CN112536649A - Optical glass polishing method and device based on magnetic abrasive particle flow - Google Patents
Optical glass polishing method and device based on magnetic abrasive particle flow Download PDFInfo
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- 239000002245 particle Substances 0.000 title claims abstract description 73
- 239000005304 optical glass Substances 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 title claims abstract description 23
- 239000007788 liquid Substances 0.000 claims abstract description 30
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- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 5
- 229920001223 polyethylene glycol Polymers 0.000 claims description 5
- 238000005054 agglomeration Methods 0.000 claims description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 3
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 3
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- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000005642 Oleic acid Substances 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
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- 229910003460 diamond Inorganic materials 0.000 claims description 3
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- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 229940068984 polyvinyl alcohol Drugs 0.000 claims description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims description 3
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 claims description 3
- 235000019982 sodium hexametaphosphate Nutrition 0.000 claims description 3
- 229940048086 sodium pyrophosphate Drugs 0.000 claims description 3
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- 230000007246 mechanism Effects 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- UJGOCJFDDHOGRX-UHFFFAOYSA-M [Fe]O Chemical compound [Fe]O UJGOCJFDDHOGRX-UHFFFAOYSA-M 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 239000006061 abrasive grain Substances 0.000 abstract description 42
- 239000012530 fluid Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
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- 238000010884 ion-beam technique Methods 0.000 description 2
- WKPSFPXMYGFAQW-UHFFFAOYSA-N iron;hydrate Chemical compound O.[Fe] WKPSFPXMYGFAQW-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
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- 230000004927 fusion Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
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- 230000014759 maintenance of location Effects 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/005—Blocking means, chucks or the like; Alignment devices
- B24B13/0055—Positioning of lenses; Marking of lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
本发明公开了一种基于磁性磨粒流的光学玻璃抛光方法及其装置,在聚合物胶体中加入磁性磨粒、加工磨粒和分散剂,制备具有高浓度磁性磨粒的抛光液;其中,磁性磨粒占抛光液的质量分数为75%~95%,聚合物胶体的质量分数为10%~20%,加工磨粒的质量分数为1%~5%,分散剂的质量分数为0.5%~2%。同时公开了一种实现上述抛光方法的装置,在抛光过程中,利用抛光装置控制光学玻璃零件与抛光液之间做相对运动,采用磁场发生器给所述抛光液施加磁场,调节抛光液中磨粒的聚集度,增加零件与磨粒之间的摩擦力,进而实现磨粒对零件的微量去除,达到高效抛光的效果。本发明可低成本地实现曲面光学玻璃零件的高效低损伤抛光。
The invention discloses an optical glass polishing method and device based on magnetic abrasive grain flow. Magnetic abrasive grains, processing abrasive grains and dispersant are added to polymer colloid to prepare a polishing liquid with high concentration of magnetic abrasive grains; wherein, The mass fraction of magnetic abrasive particles in the polishing liquid is 75% to 95%, the mass fraction of polymer colloid is 10% to 20%, the mass fraction of processed abrasive particles is 1% to 5%, and the mass fraction of dispersant is 0.5% ~2%. At the same time, a device for realizing the above polishing method is disclosed. During the polishing process, the polishing device is used to control the relative movement between the optical glass parts and the polishing liquid, and a magnetic field generator is used to apply a magnetic field to the polishing liquid to adjust the grinding in the polishing liquid. The aggregation degree of the particles increases the friction between the parts and the abrasive particles, thereby realizing the micro-removal of the abrasive particles to the parts, and achieving the effect of high-efficiency polishing. The invention can realize high-efficiency and low-damage polishing of curved optical glass parts at low cost.
Description
技术领域technical field
本发明属于光学玻璃的抛光领域,具体涉及一种基于磁性磨粒流的光学玻璃抛光方法及其装置。The invention belongs to the polishing field of optical glass, and particularly relates to a method and a device for polishing optical glass based on magnetic abrasive particle flow.
背景技术Background technique
光学玻璃目前已广泛应用于航空航天、军事装备、核电能源、医疗和电子设备等领域。其中光学玻璃零件类型主要为光学定位镜头和光路调节镜头。不同应用场合对光学玻璃表面有不同的质量要求,例如,空间望远镜中的光学元件须具有高力学强度和形状保持度;武器装备瞄准系统的光学元件须具有高准确性和机动性;核聚变高能激光系统的光学元件须具有高激光损伤阈值;各种光学测量仪器中的光学元件须具有完整性和便携性。Optical glass has been widely used in aerospace, military equipment, nuclear power energy, medical and electronic equipment and other fields. Among them, the types of optical glass parts are mainly optical positioning lenses and optical path adjustment lenses. Different applications have different quality requirements on the surface of optical glass. For example, the optical components in space telescopes must have high mechanical strength and shape retention; the optical components of weapon aiming systems must have high accuracy and mobility; nuclear fusion high energy The optical components of the laser system must have high laser damage threshold; the optical components in various optical measuring instruments must have integrity and portability.
