EP0416414B1 - Verfahren und Vorrichtung zur Umlenkung eines Strahls - Google Patents

Verfahren und Vorrichtung zur Umlenkung eines Strahls Download PDF

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Publication number
EP0416414B1
EP0416414B1 EP90116363A EP90116363A EP0416414B1 EP 0416414 B1 EP0416414 B1 EP 0416414B1 EP 90116363 A EP90116363 A EP 90116363A EP 90116363 A EP90116363 A EP 90116363A EP 0416414 B1 EP0416414 B1 EP 0416414B1
Authority
EP
European Patent Office
Prior art keywords
field
deflection
flux density
pole
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP90116363A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0416414A3 (en
EP0416414A2 (de
Inventor
Urs Dipl. Ing. Eth Wegmann
Albert Koller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of EP0416414A2 publication Critical patent/EP0416414A2/de
Publication of EP0416414A3 publication Critical patent/EP0416414A3/de
Application granted granted Critical
Publication of EP0416414B1 publication Critical patent/EP0416414B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Definitions

  • the present invention relates to a method for deflecting a beam of monopolar charged particles, in particular electrons, in which a magnetic deflection flux density field is applied in a first direction, perpendicular to the local direction of propagation of the beam, in order to deflect the beam in a second direction, perpendicular to first and to the beam propagation direction.
  • FIG. 1 Such a deflection method, as will be explained with reference to FIG. 1, is disadvantageous.
  • Fig. 1 two magnetic poles 1 are schematically shown, which form a magnetic dipole.
  • the qualitatively represented flux density field results B which runs in a straight line between the magnetic poles 1 in the region of the dipole axis A.
  • a beam of charged particles such as an electron beam 3
  • E the plane of symmetry
  • the charged particles experience a deflection force F, as shown in Fig. 1.
  • This deflecting force is used to deflect the electron beam in accordance with the aforementioned US Pat. No. 4,064,352.
  • deflection forces F b result which, in contrast to the force Fa, have a transverse component and a longitudinal component with respect to the dipole axis A, whereas in In the plane of symmetry E lying 3a, only a transverse component to the axis A is created.
  • the beam cross sections are influenced at a given flux density field and when the position of the beam is shifted in the direction of the dipole axis A, as indicated by dash-dotted lines, different forces act on different areas of the beam cross-sectional area.
  • Another disadvantage is that when the position of the beam changes parallel to the axis A, the absolute amounts of the resulting forces F change because the beam is not displaced along the field lines, where the amount of the field vectors is constant.
  • this arrangement in turn has the disadvantage that precisely when a beam is deflected by a large angle, such as by 180 ° and more, e.g. by 270 °, the magnetic arrangement becomes voluminous because the pole jaws have to take up the beam between them in long areas.
  • the intended polbakken are also increasingly exposed to the effects of the beam on a target object, in particular the evaporation of material.
  • the extent to which the beam can be shifted across the jaws on the target object, such as the crucible to be evaporated depends on the distance and the length of the jaws.
  • the disadvantages of the known procedure lie in the fact that regions of the deflection flux density field with curved field lines, that is to say inhomogeneous field regions, are not suitable for beam guidance, since they lead to the disadvantages explained with reference to FIG. 1.
  • the present invention is based on the task of also being able to use inhomogeneous, curved deflection field regions for the beam guidance without the disadvantage mentioned (FIG. 1), which significantly increases the flexibility with regard to the design of organs for producing the deflection field, such as pole jaws .
  • the beam is controlled in the first direction, that is to say laterally essentially in the direction of the deflection field according to the wording of claim 3 distracted.
  • This deflection hardly causes the change in deflection within the deflection field region linearized according to the invention, on the other hand the deflection can be changed without the lateral deflection being changed. Since the beam continues to be inhomogeneous for the time being, only through the inventive If homogenized field areas can be guided, especially outside of a pole jaw arrangement, the deflection stroke can be increased significantly without the beam reaching the immediate jaw area.
  • the deflection is preferably also carried out by means of a controllable deflection flux density field, according to the wording of claim 4, which is essentially in the second direction to the beam propagation direction, i.e. essentially in the direction of deflection.
  • the beam is changed in a controlled manner with respect to its cross-sectional area, essentially decoupled from the deflection and, if appropriate, the lateral deflection mentioned.
  • there are three control variables for the beam that are largely decoupled from one another, so that on the one hand the position of its impact surface on a target can be changed in two coordinates and, in addition, the size of this impact surface and thus the applied energy density.
  • the beam is preferably controlled with respect to its cross-sectional area by means of a focusing flux density field, which is essentially also applied in the second direction, but with opposite polarity on both sides of the beam, and / or likewise in the first direction, whereby through the Opposing polarity on both sides of the beam within the beam cross-sectional area “tensile” or “compressive forces” compress or expand the beam cross-sectional area.
  • a focusing flux density field which is essentially also applied in the second direction, but with opposite polarity on both sides of the beam, and / or likewise in the first direction, whereby through the Opposing polarity on both sides of the beam within the beam cross-sectional area "tensile” or “compressive forces” compress or expand the beam cross-sectional area.
  • a pair of magnetic pole arrangements in the form of pole jaws which are extended on both sides of the beam, are provided there for generating the deflection flux density field. These extend over the entire area traversed by the electron beam between the beam generator and the target. The beam thus passes through essentially constant deflection field conditions.
  • the aim of the present invention is sometimes to provide pole arrangements for deflecting the beam which are as small as possible and which also allow the beam path to be influenced outside their area. This is achieved in the procedure according to claim 7.
  • the additional poles are designed in a simple manner according to the wording of claim 10.
  • Claims 11 to 24 specify further preferred advantageous design variants of the device according to the invention.
  • a device is proposed in which the pole jaws are as small as possible and are not to be provided in the area of the intended target object.
  • FIG. 3 schematically shows the procedure according to the invention in contrast to that shown in FIGS. 1 and 2.
  • the two magnetic poles 1 there is primarily the known field profile of the magnetic flux density field, which is shown here with dashed lines B .
  • this field is now linearized in a region L, which is considerably longer than the diameter D of the beam 3, in the polar axis direction, ie parallel to the dipole axis A, by essentially compensating for the field components perpendicular to the dipole axis A.
  • the position of the particle beam 3 can be shifted without force components arising in the direction of the dipole axis A on the resultant force F. Furthermore, regardless of the shift in position in the direction mentioned, the deflection force F applied remains constant. Since all charges in the respective cross-sectional areas of the beam 3 are subjected to constant forces when the position is shifted in the direction of the dipole axis A, there is also no change in the cross-sectional shape of the beam when it is shifted, although it runs above or outside the area of the poles 1.
