EP0517735B1 - Procede de fonctionnement stable d'un plasmatron a vapeur d'eau comme gaz de plasma - Google Patents

Procede de fonctionnement stable d'un plasmatron a vapeur d'eau comme gaz de plasma Download PDF

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Publication number
EP0517735B1
EP0517735B1 EP91904221A EP91904221A EP0517735B1 EP 0517735 B1 EP0517735 B1 EP 0517735B1 EP 91904221 A EP91904221 A EP 91904221A EP 91904221 A EP91904221 A EP 91904221A EP 0517735 B1 EP0517735 B1 EP 0517735B1
Authority
EP
European Patent Office
Prior art keywords
temperature
plasma
plasmatron
steam
plasma gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP91904221A
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German (de)
English (en)
Other versions
EP0517735A1 (fr
Inventor
Hans-Ulrich Dummersdorf
Dietrich Hebecker
Dirk Von Lengerken
Carsten Winter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MASCHINEN- und ANLAGENBAU GRIMMA GmbH
Original Assignee
MASCHINEN- und ANLAGENBAU GRIMMA GmbH
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Publication of EP0517735A1 publication Critical patent/EP0517735A1/fr
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Publication of EP0517735B1 publication Critical patent/EP0517735B1/fr
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Classifications

    • A—HUMAN NECESSITIES
    • A62—LIFE-SAVING; FIRE-FIGHTING
    • A62D—CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
    • A62D3/00—Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances
    • A62D3/10—Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances by subjecting to electric or wave energy or particle or ionizing radiation
    • A62D3/19—Processes for making harmful chemical substances harmless or less harmful, by effecting a chemical change in the substances by subjecting to electric or wave energy or particle or ionizing radiation to plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/28—Cooling arrangements
    • A—HUMAN NECESSITIES
    • A62—LIFE-SAVING; FIRE-FIGHTING
    • A62D—CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING OR PROTECTING AGAINST HARMFUL CHEMICAL AGENTS; CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS
    • A62D2101/00—Harmful chemical substances made harmless, or less harmful, by effecting chemical change
    • A62D2101/20—Organic substances
    • A62D2101/22—Organic substances containing halogen

