EP0489834B1 - Einrichtung für infrarotausstrahlung - Google Patents

Einrichtung für infrarotausstrahlung Download PDF

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Publication number
EP0489834B1
EP0489834B1 EP90913501A EP90913501A EP0489834B1 EP 0489834 B1 EP0489834 B1 EP 0489834B1 EP 90913501 A EP90913501 A EP 90913501A EP 90913501 A EP90913501 A EP 90913501A EP 0489834 B1 EP0489834 B1 EP 0489834B1
Authority
EP
European Patent Office
Prior art keywords
infra
red radiation
radiation
red
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP90913501A
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English (en)
French (fr)
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EP0489834A1 (de
Inventor
Robert William Blundy
John Lionel Driscoll
Donald James Eaton
William Jones
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EA Technology Ltd
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EA Technology Ltd
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Publication of EP0489834B1 publication Critical patent/EP0489834B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/68Heating arrangements specially adapted for cooking plates or analogous hot-plates
    • H05B3/74Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
    • H05B3/744Lamps as heat source, i.e. heating elements with protective gas envelope, e.g. halogen lamps
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/0033Heating devices using lamps
    • H05B3/0071Heating devices using lamps for domestic applications
    • H05B3/008Heating devices using lamps for domestic applications for heating of inner spaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/0033Heating devices using lamps
    • H05B3/009Heating devices using lamps heating devices not specially adapted for a particular application
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/40Heating elements having the shape of rods or tubes
    • H05B3/42Heating elements having the shape of rods or tubes non-flexible
    • H05B3/44Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material

