USH1578H - Silver halide photographic light-sensitive material - Google Patents
Silver halide photographic light-sensitive material Download PDFInfo
- Publication number
- USH1578H USH1578H US08/351,753 US35175394A USH1578H US H1578 H USH1578 H US H1578H US 35175394 A US35175394 A US 35175394A US H1578 H USH1578 H US H1578H
- Authority
- US
- United States
- Prior art keywords
- group
- hydrogen atom
- silver halide
- layer
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 52
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 45
- 239000004332 silver Substances 0.000 title claims abstract description 45
- 239000000463 material Substances 0.000 title claims abstract description 33
- 239000000839 emulsion Substances 0.000 claims abstract description 46
- 229920003169 water-soluble polymer Polymers 0.000 claims abstract description 27
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 26
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 24
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000203 mixture Substances 0.000 claims abstract description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011230 binding agent Substances 0.000 claims abstract description 8
- 239000000084 colloidal system Substances 0.000 claims abstract description 8
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims abstract description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000010419 fine particle Substances 0.000 claims abstract description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 6
- 229910018404 Al2 O3 Inorganic materials 0.000 claims abstract description 4
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 4
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 4
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 4
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 101100177155 Arabidopsis thaliana HAC1 gene Proteins 0.000 claims 1
- 238000012545 processing Methods 0.000 abstract description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract description 19
- 125000000217 alkyl group Chemical group 0.000 abstract description 15
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 12
- 150000001768 cations Chemical class 0.000 abstract description 8
- 125000002947 alkylene group Chemical group 0.000 abstract description 4
- 150000001450 anions Chemical group 0.000 abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 4
- 125000003342 alkenyl group Chemical group 0.000 abstract description 3
- 125000003710 aryl alkyl group Chemical group 0.000 abstract description 3
- 125000000732 arylene group Chemical group 0.000 abstract description 3
- 125000005843 halogen group Chemical group 0.000 abstract description 3
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 abstract 1
- 101150035983 str1 gene Proteins 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 50
- 239000010410 layer Substances 0.000 description 44
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 239000002245 particle Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 20
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 16
- 229920001577 copolymer Polymers 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 14
- 235000019322 gelatine Nutrition 0.000 description 14
- 239000001828 Gelatine Substances 0.000 description 13
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 12
- 238000011161 development Methods 0.000 description 12
- 230000003068 static effect Effects 0.000 description 12
- 229920002307 Dextran Polymers 0.000 description 11
- 229960002086 dextran Drugs 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000000654 additive Substances 0.000 description 8
- 239000011241 protective layer Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 7
- 229910021612 Silver iodide Inorganic materials 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000008239 natural water Substances 0.000 description 7
- 230000005070 ripening Effects 0.000 description 7
- 229940045105 silver iodide Drugs 0.000 description 7
- 239000004816 latex Substances 0.000 description 6
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- 238000002360 preparation method Methods 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- 125000000129 anionic group Chemical group 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Substances [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 5
- 238000011160 research Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
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- 150000001875 compounds Chemical class 0.000 description 4
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- 239000006224 matting agent Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000008107 starch Substances 0.000 description 4
- 235000019698 starch Nutrition 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000012362 glacial acetic acid Substances 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
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- 239000000314 lubricant Substances 0.000 description 3
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 3
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- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
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- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
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- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
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- 235000010443 alginic acid Nutrition 0.000 description 1
- 239000000783 alginic acid Substances 0.000 description 1
- 229960001126 alginic acid Drugs 0.000 description 1
- 150000004781 alginic acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000000305 astragalus gummifer gum Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- JOILQYURMOSQTJ-UHFFFAOYSA-N azanium;2,4-dihydroxybenzenesulfonate Chemical compound [NH4+].OC1=CC=C(S([O-])(=O)=O)C(O)=C1 JOILQYURMOSQTJ-UHFFFAOYSA-N 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 235000010418 carrageenan Nutrition 0.000 description 1
