CN112536649A - Optical glass polishing method and device based on magnetic abrasive particle flow - Google Patents
Optical glass polishing method and device based on magnetic abrasive particle flow Download PDFInfo
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- CN112536649A CN112536649A CN202011517871.2A CN202011517871A CN112536649A CN 112536649 A CN112536649 A CN 112536649A CN 202011517871 A CN202011517871 A CN 202011517871A CN 112536649 A CN112536649 A CN 112536649A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/005—Blocking means, chucks or the like; Alignment devices
- B24B13/0055—Positioning of lenses; Marking of lenses
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses an optical glass polishing method and device based on magnetic abrasive particle flow, wherein magnetic abrasive particles, processing abrasive particles and a dispersing agent are added into a polymer colloid to prepare a polishing solution with high-concentration magnetic abrasive particles; wherein, the magnetic abrasive particles account for 75-95% of the polishing solution by mass, the polymer colloid accounts for 10-20% by mass, the processing abrasive particles account for 1-5% by mass, and the dispersing agent accounts for 0.5-2% by mass. And in the polishing process, the polishing device is used for controlling the optical glass part and the polishing solution to move relatively, the magnetic field generator is used for applying a magnetic field to the polishing solution, the aggregation degree of abrasive particles in the polishing solution is adjusted, the friction force between the part and the abrasive particles is increased, and then the part is removed in a micro-scale manner by the abrasive particles, so that the effect of efficient polishing is achieved. The invention can realize the high-efficiency low-damage polishing of the curved optical glass part with low cost.
Description
Technical Field
The invention belongs to the field of polishing of optical glass, and particularly relates to a magnetic abrasive flow-based optical glass polishing method and device.
Background
Optical glass is widely applied to the fields of aerospace, military equipment, nuclear power energy, medical treatment, electronic equipment and the like. The optical glass parts mainly comprise an optical positioning lens and a light path adjusting lens. Different application occasions have different quality requirements on the surface of the optical glass, for example, optical elements in a space telescope need to have high mechanical strength and shape retention; the optical elements of the aiming system of the weaponry must have high accuracy and mobility; an optical element of the nuclear fusion high-energy laser system needs to have a high laser damage threshold; optical components in various optical measurement instruments must have integrity and portability.
In order to meet the performance requirements of the application fields, the working surface of the optical glass part needs to be ultra-smooth and has little/no surface layer damage, and the polishing process of the optical glass part has strict requirements. At present, a mirror surface with very high precision can be manufactured by adopting a traditional polishing method aiming at a plane type mirror surface; for curved optical glass elements, such as spherical and aspherical mirrors, computer-aided flexible polishing techniques such as small mechanical tools (CCOS), Magnetorheological (MRF) and ion beam shaping (IBF) are commonly used. The CCOS technology is based on a numerical control system, can realize the polishing of large-size workpieces by using small tools, and has the defects of low processing efficiency and edge effect; the MRF processing medium is Bingham fluid with magnetic particles as main components, and can realize material shearing removal in the high-speed movement process, and the MRF has the defects of small processing spot, certain limitation on the size and curvature of a workpiece, and the magnetorheological fluid has the defect of sedimentation to limit the processing efficiency; the IBF realizes the removal of the surface layer material by bombarding the surface of the material by ion beams, and has the advantages of no subsurface damage layer on the processed surface, no edge effect, harsh processing conditions (vacuum environment) and low processing efficiency. The common disadvantages of the above polishing methods also include the complexity of the process and the high equipment costs.
The magnetic abrasive particle polishing methods disclosed in application numbers 2006201055708 and 2015108115101 both use dry magnetic abrasive particles as a polishing medium, and the processing mode is dry friction and abrasion, so that the method is easy to generate local energy aggregation on the processing surface to aggravate the damage of the surface layer of a part; in addition, since the processing medium is dry magnetic abrasive powder, even in the non-polarized state of the abrasive, the workpiece is difficult to enter the polishing medium conveniently because the abrasive has a high degree of aggregation.
In summary, it is difficult to achieve high efficiency, high surface quality and low cost polishing of optical glass parts with the existing polishing technology. Therefore, it is necessary to develop a polishing method which has high processing efficiency, low implementation cost, and can ensure processing quality.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides an optical glass polishing method and device based on high-concentration magnetic abrasive fluid by combining the advantages of magnetorheological fluid and a dry type magnetic abrasive particle polishing method.