Definitions

  • This invention relates to an infra-red radiation emission arrangement.
  • Infra-red radiation emitters which comprise a tungsten filament in an envelope of vitreous silica. Such emitters have a fast response, in that the radiation emitted can change from full power to negligible values within one second of the emitter being switched off.
  • Such emitters emit radiation primarily in the short wavelength of infra-red radiation, ie. in the range of from 0.8 to 2.5 microns or in the medium wavelength of infra-red radiation, from 1.2 to 4.0 microns.
  • EP-A-0134090 and GB-A-2160400 It is known from EP-A-0134090 and GB-A-2160400 to provide an infra-red radiation emission arrangement comprising a primary source of short or medium wavelength infra-red radiation arranged to emit the radiation in a first direction, and a substrate of thermally insulating material having a surface spaced apart from the primary source and facing the first direction. This arrangement does not, however, provide for significant re-radiation of long wavelength infra-red radiation since the surface has a high reflectivity.
  • an infra-red radiation emission arrangement comprising: a primary source of short or medium wavelength infra-red radiation arranged to emit said short or medium wavelength infra-red radiation in a first direction; and a substrate of thermally insulating material having a surface spaced apart from said primary source and facing said first direction; characterised by a coating of an infra-red radiation absorptive material provided on at least a part of said surface on which, in use, said short or medium wavelength infra-red radiation is incident, said coating being adapted to absorb said short or medium wavelength infra-red radiation whereby said coating is heated to re-radiate infra-red radiation at a longer wavelength in a second direction, substantially opposite said first direction; said infra-red absorptive material having a normal spectral emittance at infra-red wavelengths of at least 0.8.
  • radiation from said primary source is incident on, and absorbed by, said coating.
  • the substrate is thermally insulating, little heat is conducted away from said coating and so the coating is maintained above ambient temperature.
  • the temperature achieved by the infra-red absorptive material will depend upon the intensity of the short or medium wavelength infra-red radiation from said primary source incident thereon, and on the absorptivity/reflectivity of said coating.
  • the intensity of radiation incident on said coating is itself dependent upon the positioning and shaping of said coating relative to said primary source. Accordingly, said coating will be at a lower temperature, and so will emit radiation of a longer wavelength than, said primary source.
  • a part of said surface is reflective of radiation at infra-red wavelengths.
  • the total radiation output of such an arrangement is a combination of the short or medium wavelength radiation from said primary source, reflected by said surface, and medium/long wavelength radiation emitted by said coating. In this way, the total radiation output of the arrangement can be further controlled.
  • said coating has a low thermal mass, responding rapidly in temperature to variations in the incident infra-red radiation.
  • the thermal response of the arrangement is dependent upon the thermal response of said primary source, which can be very fast as indicated previously and the thermal mass of that part of the substrate which responds to the incident infra-red radiation. Accordingly, an arrangement according to this aspect of the present invention has a relatively fast thermal response and an emission spectrum in the long wavelength infra-red.
  • the arrangement of the invention has the advantages that it has a faster thermal response time when emitting in the long wavelength region of the infra-red spectrum than known emission arrangements, and also that it provides for controllable broadening of the useful wavelength limits of the total radiation output from the arrangement as compared with a conventional single hot body infra-red emitter.
  • said surface of the coating re-radiates at least 50%, and preferably at least 85% of the radiation energy incident on said coating from the primary source.
  • said primary source includes an envelope, a part of said envelope through which radiation is transmitted away from said surface being coated with an infra-red radiation absorptive material which, in operation, is heated to re-radiate infra-red radiation at a longer wavelength.
  • the arrangement can include a secondary reflector to direct radiation from said primary source towards said surface.
  • Figure 1 shows three infra-red radiation emission arrangements 1, 2 and 3, each comprising a short wavelength infra-red radiation emitter 4, such as a tungsten quartz emitter.
  • a short wavelength infra-red radiation emitter 4 such as a tungsten quartz emitter.
  • the spectral output of a known tungsten quartz emitter is shown in Figure 2.
  • Each short wavelength infra-red radiation emitter 4 has an associated reflector 5 which is arranged to direct infra-red radiation from the emitter 4 towards a concave surface 6 of a high efficiency thermally insulating substrate 7.
  • the substrate 7 may be made of a low thermal mass material, such as ceramic fibres or microporous thermally insulating material, which reflects radiation of infra-red wavelengths as well as being thermally insulating.
  • the surface 6 has a coating 8 on which the radiation from the associated emitter 4 is incident.
  • the coating 8 is of an infra-red radiation absorptive material, such as copper oxide, boron carbide or iron oxide.
  • the coating 8 is heated by the incident radiation from the associated emitter 4 (indicated by arrow S) and emits infra-red radiation in the medium/long wavelength part of the infra-red radiation spectrum (as indicated by the arrow M/L).
  • the coating is very thin, so that it has a low thermal mass and so responds quickly to variations in the infra-red radiation incident thereon.
  • the coating 8 may be made of any infra-red radiation absorptive material which has a high emissivity, preferably of at least 0.8.