- 239000000679 carrageenan Substances 0.000 description 1
- 229920001525 carrageenan Polymers 0.000 description 1
- 229940113118 carrageenan Drugs 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- GTKRFUAGOKINCA-UHFFFAOYSA-M chlorosilver;silver Chemical class [Ag].[Ag]Cl GTKRFUAGOKINCA-UHFFFAOYSA-M 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005115 demineralization Methods 0.000 description 1
- 230000002328 demineralizing effect Effects 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229960000633 dextran sulfate Drugs 0.000 description 1
- 108010042194 dextransucrase Proteins 0.000 description 1
- 235000019425 dextrin Nutrition 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 239000001963 growth medium Substances 0.000 description 1
- 235000010417 guar gum Nutrition 0.000 description 1
- 239000000665 guar gum Substances 0.000 description 1
- 229960002154 guar gum Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- CBEQRNSPHCCXSH-UHFFFAOYSA-N iodine monobromide Chemical compound IBr CBEQRNSPHCCXSH-UHFFFAOYSA-N 0.000 description 1
- DBTMGCOVALSLOR-VPNXCSTESA-N laminarin Chemical compound O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)OC1O[C@@H]1[C@@H](O)C(O[C@H]2[C@@H]([C@@H](CO)OC(O)[C@@H]2O)O)O[C@H](CO)[C@H]1O DBTMGCOVALSLOR-VPNXCSTESA-N 0.000 description 1
- 229920005610 lignin Polymers 0.000 description 1
- 235000010420 locust bean gum Nutrition 0.000 description 1
- 239000000711 locust bean gum Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- URXNVXOMQQCBHS-UHFFFAOYSA-N naphthalene;sodium Chemical compound [Na].C1=CC=CC2=CC=CC=C21 URXNVXOMQQCBHS-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 235000019423 pullulan Nutrition 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical compound O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical compound O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- KIIUTKAWYISOAM-UHFFFAOYSA-N silver sodium Chemical compound [Na].[Ag] KIIUTKAWYISOAM-UHFFFAOYSA-N 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- SYWDUFAVIVYDMX-UHFFFAOYSA-M sodium;4,6-dichloro-1,3,5-triazin-2-olate Chemical compound [Na+].[O-]C1=NC(Cl)=NC(Cl)=N1 SYWDUFAVIVYDMX-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229940117958 vinyl acetate Drugs 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 229920001285 xanthan gum Polymers 0.000 description 1
- 235000010493 xanthan gum Nutrition 0.000 description 1
- 239000000230 xanthan gum Substances 0.000 description 1
- 229940082509 xanthan gum Drugs 0.000 description 1
- UHVMMEOXYDMDKI-JKYCWFKZSA-L zinc;1-(5-cyanopyridin-2-yl)-3-[(1s,2s)-2-(6-fluoro-2-hydroxy-3-propanoylphenyl)cyclopropyl]urea;diacetate Chemical compound [Zn+2].CC([O-])=O.CC([O-])=O.CCC(=O)C1=CC=C(F)C([C@H]2[C@H](C2)NC(=O)NC=2N=CC(=CC=2)C#N)=C1O UHVMMEOXYDMDKI-JKYCWFKZSA-L 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/853—Inorganic compounds, e.g. metals
Definitions
- the present invention relates to a silver halide photosensitive material, and more particularly relates to an antistatic silver halide photosensitive material capable of being very quickly processed.
- silver halide photographic light-sensitive material comprises an insulating plastic film support, on which there are provided a light-sensitive emulsion layer, antihalation layer, protective layer, intermediate layer, foundation layer and back coating layer. Therefore, silver halide light-sensitive material is easily charged with static electricity. Especially when the temperature is low, for example, in the winter, silver halide light-sensitive material is charged with static electricity while it is handled, so that problems may be encountered. For example, due to the progress of manufacturing technique of silver halide photosensitive material, the speed of coating and that of cutting are increased in the manufacturing process recently. Therefore, frictional electrification occurs. Further, the speed of film conveyance is remarkably increased in the photographing and processing of films. For this reason, problems are encountered when the films are electrostatically charged.
- antistatic agents are applied to silver halide photosensitive material.
- a surface active agent of polyoxyethylene is generally used for the antistatic agent.
- the surface active agent is dissolved in the processing solution in the process of development and reacts with other substances in the solution, so that trubidness, sludge and streaks of development are caused.
- Japanese Patent Examined Publication Nos. 49894/1985 and 16057/1986 disclose the following technique:
- a support which has an undercoat layer having antistatic properties when the undercoat layer contains a metallic oxide.
- the photographic light-sensitive material of the invention comprises a support having thereon a silver halide emulsion layer and optionally a hydrophilic colloid layer, at least one of said emulsion layer and said hydrophilic colloid layer contains a water-soluble polymer which comprises repeating unit represented by formula 1 in an amount of 10 to 100 mol %, and an electric conductive layer being provided at a position between the support and the silver halide emulsion layer and comprising a binder and fine particles of an electric conductive crystalline metal oxide of ZnO, TiO 2 , SnO 2 , Al 2 O 3 , In 2 O 3 , SiO 2 , MgO, BaO, MoO 3 , V 2 O 5 or a mixture thereof, each of which has a volumetric resistivity of not higher than 10 7 ⁇ cm; ##STR3## wherein R 1 and R 2 are each independently a hydrogen atom, an alkyl group, a halogen atom or a --CH 2 COOM 1 , in which
- the light-sensitive material is adapted to a rapid processing in which whole processes are carried out within 30 seconds in total.
- Crystalline metal oxide particles are used for the conductive metal oxide in the present invention.