为满足上述应用领域的性能要求,光学玻璃零件的工作面须达到超光滑、少/无表层损伤,对其抛光工艺提出了苛刻的要求。目前,针对平面型镜面,采用传统的抛光方法即可制造出精度非常高的镜面;而对于曲面形状的光学玻璃元件,如球面镜和非球面镜等,通常采用机械小工具技术(CCOS)、磁流变技术(MRF)和离子束修形技术(IBF)等计算机辅助的柔性抛光技术加工。CCOS技术基于数控系统可实现利用小工具抛光大尺寸工件,缺点是加工效率低且存在边缘效应;MRF的加工介质是以磁性颗粒为主要成分的Bingham流体,其在高速运动过程中可实现材料剪切去除,MRF的缺点是加工斑点小,对工件尺寸和曲率有一定限制,此外,磁流变液还有沉降的缺陷,限制其加工效率;IBF通过离子束轰击材料表面实现表层材料去除,其优点是加工表面无亚表面损伤层,无边缘效应,缺点是加工条件苛刻(真空环境),加工效率低。上述抛光方法的共同缺点还包括工艺复杂,设备成本较高。In order to meet the performance requirements of the above application fields, the working surface of optical glass parts must be ultra-smooth, with little/no surface damage, and strict requirements are placed on the polishing process. At present, for flat mirrors, traditional polishing methods can be used to produce very high-precision mirrors; for curved optical glass components, such as spherical mirrors and aspherical mirrors, mechanical small tool technology (CCOS), magnetic flow It is processed by computer-aided flexible polishing technology such as variable technology (MRF) and ion beam shaping technology (IBF). CCOS technology is based on numerical control system, which can use small tools to polish large-sized workpieces. The disadvantage is that the processing efficiency is low and there is edge effect. The processing medium of MRF is Bingham fluid with magnetic particles as the main component, which can realize material shearing during high-speed movement. The disadvantage of MRF is that the processing spot is small, which has certain restrictions on the size and curvature of the workpiece. In addition, the magnetorheological fluid has the defect of sedimentation, which limits its processing efficiency; IBF achieves surface material removal by bombarding the surface of the material with ion beams. The advantage is that there is no subsurface damage layer on the machined surface and no edge effect. The disadvantage is that the processing conditions are harsh (vacuum environment) and the processing efficiency is low. The common disadvantages of the above-mentioned polishing methods also include complicated process and high equipment cost.
申请号为2006201055708和2015108115101公开的磁性磨粒抛光方法均采用干的磁性磨粒作为抛光介质,其加工方式为干式摩擦磨损,此类方法易在加工表面产生局部能量聚集,加剧零件表层损伤;此外,由于加工介质为干式磁性磨粒粉末,即使在磨粒非极化状态下,由于磨粒聚集度较高,工件也难以方便进入抛光介质。The magnetic abrasive grain polishing methods disclosed in the application numbers 2006201055708 and 2015108115101 all use dry magnetic abrasive grains as the polishing medium, and the processing method is dry friction and wear. Such methods are prone to local energy accumulation on the machined surface, aggravating the surface damage of parts; In addition, since the processing medium is dry magnetic abrasive grain powder, even in the non-polarized state of the abrasive grains, it is difficult for the workpiece to easily enter the polishing medium due to the high degree of agglomeration of the abrasive grains.
综上所述,现有的抛光技术难以实现高效、高表面质量和低成本地抛光光学玻璃零件。因此,需要开发一种加工效率较高,实现成本较低,且能够保证加工质量的抛光方法。To sum up, the existing polishing technologies are difficult to achieve efficient, high surface quality and low-cost polishing of optical glass parts. Therefore, it is necessary to develop a polishing method with high processing efficiency, low implementation cost, and guaranteed processing quality.
发明内容SUMMARY OF THE INVENTION
为克服现有技术的缺陷,本发明结合磁流变液和干式磁性磨粒抛光方法的优势,提出一种基于高浓度磁性磨粒流体的光学玻璃抛光方法及其装置。In order to overcome the defects of the prior art, the present invention combines the advantages of the magnetorheological fluid and the dry magnetic abrasive grain polishing method, and proposes a high-concentration magnetic abrasive grain fluid-based optical glass polishing method and device.