  • Table 1 shows a number of high emissivity materials and indicates the conditions at which this high emissivity was measured, namely the wavelength range of radiation emitted and the temperature of the material at which this emission took place.
  • Figure 3 shows a second embodiment of a radiation emission arrangement according to the present invention.
  • the surface 6 is provided as a planar surface. Surfaces having other geometries may also be used.
  • Figure 4 shows a third embodiment of an infra-red radiation emission arrangement prepared in accordance with the present invention.
  • the primary source 4 is shown in greater detail as a tungsten filament 10 in an envelope 12 of vitreous silica.
  • Part of the envelope 12 through which radiation from the filament 10 is transmitted, away from the substrate 7, is coated with an infra-red radiation absorptive material having a high emissivity. Suitable materials are those disclosed in table 1 previously.
  • the coating 14 on the envelope 12 is heated by the incident radiation from the tungsten filament 10 and emits infra-red radiation in the medium/long wavelength part of the infra-red radiation spectrum.
  • An advantage of this embodiment over the embodiments of Figures 1 and 3 is that the effect of shielding of radiation from the coating 8 by the secondary reflector 5 of Figure 1 and 3 on the total radiation output of the embodiment is reduced.
  • the arrow s indicates short wavelength radiation from the primary source and the arrow M/L indicate longer wavelength radiation.
  • each infra-red radiation emission arrangement 1, 2 or 3 can be set by appropriate selection of the mass, ie. the thickness, and the material of the coating 8, and of the position of the emitter 4 and its reflector 5 relative to the coated surface 6 of the substrate 7, such selection determining the temperature of the coating 8 during operation.
  • Figure 5 shows a substrate 7 for use with a fourth embodiment of an infra-red radiation emission arrangement provided in accordance with the present invention.
  • the surface 6 is partially not covered by the coating 8. Accordingly, infra-red radiation incident on the uncoated parts 9 from the associated emitter 4 will be directly reflected therefrom.
  • the total radiation output of this arrangement is a combination of radiation at medium/long wavelengths emitted from the coating 8 and infra-red radiation of short/medium wavelengths reflected from the uncoated part 9.
  • the coating 8 has a sufficient quantity of infra-red absorptive material per unit surface area of the part of the substrate 7 that substantially all of the incident infra-red radiation is absorbed and re-radiated at longer wavelengths.
  • the coating 8 may include an insufficient quantity of infra-red radiation absorptive material to absorb all of the incident infra-red radiation. It is envisaged that this may be because the quantity of material is insufficient to coat the entire surface of the substrate 7 so that incident radiation is reflected from the uncoated parts. In this latter case, the infra-red radiation that is not absorbed by the coating 8 is transmitted to the substrate 7 and reflected therefrom. Accordingly, as with the embodiment of Figure 5, the total radiation output of such an arrangement is a combination of radiation at medium/long wavelength emitted from the coating 8 and infra-red radiation of short/medium wavelengths reflected from the substrate 7.
  • Figures 6 and 7 show spectral output for infra-red emission arrangements provided in accordance with the present invention.
  • the substrate 7 was made of an alumino-silicate ceramic fibre board (for example "Kaowool 1600" manufactured by Morgan Ceramic Fibres Limited) of thickness 5 mm to 7 mm with a backing of microporous thermal insulation board (for example, "Microtherm” manufactured by Micropore Insulation Limited) of thickness 25 mm.
  • a single board of ceramic fibre or Microtherm of thickness 25 mm to 30 mm may be used.
  • the quoted thermal conductivities of the substrate material are 0.079 W/mK for Kaowool and 0.025 W/mK for Microtherm.
  • the reflectivity of these two substrate materials at short wavelengths of infra-red radiation is high - a graph showing the reflectivity of Microtherm is provided as Figure 8.
  • the material used for the absorptive coating is silicon carbide although successful emission arrangements have also been made using coatings of copper oxide, boron silicide and molybdenum disilicide.
  • silicon carbide is known to have an emissivity of at least 0.8. Its absorptivity is dependent on the quantity of material provided per unit surface area of substrate. Above a certain value of the coating thickness, the absorptivity equals the emissivity and the coating is opaque to the incident radiation. For the particular silicon carbide used, this critical value was 150 grams per square metre.
  • the substrate 7 and coating 8 were planar and the substate and primary sources were arranged horizontally.
  • Figure 6 shows the effect of the amount of material in the coating on the spectral radiation output from the substrate.
  • the details of the examples are as follows:
  • the spectral radiation output for example C is primarily at wavelengths greater than 2 microns.
  • the spectral radiation output for example B includes a significant component at wavelengths less than 2 microns which is contributed by reflection from the Kaowool.
  • Figure 7 shows the effect of leaving part of the substrate surface uncoated, the remainder being coated with silicon carbide of coat weight 150 grams per square metre. The details are as follows:
  • example A the spectral output of example A is primarily at the short wavelength end of the infra-red radiation spectrum and although this example, which is not an emission arrangement in accordance with the present invention, has the best thermal response, this is primarily due to the fast thermal response of the primary source.
  • the other examples B, C, D and E have a substantially faster thermal response than the commercial long wavelength radiation emitters such as Pearlco 500 watt and Vulcan 400 watt.
  • Arrangements in accordance with the invention can be used as heat/curing sources in commercial process ovens, or as domestic heating sources.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Resistance Heating (AREA)

