EP0491182A2 - Processeur pour des matériaux photosensibles avec mèche pour flux laminaire d'un fluide - Google Patents

Processeur pour des matériaux photosensibles avec mèche pour flux laminaire d'un fluide Download PDF

Info

Publication number
EP0491182A2
EP0491182A2 EP91119964A EP91119964A EP0491182A2 EP 0491182 A2 EP0491182 A2 EP 0491182A2 EP 91119964 A EP91119964 A EP 91119964A EP 91119964 A EP91119964 A EP 91119964A EP 0491182 A2 EP0491182 A2 EP 0491182A2
Authority
EP
European Patent Office
Prior art keywords
fluid
processing
sump
chamber
wick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP91119964A
Other languages
German (de)
English (en)
Other versions
EP0491182A3 (en
Inventor
Douglas Oliver C/O Eastman Kodak Company Hall
Bruce Robert C/O Eastman Kodak Company Muller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of EP0491182A2 publication Critical patent/EP0491182A2/fr
Publication of EP0491182A3 publication Critical patent/EP0491182A3/de
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/003—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected film surface only souching the liquid

Definitions

  • This invention relates to apparatus for processing photosensitive material, such as sheets of X-ray film, wherein a processing fluid is returned to a sump in a way which avoids entrapment of air in the fluid returning to the sump.
  • aeration and air entrapment can cause degradation of the chemistry of a processing solution.
  • Air entrapment occurs any time the processing solution experiences a free-fall condition.
  • aeration and air entrapment can occur when the processing solution is returned from the processing chamber to the sump because the processing solution experiences a free-fall situation as it flows through the drains and chute in the process of being returned to the sump. Accordingly, it is desirable to eliminate the free-fall condition existing in the apparatus of the before-mentioned copending U.S. patent application and to obtain, instead, a laminar flow of the processing fluid as it is returned to the sump.
  • a processor having a processing chamber through which photosensitive material can be advanced while processing fluid is supplied along a path to the chamber, and wherein a wick is located along the one part of the path to avoid free-fall of the fluid and to produce laminar flow of the fluid, thereby reducing entrapment of air in the fluid.
  • Figs. 1 and 2 of the drawings illustrate a photographic processing apparatus of the invention, generally designated 8, that is useful for processing a strip or sheet of photosensitive material 10 (film or paper).
  • the photographic processing apparatus includes a plurality of photographic processing units, three of which are shown at 12, 14 and 16.
  • a processing fluid 18 (Fig. 2) is supplied to each unit.
  • the fluid 18 is generally in a liquid form including such photographic processing liquids as developer, fixer, bleach, rinsing fluid, water or any other fluids for use in the processing of photosensitive materials. Any number of photographic processing units can be included in the photographic processing apparatus depending on the number of processing fluids required for processing a specific photosensitive material.
  • a plurality of sump tanks 20, 22, 24 for fluid 18 are provided for units 12, 14, 16, respectively.
  • the units 12, 14, 16 include vessels 31, 32, 33 respectively and processing devices 41, 42, 43, respectively.
  • the film 10 is conveyed through the apparatus by a plurality of pairs of nip rollers 34 of the photographic processing units 12, 14, 16.
  • the rollers can be driven by any conventional drive means (not shown).
  • vessel 31 comprises an upper tank 38 and a lower tank 40.
  • Four connecting tubes 44 connect the interior of tanks 38 and 40. The tubes allow the fluid 18 to flow freely between the upper tank 38 and the lower tank 40.
  • a processing device 41 is located between the upper tank 38 and the lower tank 40.
  • the device 41 includes a first or upper applicator housing 48 and a second or lower applicator housing 50.
  • the housings define a fluid chamber 52, and film 10 travels through the chamber during processing of the film 10.
  • Fluid 18 enters the chamber 52 through two elongated slots 54 in housing 48.
  • the slots are located proximate an entrance end 56 and an exit end 58, respectively, of the fluid chamber 52.
  • the fluid 18 also enters the chamber 52 through two elongated slots 60 in housing 50.
  • the slots are located near the entrance and exit ends 56, 58 respectively of the fluid chamber 52.