- Metal oxide particles containing oxygen defects are preferably used, and also metal oxide particles containing a small amount of another kind of atoms forming an electron donor with respect to the used metal oxide are preferably used because the electric conductivity of such metal oxide is generally high. Especially, the latter is preferably used because the occurrence of fog can be avoided in a silver halide emulsion.
- the metal oxide are: ZnO, TiO 2 , SnO 2 , Al 2 O 3 , In 2 O 3 , SiO 2 , MgO, BaO, MoO 3 and V 2 O 5 , and their mixtures.
- ZnO 2 , TiO 2 and SnO 2 are preferably used.
- Effective examples of a case in which another kind of atoms are contained, are addition of Al or In to ZnO; addition of Sb, Nb or halogen elements to SnO 2 ; and addition of Nb or Ta to TiO 2 .
- An amount of addition is preferably in a range from 0.01 to 30 mol %, and more preferably in a range from 0.1 to 10 mol %.
- the metallic oxide particles usable for the present invention are electrically conductive, and the volumetric resistivity there of is not higher than 10 7 ⁇ cm, more preferably not lot higher than 10 5 ⁇ cm.
- the fine particles of the electrically conductive crystalline metal oxide or metal oxide mixture can be prepared by the methods, for example, described in JP I.O.P. Publication 143430/1981. Concretely, they can easily prepared in the following manner: (1) particles of the metal oxide prepared by baking is subjected to heat treatment in the presence of another kind of atom which raises electric conductivity of the metal oxide powder, (2) particles of the metal oxide is prepared by baking in the presence of another kind of atom which raises electric conductivity of the metal oxide powder, or (3) at the time of baking the metal oxide to make fine particles thereof, oxygen concentration in the atmosphere is lowered for introducing oxygen vacancies into the metal powder.
- the size of particles is preferably 0.01 to 0.7 ⁇ m, and more preferably 0.02 to 0.5 ⁇ m.
- the conductive metal oxides usable in the present invention are dispersed in the binder and provided between the support and the silver halide emulsion layer.
- the volumetric content of the conductive metal oxide particles in the layer is high.
- the volumetric content of the conductive metal oxide is preferably in a range from 5 to 95% in value.
- the conductive metal oxide is used in an amount of 0.05 to 10 g/m 2 , more preferably, 0.1 to 5 g/m 2 , of light-sensitive material. Due to the foregoing, a competent antistatic property can be provided.
- the conductive layer containing the metal oxide particles is provided as an under-coat layer at a position between the support and the silver halide emulsion layer.
- the conductive under-coat layer may be provided in the following manner:
- Electrically conductive particles are dispersed in the binder of the under coat layer, and the under coat layer is directly coated on the support. Alternatively, a hydrophilic polymer layer is further coated on it, and an emulsion layer is coated.
- the binder of the under coat layer are a latex polymer, water soluble polymer, cellulose ester, and soluble polyester.
- latex polymers are latex of copolymer containing polyvinyl chloride, copolymer containing vinylidene chloride, glycidyl acrylate, copolymer containing glycidyl methacrylate, copolymer containing alkylester of acrylic acid, and copolymer containing butadiene.
- the latex is described in JP O.P.I. Publication Nos. 135526/1976, 43911/1975, 114120/1976, 121323/1976 and 112677/1977 and Japanese Patent Publication No. 14434/1976.
- soluble polyester are discloses in JP O.P.I. Publication No. 1612/1979, and Japanese Patent Publication Nos. 2529/1969 and 10432/1960.
- a matting agent may be added into the protective layer.
- the matting agent are a homopolymer of polymethyl mathacrylate described in U.S. Pat. Nos. 2,992,101, 2,701,254, 4,142,894 and 4,396,706; a copolymer of methyl methacrylate and methacrylic acid; and particles of starch and silica.
- the surface active agent may be used together.
- a lubricant may be added into the surface protective layer.
- Usable examples of the lubricant are silicon compounds described in U.S. Pat. Nos. 3,489,576 and 4,047,958, colloidal silica described in Japanese Patent Publication No. 23139/1981, paraffin wax, higher fatty acid ester and starch.
- a plasticizer may be added into the hydrophile colloidal layer.
- the plasticizer are polyol of trimethylol-propane, pentanediol, butanediol, ethyleneglycol and glycerin.
- the support used for the present invention are a transparent or opaque synthetic resin film of polyethylene terephthalate, cellulose acetate, polycarbonate, polystyrene and polypropylene and a paper support laminated with polyethylene resin.
- the thickness of the support is preferably 50 to 200 ⁇ m, and more preferably 100 to 180 ⁇ m.
- a water-soluble polymer is added into at least one an emulsion layer or a hydrophilic colloid layer such as a surface protective layer, back-coating layer, intermediate layer, under-coating layer and anti-halation layer other than the layer in which the conductive metal oxide particles are added to make it to a electric conductive layer.
