EP0549046A1 - Système d'éclairage et lampe à décharge luminescente à haute pression pour l'utilisation dans un tel système d'éclairage - Google Patents

Système d'éclairage et lampe à décharge luminescente à haute pression pour l'utilisation dans un tel système d'éclairage Download PDF

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Publication number
EP0549046A1
EP0549046A1 EP92203930A EP92203930A EP0549046A1 EP 0549046 A1 EP0549046 A1 EP 0549046A1 EP 92203930 A EP92203930 A EP 92203930A EP 92203930 A EP92203930 A EP 92203930A EP 0549046 A1 EP0549046 A1 EP 0549046A1
Authority
EP
European Patent Office
Prior art keywords
excimer
lighting system
bar
discharge
walls
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP92203930A
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German (de)
English (en)
Other versions
EP0549046B1 (fr
Inventor
Claus Philips Patentverwaltung Gmbh Beneking
Horst Philips Patentverwaltung Gmbh Dannert
Manfred Philips Patentverwaltung Gmbh Neiger
Klaus Philips Patentverwaltung Gmbh Stockwald
Volker Philips Patentverwaltung Gmbh Schorp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Intellectual Property and Standards GmbH
Koninklijke Philips NV
Original Assignee
Philips Patentverwaltung GmbH
Philips Gloeilampenfabrieken NV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Patentverwaltung GmbH, Philips Gloeilampenfabrieken NV, Koninklijke Philips Electronics NV filed Critical Philips Patentverwaltung GmbH
Priority to EP19920203930 priority Critical patent/EP0549046B1/fr
Publication of EP0549046A1 publication Critical patent/EP0549046A1/fr
Application granted granted Critical
Publication of EP0549046B1 publication Critical patent/EP0549046B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/12Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel

Definitions

  • the invention relates to a lighting system which comprises a high-pressure glow discharge lamp with a planar, vacuum-tightly sealed discharge vessel, the discharge vessel enclosing a discharge space containing gas filling forming excimers, the parallel walls of which are formed by a dielectric, the surfaces of the walls facing away from the discharge space being provided with planar electrodes are, at least one of these walls with an associated electrode being at least partially transparent to the radiation generated, the surfaces of the walls facing the discharge space being arranged at a distance d from one another, and the gas filling containing at least one of the noble gases Xe and Kr as excimer formers , wherein the excimer generator has a partial pressure P which is less than a limit value Pg, into which lighting system the lamp is fed in an operating state with an alternating voltage with operating frequency f.
  • a dielectrically impeded glow discharge (also called “silent discharge”) is generated in a high-pressure glow discharge lamp at a relatively high gas pressure.
  • a gas filling emitting radiation upon electrical excitation and at least one dielectric are present between two completely or partially transparent electrodes.
  • the electrical supply takes place with AC voltage.
  • the discharge principle is described, for example, in the article by B. Eliasson and U. Kogelschatz, Appl. Phys. B46 (1988) 299-303.
  • a lamp suitable for use in a lighting system of the type mentioned at the outset is known, for example, from EP-A 0 324 953 (see also EP-A 0 254 111, 0 312 732 and 0 371 304).
  • a planar discharge vessel which is sealed in a vacuum-tight manner is understood to mean a discharge vessel which is in any case almost parallel Walls whose dimensions are large compared to the distance between these walls and a vacuum-tight side wall, the walls can be plane-parallel or coaxial and where a stroke distance, also called discharge length, from the distance (d) between the inner surfaces of the Walls is determined.
  • a dielectric, i.e. electrically non-conductive, material used for the walls of the discharge vessel. At least one of the parallel walls is transparent to the radiation generated and materials such as e.g. Glass, quartz, which can be UV-transparent, or the fluorides of magnesium or calcium that are transparent for very short-wave radiation.
  • the dielectrics mentioned are generally dielectric and chemically resistant to the gas filling.
  • the flat electrodes can be made of metal, e.g. Metal plates or metal layers can be formed.
  • Transparent electrodes can be used as mesh or grid electrodes, e.g. Wire nets or grid electrodes, or also as transparent metal layers (5 - 10 nm) or electrically conductive oxide layers.
  • the invention has for its object to provide a lighting system that has a high radiation yield, and also to enable extensive homogeneous flat radiation sources with high radiation yield.
  • Figure 1 AC voltage shown.
  • Figure 2 shows schematically the relationship between the operating voltage amplitude U and the total pressure Pges of the gas filling. Pges is the sum of the partial pressures of the excimer generator and any buffer gas (Pp) used.
  • Figure 3 shows an embodiment of a lamp for use in a lighting system according to the invention.
  • Figure 4 shows a single part of the lamp of Figure 3.
  • the invention is based on the insight that an excellent operating range with respect to the operating parameters P and f exists for a discharge length d between 0.05 and 10 mm, which is shown hatched in FIG. 1.
  • the partial pressure P of the excimer former is limited by a limit value Pg which has a maximum P M at an operating frequency f M.
  • Pg which has a maximum P M at an operating frequency f M.
  • the selection of the operating parameters in the shaded area enables the voltage amplitude U to be set to a value within an interval ⁇ U, with one ignition per half-wave of the AC voltage (see Figure 2). Under these circumstances, the lamp assumes a homogeneous operating condition.
  • the interval is limited by a voltage amplitude U 1 below which the discharge extinguishes, and a voltage amplitude U 2 above which more than one ignition per AC half-wave takes place.
  • the operating range is easy to determine.
  • operating points at this frequency f M with operating pressures P less than P M also belong to the operating range.
  • the operating point (P, f) is close to the operating point (P M , f M ).
  • the lamp then has a relatively high radiation yield.
  • the gas filling contains electronegative gases with a partial pressure P D between 5x10 ⁇ 5 and 5x10 ⁇ 4 times the partial pressure of the excimer.
  • a very advantageous embodiment of a lighting system according to the invention solves the problem that the areal expansion of the lamp is limited by the total pressure of the gas filling (substantially below 1000 mbar). If a vessel size limited by the wall thickness and the maximum tolerable mechanical stresses occurring in the material is exceeded, implosion can occur. This limit is at a total pressure of approximately 100 mbar and wall thicknesses of 2-3 mm with a typically 10 cm linear expansion of the walls.
  • the gas filling is additionally used as a buffer gas when Xe is used as Excimer former contains at least one of the noble gases He, Ne, Ar and Kr, and when Kr is used as the excimer former contains at least one of the noble gases He, Ne and Ar.
  • the atomic mass of the buffer gas is significantly smaller than the atomic mass of the excimer generator.
  • the total pressure of the gas charge Pges is increased by the added buffer gas without impairing the homogeneous operating behavior.
  • the total pressure Pges of the gas filling being less than four times the partial pressure P of the excimer former.
  • a preferred embodiment of a lighting system according to the invention is characterized in that the discharge vessel has an inner phosphor layer.
  • phosphors for example described by Opstelten, Radielovic and Verstegen in Philips Tech. Rev. 35, 1975, 361-370
  • large-area, homogeneously radiating light sources can be produced, which can be used as backlighting of large-area LCDs, luminous walls, display elements and the like. ⁇ . Find.
  • Another preferred embodiment of a lighting system according to the invention is characterized in that the discharge vessel has fluorescent vessel walls.
  • FIG. 3 shows schematically and in section a high-pressure glow discharge lamp 1 suitable for use in an illumination system according to the invention.
  • the lamp 1 has a planar, vacuum-tightly sealed discharge vessel 2, which surrounds a discharge space 3 containing a gas filling which forms excimers.
  • the discharge vessel 2 has parallel walls 4 A , 4 B made of a dielectric, in this case quartz glass plates with a thickness of 2 mm.
  • the walls 4 A , 4 B of the discharge vessel 2 are connected to one another by a cylindrical quartz spacer ring 5 with a diameter of 40 mm.
  • the quartz spacer ring 5 has a pump nozzle 6 with which the discharge vessel 2 is evacuated and filled.
  • the parts 4 A , 4 B , 5, 6 of the discharge vessel 2 are joined together by glass soldering technology.
  • the surfaces 7 A , 7 B of the walls 4 A , 4 B facing away from the discharge space 3 are included planar electrodes 8 A , 8 B provided.
  • the lamp 1 has a coupling-out electrode 8 B, which is partially transparent to the generated radiation, made of a lattice structure made of gold with web widths of 0.5 mm and a mesh size of 1.5 mm.
  • the electrode 8 B shown in view in Figure 4 is applied to the surface by pyrolytic sedimentation.
  • the other electrode 8 A consists of aluminum and is evaporated onto the wall 4 A. Otherwise, the latter electrode 8 A can also have a grid structure, for example made of gold.
  • the surfaces 9 A , 9 B of the walls 4 A , 4 B facing the discharge space 3 are arranged at a distance d of 2 mm from one another.
  • the gas filling contains Xe as an excimer.
  • the lamp 1 is supplied in an operating state with an AC voltage from an electrical supply, not shown.
  • the limit value Pg has a maximum value P M of 0.75 bar at a frequency f M of 72 kHz.
  • the gas filling is composed as follows.
  • the partial pressure of the excimer generator is 0.5 bar (i.e. below P M ).
  • the gas filling also contains neon as a buffer gas with a partial pressure of also 0.5 bar and a doping of O2 with a partial pressure of 0.1 mbar.
  • the total pressure (approximately 1 bar) of the gas filling is less than four times the partial pressure of the excimer generator.
  • the partial pressure P D of the O2 doping is 2x10 ⁇ 4 times the partial pressure of the excimer.
  • the lamp When the lamp is operated with a sinusoidally alternating high voltage with a frequency of 50 kHz, a homogeneous discharge is generated.
  • the radiation power density on the lamp surface is 250 W / m2. At this frequency of 50 kHz and at a voltage with maximum power coupling, a stratification efficiency of more than 10% is achieved.
  • the power and the radiation efficiency can be increased by approx. 50% by using a finer mesh structure, e.g. with 90% transmission.
  • Another embodiment of a lamp according to the invention has a discharge length d of 10 mm and a gas filling of 0.25 bar xenon as excimer and 0.75 bar neon as a buffer gas.
  • the limit value Pg a maximum value P M of 0.3 bar at a frequency f M of 3.5 kHz.
  • the lamp is operated at a frequency of 2.5 kHz, i.e. close to the operating point (P M , f M ).
  • the lamp has a radiant power density on the lamp surface of 50 W / m2 and a radiant efficiency of 20%.
  • the lighting system can be used as a flat spotlight for contact lithography or coating techniques.
  • the lamp can also have an inner phosphor coating and can then be used for other lighting purposes, for example for backlighting of LCDs or display elements, or for general lighting.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Discharge Lamp (AREA)
EP19920203930 1991-12-20 1992-12-15 Système d'éclairage et lampe à décharge luminescente à haute pression pour l'utilisation dans un tel système d'éclairage Expired - Lifetime EP0549046B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP19920203930 EP0549046B1 (fr) 1991-12-20 1992-12-15 Système d'éclairage et lampe à décharge luminescente à haute pression pour l'utilisation dans un tel système d'éclairage