  • an upper layer of fluid 18 and a lower layer of fluid 18 are formed on opposite sides of the film 10 in chamber 52.
  • the upper tank 38 has slits 62 in the lower wall which are aligned with the inlet slots 54 in housing 48.
  • the lower tank 40 has slits 64 formed in its upper wall which are aligned with the inlet slots 60 in housing 50.
  • the slits 62 permit fluid 18 to flow between the upper tank 38 and the chamber 52, and the slit 64 allows fluid to flow between the lower tank 40 and the chamber 52.
  • the processing device 41 is essentially submersed in the fluid 18 in the vessel 31.
  • O-rings 66,67 seal the interface between the tanks 38, 40 and the applicator housings 48 and 50.
  • Fluid is supplied to upper tank 38 through a conduit 68 having openings 78 therein.
  • a pump 72 has an inlet connected to a conduit 76 in sump 20.
  • Conduit 76 also has openings therein (not shown) which enables the pump to withdraw fluid from the sump through conduit 76.
  • the pump has an outlet connected by a conduit 78 to conduit 68 in the upper tank.
  • Processing fluid furnished to chamber 52 flows toward the center of the processing device 41 and along both surfaces of the photosensitive material 10. Fluid is exhausted from chamber 52 through slit-like orifices 80, 82 that lead into upper and lower drains 84, 86, respectively. The processing fluid flows from drains 84, 86 through chutes 88, 90, respectively, and then back into the sump 20, as shown in Fig. 3.
  • the chutes 88, 90 extend in a generally vertical direction which allows the processing fluid to encounter a free-flow condition as it leaves the drains and falls through the chute on the way to the sump as disclosed in the before-mentioned US-A 4,994,840.
  • aeration and air entrapment occurs in the fluid, thereby degrading the chemistry of the fluid.
  • wicks 92, 94 are provided in the chutes 88, 90, respectively to produce a laminar flow of the fluid as it travels from the drains into the sump tank.
  • the wicks are formed of a flexible material and extend from the outlet of the drains 84, 86 along the chutes in a downwardly direction from the drains.
  • the wicks are made from a material which is chemically inert to the fluid traveling through the wicks.
  • the wicks can be made from an open cell foam material, such as a styrene foam.
  • the wicks can be made from a loosely woven material that is rolled or folded to form the wick. In either case, it is important that the fluid be able to flow through the open cells of the foam or loosely woven material. As this occurs, the velocity of the fluid is reduced and the turbulent flow of fluid resulting from fluid flowing through the chute without a wick is converted to laminar flow at the time the fluid enters the sump tank. Thus, there is no air entrapment and the chemistry of the fluid is not degraded.
  • the wick is made of a flexible material that can be configured to any desired shape.
  • the wicks 92, 94 extend far enough downwardly to be below the surface 96 of fluid in the sump tank 20.
  • both the chutes 88, 90 and the wicks 92, 94 are below the level of the surface 96.
  • Surface 96 can be maintained at a constant level by providing an overflow hole 98 in a wall of the sump tank through which excess fluid can be removed from the tank and provided to a storage container or a drain (not shown).
  • wicks are specifically shown in the chutes used for returning fluid to the sump tank, similar wicks can be used in other areas of the processor where fluid traveling along its path encounters a free-fall resulting in turbulence and air entrapment that is detrimental to the chemistry of the fluid.
  • part of the path for fluid flows from the upper tank 38 to the lower tank 40 through a series of connecting tubes 44, and the fluid may be subject to free-fall as it moves through those tubes. Therefore, wicks can also be provided in the tubes to convert the free-fall turbulent flow of the fluid to a laminar flow and avoid air entrapment.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
EP19910119964 1990-12-17 1991-11-22 Processor for photosensitive material with laminar fluid flow wick Withdrawn EP0491182A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US628052 1984-07-05
US07/628,052 US5093678A (en) 1990-12-17 1990-12-17 Processor with laminar fluid flow wick

Publications (2)

Publication Number Publication Date
EP0491182A2 true EP0491182A2 (fr) 1992-06-24
EP0491182A3 EP0491182A3 (en) 1993-02-17

Family

ID=24517243

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19910119964 Withdrawn EP0491182A3 (en) 1990-12-17 1991-11-22 Processor for photosensitive material with laminar fluid flow wick

Country Status (3)