- a hydrophilic colloid layer such as a surface protective layer, back-coating layer, intermediate layer, under-coating layer and anti-halation layer other than the layer in which the conductive metal oxide particles are added to make it to a electric conductive layer.
- Water solube polymers usable in the invention preferably have a solubility in water of about 0.05 g or more per 100 g of water at the temperature of 20° C. More preferably, the solubility is not less than 0.1 g per 100 g of water at 20° C. It is preferable that the water soluble polymers each has a high solubility with respect to the developing and fixing solutions.
- the preferable solubility of the water soluble polymer is not less than 0.05 g per 100 g of the developing solution.
- the solubility in the developing solution is, more preferably, not less than 0.5 g, and further preferably, not less than 1 g, per 100 g of the developing solution.
- Natural or synthetic water soluble polymers may be used. Synthetic water soluble polymers may be used in the invention may have nonionic groups, anionic groups, or both nonionic and anionic groups in the molecular structure.
- examples of the nonionic group are an ether group, ethylene oxide group, and hydroxy group.
- examples of the anionic group are a sulfonic acid group or its salt, carboxylic acid group or its salt, and phosphoric acid group and its salt.
- a homopolymer or copolymer may be used as the synthetic water soluble polymer. As long as the polymer itself is water-soluble, the copolymer partially derived from a hydrophobic monomer may be used.
- the composition of the copolymer is restricted by a position where it is added and an amount of copolymer to be added. For example, when the copolymer is added to an emulsion layer and the amount of which is large, the composition of the copolymer is determined so that the effect of addition is not deteriorated.
- Natural water soluble polymers usable in the invention may have nonionic groups, anionic groups, or both nonionic and anionic groups in the molecular structure.
- Preferable water soluble polymers in the invention are ones containing a repeating unit represented by the following formula 1. Especially, the following repeating unit may be contained in the polymer by 10 to 100 mol %. ##STR5##
- R 1 and R 2 each independently a hydrogen atom, an alkyl group, a halogen atom, or --CH 2 COOM 1
- M 1 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
- the alkyl group is preferably one having 1 to 4 carbon atoms which may have a substituent, for example, a substituted or unsubstituted methyl, ethyl, propyl or buthyl group.
- L represents --CONH--, --NHCO--, --COO, --OCO, --CO--, --SO 2 --, --NHSO 2 --, --SO 2 NH-- or --O--.
- J is an alkylene group, prepeferably an alkylene group having 1 to 10 carbon atoms, including one having a substituent such as a substituted or unsubstituted methylen, ethylene, propylene, trimethylene, butylene, and hexylene group; an arylene group including substituted one such as a substituted and unsubstituted phenylene group; or a substituted or unsubstituted aralkylene group such as ##STR6## .paren open-st.CH 2 CH 2 O.paren close-st. m .paren open-st.CH 2 .paren close-st.
- n or .paren open-st.CH 2 CHCH 2 O.paren close-st. m .paren open-st.CH 2 .paren close-st. n , wherein m is an integer from 0 to 40, and n is an integer from 0 to 4.
- Q is a hydrogen atom, --R 3 , ##STR7##
- M is a hydrogen atom or a cation group
- R 9 is an alkyl group having 1 to 4 carbon atoms such as a methyl, ethyl, propyl or butyl group
- R 3 , R 4 , R 5 , R 6 , R 7 , R 8 and R 9 are each independently an alkyl group having 1 to 20 carbon atoms such as a substituted or unsubstituted methyl, ethyl, propyl, butyl, hexyl, decyl or hexadecyl group, an alkenyl group such as a substituted or unsubstituted vinyl or allyl group, a phenyl group such as a phenyl, methoxyphenyl, chlorophenyl group or those each further having a substituent; an aralkyl group such as a substituted or unsubstituted benzyl group; X is an anion; and p and q are each al
- Y represents a hydrogen atom or --(L--)p--(J--)q--Q.
- the repeating unit represented by formula 1 may be copolymerized with ethylenic unsaturated monomer to from the synthetic water soluble polymer.
- copolymerizable ethylenic monomer includes styrene; alkylstyrene and hydroxylalkylstyrene in which the alkyl group preferably has 1 to 4 carbon atoms, for example, methyl, ethyl and butyl are preferably; vinylbenzenesulfonic acid and its slat; ⁇ -methyl styrene; 4-vinylpiridine; N-vinylpyrolidone; monoethylenic unsaturated ester of fatty acid such as, vinylacetate and vinylpropionate; ethylenic unsaturated monocarboxylic or dicarboxylic acid and its salt, for example, acrylic acid and methacrylic acid; maleic acid anhydride; ethylenic unsaturated monocarboxylic acid or ester of di
- the molecular weight is preferably 1,000 to 100,000, and more preferably 2,000 to 50,000.
