EP0660174A2 - Silver halide photographic light-sensitive material - Google Patents

Silver halide photographic light-sensitive material Download PDF

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Publication number
EP0660174A2
EP0660174A2 EP94119874A EP94119874A EP0660174A2 EP 0660174 A2 EP0660174 A2 EP 0660174A2 EP 94119874 A EP94119874 A EP 94119874A EP 94119874 A EP94119874 A EP 94119874A EP 0660174 A2 EP0660174 A2 EP 0660174A2
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EP
European Patent Office
Prior art keywords
group
hydrogen atom
sensitive material
light
metal oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP94119874A
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German (de)
English (en)
French (fr)
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EP0660174A3 (enExample
Inventor
Masaaki Taguchi
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Konica Minolta Inc
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Konica Minolta Inc
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Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of EP0660174A2 publication Critical patent/EP0660174A2/en
Publication of EP0660174A3 publication Critical patent/EP0660174A3/xx
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/853—Inorganic compounds, e.g. metals

Definitions

  • the present invention relates to a silver halide photosensitive material, and more particularly relates to an antistatic silver halide photosensitive material capable of being very quickly processed.
  • silver halide photographic light-sensitive material comprises an insulating plastic film support, on which there are provided a light-sensitive emulsion layer, antihalation layer, protective layer, intermediate layer, foundation layer and back coating layer. Therefore, silver halide light-sensitive material is easily charged with static electricity. Especially when the temperature is low, for example, in the winter, silver halide light-sensitive material is charged with static electricity while it is handled, so that problems may be encountered. For example, due to the progress of manufacturing technique of silver halide photosensitive material, the speed of coating and that of cutting are increased in the manufacturing process recently. Therefore, frictional electrification occurs. Further, the speed of film conveyance is remarkably increased in the photographing and processing of films. For this reason, problems are encountered when the films are electrostatically charged.
  • antistatic agents are applied to silver halide photosensitive material.
  • a surface active agent of polyoxyethylene is generally used for the antistatic agent.
  • the surface active agent is dissolved in the processing solution in the process of development and reacts with other substances in the solution, so that trubidness, sludge and streaks of development are caused.
  • Japanese Patent Examined Publication Nos. 49894/1985 and 16057/1986 disclose the following technique:
  • the photographic light-sensitive material of the invention comprises a support having thereon a silver halide emulsion layer and optionally a hydrophilic colloid layer, at least one of said emulsion layer and said hydrophilic colloid layer contains a water-soluble polymer which comprises repeating unit represented by formula 1 in an amount of 10 to 100 mol %, and an electric conductive layer being provided at a position between the support and the silver halide emulsion layer and comprising a binder and fine particles of an electric conductive crystalline metal oxide of ZnO, Ti0 2 , Sn0 2 , AI 2 0a, In 2 0a, Si0 2 , MgO, BaO, M 0 0 3 , V 2 0 5 or a mixture thereof, each of which has a volumetric resistivity of not higher than 10 7 Qcm; wherein R 1 and R 2 are each independently a hydrogen atom, an alkyl group, a halogen atom or a -CH 2 COOM 1 , in which M
  • the light-sensitive material is adapted to a rapid processing in which whole processes are carried out within 30 seconds in total.
  • Crystalline metal oxide particles are used for the conductive metal oxide in the present invention.
  • Metal oxide particles containing oxygen defects are preferably used, and also metal oxide particles containing a small amount of another kind of atoms forming an electron donor with respect to the used metal oxide are preferably used because the electric conductivity of such metal oxide is generally high. Especially, the latter is preferably used because the occurrence of fog can be avoided in a silver halide emulsion.