  • FIG. 4 schematically shows a preferred implementation of the field profile according to FIG. 3 or schematically an apparatus according to the invention for this.
  • the curved flux density field arises between the two magnetic poles 1a, for example formed by pole jaws 5 on both sides of a magnet 7 B 1.
  • the position of the particle beam 3 is defined on the straight line g which is equidistant from the poles 1a and thus parallel to the magnetic axis of the magnet 7. Along this straight line g, the beam 3 should also be position-changeable in accordance with the explanations for FIG. 3.
  • compensation magnets 9 are provided with poles 10 on the one hand, the poles on the opposite side being formed directly by the first-mentioned 1a.
  • the magnets 9 create compensation flux density fields B 2 formed as shown in dashed lines. It goes without saying that the representation of FIG. 4 makes no claim to exactness, but only represents the qualitative field course. Instead of the magnets 9, a magnet 9a could also be provided.
  • 5a is the amount of the field between the poles 1a B 1 shown and the respective amounts of the compensation fields B 2, when progressing on the line g in the direction y shown in FIG. 4. It is taken into account that field lines define locations of the same field strength amounts and that these increase with increasing distance from the respective dipole axes A1 between the poles 1a and A2 between the poles of the magnets 9, which partially collapse in the embodiment according to FIG. 4.
  • FIG. 5b shows the vertical components in the x-direction according to FIG. 4 of the flux density field when the progression along the line g as described.
  • the vector components of the two field components may be added directly to assess the resulting field.
  • there are vanishing x components in the region L which can be larger or smaller depending on the design, but in any case is significantly larger than the diameter D of the particle beam 3 B rx of the resulting field B r (not entered in Fig. 4!).
  • FIG. 5c A corresponding representation for the horizontal components in the y direction is shown in FIG. 5c. From this it can be seen that the horizontal components B ry of the resulting flux density field B r are essentially constant over the section L.
  • This procedure can be used wherever, spatially, a homogeneous magnetic field is desired.
  • Magnetic poles 1a are formed between the pole jaws 5, which are united in a U-shape by a base part 11, with the end faces 13 of the jaws. This by providing a magnet 15 between the pole jaws 5.
  • the magnet 15 can be an electromagnet, a permanent magnet or a combined arrangement of electric and permanent magnets.
  • pole jaws 16 are provided, which are connected to the pole jaws 5 via magnets 17.
  • the magnets 17 can also be permanent magnets, electromagnets or a combination of electric and permanent magnets.
  • the fields resulting qualitatively from the magnet arrangements shown B 1 and B 2 are for example registered, also, dash-dotted, the particle beam generated by a beam generator 19, in particular electron beam 3. With B r is again from the fields B 1 and B 2 resulting rectangular box shown.
  • FIG. 7 shows a preferred further development of the arrangement according to FIG. 6, as is used in particular for controlling the electron beam in an electron beam gun for the evaporation of materials in a coating system.
  • Corresponding parts have the position symbols already used in FIG. 6.
  • a deflection flux density field is used B A, which has the same polarity on both sides of the beam 3 and which is perpendicular to the direction of propagation of the beam 3 in the area concerned and also perpendicular to the direction of the deflection field B r .
  • 5 magnet arrangements 21 are provided on the jaws, which in turn can be permanent magnets, electromagnets or a combination thereof. While the parts 5a of the jaws 5 forming the poles 1a are made of iron, that is to say of ferromagnetic material, the magnets 21 are in sections 5b of the jaws 5, in ma gnetisch largely insulating material, such as made of Inox (trademark).
  • a further pair of magnets 23 is provided in the jaw regions 5b, which, in contrast to the deflection magnets 21, now has a flux density field B Generate F , which is reversely polarized on both sides of the beam 3.
  • B F the beam cross-sectional area Q is influenced by, as represented by F F , always resulting opposing forces that stretch or compress the beam cross-sectional area perpendicular to the field. This differs, as mentioned, from the deflection field of the magnets 23, which always causes a resulting force in one direction on the particles in the beam.
  • the magnets 23 are also permanent magnets, electromagnets, and, preferably, a combination of these types of magnets.
  • the structure of the entire arrangement is preferably made of copper, inox (trademark) and pure iron, taking into account the cooling requirements.
  • inox trademark
  • pure iron pure iron
  • Fig. 4 is further shown in dashed lines, how, when controlling the beam deflection, the compensation fields B 2 as a function of the deflection field B 1 can be controlled if necessary: the windings L2 for electromagnetic generation or co-generation of the fields B 2 are, for example, with a winding L1 for generating or co-generating the field B 1 connected in series, or in another way, which is now obvious to the person skilled in the art, the excitation currents are carried out in mutual dependence.
  • FIG. 9 show schematically side views of a device according to the invention.
  • the pole jaws 5 are deliberately bent at their end faces 1 which form the poles in order to give the beam 3 generated by the beam generator 19, which is fixedly mounted with respect to the magnet arrangement with the jaws 5, a desired predetermined path.
  • dashed lines the course of equipotential lines or areas.
  • the device according to the invention When the device according to the invention is used as a control device on an electron gun, with the electron beam of which a target object is vaporized, for example in a coating system, the arrangement shown schematically in FIG. 9c is preferred.
  • the beam 3 is initially guided between the jaws 5 in the largely homogeneous deflection flux density field there.
  • the beam 3 leaves the jaw area and runs above the end faces 13, where the linearization measures, as explained with reference to FIGS. 4 and 5, are now also preferably carried out. Since the surfaces 13 are inclined against a schematically entered target object 25, which is fixedly positioned with respect to the jaws 5, the beam path is additionally curved, so that after leaving the deflection field influence area it strikes the distant target surface 25 inclined and stretched. This makes it possible for the target object 25 to be arranged away from the jaws 5, which on the one hand allows a reduction in the jaw extension and on the other hand ensures that the beam extends outside the jaws 5 in large areas and the latter are hardly coated since they are beyond influence the evaporation 26.
  • the shape of the jaw 5 at 5c shown in dashed lines in FIG. 8 corresponds to the bevel schematically shown in FIG. 9c of the one forming the poles End faces 13.
  • a highly compact control unit in particular for an electron beam from an electron gun, is realized, in which the beam focusing, the lateral beam deflection and the beam deflection can be controlled essentially independently of one another.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Particle Accelerators (AREA)
  • Recrystallisation Techniques (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Forging (AREA)
  • Vending Machines For Individual Products (AREA)
EP90116363A 1989-09-05 1990-08-27 Verfahren und Vorrichtung zur Umlenkung eines Strahls Expired - Lifetime EP0416414B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3929475A DE3929475A1 (de) 1989-09-05 1989-09-05 Verfahren und vorrichtung zur umlenkung eines strahls
DE3929475 1989-09-05