- Examples of usable natural water soluble polymers are described in "Technical Data of Water Soluble Polymer and Water Dispersion Resin", 1981, published by Business Development Center Publishing Department.
- Usable examples of the natural water soluble polymers are lignin, starch, pullulan, cellulose, alginic acid, dextran, dextrin, guar gum, gum arabic, pectin, casein, agar, xanthan gum, cyclodextrin, locust bean gum, tragacanth gum, carrageenan, glycogen, laminaran, lichenin, nigeran, and their derivatives.
- Preferable derivatives of the natural water soluble polymers include ones each having a sulfo group, a carboxyl group, a phosphoric acid and its salt group, a sulfoalkyl group, carboxylalkylene group, an alkylphsphoric group and its salt, an polyoxalkylene group such as polyoxyethylene, polyoxyglyceline, polyoxypropylene group and an alkyl group such as methyl, ethyl and benzyl group.
- a glucose copolymer and its derivatives are preferably used.
- starch, glycogen, cellulose, lichenin, dextran and nigeran are preferably used.
- Dextran and its derivatives are more preferably used.
- Dextran is a polymer of D-glucose of ⁇ - 1,6 bond.
- dextran is obtained when dextran producing bacteria are cultured in the presence of sugars.
- dextran sucrase separated from the culture medium of dextran producing bacteria such as leuconostoc and mesenteriodes is reacted with sugars, dextran can be obtained.
- the obtained native dextran is subjected to the partially decomposing polymerization in which acid or alkali enzyme is used, the molecular weight is lowered to a predetermined value, so that the dextran of which the limiting viscosity number is in a range from 0.03 to 2.5 can be provided.
- modified dextran examples include dextran sulfate, carboxyalkyldextran, and hydroxialkyldextran.
- the molecular weight of the natural water soluble polymer is preferably 100 to 100,000, and more preferably 2,000 to 50,000.
- an adding amount of synthetic or natural the water soluble polymer is preferably 0.01 to 3.0 g/m 2 , and more preferably 0.05 to 1.0 g/m 2 .
- Silver halide photosensitive material according to the invention can be applied for any types of photographic material such as medial radioactive ray radigraphic material, laser beam recording photographic material, directly positive type photographic material, photographic material for graphic arts, color negative photographic material, reversal color photographic material, color photographic paper thermal development photographic material, and diffusion transfer type photographic material.
- photographic material such as medial radioactive ray radigraphic material, laser beam recording photographic material, directly positive type photographic material, photographic material for graphic arts, color negative photographic material, reversal color photographic material, color photographic paper thermal development photographic material, and diffusion transfer type photographic material.
- Silver halide emulsion usable in the silver halide photographic material of the present invention includes silver chloride, silver bromide, silver chlorobromide, silver iodobromide and silver chloroiodobromide emulsions having arbitrary halide composition.
- the composition of halide may be uniform in the particles, or silver iodide may be partially localized. It is preferable that silver iodide is locatized at the center portion of the silver halide grain.
- JP O.P.I. No. 6643/1986 can be referred.
- a tabular silver iodobromide emulsion having a high aspect ratio can be prepared by the followings.
- An aqueous solution of silver nitrate or aqueous solution of silver nitrate and that of halide are simultaneously added to an aqueous gelatine solution, maintaining the pBr value to be not more than 2, to form seed crystals. Then the seed crystals are made to grow by the double jet method.
- Various photographic additives may be added to the silver halide emulsion applied to the invention, at a time during physical ripening or before and after chemical ripening.
- Examples of well known additives are described in Research Disclosure (RD), the volumes of which are No. 17643 (published in December of 1978), No. 18716 (published in November of 1979) and No. 308119 (published in December of 1989). Types of these compounds and pages of Research Disclosure on which these compounds are described are as follows.
- a polyethylene terephthalate film is appropriately used for the support.
- a subbing layer is preferably provided on the surface of the support, and also it is preferable that the surface of the support is subjected to corona discharge or ultraviolet ray irradiation so that the coating layers can be appropriately adhered on the surface.
- Photographic processing of the photographic material of the invention is preferably carried out in 30 seconds that is a period of time from when a fore end of the photosensitive material to be processed enters a film insertion sensor of the automatic developing apparatus to when the fore end of the photosensitive material reaches a discharge sensor of the automatic developing apparatus.
- processing may be carried out by the .processing solution described on pages 29 to 30 of XX to XXI of the above RD-17643, or pages 1011 to 1012 of XX to XXI of the above RD-308119.
- This photographic processing may be a monochromatic processing.
- the processing temperature is commonly in a range from 18° C. to 50° C.