  • the metal oxide are: ZnO, Ti0 2 , Sn0 2 , A1 2 0 3 , In 2 0 3 , Si0 2 , MgO, BaO, MoOs and V 2 0 s , and their mixtures.
  • Zn0 2 , Ti0 2 and Sn0 2 are preferably used.
  • Effective examples of a case in which another kind of atoms are contained, are addition of AI or In to ZnO; addition of Sb, Nb or halogen elements to Sn0 2 ; and addition of Nb or Ta to Ti0 2 .
  • An amount of addition is preferably in a range from 0.01 to 30 mol%, and more preferably in a range from 0.1 to 10 mol%.
  • the metallic oxide particles usable for the present invention are electrically conductive, and the volumetric resistivity there of is not higher than 10 7 Qcm, more preferably not lot higher than 10 5 Qcm.
  • the fine particles of the electrically conductive crystalline metal oxide or metal oxide mixture can be prepared by the methods, for example, described in JP I.O.P. Publication 143430/1981. Concretely, they can easily prepared in the following manner: (1) particles of the metal oxide prepared by baking is subjected to heat treatment in the presence of another kind of atom which raises electric conductivity of the metal oxide powder, (2) particles of the metal oxide is prepared by baking in the presence of another kind of atom which raises electric conductivity of the metal oxide powder, or (3) at the time of baking the metal oxide to make fine particles thereof, oxygen concentration in the atmosphere is lowered for introducing oxygen vacancies into the metal powder.
  • the size of particles is preferably 0.01 to 0.7 ⁇ m, and more preferably 0.02 to 0.5 am.
  • the conductive metal oxides usable in the present invention are dispersed in the binder and provided between the support and the silver halide emulsion layer.
  • the volumetric content of the conductive metal oxide particles in the layer is high.
  • the volumetric content of the conductive metal oxide is preferably in a range from 5 to 95% in value.
  • the conductive metal oxide is used in an amount of 0.05 to 10 g/m 2 , more preferably, 0.1 to 5 g/m 2 , of light-sensitive material. Due to the foregoing, a competent antistatic property can be provided.
  • the conductive layer containing the metal oxide particles is provided as an under-coat layer at a position between the support and the silver halide emulsion layer.
  • the conductive under-coat layer may be provided in the following manner:
  • latex polymers are latex of copolymer containing polyvinyl chloride, copolymer containing vinylidene chloride, glycidyl acrylate, copolymer containing glycidyl methacrylate, copolymer containing alkylester of acrylic acid, and copolymer containing butadiene.
  • the latex is described in JP O.P.I. Publication Nos. 135526/1976, 43911/1975, 114120/1976, 121323/1976 and 112677/1977 and Japanese Patent Publication No. 14434/1976.
  • soluble polyester are discloses in JP O.P.I. Publication No. 1612/1979, and Japanese Patent Publication Nos. 2529/1969 and 10432/1960.
  • a matting agent may be added into the protective layer.
  • the matting agent are a homopolymer of polymethyl mathacrylate described in U.S.P. Nos. 2,992,101, 2,701,254, 4,142,894 and 4,396,706; a copolymer of methyl methacrylate and methacrylic acid; and particles of starch and silica.
  • the surface active agent may be used together.
  • a lubricant may be added into the surface protective layer.
  • Usable examples of the lubricant are silicon compounds described in U.S.P. Nos. 3,489,576 and 4,047,958, colloidal silica described in Japanese Patent Publication No. 23139/1981, paraffin wax, higher fatty acid ester and starch.
  • a plasticizer may be added into the hydrophile colloidal layer.
  • the plasticizer are polyol of trimethylol-propane, pentanediol, butanediol, ethyleneglycol and glycerin.
  • the support used for the present invention are a transparent or opaque synthetic resin film of polyethylene terephthalate, cellulose acetate, polycarbonate, polystyrene and polypropylene and a paper support laminated with polyethylene resin.
  • the thickness of the support is preferably 50 to 200 am, and more preferably 100 to 180 am.
  • a water-soluble polymer is added into at least one an emulsion layer or a hydrophilic colloid layer such as a surface protective layer, back-coating layer, intermediate layer, under-coating layer and anti-halation layer other than the layer in which the conductive metal oxide particles are added to make it to a electric conductive layer.