Definitions

  • the present invention relates to a method for the stable operation of a plasmatron with initially essentially water vapor as the plasma gas according to the preamble of claim 1.
  • Plasmatrons which are used for chemical material conversion, are mainly operated with a gas that is chemically inert to the plasmatron materials as the plasma gas.
  • processes of plasma pyrolysis work with hydrogen as the plasma gas.
  • the erosion of the parts which are exposed to or are in contact with the arc is particularly high in the case of plasmatrons which are operated using water vapor as the plasma gas.
  • This high erosion load therefore affects in particular the cathode and the anode.
  • the relatively high loss of electrode mass leads to a short service life of the electrodes of the plasmatron, which is operated with water vapor as the plasma gas, so that continuous operation is practically impossible due to the frequently necessary change of electrodes.
  • the invention has for its object to provide a method for stable operation of a plasmatron, which is operated with water vapor as the plasma gas, by a continuous with intensive cooling of all thermally highly stressed parts, in particular the electrodes of the plasmatron, and in the other conventional thermal process conditions Operation by increasing the service life of thermally highly stressed parts of the plasmatron and by reducing or avoiding fluctuations in the operating parameters of the plasmatron can be reached.
  • the causes are to be eliminated, which lead to a substantially higher electrode erosion and to fluctuations in the operating parameters in the case of plasmatrons with water vapor as plasma gas in comparison with plasmatrons with other gas plasmas, without, on the other hand, disadvantageous changes in the thermal process conditions or in the cooling area.
  • the cooling of the cooled parts of the plasma cartridge is preferably limited and / or a condensation temperature of the plasma gas is lowered.
  • a further improvement of the method according to the invention for reducing condensation problems with regard to the water vapor plasma on the hot water-cooled parts of the plasmatron, in particular the anode and cathode thermally acted upon by the arc, is achieved according to a further preferred embodiment of the method according to the invention in that the cooling of the thermally highly stressed parts of the plasma cartridge, in particular the electrodes, are combined by hot water with a temperature of at least 80 ° C. with a lowering of the condensation temperature of the plasma gas by admixing a gas with a low condensation temperature.
  • Air is preferably added to the plasma vapor after the evaporation stage to lower the condensation temperature of the plasma gas mixture, the
  • the condensation temperature of the water vapor plasma gas component is, for example, 80 ° C., while in this case the electrode cooling according to the invention by means of hot water maintains an electrode temperature of more than 80 ° C.
  • This problem is preferably solved by limiting the cooling of the thermally highly stressed and therefore cooled parts of the plasmatron by using hot water as a coolant with a temperature of at least approximately 80 ° C.
  • the limitation of the cooling is achieved by only reducing the thermal driving force between the electrode surface, preferably the anode inner wall, and the cooling water.
  • a particularly effective solution is achieved according to an advantageous embodiment of the invention by a combination of the limitation of cooling in conjunction with the use of hot water as a coolant and the simultaneous lowering of the condensation temperature of the water vapor plasma by admixing a gas with a condensation temperature lower than that of water vapor, the Cooling water inlet temperature is controlled so that the surface temperature of the cathode and anode of the plasma cartridge is at least close to the condensation temperature of the plasma gas mixture corresponding to the new water vapor partial pressure.
  • Air is preferably additionally mixed into the water vapor as the gas reducing the condensation temperature of the water vapor plasma.
  • the invention is explained in more detail below on the basis of an exemplary embodiment for the destruction of toxic waste products with the aid of a chemical substance conversion by treatment in plasma cartridges which are operated essentially with water vapor as the plasma gas.
  • a plasma system for the destruction of toxic waste products preferably for the chemical conversion of waste products containing chlorinated or fluorinated hydrocarbons, consists of 10 plasma cartridges, each with a power of 30 kW, with the corresponding reactors and necessary additional units in a conventional manner.
  • the system is operated with 25 kg / h of steam at a temperature of 300 ° C at 0.1 mPa as plasma gas.
  • the plasmatron has a cooling device which uses cooling water as a coolant for cooling the thermally highly stressed parts of the plasmatron, in particular the anode and cathode.
  • the cooling water inlet temperature at the anode and increased the cathode by reducing the cooling in the cooling water circuits of the system to preferably 80 ° C., so that the thermally highly stressed parts of the plasmatons are subject to hot water cooling.
  • a cooling water speed of 50 to 70 m / s a cooling water outlet temperature of 81 to 82 ° C is reached.
  • Such a temperature control only insignificantly reduces the thermal driving force compared to the cooling water temperature, which is normally kept at room temperature, due to the (considerable) temperature difference between the surface temperature of the electrode and the original cooling water temperature, ie sufficient cooling of the electrodes can also be achieved with hot water.
  • a second preferred embodiment of the invention in the form of the use of hot water according to the invention with a temperature of preferably At least 80 ° C cooled plasmatrons for the destruction of toxic waste products by chemical conversion, the fluctuations in the operation of the plasmatrons that may still remain despite the reduction of the electrode cooling through the use of hot water cooling are not justifiable, since this, even if to a small extent, makes the leakage more toxic Pollutants could occur.
  • the cooling according to the invention of the thermally particularly stressed plasmatron parts, in particular the electrodes with hot water combined with a reduction in the condensation temperature of the water vapor plasma gas.
  • the condensation temperature can be reduced by admixing a foreign gas with a condensation temperature lower than that of water vapor to the water vapor. In this case, e.g. 62.5 m3 / h of air mixed into the plasma vapor after the evaporation stage.
  • the condensation temperature of the water vapor plasma component is now 80 ° C.
  • the electrode temperature with the electrode cooling according to the present invention is at least in this case preferably slightly more than 80 ° C., condensation of water vapor can be completely prevented in this way, so that the cause of fluctuations in the operation of the plasmatons are completely eliminated and a continuous flow of the material conversion processes is guaranteed. In this way, breakthroughs of toxic substances through a water vapor plasmatron can be completely avoided.
  • the invention provides a plasmatron and a method for the stable operation of a plasmatron with water vapor as the plasma gas, in which the fluctuations typical of water vapor plasmas, sudden fluctuations in the Operating conditions and increased electrode erosion can be avoided.
  • This is achieved by limiting the cooling of the thermally highly stressed plasmatron parts, in particular electrodes, as a result of using hot water as the coolant, which is used at a temperature of at least 80 ° C. most preferably.
  • the condensation of water vapor at strongly cooled areas of the plasmatron which leads to severe disturbances or interruptions of the plasma jet as a result of the arc and explosive evaporation of the condensate, and to material erosion from the electrode surface, leads to electrode erosion.
  • the invention not only brings about stable operation and long electrode life, but also improves the efficiency of the plasmatron and the yield of the plasma chemical processes.
  • the effect of the hot water cooling of the plasmatron electrodes can preferably be additionally increased by lowering the condensation point of the water vapor plasma atmosphere by adding a gas to the water vapor with a condensation temperature which is lower than that of water vapor, so that the latter now Water vapor partial pressure corresponding condensation temperature of the plasma gas mixture is below the temperature which is maintained as the surface temperature even at the most cooled points of the plasmatron, the electrodes, so that condensation and resulting condensate evaporation phenomena in the arc area of the plasmatron are actually avoided.
  • the pressure conditions in the plasma reactor and the respective phase conversion products, deviations and modifications can be carried out with the aim of avoiding the problems with plasmatron parts resulting from the condensation of the water vapor on cooled plasmatron parts, which essentially contain water vapor as plasma gas by ensuring, by choosing the cooling and / or condensation conditions, that condensation of the plasma gas or gas mixture or parts thereof does not occur at the cooled areas, in particular the electrodes of the plasmatron.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Business, Economics & Management (AREA)
  • Emergency Management (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Paints Or Removers (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Paper (AREA)
  • Drying Of Semiconductors (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • External Artificial Organs (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Claims (7)