本发明为解决其技术问题所采用的技术方案是:The technical scheme adopted by the present invention for solving its technical problem is:
一种基于磁性磨粒流的光学玻璃抛光方法,在聚合物胶体中加入磁性磨粒、加工磨粒和分散剂,制备具有高浓度磁性磨粒的抛光液;其中,磁性磨粒占抛光液的质量分数为75%~95%,聚合物胶体的质量分数为10%~20%,加工磨粒的质量分数为1%~5%,分散剂的质量分数为0.5%~2%。An optical glass polishing method based on magnetic abrasive grain flow, adding magnetic abrasive grains, processing abrasive grains and a dispersant to a polymer colloid to prepare a polishing liquid with a high concentration of magnetic abrasive grains; wherein, the magnetic abrasive grains account for 5% of the polishing liquid The mass fraction is 75% to 95%, the mass fraction of the polymer colloid is 10% to 20%, the mass fraction of the processed abrasive particles is 1% to 5%, and the mass fraction of the dispersant is 0.5% to 2%.
在抛光过程中,光学玻璃零件与抛光液之间做相对运动,采用磁场发生器给所述抛光液施加磁场,调节抛光液中磨粒的聚集度,增加零件与磨粒之间的摩擦力,进而实现磨粒对零件的微量去除,达到高效抛光的效果。During the polishing process, the optical glass parts and the polishing liquid move relative to each other, and a magnetic field generator is used to apply a magnetic field to the polishing liquid to adjust the concentration of abrasive particles in the polishing liquid and increase the friction between the parts and the abrasive particles. In this way, the micro-removal of abrasive particles to the parts is realized, and the effect of high-efficiency polishing is achieved.
进一步,所述的磁性磨粒为铁氧体粉末或羟基铁粉,粒径范围为0.05~3μm;所述的聚合物胶体为硅溶胶或铝溶胶;所述的加工磨粒为金刚石、碳化硅、氧化铝、氧化铈、氧化硅、氧化锆、氧化钛的一种或几种磨粒的混合物,粒径范围为0.5~30μm,磨粒的种类、粒度和浓度根据抛光工件的加工质量和效率选取。Further, the magnetic abrasive particles are ferrite powder or hydroxy iron powder, and the particle size range is 0.05-3 μm; the polymer colloid is silica sol or aluminum sol; the processed abrasive particles are diamond, silicon carbide , alumina, cerium oxide, silicon oxide, zirconium oxide, titanium oxide, one or a mixture of several abrasive particles, the particle size range is 0.5 ~ 30μm, the type, particle size and concentration of the abrasive particles are based on the processing quality and efficiency of the polished workpiece Select.
再进一步,在所述抛光液中,可以加入分散剂以防止磁性磨粒和加工磨粒的沉降和凝聚。所述的分散剂为油酸、聚乙二醇、六偏磷酸钠、焦磷酸钠、聚乙烯醇的一种或几种混合物,分散剂的种类和浓度根据加工磨粒和聚合物胶体种类以及加工工件的材料特性选取。Still further, in the polishing liquid, a dispersant may be added to prevent settling and agglomeration of magnetic abrasive grains and processing abrasive grains. The dispersant is one or more mixtures of oleic acid, polyethylene glycol, sodium hexametaphosphate, sodium pyrophosphate, and polyvinyl alcohol. Selection of material properties of the workpiece to be machined.
本发明进一步公开了一种实现所述抛光方法的装置,包括用于盛放抛光液的抛光槽、磁场发生器和用于固定零件的夹具,所述磁场发生器安装在所述抛光槽的周围,所述夹具位于所述抛光槽上方。The invention further discloses a device for realizing the polishing method, comprising a polishing tank for holding polishing liquid, a magnetic field generator and a fixture for fixing parts, and the magnetic field generator is installed around the polishing tank , the fixture is located above the polishing groove.
进一步,所述抛光槽包括粗加工抛光槽和精加工抛光槽,所述粗加工抛光槽中抛光液的加工磨粒为硬度和粒度较大的磨粒,所述精加工抛光槽中抛光液的加工磨粒为硬度和粒度较小的磨粒,抛光过程中,零件首先浸入粗加工抛光槽加工,然后再浸入精加工抛光槽加工。Further, the polishing groove includes a roughing polishing groove and a finishing polishing groove, the processing abrasive grains of the polishing liquid in the roughing polishing groove are abrasive grains with larger hardness and particle size, and the polishing liquid in the finishing polishing groove is The processed abrasive grains are abrasive grains with smaller hardness and particle size. During the polishing process, the parts are first immersed in the roughing polishing groove for processing, and then immersed in the finishing polishing groove for processing.