- hydroxybenzene for example, hydroquinone
- 3-pyrazolidone for example, 1-phenyl-3-pyrazolidone
- aminophenol for example, N-methyl-p-aminophenol
- an alkaline agent, pH buffer, antifogging agent, development accelerator, surface active agent, antifoaming agent, color toning agent, water sofener, dissolution assistant, and thickener may be used in the developer according to necessity.
- Tiosulfate or tiocyanate is used for the fixing agent.
- Water soluble aluminum salt such as aluminum sulfate or potash alum may be contained as a hardening agent.
- Preservatives, pH adjusting agent and water sofener may be contained.
- a conductive under coat layer of the following composition was coated on both sides of the above subbed support (A), so that the support (B) was prepared.
- SnO 2 /Sb used in support (B) had a volumetric resistivity of 3.5 ⁇ cm.
- Further support (C) was prepared in the same manner as in support (B) except that SnO 2 /Sb was replaced by ZnO 2 /Al particle having an average sized of 0.6 ⁇ m, ZnO 2 /Al ratio in mol of 9/1 and a volumetric resistivity of 3 ⁇ 10 2 ⁇ cm.
- a hexagonal tabular seed emulsion was prepared by the following method.
- Distilled water is added so that the total amount is made to be 3500 ml.
- solution A After the stop of addition of solutions B and C, the temperature of solution A was raised to 60° C. spending 60 minutes. Then solutions B and C were added by a double-jet mixing method at a flow rate of 68.5 ml/min for 5 minutes. During this operation, the silver electrode potential of the emulsion was controlled to be +6 mV using solution D, wherein the silver electrode potential was measured by the silver ion selecting electrode while a saturated silver-silver chloride electrode was used as a comparative electrode.
- the pH value was adjusted to be 6 by 3% KOH, and immediately desalting and washing were carried out so that seed emulsion Em-0 was obtained.
- the seed emulsion Em-0 was inspected with an electron microscope and it was confirmed that 90% or more of the total projected area of the silver halide particles was composed of hexagonal tabular particles, the adjacent edge ratio of which was 1.0 to 2.0.
- the average thickness of the hexagonal tabular particles was 0.07 ⁇ m, and the average diameter, which is a value converted to the diameter of a circle, was 0.5 ⁇ m.
- Tabular silver iodide emulsion EM-1 was prepared using the following 4 solutions.
- Em-1 was obtained.
- Em-1 The grains of Em-1 were tabular silver iodide in which the diameter of an average projected area was 0.65 ⁇ m, the particle thickness was 0.26 ⁇ m, the aspect ratio was 2.5, and the silver iodide content was 1.1 mol%.
- Highly monodispersed cubic silver iodobromide grains were used as seed grains, which had an average grain size of 0.2 ⁇ m, an iodide content of 2.0 mol % and a grain size variation coefficient indication monodispersed degree of 0.15.
- the seed grains were grown with iodobromide having a iodide content of 30 mol % at pH of 9.8 and pAg of 7.8.
- emulsion Em-2 composed of monodispersed tetradeca-hedral silver iodobromide grains having an average iodide content of 2.2 mol %, average grains size of 0.54 ⁇ m and a grain size variation coefficient of 0.17.
- the emulsion was desalted by the common floculation sedimentation so as to remove an excessive amount of salt. While the temperature was maintained at 40° C., Demol N, condensated products of formalin and naphthalene sodium sulfonate, and a aqueous solution of magnesium sulfate were added to the emulsion so as to be coagulated, and supernatant liquid was removed.
- ammonium tiocyanate was added by an amount of 2 ⁇ 10 -3 mol and 4 ⁇ 10 -3 mol with respect to 1 mol of silver to Em-1 and Em-2, respectively. Further, appropriate amounts of chloroauric acid and sodium thiosalfate were added to each emulsions to start chemical ripening. The ripening was carried out at pH of 6.5 and silver electrode potential of 50 mV.
- Em-1 fine particles of silver iodide were added by an amount of 4.0 g per 1 mol of silver 70 minutes before the completion of chemical ripening. Further, 4-hydroxy-6-methyl-1,3,3a,7-tetrazinden was added in an amount of 3 ⁇ 10 -2 mol for stabilization. With respect to Em-2, potassium iodide was added in an amount of 200 mg per 1 mol of silver 15 minutes before the completion of chemical ripening (70 minutes after the start of chemical ripening). Then, 10% (wt/vol) acetic acid was added 5 minutes after, so that the value of pH was lowered to 5.6, and that value of pH was maintained for 5 minutes.
- the value of pH was adjusted to be 6.20 and the silver electrode potential was adjusted to 80 mV at 35° C. using a solution of sodium carbonate and a solution of potassium bromide.
- samples were prepared in the following manner.
- the photographic emulsion layer was provided on both side of the support so that the emulsion amount could be 2.0 g/m 2 per one side in terms of silver.
- An amount of gelatine and that of polymer latex per one side were adjusted to be the values shown on Table 1.