Country Link
US (1) US5093678A (fr)
EP (1) EP0491182A3 (fr)
JP (1) JPH04294349A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5335039A (en) * 1992-10-02 1994-08-02 Eastman Kodak Company Apparatus for processing photosensitive material
US5379087A (en) * 1993-04-27 1995-01-03 Eastman Kodak Company Processing apparatus
US10035174B2 (en) 2015-02-09 2018-07-31 United Technologies Corporation Open-cell reticulated foam

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1928235A (en) * 1930-10-07 1933-09-26 Hughes Ind Co Ltd Apparatus for treating films
DE3623452A1 (de) * 1986-07-11 1988-01-28 Theilemann Retheto Filmtech Filmreinigungsvorrichtung
US4994840A (en) * 1990-03-16 1991-02-19 Eastman Kodak Company Apparatus for processing photosensitive material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3946039A (en) * 1967-10-30 1976-03-23 Energy Research & Generation, Inc. Reticulated foam structure
US3645298A (en) * 1968-01-30 1972-02-29 Brunswick Corp Collimated hole flow control device
US3945402A (en) * 1974-10-25 1976-03-23 Murphy Peter J Laminar flow pipe system
US4043360A (en) * 1975-07-16 1977-08-23 Incontrol Ltd. Pressure reducing device for fluids
US4398818A (en) * 1980-10-03 1983-08-16 Xerox Corporation Liquid toner fountain for the development of electrostatic images
FR2500653A1 (fr) * 1981-02-26 1982-08-27 Commissariat Energie Atomique Dispositif de reglage du debit d'un fluide
CA1199854A (fr) * 1983-08-31 1986-01-28 Majesty (Her) The Queen In Right Of Canada As Represented By The Minister Of National Defence Element a ecoulement laminaire
US4660587A (en) * 1986-07-28 1987-04-28 Rizzie Joseph W System for producing uniform velocity distribution of fluids in conduits
US4716936A (en) * 1986-12-22 1988-01-05 The United States Of America As Represented By The Secretary Of The Army Fluidic system with noise filter for increasing operating range
US4989028A (en) * 1989-10-25 1991-01-29 Eastman Kodak Company Apparatus for processing light sensitive material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1928235A (en) * 1930-10-07 1933-09-26 Hughes Ind Co Ltd Apparatus for treating films
DE3623452A1 (de) * 1986-07-11 1988-01-28 Theilemann Retheto Filmtech Filmreinigungsvorrichtung
US4994840A (en) * 1990-03-16 1991-02-19 Eastman Kodak Company Apparatus for processing photosensitive material

Also Published As

Publication number Publication date
JPH04294349A (ja) 1992-10-19
EP0491182A3 (en) 1993-02-17
US5093678A (en) 1992-03-03

Similar Documents

Publication Publication Date Title
EP0446768B1 (fr) Appareil pour le développement d'un matériau photosensible
US5070351A (en) Method and apparatus for processing photosensitive material
US5059997A (en) Apparatus for processing photosensitive material
EP0623844A1 (fr) Appareils de développement automatiques
EP0623849A1 (fr) Appareils de développement automatiques
US5093678A (en) Processor with laminar fluid flow wick
JP2928093B2 (ja) モジュラー処理チャネルを有する感光材処理装置
US5452043A (en) Rack and a tank for a photographic low volume thin tank insert for a rack and a tank photographic processing apparatus
US5528329A (en) Photographic film processing apparatus
JP2928091B2 (ja) 感光材料処理装置
US3336853A (en) Apparatus for treating sheet-form materials
JP2928090B2 (ja) 感光材処理装置
US5426480A (en) Photographic film processing apparatus
EP0695970A1 (fr) Appareil de traitement de film photographique
US5418591A (en) Counter cross flow for an automatic tray processor
JP4359410B2 (ja) 感光材料処理装置
JP2722421B2 (ja) 感光材料処理装置
JPS62115450A (ja) 自動現像装置
JP2696762B2 (ja) 感光材料処理装置
JP2722420B2 (ja) 感光材料処理装置
JPH02205846A (ja) 感光材料処理装置
JPH01267648A (ja) 感光材料処理装置および感光材料処理方法
JPH09304904A (ja) 補充装置
JPH0534890A (ja) 感光材料処理装置
JPH04269745A (ja) 感光材料処理装置

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR GB IT

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): DE FR GB IT

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 19930818