EP0703847A4 - Magnetorheological polishing devices and methods - Google Patents

Magnetorheological polishing devices and methods

Info

Publication number
EP0703847A4
EP0703847A4 EP94919329A EP94919329A EP0703847A4 EP 0703847 A4 EP0703847 A4 EP 0703847A4 EP 94919329 A EP94919329 A EP 94919329A EP 94919329 A EP94919329 A EP 94919329A EP 0703847 A4 EP0703847 A4 EP 0703847A4
Authority
EP
European Patent Office
Prior art keywords
fluid
polishing
methods
polishing devices
magnetorheological polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP94919329A
Other languages
German (de)
French (fr)
Other versions
EP0703847A1 (en
EP0703847B1 (en
Inventor
William I Kordonsky
Igor V Prokhorov
Sergei R Gorodkin
Gennaadii R Gorodkin
Leonid K Gleb
Bronislav E Kashevsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
QED Technologies International LLC
Original Assignee
Byelocorp Scientific Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/071,813 external-priority patent/US5449313A/en
Application filed by Byelocorp Scientific Inc filed Critical Byelocorp Scientific Inc
Publication of EP0703847A1 publication Critical patent/EP0703847A1/en
Publication of EP0703847A4 publication Critical patent/EP0703847A4/en
Application granted granted Critical
Publication of EP0703847B1 publication Critical patent/EP0703847B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B39/00—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor
    • B24B39/02—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor designed for working internal surfaces of revolution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent

Abstract

A method of polishing an object is disclosed. In one embodiment, as shown in the figure, the method comprises the steps of creating a polishing zone (10) within a magnetorheological fluid (2); determining the characteristics of the contact between the object and the polishing zone necessary to polish the object (4); controlling the consistency of the fluid (2) in the polishing zone (10); bringing the object (4) into contact with the polishing zone (10) of the fluid (2); and moving at least one of said object (4) and said fluid (2) with respect to the other. Also disclosed is a polishing device (1). In one embodiment, the device comprises a magnetorheological fluid (2), a means (6) for inducing a magnetic field, and a means for displacing the object (4) to be polished or the means (6) for inducing a magnetic field relative to one another.
EP94919329A 1993-06-04 1994-06-03 Magnetorheological polishing devices and methods Expired - Lifetime EP0703847B1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US08/071,813 US5449313A (en) 1992-04-14 1993-06-04 Magnetorheological polishing devices and methods
US71813 1993-06-04
BY863 1993-12-09
BY8630193 1993-12-09
PCT/US1994/006209 WO1994029077A1 (en) 1993-06-04 1994-06-03 Magnetorheological polishing devices and methods

Publications (3)

Publication Number Publication Date
EP0703847A1 EP0703847A1 (en) 1996-04-03
EP0703847A4 true EP0703847A4 (en) 1997-07-09
EP0703847B1 EP0703847B1 (en) 2002-04-10

Family

ID=25665737

Family Applications (1)

Application Number Title Priority Date Filing Date
EP94919329A Expired - Lifetime EP0703847B1 (en) 1993-06-04 1994-06-03 Magnetorheological polishing devices and methods

Country Status (7)