进一步,所述磁场发生器为螺旋结构的电磁激励线圈。Further, the magnetic field generator is an electromagnetic excitation coil with a spiral structure.
再进一步,所述夹具与用于驱动夹具转动以及上下左右前后移动的驱动机构连接。Still further, the clamp is connected with a driving mechanism for driving the clamp to rotate and move up, down, left, right and back.
本发明的构思为:开发一种包含加工磨粒的磁性磨粒流抛光液,在磁场作用下实现光学玻璃的高效精密抛光。其中,加工磨粒为硬质磨粒或化学活性磨粒,聚合物胶体和分散剂主要作用为保持磨粒分布稳定性,磁性磨粒在外加磁场作用下控制加工磨粒与零件的压力,配合零件与抛光流体的相对运动,达到高效抛光光学玻璃零件的目的。The concept of the present invention is: to develop a magnetic abrasive particle flow polishing liquid containing processed abrasive particles to realize efficient and precise polishing of optical glass under the action of a magnetic field. Among them, the processed abrasive particles are hard abrasive particles or chemically active abrasive particles. The main function of the polymer colloid and dispersant is to maintain the stability of the abrasive particle distribution. The magnetic abrasive particles control the pressure between the processed abrasive particles and the parts under the action of an external magnetic field. The relative movement of the parts and the polishing fluid achieves the purpose of efficiently polishing optical glass parts.
与现有技术相比,本发明的有益效果主要表现为:属于流体抛光方法,适用于加工曲面零件;加工磨粒通过磁场柔性把持,有利于减少加工损伤层;抛光过程分成粗加工和加工,并采用不同加工磨粒,可有效提高加工效率;抛光液易于制备,抛光装置可方便应用于数控机床,可显著降低加工成本。Compared with the prior art, the beneficial effects of the invention are mainly as follows: it belongs to a fluid polishing method, which is suitable for processing curved surface parts; the processing abrasive particles are flexibly held by a magnetic field, which is beneficial to reduce the processing damage layer; the polishing process is divided into rough processing and processing, Different processing abrasive grains are used, which can effectively improve processing efficiency; the polishing liquid is easy to prepare, and the polishing device can be easily applied to CNC machine tools, which can significantly reduce processing costs.
附图说明Description of drawings
图1为本发明磁性磨粒流抛光装置的结构示意图;Fig. 1 is the structural representation of the magnetic abrasive grain flow polishing device of the present invention;
图2为本发明抛光装置处于工作状态时的磨粒流状态的示意图。FIG. 2 is a schematic diagram of the flow state of abrasive grains when the polishing apparatus of the present invention is in a working state.
具体实施方式Detailed ways
下面结合附图对本发明的方案做进一步说明。The solution of the present invention will be further described below in conjunction with the accompanying drawings.
参照图1和图2,一种基于磁性磨粒流的光学玻璃抛光方法,在聚合物胶体2中加入磁性磨粒3和加工磨粒4,提高抛光效率并降低加工区域局部温度,再加入分散剂提高磨粒的沉降稳定性,制备具有高浓度磁性磨粒的抛光液;其中,磁性磨粒占抛光液的质量分数为75%~95%,聚合物胶体的质量分数为10%~20%,加工磨粒的质量分数为1%~5%,分散剂的质量分数为0.5%~2%。Referring to Figures 1 and 2, a method for polishing optical glass based on magnetic abrasive grain flow, adding magnetic
在抛光过程中,光学玻璃零件1与抛光液5之间做相对运动,采用磁场发生器10给所述抛光液5施加磁场,调节抛光液中磨粒的聚集度,增加零件与磨粒之间的摩擦力,进而实现磨粒对零件的微量去除,达到高效抛光的效果。During the polishing process, the relative movement between the
进一步,所述的磁性磨粒为铁氧体粉末或羟基铁粉,粒径范围为0.05~3μm;所述的聚合物胶体为硅溶胶或铝溶胶;所述的加工磨粒为金刚石、碳化硅、氧化铝、氧化铈、氧化硅、氧化锆、氧化钛的一种或几种磨粒的混合物,粒径范围为0.5~30μm,磨粒的种类、粒度和浓度根据抛光工件的加工质量和效率选取。Further, the magnetic abrasive particles are ferrite powder or hydroxy iron powder, and the particle size range is 0.05-3 μm; the polymer colloid is silica sol or aluminum sol; the processed abrasive particles are diamond, silicon carbide , alumina, cerium oxide, silicon oxide, zirconia, titanium oxide, one or a mixture of several abrasive grains, the particle size range is 0.5 ~ 30μm, the type, particle size and concentration of the abrasive grains are based on the processing quality and efficiency of the polished workpiece Select.