The technical scheme adopted by the invention for solving the technical problem is as follows:
an optical glass polishing method based on magnetic abrasive particle flow is characterized in that magnetic abrasive particles, processing abrasive particles and a dispersing agent are added into polymer colloid to prepare polishing solution with high-concentration magnetic abrasive particles; wherein, the magnetic abrasive particles account for 75-95% of the polishing solution by mass, the polymer colloid accounts for 10-20% by mass, the processing abrasive particles account for 1-5% by mass, and the dispersing agent accounts for 0.5-2% by mass.
In the polishing process, the optical glass part and the polishing solution move relatively, a magnetic field generator is adopted to apply a magnetic field to the polishing solution, the aggregation degree of abrasive particles in the polishing solution is adjusted, the friction force between the part and the abrasive particles is increased, the abrasive particles are removed slightly from the part, and the efficient polishing effect is achieved.
Further, the magnetic abrasive particles are ferrite powder or hydroxyl iron powder, and the particle size range is 0.05-3 mu m; the polymer colloid is silica sol or aluminum sol; the processing abrasive particles are one or a mixture of several of diamond, silicon carbide, aluminum oxide, cerium oxide, silicon oxide, zirconium oxide and titanium oxide, the particle size range is 0.5-30 mu m, and the types, the particle sizes and the concentrations of the abrasive particles are selected according to the processing quality and the processing efficiency of the polishing workpiece.
Still further, in the polishing liquid, a dispersant may be added to prevent sedimentation and agglomeration of the magnetic abrasive particles and the processing abrasive particles. The dispersing agent is one or a mixture of more of oleic acid, polyethylene glycol, sodium hexametaphosphate, sodium pyrophosphate and polyvinyl alcohol, and the type and concentration of the dispersing agent are selected according to the types of the processed abrasive particles and the polymer colloid and the material characteristics of the processed workpiece.
The invention further discloses a device for realizing the polishing method, which comprises a polishing tank for containing polishing liquid, a magnetic field generator and a clamp for fixing parts, wherein the magnetic field generator is arranged around the polishing tank, and the clamp is positioned above the polishing tank.
Further, the polishing tank comprises a rough machining polishing tank and a finish machining polishing tank, machining abrasive particles of polishing liquid in the rough machining polishing tank are abrasive particles with larger hardness and granularity, machining abrasive particles of polishing liquid in the finish machining polishing tank are abrasive particles with smaller hardness and granularity, and in the polishing process, a part is firstly immersed into the rough machining polishing tank for machining and then is immersed into the finish machining polishing tank for machining.
Further, the magnetic field generator is an electromagnetic excitation coil with a spiral structure.
Still further, the clamp is connected with a driving mechanism for driving the clamp to rotate and move up, down, left, right and back.
The conception of the invention is as follows: the magnetic abrasive flow polishing solution containing the processing abrasive particles is developed, and the high-efficiency precise polishing of the optical glass is realized under the action of a magnetic field. The processing abrasive particles are hard abrasive particles or chemically active abrasive particles, the polymer colloid and the dispersing agent mainly serve for keeping the distribution stability of the abrasive particles, the magnetic abrasive particles control the pressure of the processing abrasive particles and the parts under the action of an external magnetic field, and the purpose of efficiently polishing the optical glass parts is achieved by matching the relative motion of the parts and polishing fluid.
Compared with the prior art, the invention has the following beneficial effects: belongs to a fluid polishing method and is suitable for processing curved surface parts; the processing abrasive particles are flexibly held through a magnetic field, so that the processing damage layer is reduced; the polishing process is divided into rough machining and machining, and different machining abrasive particles are adopted, so that the machining efficiency can be effectively improved; the polishing solution is easy to prepare, and the polishing device can be conveniently applied to numerical control machines and can obviously reduce the processing cost.
Drawings
FIG. 1 is a schematic structural view of a magnetic abrasive flow polishing apparatus according to the present invention;
FIG. 2 is a schematic view of the abrasive flow state of the polishing apparatus of the present invention in operation.
Detailed Description
The scheme of the invention is further explained in the following by combining the attached drawings.
Referring to fig. 1 and 2, in the optical glass polishing method based on the magnetic abrasive flow, magnetic abrasive particles 3 and processing abrasive particles 4 are added into a polymer colloid 2, so that the polishing efficiency is improved, the local temperature of a processing area is reduced, a dispersing agent is added to improve the sedimentation stability of the abrasive particles, and a polishing solution with high-concentration magnetic abrasive particles is prepared; wherein, the magnetic abrasive particles account for 75-95% of the polishing solution by mass, the polymer colloid accounts for 10-20% by mass, the processing abrasive particles account for 1-5% by mass, and the dispersing agent accounts for 0.5-2% by mass.