Country Link
EP (1) EP0703847B1 (en)
JP (2) JPH08510695A (en)
KR (1) KR100335219B1 (en)
AT (1) ATE215869T1 (en)
CA (3) CA2163671C (en)
DE (1) DE69430370T2 (en)
WO (1) WO1994029077A1 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0687525A1 (en) * 1994-06-13 1995-12-20 Read-Rite Corporation A lapping system for automatic contouring
JP4805640B2 (en) * 2005-09-16 2011-11-02 株式会社リコー Surface treatment equipment
JP2007326183A (en) * 2006-06-08 2007-12-20 Fdk Corp Magnetic polishing liquid
US7364493B1 (en) 2006-07-06 2008-04-29 Itt Manufacturing Enterprises, Inc. Lap grinding and polishing machine
KR100788796B1 (en) 2006-11-20 2007-12-27 연세대학교 산학협력단 Manufacture method of nano-structures by using focused ion beam and magneto-rheological fluid
US8974268B2 (en) * 2010-06-25 2015-03-10 Corning Incorporated Method of preparing an edge-strengthened article
US9102030B2 (en) 2010-07-09 2015-08-11 Corning Incorporated Edge finishing apparatus
JP5124034B2 (en) * 2011-06-14 2013-01-23 有限会社村松研磨工業 Barrel polishing equipment
CN102284890A (en) * 2011-09-26 2011-12-21 厦门大学 Surface-shaped self-adaptive rotary-shaft symmetric optical component polishing device
EA024869B1 (en) * 2013-12-27 2016-10-31 Государственное Научное Учреждение "Институт Тепло- И Массообмена Имени А.В. Лыкова Национальной Академии Наук Беларуси" Method of magnetorheologic forming and polishing of surface with irregular shape
CN104308671B (en) * 2014-10-09 2017-01-11 东北大学 Magnetorheological polishing device and method
CN105014484A (en) * 2015-08-17 2015-11-04 宇环数控机床股份有限公司 Magnetic field generation device of magnetorheological polishing equipment
CN107378651A (en) * 2017-08-04 2017-11-24 北京交通大学 A kind of magnetorheological plane polishing device
KR101932413B1 (en) * 2017-08-29 2018-12-27 인하대학교 산학협력단 Surface brightness making device
KR101994029B1 (en) * 2018-01-02 2019-09-30 인하대학교 산학협력단 Flat surface grinding apparatus
US11440156B2 (en) * 2018-06-19 2022-09-13 Islamic Azad University of Najafabad Magnetic abrasive finishing of curved surfaces
CN108789117B (en) * 2018-06-20 2020-05-05 中国科学院上海光学精密机械研究所 Efficient polishing machine and polishing method for meter-level large-caliber optical element
CN109623507A (en) * 2019-01-02 2019-04-16 中国科学院上海光学精密机械研究所 YAG slab laser crystal reflection face shape processing method
CN110421412A (en) * 2019-09-05 2019-11-08 河北工业大学 A kind of small-sized magnetorheological plane polishing device
CN112123029B (en) * 2020-09-25 2022-09-06 山东理工大学 Magnetic field-assisted microstructure vibration finishing device and finishing method
CN112536649A (en) * 2020-12-21 2021-03-23 浙江师范大学 Optical glass polishing method and device based on magnetic abrasive particle flow
CN113561035B (en) * 2021-07-30 2023-04-11 西安工业大学 Point cloud alternating magnetorheological polishing device and method
CN113752098B (en) * 2021-09-29 2022-06-21 哈尔滨工业大学 Water-bath heating-assisted small ball head magnetorheological polishing method
CN113941904B (en) * 2021-10-29 2022-07-29 哈尔滨工业大学 Small ball head magnetorheological polishing process method based on rotary ultrasonic vibration of small-sized revolving body part
CN113878413B (en) * 2021-11-15 2022-12-13 华圭精密科技(东莞)有限公司 Polishing anti-collision magnetorheological polishing machine and control method
CN114055258B (en) * 2021-11-19 2023-04-18 浙江师范大学 Magnetic polishing device and magnetic polishing control method
CN117428580B (en) * 2023-12-15 2024-03-19 成都市凯林机械贸易有限责任公司 Polishing device for valve machining

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2735231A (en) * 1953-05-22 1956-02-21 Reflectone Corp simjian
US3848363A (en) * 1973-02-20 1974-11-19 Minnesota Mining & Mfg Apparatus for treating objects with particles moved by magnetic force
US3897350A (en) * 1974-05-30 1975-07-29 Mobil Oil Corp Anti-rust compositions
US4186528A (en) * 1978-05-23 1980-02-05 Kosobutsky Alexandr A Machine for treating spherical surfaces of parts with magneto-abrasive powder
US4485024A (en) * 1982-04-07 1984-11-27 Nippon Seiko Kabushiki Kaisha Process for producing a ferrofluid, and a composition thereof
JPS6067057A (en) * 1983-09-21 1985-04-17 Taihoo Kogyo Kk Grinding
JPS6173305A (en) * 1984-09-18 1986-04-15 Tdk Corp Magnetic fluid
JPS6167045A (en) * 1984-09-10 1986-04-07 Canon Inc Toner coating method
DD227372A1 (en) * 1984-10-25 1985-09-18 Orsta Hydraulik Veb K METHOD FOR FINISHING STEEL TUBES
US4821466A (en) * 1987-02-09 1989-04-18 Koji Kato Method for grinding using a magnetic fluid and an apparatus thereof
JPS63232402A (en) * 1987-03-20 1988-09-28 Nippon Seiko Kk Conductive magnetic fluid composition and manufacture thereof
US4839074A (en) * 1987-05-22 1989-06-13 Exxon Chemical Patents Inc. Specified C14 -carboxylate/vinyl ester polymer-containing compositions for lubricating oil flow improvement
JPH01303446A (en) * 1988-06-01 1989-12-07 Asahi Chem Ind Co Ltd Magnetic particles and manufacture of the same
JP2632943B2 (en) * 1988-07-26 1997-07-23 戸田工業株式会社 Magnetic recording media
JP2949289B2 (en) * 1989-03-28 1999-09-13 日本エクスラン工業株式会社 Method for producing polymer-coated magnetic particles
US4992190A (en) * 1989-09-22 1991-02-12 Trw Inc. Fluid responsive to a magnetic field
JP3069612B2 (en) * 1990-06-13 2000-07-24 科学技術庁金属材料技術研究所長 Magnetic fluid and method for producing the same
JP2889664B2 (en) * 1990-07-19 1999-05-10 株式会社リコー Rotation amount measurement method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *

Also Published As

Publication number Publication date
JPH08510695A (en) 1996-11-12
ATE215869T1 (en) 2002-04-15
CA2497731A1 (en) 1994-12-22
DE69430370T2 (en) 2002-12-12
KR960702786A (en) 1996-05-23
CA2163671A1 (en) 1994-12-22
CA2497732C (en) 2011-03-01
DE69430370D1 (en) 2002-05-16
JP2005040944A (en) 2005-02-17
CA2497732A1 (en) 1994-12-22
EP0703847A1 (en) 1996-04-03
JP4741212B2 (en) 2011-08-03
EP0703847B1 (en) 2002-04-10
CA2163671C (en) 2005-10-25
CA2497731C (en) 2006-02-07
WO1994029077A1 (en) 1994-12-22
KR100335219B1 (en) 2002-11-07

Similar Documents

Publication Publication Date Title
EP0703847A4 (en) Magnetorheological polishing devices and methods
US5104421B1 (en) Polishing method of goods and abrasive pad therefor
MY128249A (en) Composition and method for polishing rigid disks
MY119075A (en) Colloidal silica slurry for nip plated disk polishing
SG46622A1 (en) Wafer polishing apparatus and method
EP0628997A3 (en) Semiconductor device with small die pad and method of making same.
EP0431553A3 (en) Microscopic grinding method and microscopic grinding device
EP0894570A3 (en) Method and apparatus for polishing
AU1974700A (en) Method and device for grinding workpieces with centers which comprise form variations
GB2239619B (en) Grinding method and grinding machine with controlled grinding force
AU7724794A (en) Apparatus and method for deep thermoelectric refrigeration
IT8249575A0 (en) METHOD AND DEVICE FOR THE FUNCTIONAL CONTROL OF GRINDING MACHINES
DE3478289D1 (en) Magnetic attraction system grinding method
PL295535A1 (en) Glass globules, method of obtaining abrasive particles and method of making an abrasive tool
AU1398688A (en) Mixing apparatus and method
EP0616362A3 (en) Method for polishing work piece and apparatus therefor.
DE69323178D1 (en) POLISHING METHOD, DEVICE DETERMINED FOR THIS AND BAKING / POLISHING DISC
GB9003508D0 (en) Sensing-measuring device for the continuous determination of cavitation in dynamic pumps
GB2275432B (en) Method and apparatus for grinding ball grooves
SU1783714A1 (en) Method for part polishing
SU1839931A1 (en) Power control gyroscope
AU7178691A (en) Method and device for determining field of presure of continuous fluid medium on the surface of an object
SU1839843A1 (en) Pneumo-inductive device for controlling spheres
IT217531Z2 (en) COMMAND AND CONTROL DEVICE FOR THE POSITION OF THE OPERATING BODY IN CLEANING, POLISHING, GRINDING AND SIMILAR MACHINES.
HUT48997A (en) Method and device for controlling operation of water-works, first of all of cooling water-discharge pumps

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19960104

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE

A4 Supplementary search report drawn up and despatched
AK Designated contracting states

Kind code of ref document: A4

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE

17Q First examination report despatched

Effective date: 19990422

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: CH

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: BE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020410

REF Corresponds to:

Ref document number: 215869

Country of ref document: AT

Date of ref document: 20020415

Kind code of ref document: T

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REF Corresponds to:

Ref document number: 69430370

Country of ref document: DE

Date of ref document: 20020516

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020603

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020603

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020710

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20020710

ET Fr: translation filed
REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20021030

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20030113

REG Reference to a national code

Ref country code: GB

Ref legal event code: 732E

NLS Nl: assignments of ep-patents

Owner name: QED TECHNOLOGIES INTERNATIONAL, INC.

Effective date: 20071129

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IE

Payment date: 20130330

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20130529

Year of fee payment: 20

Ref country code: SE

Payment date: 20130607

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20130620

Year of fee payment: 20

Ref country code: IT

Payment date: 20130617

Year of fee payment: 20

Ref country code: FR

Payment date: 20130618

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20130628

Year of fee payment: 20

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 69430370

Country of ref document: DE

REG Reference to a national code

Ref country code: NL

Ref legal event code: V4

Effective date: 20140603

REG Reference to a national code

Ref country code: GB

Ref legal event code: PE20

Expiry date: 20140602

REG Reference to a national code

Ref country code: SE

Ref legal event code: EUG

REG Reference to a national code

Ref country code: IE

Ref legal event code: MK9A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20140602

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20140604

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20140603