  • a hydrophilic colloid layer such as a surface protective layer, back-coating layer, intermediate layer, under-coating layer and anti-halation layer other than the layer in which the conductive metal oxide particles are added to make it to a electric conductive layer.
  • Water solube polymers usable in the invention preferably have a solubility in water of about 0.05 g or more per 100 g of water at the temperature of 20 °C. More preferably, the solubility is not less than 0.1 g per 100 g of water at 20 ° C. It is preferable that the water soluble polymers each has a high solubility with respect to the developing and fixing solutions.
  • the preferable solubility of the water soluble polymer is not less than 0.05 g per 100 g of the developing solution.
  • the solubility in the developing solution is, more preferably, not less than 0.5 g, and further preferably, not less than 1 g, per 100 g of the developing solution.
  • Natural or synthetic water soluble polymers may be used. Synthetic water soluble polymers may be used in the invention may have nonionic groups, anionic groups, or both nonionic and anionic groups in the molecular structure.
  • examples of the nonionic group are an ether group, ethylene oxide group, and hydroxy group.
  • examples of the anionic group are a sulfonic acid group or its salt, carboxylic acid group or its salt, and phosphoric acid group and its salt.
  • a homopolymer or copolymer may be used as the synthetic water soluble polymer. As long as the polymer itself is water-soluble, the copolymer partially derived from a hydrophobic monomer may be used.
  • the composition of the copolymer is restricted by a position where it is added and an amount of copolymer to be added. For example, when the copolymer is added to an emulsion layer and the amount of which is large, the composition of the copolymer is determined so that the effect of addition is not deteriorated.
  • Natural water soluble polymers usable in the invention may have nonionic groups, anionic groups, or both nonionic and anionic groups in the molecular structure.
  • Preferable water soluble polymers in the invention are ones containing a repeating unit represented by the following formula 1. Especially, the following repeating unit may be contained in the polymer by 10 to 100 mol%.
  • R 1 and R 2 each independently a hydrogen atom, an alkyl group, a halogen atom, or -CH2COOM"
  • M 1 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
  • the alkyl group is preferably one having 1 to 4 carbon atoms which may have a substituent, for example, a substituted or unsubstituted methyl, ethyl, propyl or buthyl group.
  • L represnts -CONH-, -NHCO-, -COO, -OCO, -CO-, -S0 2 -, -NHS0 2 -, -S0 2 NH- or -O-.
  • J is an alkylene group, prepeferably an alkylene group having 1 to 10 carbon atoms, including one having a substituent such as a substituted or unsubstituted methylen, ethylene, propylene, trimethylene, butylene, and hexylene group; an arylene group including substituted one such as a substituted or unsubstituted phenylene group; or a substituted or unsubstituted aralkylene group such as
  • n is an integer from 0 to 4.
  • Q is a hydrogen atom, -R 3 , -OM, -NH 2 , -S03 M,
  • M is a hydrogen atom or a cation group
  • R 9 is an alkyl group having 1 to 4 carbon atoms such as a methyl, ethyl, propyl or butyl group
  • R 3 , R 4 , R 5 , R 6 , R 7 , R 8 and R 9 are each independently an alkyl group having 1 to 20 carbon atoms such as a substituted or unsubstituted methyl, ethyl, propyl, butyl, hexyl, decyl or hexadecyl group, an alkenyl group such as a substituted or unsubstituted vinyl or allyl group, a phenyl group such as a phenyl, methoxyphenyl, chlorophenyl group or those each further having a substituent; an aralkyl group such as a substituted or unsubstituted benzyl group; X is an anion; and p and q are each al
  • Y represents a hydrogen atom or -(L-)p-(J-)q-Q.
  • the repeating unit represented by formula 1 may be copolymerized with ethylenic unsaturated monomer to from the synthetic water soluble polymer.
  • copolymerizable ethylenic monomer includes styrene; alkylstyrene and hydroxylalkylstyrene in which the alkyl group preferably has 1 to 4 carbon atoms, for example, methyl, ethyl and butyl are preferably; vinylbenzenesulfonic acid and its slat; a-methyl styrene; 4-vinylpiridine; N-vinylpyrolidone; monoethylenic unsaturated ester of fatty acid such as, vinylacetate and vinylpropionate; ethylenic unsaturated monocarboxylic or dicarboxylic acid and its salt, for example, acrylic acid and methacrylic acid; maleic acid anhydride; ethylenic unsaturated monocarboxylic acid or ester of di