  1. Procédé pour assurer la marche stable d'un plasmatron, avec comme gaz de plasma au moins essentiellement de la vapeur d'eau, dans lequel en particulier les pièces soumises à une forte contrainte thermique, telles que les électro-des, etc., sont refroidies à l'aide d'un moyen de refroidissement, caractérisé en ce que la température du moyen de refroidissement et/ou la composition du gaz de plasma sont régulées de façon que la température de condensation du gaz plasma-gène soit au moins essentiellement inférieure à la température de surface, déterminée par la température du moyen de refroidissement, des pièces du plasmatron traversées par le moyen de refroidissement et refroidies.
  2. Procédé selon la revendication 1, caractérisé en ce qu'on limite le refroidissement des pièces refroidies du plasmatron et/ou qu'on abaisse la température de condensation du gaz de plasma.
  3. Procédé selon la revendication 1 ou 2, caractérisé en ce qu'on utilise comme moyen de refroidissement de l'eau chaude à une température d'au moins environ 80°C.
  4. Procédé selon au moins l'une des revendications 1 à 3 précédentes, caractérisé en ce que la température de condensation du plasma de vapeur d'eau est diminuée par addition d'au moins un gaz ayant une température de condensation plus basse.
  5. Procédé selon la revendication 4, caractérisé en ce que, après l'étape de vaporisation de la vapeur d'eau, on mélange de l'air à la vapeur de plasma.
  6. Procédé assurant la marche stable d'un plasmatron, pour permettre une transformation chimique de matières, en particulier pour la destruction totale de déchets toxiques, contenant en particulier des hydrocarbures chlorés ou fluorés, selon la revendication 1, caractérisé en ce qu'on utilise comme gaz de plasma au moins essentiellement de la vapeur d'eau, et, comme fluide du moyen de refroidissement, de l'eau chaude à une température d'au moins environ 80°C.
  7. Procédé selon la revendication 6, caractérisé en ce qu'on utilise comme gaz de plasma essentiellement de la vapeur d'eau, à laquelle on a mélangé un gaz abaissant la température de condensation, en particulier l'air, et que l'on utilise comme moyen de refroidissement de l'eau chaude à une température d'au moins 80°C.
EP91904221A 1990-02-26 1991-02-26 Procede de fonctionnement stable d'un plasmatron a vapeur d'eau comme gaz de plasma Expired - Lifetime EP0517735B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DD90338145A DD299613A7 (de) 1990-02-26 1990-02-26 Verfahren zum stabilen betrieb von plasmatrons mit wasserdampf als plasmagas
DD338145 1990-02-26
PCT/EP1991/000348 WO1991013532A1 (fr) 1990-02-26 1991-02-26 Plasmatron a vapeur d'eau comme gaz de plasma et procede de fonctionnement stable du plasmatron

Publications (2)

Publication Number Publication Date
EP0517735A1 EP0517735A1 (fr) 1992-12-16
EP0517735B1 true EP0517735B1 (fr) 1995-12-27

Family

ID=5616667

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91904221A Expired - Lifetime EP0517735B1 (fr) 1990-02-26 1991-02-26 Procede de fonctionnement stable d'un plasmatron a vapeur d'eau comme gaz de plasma

Country Status (12)