Claims (14)

  1. Infrarot-Strahlungsemissionsanordnung, umfassend: eine Primärquelle (4) kurz- oder mittelwelliger Infrarot-Strahlung, welche zur Emission der kurz- oder mittelwelligen Infrarot-Strahlung in einer ersten Richtung ausgelegt ist, sowie ein Substrat (7) aus thermisch isolierendem Material mit einer von der Primärquelle (4) im Abstand vorgesehenen und in die erste Richtung weisenden Oberfläche (6),
    gekennzeichnet durch eine auf zumindest einem Teil der Oberfläche (6), auf den die kurz- oder mittelwellige Infrarot-Strahlung im Gebrauch einfällt, vorgesehene Schicht (8) eines Infrarot-Strahlung absorbierenden Materials, wobei die Schicht (8) ausgeführt ist, die kurz- oder mittelwellige Infrarot-Strahlung zu absorbieren, wodurch die Schicht (8) zur Abstrahlung längerwelliger Infrarot-Strahlung in einer zweiten, der ersten Richtung im wesentlichen entgegengesetzten Richtung erwärmt wird, wobei das infrarot-absorbierende Material bei Infrarot-Wellenlängen eine normale spektrale Emittanz von wenigstens 0,8 aufweist.
  2. Anordnung nach Anspruch 1,
    dadurch gekennzeichnet,
    daß die Schicht (8) wenigstens 50% der einfallenden Infrarot-Strahlungsenergie wieder abstrahlt.
  3. Anordnung nach Anspruch 2,
    dadurch gekennzeichnet,
    daß die Schicht (8) wenigstens 85% der einfallenden Infrarot-Strahlungsenergie wieder abstrahlt.
  4. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß die Schicht (8) lediglich einen Teil der Oberfläche (6) bedeckt und ein von der Schicht (8) nicht bedeckter Teil der Oberfläche (6) für Strahlung bei Infrarot-Wellenlängen reflektierend ist.
  5. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß die pro Einheitsfläche des zumindest einen Teils der Oberfläche (6) vorgesehene Menge des Infrarot-Strahlung absorbierenden Materials ausreichend ist, im wesentlichen die gesamte kurz- und mittelwellige Infrarot-Strahlung zu absorbieren.
  6. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß die Oberfläche (6) für Strahlung bei Infrarot-Wellenlängen reflektierend ist und die pro Einheitsfläche des zumindest einen Teils der Oberfläche (6) vorgesehene Menge des Infrarot-Strahlung absorbierenden Materials nicht ausreichend ist, im wesentlichen die gesamte kurz- und mittelwellige Infrarot-Strahlung zu absorbieren, wodurch ein Teil der kurz- und mittelwelligen Infrarot-Strahlung von der Oberfläche (6) reflektiert wird.
  7. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß das Infrarot-Strahlung absorbierende Material aus der aus Kupferoxid, Borcarbid und Eisenoxid bestehenden Gruppe ausgewählt ist.
  8. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß das Infrarot-Strahlung absorbierende Material Siliziumcarbid ist.
  9. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß das thermisch isolierende Material Keramikfaser umfaßt.
  10. Anordnung nach einem der Ansprüche 1 bis 8,
    dadurch gekennzeichnet,
    daß das thermisch isolierende Material mikroporöses thermisch isolierendes Material ist.
  11. Anordnung nach einem der vorhergehenden Ansprüche,
    dadurch gekennzeichnet,
    daß die Primärquelle (4) eine Umhüllung (12) umfaßt.
  12. Anordnung nach Anspruch 11,
    dadurch gekennzeichnet,
    daß die Primärquelle (4) in der Umhüllung (12) einen Wolframfaden (10) umfaßt.
  13. Anordnung nach Anspruch 11 oder 12,
    dadurch gekennzeichnet,
    daß die Primärquelle (4) zur Emission der kurz- oder mittelwelligen Infrarot-Strahlung auch in der zweiten Richtung ausgelegt ist und ein Teil der Umhüllung (12), durch den Strahlung in der zweiten Richtung durchgelassen wird, mit einer Primärquellenschicht (4) versehen ist, welche aus einem Infrarot-Strahlung absorbierenden Material gebildet ist, das die von der Primärquelle (4) in der zweiten Richtung emittierte kurz- oder mittelwellige Infrarot-Strahlung absorbiert, wodurch die Primärquellenschicht (14) zur Abstrahlung längerwelliger Infrarot-Strahlung erwärmt wird.
  14. Anordnung nach einem der Ansprüche 1 bis 12,
    gekennzeichnet durch einen Sekundärreflektor (5), um Strahlung der Primärquelle (4) in der ersten Richtung auf die Oberfläche (6) zu richten.
EP90913501A 1989-08-31 1990-08-31 Einrichtung für infrarotausstrahlung Expired - Lifetime EP0489834B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB898919700A GB8919700D0 (en) 1989-08-31 1989-08-31 Infra-red radiation emission arrangement
GB8919700 1989-08-31
PCT/GB1990/001346 WO1991003915A1 (en) 1989-08-31 1990-08-31 Infra-red radiation emission arrangement