  • Mn number average molecular weight
  • the molecular weight is preferably 1,000 to 100,000, and more preferably 2,000 to 50,000.
  • Examples of usable natural water soluble polymers are described in "Technical Data of Water Soluble Polymer and Water Dispersion Resin", 1981, published by Business Development Center Publishing Department.
  • Usable examples of the natural water soluble polymers are lignin, starch, pullulan, cellulose, alginic acid, dextran, dextrin, guar gum, gum arabic, pectin, casein, agar, xanthan gum, cyclodextrin, locust bean gum, tragacanth gum, carrageenan, glycogen, laminaran, lichenin, nigeran, and their derivatives.
  • Preferable derivatives of the natural water soluble polymers include ones each having a sulfo group, a carboxyl group, a phosphoric acid and its salt group, a sulfoalkyl group, carboxylalkylene group, an alkylphsphoric group and its salt, an polyoxalkylene group such as polyoxyethylene, polyoxyglyceline, polyoxypropylene group and an alkyl group such as methyl, ethyl and benzyl group.
  • a glucose copolymer and its derivatives are preferably used.
  • starch, glycogen, cellulose, lichenin, dextran and nigeran are preferably used.
  • Dextran and its derivatives are more preferably used.
  • Dextran is a polymer of D-glucose of a-1,6 bond.
  • dextran is obtained when dextran producing bacteria are cultured in the presence of sugars.
  • dextran sucrase separated from the culture medium of dextran producing bacteria such as leuconostoc and mesenteriodes is reacted with sugars, dextran can be obtained.
  • the obtained native dextran is subjected to the partially decomposing polymerization in which acid or alkali enzyme is used, the molecular weight is lowered to a predetermined value, so that the dextran of which the limiting viscosity number is in a range from 0.03 to 2.5 can be provided.
  • modified dextran examples include dextran sulfate, carboxyalkyldextran, and hydroxialkyldextran.
  • the molecular weight of the natural water soluble polymer is preferably 100 to 100,000, and more preferably 2,000 to 50,000.
  • an adding amount of synthetic or natural the water soluble polymer is preferably 0.01 to 3.0 g/m 2 , and more preferably 0.05 to 1.0 g/m 2 .
  • Silver halide photosensitive material according to the invention can be applied for any types of photographic material such as medial radioactive ray radigraphic material, laser beam recording photographic material, directly positive type photographic material, photographic material for graphic arts, color negative photographic material, reversal color photographic material, color photographic paper thermal development photographic material, and diffusion transfer type photographic material.
  • photographic material such as medial radioactive ray radigraphic material, laser beam recording photographic material, directly positive type photographic material, photographic material for graphic arts, color negative photographic material, reversal color photographic material, color photographic paper thermal development photographic material, and diffusion transfer type photographic material.
  • Silver halide emulsion usable in the silver halide photographic material of the present invention includes silver chloride, silver bromide, silver chlorobromide, silver iodobromide and silver chloroiodobromide emulsions having arbitrary halide composition.
  • the composition of halide may be uniform in the particles, or silver iodide may be partially localized. It is preferable that silver iodide is locatized at the center portion of the silver halide grain.
  • JP O.P.I. No. 6643/1986 can be referred.
  • a tabular silver iodobromide emulsion having a high aspect ratio can be prepared by the followings.
  • An aqueous solution of silver nitrate or aqueous solution of silver nitrate and that of halide are simultaneously added to an aqueous gelatine solution, maintaining the pBr value to be not more than 2, to form seed crystals. Then the seed crystals are made to grow by the double jet method.
  • Various photographic additives may be added to the silver halide emulsion applied to the invention, at a time during physical ripening or before and after chemical ripening.