In the polishing process, the optical glass part 1 and the polishing solution 5 move relatively, a magnetic field is applied to the polishing solution 5 by the magnetic field generator 10, the aggregation degree of abrasive particles in the polishing solution is adjusted, the friction force between the part and the abrasive particles is increased, the part is removed slightly by the abrasive particles, and the efficient polishing effect is achieved.
Further, the magnetic abrasive particles are ferrite powder or hydroxyl iron powder, and the particle size range is 0.05-3 mu m; the polymer colloid is silica sol or aluminum sol; the processing abrasive particles are one or a mixture of several of diamond, silicon carbide, aluminum oxide, cerium oxide, silicon oxide, zirconium oxide and titanium oxide, the particle size range is 0.5-30 mu m, and the types, the particle sizes and the concentrations of the abrasive particles are selected according to the processing quality and the processing efficiency of the polishing workpiece.
Still further, in the polishing liquid, a dispersant may be added to prevent sedimentation and agglomeration of the magnetic abrasive particles and the processing abrasive particles. The dispersing agent is one or a mixture of more of oleic acid, polyethylene glycol, sodium hexametaphosphate, sodium pyrophosphate and polyvinyl alcohol, and the type and concentration of the dispersing agent are selected according to the types of the processed abrasive particles and the polymer colloid and the material characteristics of the processed workpiece.
An optical glass polishing device based on magnetic abrasive particle flow comprises a polishing tank for containing polishing liquid 5, a magnetic field generator 10 and a clamp 6 for fixing parts, wherein the magnetic field generator 10 is arranged around the polishing tank, and the clamp 6 is positioned above the polishing tank.
The polishing grooves comprise rough machining polishing grooves 9 and finish machining polishing grooves 11, machining abrasive particles in the rough machining polishing grooves 9 are abrasive particles with large hardness and large granularity, polishing abrasive particles in the finish machining polishing grooves 11 are abrasive particles with small hardness and small granularity, and in the polishing process, the part 1 is firstly immersed into the rough machining polishing grooves 9 for machining and then immersed into the finish machining polishing grooves 11 for machining.
The magnetic field generator 10 is an electromagnetic exciting coil with a spiral structure, the coil is spirally wound around the polishing groove, and when the coil is electrified, a magnetic field 13 approximately parallel to the spindle 8 is generated in the polishing groove.
The optical glass polishing method based on the magnetic abrasive particle flow can realize the high-efficiency and low-cost polishing of the optical glass revolving body part.
Adding iron oxide powder and 1000# silicon carbide abrasive particles into silica sol, wherein a dispersing agent is polyethylene glycol, fully stirring, and adding into a rough machining polishing tank 9; adding iron oxide powder and cerium oxide abrasive particles with the particle size of 1-3 mu m into silica sol, fully stirring polyethylene glycol serving as a dispersing agent, and adding into a finish machining polishing tank 11. The processing object is an aspherical mirror made of K9 glass. Is notAfter the spherical mirror 1 is fixed on a main shaft 8 through a clamp 6, a main shaft motor 7 is started to drive the main shaft 8 to rotate, then a magnetic field emitter 10 is electrified, a magnetic field 13 from bottom to top is generated in a polishing groove, so that magnetic abrasive particles in polishing liquid are gathered on the upper layer of the polishing groove, particle groups wrapping the processed abrasive particles are formed in polymer colloid, and meanwhile, the settlement of the abrasive particles in the polishing liquid is effectively avoided, and the reference is made to fig. 2. After the rough machining is finished, the magnetic field generator 10 is powered off, and the main shaft 8 is lifted; the table 12 moves the finish polishing tank 11 to below the spindle 8, and then the above-described rough machining process is repeated. In the finish-machining polishing tank, the molecular formula of the silica sol is SiO2·nH2O, a large number of water molecules contained in the silicate glass network can be subjected to hydration reaction with the silicate glass network: Si-O-Si(glass)+H2O → 2SiOH, a soft film is formed on the surface of the glass, and the removal of the processing abrasive particles is convenient; and the cerium oxide is chemically active abrasive particles and can form Si-O-Ce bridge bonds by ion exchange with the surface of the glass, so that the friction force between the abrasive particles and the surface of a part is improved, and the high-efficiency and low-damage polishing of the optical glass is completed.