Publications (2)

Publication Number Publication Date
EP0489834A1 EP0489834A1 (de) 1992-06-17
EP0489834B1 true EP0489834B1 (de) 1994-12-07

Family

ID=10662329

Family Applications (1)

Application Number Title Priority Date Filing Date
EP90913501A Expired - Lifetime EP0489834B1 (de) 1989-08-31 1990-08-31 Einrichtung für infrarotausstrahlung

Country Status (5)

Country Link
EP (1) EP0489834B1 (de)
DE (1) DE69014892T2 (de)
ES (1) ES2064760T3 (de)
GB (1) GB8919700D0 (de)
WO (1) WO1991003915A1 (de)

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Publication number Priority date Publication date Assignee Title
GB2257002A (en) * 1991-06-21 1992-12-23 Electrolux Cookers Ceramic electric hob
GB9214380D0 (en) * 1992-07-07 1992-08-19 Sev Furnaces Ltd Radiation transmitting apparatus
US5751896A (en) * 1996-02-22 1998-05-12 Micron Technology, Inc. Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition
US6188836B1 (en) * 1999-03-22 2001-02-13 Appliance Development Corporation Portable radiant heater with two reflectors
JP3360072B2 (ja) * 2000-07-10 2002-12-24 アイシー テック コ.,エルティーディー 電気ヒータ
US6526227B2 (en) * 2001-02-27 2003-02-25 Ic Tech Co., Ltd. Radiant electric heater
US7507575B2 (en) 2005-04-01 2009-03-24 3M Innovative Properties Company Multiplex fluorescence detection device having removable optical modules
US7709249B2 (en) 2005-04-01 2010-05-04 3M Innovative Properties Company Multiplex fluorescence detection device having fiber bundle coupling multiple optical modules to a common detector
US20070009382A1 (en) * 2005-07-05 2007-01-11 William Bedingham Heating element for a rotating multiplex fluorescence detection device
US7527763B2 (en) 2005-07-05 2009-05-05 3M Innovative Properties Company Valve control system for a rotating multiplex fluorescence detection device
JP4743495B2 (ja) 2005-07-08 2011-08-10 東京エレクトロン株式会社 流体加熱装置
KR20110008261A (ko) 2008-04-24 2011-01-26 쓰리엠 이노베이티브 프로퍼티즈 컴파니 웨이블릿 변환을 사용한 핵산 증폭 곡선의 분석
CN108180991B (zh) * 2018-03-05 2024-07-16 清华大学 一种红外窄带热辐射器及制备方法

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Publication number Priority date Publication date Assignee Title
FR1114485A (fr) * 1954-10-25 1956-04-12 émetteur infra-rouge
US3179789A (en) * 1963-08-26 1965-04-20 Joseph A Gialanella Radiant energy generating and distributing apparatus
US3546431A (en) * 1969-04-25 1970-12-08 Erich L Gibbs Immersion heater and method of making the same
US3805024A (en) * 1973-06-18 1974-04-16 Irex Corp Electrical infrared heater with a coated silicon carbide emitter
GB1599452A (en) * 1978-02-02 1981-10-07 Thorn Emi Ltd Infra-red heating device
GB8321717D0 (en) * 1983-08-12 1983-09-14 Thorn Emi Domestic Appliances Heating apparatus
GB2160400B (en) * 1984-06-09 1987-04-15 Micropore International Ltd Radiant heater

Also Published As

Publication number Publication date
ES2064760T3 (es) 1995-02-01
EP0489834A1 (de) 1992-06-17
WO1991003915A1 (en) 1991-03-21
GB8919700D0 (en) 1989-10-11
DE69014892T2 (de) 1995-04-27
DE69014892D1 (de) 1995-01-19

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