  • Examples of well known additives are described in Research Disclosure (RD), the volumes of which are No. 17643 (published in December of 1978), No. 18716 (published in November of 1979) and No. 308119 (published in December of 1989). Types of these compounds and pages of Research Disclosure on which these compounds are described are as follows.
  • a polyethylene terephthalate film is appropriately used for the support.
  • a subbing layer is preferably provided on the surface of the support, and also it is preferable that the surface of the support is subjected to corona discharge or ultraviolet ray irradiation so that the coating layers can be appropriately adhered on the surface.
  • Photographic processing of the photographic material of the invention is preferably carried out in 30 seconds that is a period of time from when a fore end of the photosensitive material to be processed enters a film insertion sensor of the automatic developing apparatus to when the fore end of the photosensitive material reaches a discharge sensor of the automatic developing apparatus.
  • processing may be carried out by the processing solution described on pages 29 to 30 of XX to XXI of the above RD-17643, or pages 1011 to 1012 of XX to XXI of the above RD-308119.
  • This photographic processing may be a monochromatic processing.
  • the processing temperature is commonly in a range from 18 ° C to 50 ° C.
  • hydroxybenzene for example, hydroquinone
  • 3-pyrazolidone for example, 1-phenyl-3-pyrazolidone
  • aminophenol for example, N-methyl-p-aminophenol
  • an alkaline agent, pH buffer, antifogging agent, development accelerator, surface active agent, antifoaming agent, color toning agent, water sofener, dissolution assistant, and thickener may be used in the developer according to necessity.
  • Tiosulfate or tiocyanate is used for the fixing agent.
  • Water soluble aluminum salt such as aluminum sulfate or potash alum may be contained as a hardening agent.
  • Preservatives, pH adjusting agent and water sofener may be contained.
  • a conductive under coat layer of the following composition was coated on both sides of the above subbed support (A), so that the support (B) was prepared.
  • Sn0 2 /Sb used in support (B) had a volumetric resistivity of 3.5 ⁇ cm.
  • Further support (C) was prepared in the same manner as in support (B) except that Sn0 2 /Sb was replaced by Zn0 2 /Al particle having an average sized of 0.6 am, Zn0 2 /Al ratio in mol of 9/1 and a volumetric resistivity of 3 x 10 2 ⁇ cm.
  • a hexagonal tabular seed emulsion was prepared by the following method.
  • solutions B and C After the stop of addition of solutions B and C, the temperature of solution A was raised to 60 ° C spending 60 minutes. Then solutions B and C were added by a double-jet mixing method at a flow rate of 68.5 ml/min for 5 minutes. During this operation, the silver electrode potential of the emulsion was controlled to be + mV using solution D, wherein the silver electrode potential was measured by the silver ion selecting electrode while a saturated silver-silver chloride electrode was used as a comparative electrode.
  • the pH value was adjusted to be 6 by 3% KOH, and immediately desalting and washing were carried out so that seed emulsion Em-0 was obtained.
  • the seed emulsion Em-0 was inspected with an electron microscope and it was confirmed that 90% or more of the total projected area of the silver halide particles was composed of hexagonal tabular particles, the adjacent edge ratio of which was 1.0 to 2.0.
  • the average thickness of the hexagonal tabular particles was 0.07 ⁇ m, and the average diameter, which is a value converted to the diameter of a circle, was 0.5 ⁇ m.
  • Tabular silver iodide emulsion EM-1 was prepared using the following 4 solutions.
  • Em-1 was obtained.
  • Em-1 The grains of Em-1 were tabular silver iodide in which the diameter of an average projected area was 0.65 am, the particle thickness was 0.26 ⁇ m, the aspect ratio was 2.5, and the silver iodide content was 1.1 mol%.
  • Highly monodispersed cubic silver iodobromide grains were used as seed grains, which had an average grain size of 0.2 ⁇ m, an iodide content of 2.0 mol% and a grain size variation coefficient indication monodispersed degree of 0.15.
  • the seed grains were grown with iodobromide having a iodide content of 30 mol% at pH of 9.8 and pAg of 7.8.
  • emulsion Em-2 composed of monodispersed tetradeca-hedral silver iodobromide grains having an average iodide content of 2.2 mol%, average grains size of 0.54 ⁇ m and a grain size variation coefficient of 0.17.