- Protective layer solution was prepared using the additives described later.
- the protective layer solution was prepared so that the amount of gelatine and the added amount of polymer latex per one side could be the same as the values described on Table 1. Therefore, together with the emulsion coating solution, the protective layer solution was simultaneously coated on both sides of the support at the speed of 80 m/min using two sets of slide hopper coaters. The coated layers were dried for 2 minutes and 20 seconds. In this way, the samples were obtained. In this case, the supports A and B were used.
- Weight shows a value contained in 1 litter of coating solution.
- Dye emulsifying dispersion liquid was prepared as follows. The following dyes were respectively measured so that the amount was 10 kg. Then the dyes were dissolved in a solvent containing 28 litters of tricresyl phosphate and 85 litters of ethyl acetate at 55° C., which is referred to as an oily solution. On the other hand, anion surface active agent and 1.35 kg of the following (AS) were dissolved at 45° C., and 270 millilitters of 9.3% gelatine aqueous solution was prepared, which is referred to as a aqueous solution.
- AS anion surface active agent
- AS millilitters of 9.3% gelatine aqueous solution
- the area average particle sizes of the thus obtained dispersion substance were in a range from 0.12 to 0.14 ⁇ m.
- the above coating solution was uniformly coated on both surfaces of the blue polyethylene terephthalate supports (A) and (B) provided with the above under coat layer. Then the coating solution was dried. In this way, the samples 1 to 10 were made as shown on Table 1. With respect to all samples, an amount of coated gelatine was adjusted so that the amount could be 3.0 g/m 2 on both surface. An amount of coated silver on each sample was adjusted to be 2.0 g/m 2 on one side.
- the obtained samples were exposed to white light in the following manner:
- Standard light source B described on page 39 of the second print of the first edition of "New Edition Illumination Data Book” published by the Society of Illumination was used for the light source.
- the sample was exposed for 0.1 second at 3.2 CMS with no filter. In this white exposure, both sides of a film were exposed so that amounts of exposure light could be the same on both sides.
- the exposed samples were subjected to development processing by the following method.
- a remodeled automatic processor SRX-502 (manufactured by Konica Co.) was used. A developer and a fixer of the following compositions were used. The developing temperature was 37° C., and the fixing temperature was 33° C. The washing was carried out at 18° C. by supplying water of 7.0 litters per minute. The drying temperature was 55° C. All processes were performed in the following 30 and 45 second modes.
- Table 1 represent the relative sensitivity in the case where the sensitivity of No. 1 sample was set at 100.
- the times of development fixing and washing each includes the time necessary to transporting the sample from a processing tank to the next processing tank.
- the antistatic property was investigated in the following manner:
- Humidity of an unexposed sample was adjusted at 23° C. under the condition of relative humidity 20% for 2 hours. After that, in a dark room maintained under the same air condition, the sample was rubbed by a rubber or nylon roller. The the sample was subjected to the same processing as described above.
- Static marks occur in an area not less than 3% and lower than 10%.
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5322481A JPH07175169A (ja) | 1993-12-21 | 1993-12-21 | ハロゲン化銀写真感光材料 |
| JP5-322481 | 1993-12-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USH1578H true USH1578H (en) | 1996-08-06 |
Family
ID=18144119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US08/351,753 Abandoned USH1578H (en) | 1993-12-21 | 1994-12-08 | Silver halide photographic light-sensitive material |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USH1578H (enExample) |
| EP (1) | EP0660174A2 (enExample) |
| JP (1) | JPH07175169A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5849471A (en) * | 1996-03-13 | 1998-12-15 | Konica Corporation | Silver halide light-sensitive photographic material |
| US20020058220A1 (en) * | 2000-09-18 | 2002-05-16 | Yoshihisa Tsukada | Photothermographic image-recording material |
| US20040115572A1 (en) * | 2002-12-03 | 2004-06-17 | Yoshihisa Tsukada | Photothermographic material |
| US20060199115A1 (en) * | 2001-01-30 | 2006-09-07 | Hajime Nakagawa | Photothermographic material and image forming method |
| US20060204908A1 (en) * | 2002-12-03 | 2006-09-14 | Hajime Nakagawa | Photothermographic material |
| US20070099132A1 (en) * | 2000-09-18 | 2007-05-03 | Hajime Nakagawa | Photothermographic material |