再进一步,在所述抛光液中,可以加入分散剂以防止磁性磨粒和加工磨粒的沉降和凝聚。所述的分散剂为油酸、聚乙二醇、六偏磷酸钠、焦磷酸钠、聚乙烯醇的一种或几种混合物,分散剂的种类和浓度根据加工磨粒和聚合物胶体种类以及加工工件的材料特性选取。Still further, in the polishing liquid, a dispersant may be added to prevent settling and agglomeration of magnetic abrasive grains and processing abrasive grains. The dispersant is one or more mixtures of oleic acid, polyethylene glycol, sodium hexametaphosphate, sodium pyrophosphate, and polyvinyl alcohol. Selection of material properties of the workpiece to be machined.
一种基于磁性磨粒流的光学玻璃抛光装置,包括用于盛放抛光液5的抛光槽、磁场发生器10和用于固定零件的夹具6,所述磁场发生器10安装在所述抛光槽的周围,所述夹具6位于所述抛光槽上方。An optical glass polishing device based on magnetic abrasive flow, comprising a polishing tank for holding polishing
所述抛光槽包括粗加工抛光槽9和精加工抛光槽11,所述粗加工抛光槽9中加工磨粒为硬度和粒度较大的磨粒,所述精加工抛光槽11中抛光磨粒为硬度和粒度较小的磨粒,抛光过程中,零件1首先浸入粗加工抛光槽9加工,然后浸入精加工抛光槽11加工。The polishing groove includes a rough
所述磁场发生器10为螺旋结构的电磁激励线圈,采用线圈螺旋缠绕抛光槽,当线圈通电后,在抛光槽内产生近似平行于主轴8的磁场13。The
本发明所述的一种基于磁性磨粒流的光学玻璃抛光方法,可实现光学玻璃回转体零件的高效低成本抛光。The optical glass polishing method based on the magnetic abrasive grain flow described in the present invention can realize the high-efficiency and low-cost polishing of the optical glass revolving body parts.
将氧化铁粉和1000#的碳化硅磨粒加入硅溶胶,分散剂为聚乙二醇,充分搅拌后,加入粗加工抛光槽9;将氧化铁粉和1~3μm氧化铈磨粒加入硅溶胶,分散剂为聚乙二醇,充分搅拌后,加入精加工抛光槽11。加工对象为K9玻璃材质的非球面镜。非球面镜1通过夹具6固定于主轴8后,启动主轴电机7驱动主轴8转动,然后给磁场发射器10通电,在抛光槽内产生从下向上的磁场13,使抛光液中的磁性磨粒聚集在抛光槽上层,在聚合物胶体中形成包裹加工磨粒的粒子团,同时有效避免抛光液中磨粒的沉降,参照图2。粗加工完成后,磁场发生器10断电,主轴8抬起;工作台12将精加工抛光槽11移至主轴8下方,然后重复上述粗加工的加工流程。精加工抛光槽中,由于硅溶胶分子式为SiO2·nH2O,其中含有的大量水分子可与硅酸盐玻璃网络发生水化反应:Si-O-Si(glass)+H2O→2SiOH,在玻璃表面形成软质薄膜,方便加工磨粒去除;且氧化铈为化学活性磨粒,可与玻璃表面离子交换形成Si-O-Ce桥键,提高磨粒和零件表面的摩擦力,完成光学玻璃高效低损伤抛光。Add iron oxide powder and 1000# silicon carbide abrasive grains to the silica sol, and the dispersant is polyethylene glycol. After fully stirring, add the rough
本发明使用的加工磨粒为硬质磨粒或化学活性磨粒,加工介质为流体,方便贴合曲面零件表面。在磁场的作用下,抛光液在加工对象表面形成柔性磨具,通过零件与抛光液的相对运动,实现曲面零件表面材料的柔性去除。The processed abrasive grains used in the present invention are hard abrasive grains or chemically active abrasive grains, and the processing medium is fluid, which is convenient for fitting the surfaces of curved parts. Under the action of the magnetic field, the polishing liquid forms a flexible abrasive tool on the surface of the processing object, and the surface material of the curved surface parts is flexibly removed through the relative movement of the parts and the polishing liquid.
以上所述仅为本发明的具体实施例,本发明的技术特征并不局限于此,任何本领域的技术人员在本发明的范围之内,所做的简单变化或修饰皆涵盖在本发明的专利范围之中。The above are only specific embodiments of the present invention, and the technical features of the present invention are not limited thereto. Any simple changes or modifications made by those skilled in the art within the scope of the present invention are all covered by the present invention. within the scope of the patent.
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