  • the emulsion was desalted by the common floculation sedimentation so as to remove an excessive amount of salt. While the temperature was maintained at 40 ° C, Demol N, condensated products of formalin and naphthalene sodium sulfonate, and a aqueous solution of magnesium sulfate were added to the emulsion so as to be coagulated, and supernatant liquid was removed.
  • ammonium tiocyanate was added by an amount of 2 x 10- 3 mol and 4 x 10- 3 mol with respect to 1 mol of silver to Em-1 and Em-2, respectively. Further, appropriate amounts of chloroauric acid and sodium thiosalfate were added to each emulsions to start chemical ripening. The ripening was carried out at pH of 6.5 and silver electrode potential of 50 mV.
  • Em-1 fine particles of silver iodide were added by an amount of 4.0 g per 1 mol of silver 70 minutes before the completion of chemical ripening. Further, 4-hydroxy-6-methyl-1,3,3a,7-tetrazin- den was added in an amount of 3 x 10- 2 mol for stabilization. With respect to Em-2, potassium iodide was added in an amount of 200 mg per 1 mol of silver 15 minutes before the completion of chemical ripening (70 minutes after the start of chemical ripening). Then, 10% (wt/vol) acetic acid was added 5 minutes after, so that the value of pH was lowered to 5.6, and that value of pH was maintained for 5 minutes.
  • the value of pH was adjusted to be 6.20 and the silver electrode potential was adjusted to 80 mV at 35 ° C using a solution of sodium carbonate and a solution of potassium bromide.
  • samples were prepared in the following manner.
  • the photographic emulsion layer was provided on both side of the support so that the emulsion amount could be 2.0 g/m 2 per one side in terms of silver.
  • An amount of gelatine and that of polymer latex per one side were adjusted to be the values shown on Table 1.
  • Protective layer solution was prepared using the additives described later.
  • the protective layer solution was prepared so that the amount of gelatine and the added amount of polymer latex per one side could be the same as the values described on Table 1. Therefore, together with the emulsion coating solution, the protective layer solution was simultaneously coated on both sides of the support at the speed of 80 m/min using two sets of slide hopper coaters. The coated layers were dried for 2 minutes and 20 seconds. In this way, the samples were obtained. In this case, the supports A and B were used.
  • Weight shows a value contained in 1 litter of coating solution.
  • Dye emulsifying dispersion liquid was prepared as follows. The following dyes were respectively measured so that the amount was 10 kg. Then the dyes were dissolved in a solvent containing 28 litters of tricresyl phosphate and 85 litters of ethyl acetate at 55 °C, which is referred to as an oily solution. On the other hand, anion surface active agent and 1.35 kg of the following (AS) were dissolved at 45 ° C, and 270 millilitters of 9.3% gelatine aqueous solution was prepared, which is referred to as a aqueous solution.
  • AS anion surface active agent
  • AS millilitters of 9.3% gelatine aqueous solution
  • the area average particle sizes of the thus obtained dispersion substance were in a range from 0.12 to 0.14 ⁇ m.
  • the above coating solution was uniformly coated on both surfaces of the blue polyethylene terephthalate supports (A) and (B) provided with the above under coat layer. Then the coating solution was dried. In this way, the samples 1 to 10 were made as shown on Table 1. With respect to all samples, an amount of coated gelatine was adjusted so that the amount could be 3.0 g/m 2 on both surface. An amount of coated silver on each sample was adjusted to be 2.0 g/m 2 on one side.
  • the obtained samples were exposed to white light in the following manner:
  • a remodeled automatic processor SRX-502 (manufactured by Konica Co.) was used. A developer and a fixer of the following compositions were used. The developing temperature was 37 ° C, and the fixing temperature was 33 °C. The washing was carried out at 18 ° C by supplying water of 7.0 litters per minute. The drying temperature was 55 °C. All processes were performed in the following 30 and 45 second modes.
  • Table 1 represent the relative sensitivity in the case where the sensitivity of No. 1 sample was set at 100.
  • the times of development fixing and washing each includes the time necessary to transporting the sample from a processing tank to the next processing tank.
  • the antistatic property was investigated in the following manner:

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
EP94119874A 1993-12-21 1994-12-15 Silver halide photographic light-sensitive material Withdrawn EP0660174A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5322481A JPH07175169A (ja) 1993-12-21 1993-12-21 ハロゲン化銀写真感光材料
JP322481/93 1993-12-21

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EP0660174A2 true EP0660174A2 (en) 1995-06-28
EP0660174A3 EP0660174A3 (enExample) 1995-08-02

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Cited By (3)

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EP0786694A1 (en) * 1995-09-08 1997-07-30 Konica Corporation Silver halide photographic light sensitive material
EP0795781A1 (en) * 1996-03-13 1997-09-17 Konica Corporation Silver halide light-sensitive photographic material
GB2329031A (en) * 1997-08-28 1999-03-10 Eastman Kodak Co Photographic elements with antistatic layers

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JP2002090934A (ja) * 2000-09-18 2002-03-27 Fuji Photo Film Co Ltd 熱現像画像記録材料
US20070099132A1 (en) * 2000-09-18 2007-05-03 Hajime Nakagawa Photothermographic material
US20060199115A1 (en) * 2001-01-30 2006-09-07 Hajime Nakagawa Photothermographic material and image forming method
US7381520B2 (en) * 2002-12-03 2008-06-03 Fujifilm Corporation Photothermographic material
JP4084645B2 (ja) * 2002-12-03 2008-04-30 富士フイルム株式会社 熱現像感光材料
JP2006228469A (ja) * 2005-02-15 2006-08-31 Fuji Photo Film Co Ltd 導電性膜形成用感光材料、導電性膜、透光性電磁波シールド膜、及びそれらの製造方法

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JPS6049894B2 (ja) * 1980-12-23 1985-11-05 富士写真フイルム株式会社 写真感光材料
JPS57118242A (en) * 1981-01-14 1982-07-23 Fuji Photo Film Co Ltd Photographic sensitive material
JPH01161338A (ja) * 1987-12-18 1989-06-26 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JP2796824B2 (ja) * 1989-02-23 1998-09-10 コニカ株式会社 ピンホールの改良されたハロゲン化銀写真感光材料
US5254448A (en) * 1991-01-08 1993-10-19 Konica Corporation Light-sensitive silver halide photographic material
EP0514903B1 (en) * 1991-05-22 1998-12-30 Fuji Photo Film Co., Ltd. Silver halide photographic material
US5372923A (en) * 1992-05-13 1994-12-13 Konica Corporation Light-sensitive silver halide photographic material
US5221598A (en) * 1992-11-23 1993-06-22 Eastman Kodak Company Photographic support material comprising an antistatic layer and a heat-thickening barrier layer
JPH06250336A (ja) * 1993-02-25 1994-09-09 Konica Corp 帯電防止されたハロゲン化銀写真感光材料

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Publication number Priority date Publication date Assignee Title
EP0786694A1 (en) * 1995-09-08 1997-07-30 Konica Corporation Silver halide photographic light sensitive material
US5888710A (en) * 1995-09-08 1999-03-30 Konica Corporation Silver halide photographic light sensitive material
EP0795781A1 (en) * 1996-03-13 1997-09-17 Konica Corporation Silver halide light-sensitive photographic material
US5849471A (en) * 1996-03-13 1998-12-15 Konica Corporation Silver halide light-sensitive photographic material
GB2329031A (en) * 1997-08-28 1999-03-10 Eastman Kodak Co Photographic elements with antistatic layers
GB2329031B (en) * 1997-08-28 2001-12-12 Eastman Kodak Co Photographic elements comprising highly loaded particulate material containing layer

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EP0660174A3 (enExample) 1995-08-02
USH1578H (en) 1996-08-06
JPH07175169A (ja) 1995-07-14

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