The processing abrasive particles used by the invention are hard abrasive particles or chemically active abrasive particles, and the processing medium is fluid, so that the processing medium is convenient to attach to the surface of a curved part. Under the action of a magnetic field, the polishing solution forms a flexible grinding tool on the surface of the processing object, and the flexible removal of the surface material of the curved surface part is realized through the relative motion of the part and the polishing solution.
The above description is only an embodiment of the present invention, and the technical features of the present invention are not limited thereto, and any simple changes or modifications within the scope of the present invention by those skilled in the art are covered by the claims of the present invention.
Claims (7)
1. An optical glass polishing method based on magnetic abrasive particle flow is characterized in that: adding magnetic abrasive particles, processing abrasive particles and a dispersing agent into the polymer colloid to prepare a polishing solution with high-concentration magnetic abrasive particles; wherein, the magnetic abrasive particles account for 75-95% of the polishing solution by mass, the polymer colloid accounts for 10-20% by mass, the processing abrasive particles account for 1-5% by mass, and the dispersing agent accounts for 0.5-2% by mass.
In the polishing process, the optical glass part and the polishing solution move relatively, a magnetic field generator is adopted to apply a magnetic field to the polishing solution, the aggregation degree of abrasive particles in the polishing solution is adjusted, the friction force between the part and the abrasive particles is increased, the abrasive particles are removed slightly from the part, and the efficient polishing effect is achieved.
2. The method of claim 1, wherein the method comprises: the magnetic abrasive particles are ferrite powder or hydroxyl iron powder, and the particle size range is 0.05-3 mu m; the polymer colloid is silica sol or aluminum sol; the processing abrasive particles are one or a mixture of several of diamond, silicon carbide, aluminum oxide, cerium oxide, silicon oxide, zirconium oxide and titanium oxide, the particle size range is 0.5-30 mu m, and the types, the particle sizes and the concentrations of the abrasive particles are selected according to the processing quality and the processing efficiency of the polishing workpiece.
3. The method of claim 1, wherein the method comprises: in the polishing liquid, a dispersant may be added to prevent settling and agglomeration of the magnetic abrasive particles and the processing abrasive particles. The dispersing agent is one or a mixture of more of oleic acid, polyethylene glycol, sodium hexametaphosphate, sodium pyrophosphate and polyvinyl alcohol, and the type and concentration of the dispersing agent are selected according to the types of the processed abrasive particles and the polymer colloid and the material characteristics of the processed workpiece.
4. An optical glass polishing device based on magnetic abrasive particle flow is characterized in that: the polishing device comprises a polishing groove for containing polishing liquid, a magnetic field generator and a clamp for fixing parts, wherein the magnetic field generator is arranged around the polishing groove, and the clamp is positioned above the polishing groove.
5. An optical glass polishing device based on a magnetic abrasive flow according to claim 4, characterized in that: the polishing grooves comprise rough machining polishing grooves and finish machining polishing grooves, machining abrasive particles of polishing liquid in the rough machining polishing grooves are abrasive particles with larger hardness and granularity, and machining abrasive particles of polishing liquid in the finish machining polishing grooves are abrasive particles with smaller hardness and granularity.
6. An optical glass polishing device based on a magnetic abrasive flow according to claim 4, characterized in that: the magnetic field generator is an electromagnetic exciting coil with a spiral structure.
7. An optical glass polishing device based on a magnetic abrasive flow according to claim 4, characterized in that: the clamp is connected with a driving mechanism for driving the clamp to rotate and move up, down, left, right and back.
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| CN202011517871.2A CN112536649A (en) | 2020-12-21 | 2020-12-21 | Optical glass polishing method and device based on magnetic abrasive particle flow |
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| CN202011517871.2A CN112536649A (en) | 2020-12-21 | 2020-12-21 | Optical glass polishing method and device based on magnetic abrasive particle flow |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113560992A (en) * | 2021-09-24 | 2021-10-29 | 南通腾峰光学仪器有限公司 | Burnishing and polishing device of lens for gun sight |
| CN114378718A (en) * | 2022-01-27 | 2022-04-22 | 大连理工大学 | non-Newtonian fluid dispersing device and method |
| CN115256208A (en) * | 2022-08-09 | 2022-11-01 | 大连理工大学 | Cobalt-chromium-molybdenum alloy denture polishing device and polishing process thereof |
| CN115305012A (en) * | 2022-09-21 | 2022-11-08 | 锦西化工研究院有限公司 | Polishing solution for aviation organic glass and preparation method thereof |
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| CN115305012A (en) * | 2022-09-21 | 2022-11-08 | 锦西化工研究院有限公司 | Polishing solution for aviation organic glass and preparation method thereof |
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