| US20090029125A1 (en) * | 2005-02-15 | 2009-01-29 | Fujifilm Corporation | Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69608090T2 (de) * | 1995-09-08 | 2000-09-14 | Konica Corp., Tokio/Tokyo | Lichtempfindliches photographisches Silberhalogenidmaterial |
| US5891612A (en) * | 1997-08-28 | 1999-04-06 | Eastman Kodak Company | Photographic elements comprising highly loaded particulate material containing layer |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4394441A (en) * | 1981-01-14 | 1983-07-19 | Fuji Photo Film Co., Ltd. | Photographic sensitive materials |
| US4418141A (en) * | 1980-12-23 | 1983-11-29 | Fuji Photo Film Co., Ltd. | Photographic light-sensitive materials |
| US4495275A (en) * | 1980-06-25 | 1985-01-22 | Fuji Photo Film Co., Ltd. | Silver halide photographic materials |
| US4917993A (en) * | 1987-12-18 | 1990-04-17 | Fuji Photo Film Co., Ltd. | Silver halide photographic materials |
| US5045441A (en) * | 1989-02-23 | 1991-09-03 | Konica Corporation | Silver halide photographic light-sensitive material inhibited in producing pin-holes |
| US5254448A (en) * | 1991-01-08 | 1993-10-19 | Konica Corporation | Light-sensitive silver halide photographic material |
| US5284714A (en) * | 1992-11-23 | 1994-02-08 | Eastman Kodak Company | Photographic support material comprising an antistatic layer and a heat-thickening barrier layer |
| US5372923A (en) * | 1992-05-13 | 1994-12-13 | Konica Corporation | Light-sensitive silver halide photographic material |
| US5376517A (en) * | 1993-02-25 | 1994-12-27 | Konica Corporation | Silver halide photographic light-sensitive material subjected to antistatic prevention |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0514903B1 (en) * | 1991-05-22 | 1998-12-30 | Fuji Photo Film Co., Ltd. | Silver halide photographic material |
-
1993
- 1993-12-21 JP JP5322481A patent/JPH07175169A/ja active Pending
-
1994
- 1994-12-08 US US08/351,753 patent/USH1578H/en not_active Abandoned
- 1994-12-15 EP EP94119874A patent/EP0660174A2/en not_active Withdrawn
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4495275A (en) * | 1980-06-25 | 1985-01-22 | Fuji Photo Film Co., Ltd. | Silver halide photographic materials |
| US4418141A (en) * | 1980-12-23 | 1983-11-29 | Fuji Photo Film Co., Ltd. | Photographic light-sensitive materials |
| US4394441A (en) * | 1981-01-14 | 1983-07-19 | Fuji Photo Film Co., Ltd. | Photographic sensitive materials |
| US4917993A (en) * | 1987-12-18 | 1990-04-17 | Fuji Photo Film Co., Ltd. | Silver halide photographic materials |
| US5045441A (en) * | 1989-02-23 | 1991-09-03 | Konica Corporation | Silver halide photographic light-sensitive material inhibited in producing pin-holes |
| US5254448A (en) * | 1991-01-08 | 1993-10-19 | Konica Corporation | Light-sensitive silver halide photographic material |
| US5372923A (en) * | 1992-05-13 | 1994-12-13 | Konica Corporation | Light-sensitive silver halide photographic material |
| US5284714A (en) * | 1992-11-23 | 1994-02-08 | Eastman Kodak Company | Photographic support material comprising an antistatic layer and a heat-thickening barrier layer |
| US5376517A (en) * | 1993-02-25 | 1994-12-27 | Konica Corporation | Silver halide photographic light-sensitive material subjected to antistatic prevention |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5849471A (en) * | 1996-03-13 | 1998-12-15 | Konica Corporation | Silver halide light-sensitive photographic material |
| US20020058220A1 (en) * | 2000-09-18 | 2002-05-16 | Yoshihisa Tsukada | Photothermographic image-recording material |
| US7189500B2 (en) * | 2000-09-18 | 2007-03-13 | Fuji Photo Film Co., Ltd. | Photothermographic image-recording material |
| US20070099132A1 (en) * | 2000-09-18 | 2007-05-03 | Hajime Nakagawa | Photothermographic material |
| US20060199115A1 (en) * | 2001-01-30 | 2006-09-07 | Hajime Nakagawa | Photothermographic material and image forming method |
| US20040115572A1 (en) * | 2002-12-03 | 2004-06-17 | Yoshihisa Tsukada | Photothermographic material |
| US20060204908A1 (en) * | 2002-12-03 | 2006-09-14 | Hajime Nakagawa | Photothermographic material |
| US7381520B2 (en) | 2002-12-03 | 2008-06-03 | Fujifilm Corporation | Photothermographic material |
| US20090029125A1 (en) * | 2005-02-15 | 2009-01-29 | Fujifilm Corporation | Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same |
| US20090098480A1 (en) * | 2005-02-15 | 2009-04-16 | Fujifilm Corporation | Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0660174A3 (enExample) | 1995-08-02 |
| EP0660174A2 (en) | 1995-06-28 |
| JPH07175169A (ja) | 1995-07-14 |
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Owner name: KONICA CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:TAGUCHI, MASAAKI;REEL/FRAME:007264/0368 Effective date: 19941018 |
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