Country Link
US (1) US5498826A (fr)
EP (1) EP0517735B1 (fr)
JP (1) JPH0821474B2 (fr)
AT (1) ATE132316T1 (fr)
DD (1) DD299613A7 (fr)
DE (1) DE59107163D1 (fr)
DK (1) DK0517735T3 (fr)
ES (1) ES2084155T3 (fr)
FI (1) FI923813A (fr)
GR (1) GR3019093T3 (fr)
RU (1) RU2067790C1 (fr)
WO (1) WO1991013532A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2724806A1 (fr) * 1994-09-16 1996-03-22 Pompes Maupu Entreprise Procede et dispositif d'assistance par plasma au vapo-craquage non-catalytique de composes hydrocarbones et halogeno-organiques
JP2985762B2 (ja) * 1996-03-18 1999-12-06 日本電気株式会社 排気ガスの処理方法及び処理装置
WO2004048851A1 (fr) * 2002-11-25 2004-06-10 David Systems Technology, S.L. Procede a induction et frequence plasmique integree pour traitement de dechets, recuperation de ressources et dispositif associe
EP2957152A4 (fr) 2013-02-15 2016-08-31 Pyrogenesis Canada Inc Système de torche à plasma de vapeur sans transfert à courant continu à grande puissance
RU2721931C1 (ru) * 2020-01-13 2020-05-25 Общество С Ограниченной Ответственностью "Плазариум" Прямоточный парогенератор для плазменной системы, плазменная система с таким парогенератором и способ генерации перегретого пара
CN111246649A (zh) * 2020-01-16 2020-06-05 江苏河海新能源股份有限公司 水蒸汽等离子发生装置
CN111586954B (zh) * 2020-06-08 2022-09-09 江苏帕斯玛环境科技有限公司 水蒸气等离子体产生的方法

Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
DE215325C (fr) *
DE218984C (fr) * 1908-04-16
DE1417746A1 (de) * 1960-11-28 1969-02-13 Berghaus Elektrophysik Anst Verfahren zur Durchfuehrung chemischer Prozesse
HU184389B (en) * 1981-02-27 1984-08-28 Villamos Ipari Kutato Intezet Method and apparatus for destroying wastes by using of plasmatechnic
DD218984A1 (de) * 1983-06-01 1985-02-20 Adw Ddr Verduesungsvorrichtung fuer fluessigkeiten in hochtemperaturplasmen
US4582004A (en) * 1983-07-05 1986-04-15 Westinghouse Electric Corp. Electric arc heater process and apparatus for the decomposition of hazardous materials
DE3330750A1 (de) * 1983-08-26 1985-03-14 Chemische Werke Hüls AG, 4370 Marl Verfahren zur erzeugung von acetylen und synthese- oder reduktionsgas aus kohle in einem lichtbogenprozess
US4642440A (en) * 1984-11-13 1987-02-10 Schnackel Jay F Semi-transferred arc in a liquid stabilized plasma generator and method for utilizing the same
SE453920B (sv) * 1985-03-01 1988-03-14 Skf Steel Eng Ab Sett och anordning for forgasning av fossila brenslen samt reformering av gasformiga brenslen
CA1324823C (fr) * 1988-08-08 1993-11-30 Robert Chrong-Wen Chang Procede et dispositif de pyrolyse au plasma de dechets liquides
AT402338B (de) * 1988-08-11 1997-04-25 Grimma Masch Anlagen Gmbh Verfahren zur vernichtung toxischer abprodukte sowie plasmatischer reaktor zur durchführung des verfahrens
US5026464A (en) * 1988-08-31 1991-06-25 Agency Of Industrial Science And Technology Method and apparatus for decomposing halogenated organic compound
JPH084707B2 (ja) * 1988-11-10 1996-01-24 工業技術院長 有機ハロゲン化合物の分解方法
JPH0722607B2 (ja) * 1989-09-01 1995-03-15 工業技術院長 プラズマ反応法による有機ハロゲン化合物の分解方法および装置
JPH03242158A (ja) * 1990-02-20 1991-10-29 Mitsubishi Heavy Ind Ltd フルオロカーボンの分解処理方法
JP2617144B2 (ja) * 1990-04-13 1997-06-04 新日本製鐵株式会社 ハロゲン化有機化合物のプラズマ分解処理方法

Also Published As

Publication number Publication date
JPH0821474B2 (ja) 1996-03-04
DE59107163D1 (de) 1996-02-08
DD299613A7 (de) 1992-04-30
JPH05506536A (ja) 1993-09-22
US5498826A (en) 1996-03-12
FI923813A0 (fi) 1992-08-25
EP0517735A1 (fr) 1992-12-16
GR3019093T3 (en) 1996-05-31
RU2067790C1 (ru) 1996-10-10
ES2084155T3 (es) 1996-05-01
DK0517735T3 (da) 1996-03-18
FI923813A (fi) 1992-08-25
ATE132316T1 (de) 1996-01-15
WO1991013532A1 (fr) 1991-09-05

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