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP91203372 1991-12-20
EP91203372 1991-12-20
EP19920203930 EP0549046B1 (fr) 1991-12-20 1992-12-15 Système d'éclairage et lampe à décharge luminescente à haute pression pour l'utilisation dans un tel système d'éclairage

Publications (2)

Publication Number Publication Date
EP0549046A1 true EP0549046A1 (fr) 1993-06-30
EP0549046B1 EP0549046B1 (fr) 1996-03-27

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EP19920203930 Expired - Lifetime EP0549046B1 (fr) 1991-12-20 1992-12-15 Système d'éclairage et lampe à décharge luminescente à haute pression pour l'utilisation dans un tel système d'éclairage

Country Status (1)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0703602A1 (fr) * 1994-09-20 1996-03-27 Ushiodenki Kabushiki Kaisha Dispositif source de lumière utilisant une lampe à décharge à barrière diélectrique

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH678128A5 (en) * 1989-01-26 1991-07-31 Asea Brown Boveri High power ultraviolet lamp with particle density control - heats and cools mercury reservoir connected to discharge space above dielectric covered wire counter electrode

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH678128A5 (en) * 1989-01-26 1991-07-31 Asea Brown Boveri High power ultraviolet lamp with particle density control - heats and cools mercury reservoir connected to discharge space above dielectric covered wire counter electrode

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
APPLIED PHYSICS B. PHOTOPHYSICS AND CHEMISTRY Bd. 52, 1991, HEIDELBERG DE Seiten 14 - 21 B. GELLERT ET AL. 'Generation of excimer emission in dielectric barrier discharges.' *
JAPANESE JOURNAL OF APPLIED PHYSICS Bd. 28, Nr. 12, Dezember 1989, TOKYO JP Seiten L2228 - L2231 KUMAGAI ET AL. 'A high- efficiency, high repetition- rate KrF(B-->X) excimer lamp excited by microwave discharge.' *
LASER UND OPTOELEKTRONIK Bd. 22, Nr. 4, August 1990, STUTTGART DE Seiten 55 - 59 KOGELSCHATZ ET AL. 'Neue inkoh{rente Ultraviolett-Excimerstrahler zur photolytischen Materialabscheidung.' *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0703602A1 (fr) * 1994-09-20 1996-03-27 Ushiodenki Kabushiki Kaisha Dispositif source de lumière utilisant une lampe à décharge à barrière diélectrique

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Publication number Publication date
EP0549046B1 (fr) 1996-03-27

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