hierzu bestimmte vorrichtung und schwabbel-/polierscheibe
GB9003508D0 (en) Sensing-measuring device for the continuous determination of cavitation in dynamic pumps
EP0845329A3 (fr) Procédé et dispositif de polissage d'une plaque mince
GB2275432B (en) Method and apparatus for grinding ball grooves
SU1783714A1 (ru) Способ полирования деталей
SU1839931A1 (ru) Силовой двухстепенный управляющий гироскоп

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19960104

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE

A4 Supplementary search report drawn up and despatched
AK Designated contracting states

Kind code of ref document: A4

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE

17Q First examination report despatched

Effective date: 19990422

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: CH

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: BE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

REF Corresponds to:

Ref document number: 215869

Country of ref document: AT

Date of ref document: 20020415

Kind code of ref document: T

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REF Corresponds to:

Ref document number: 69430370

Country of ref document: DE

Date of ref document: 20020516

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020603

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020603

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020710

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020710

ET Fr: translation filed
REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20021030

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20030113

REG Reference to a national code

Ref country code: GB

Ref legal event code: 732E

NLS Nl: assignments of ep-patents

Owner name: QED TECHNOLOGIES INTERNATIONAL, INC.

Effective date: 20071129

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IE

Payment date: 20130330

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20130529

Year of fee payment: 20

Ref country code: SE

Payment date: 20130607

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20130620

Year of fee payment: 20

Ref country code: IT

Payment date: 20130617

Year of fee payment: 20

Ref country code: FR

Payment date: 20130618

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20130628

Year of fee payment: 20

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 69430370

Country of ref document: DE

REG Reference to a national code

Ref country code: NL

Ref legal event code: V4

Effective date: 20140603

REG Reference to a national code

Ref country code: GB

Ref legal event code: PE20

Expiry date: 20140602

REG Reference to a national code

Ref country code: SE

Ref legal event code: EUG

REG Reference to a national code

Ref country code: IE

Ref legal event code: MK9A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20140602

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20140604

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20140603