Publications (3)

Publication Number Publication Date
EP0416414A2 EP0416414A2 (de) 1991-03-13
EP0416414A3 EP0416414A3 (en) 1991-09-18
EP0416414B1 true EP0416414B1 (de) 1995-09-27

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ID=6388674

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Application Number Title Priority Date Filing Date
EP90116363A Expired - Lifetime EP0416414B1 (de) 1989-09-05 1990-08-27 Verfahren und Vorrichtung zur Umlenkung eines Strahls

Country Status (6)

Country Link
US (1) US5038044A (enrdf_load_stackoverflow)
EP (1) EP0416414B1 (enrdf_load_stackoverflow)
JP (1) JP3075411B2 (enrdf_load_stackoverflow)
KR (1) KR0175922B1 (enrdf_load_stackoverflow)
AT (1) ATE128576T1 (enrdf_load_stackoverflow)
DE (2) DE3929475A1 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19645053C2 (de) * 1996-10-31 1999-11-11 Siemens Ag Röntgenröhre
US20050043870A1 (en) * 2003-08-22 2005-02-24 General Electric Company Method and apparatus for recording and retrieving maintenance, operating and repair data for turbine engine components

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3420977A (en) * 1965-06-18 1969-01-07 Air Reduction Electron beam apparatus
US3609378A (en) * 1966-10-31 1971-09-28 Air Reduction Monitoring of vapor density in vapor deposition furnance by emission spectroscopy
US3475542A (en) * 1967-09-13 1969-10-28 Air Reduction Apparatus for heating a target in an electron beam furnace
US3655902A (en) * 1970-10-19 1972-04-11 Air Reduction Heating system for electron beam furnace
US3924210A (en) * 1974-11-01 1975-12-02 Raytheon Co Field shaping magnet structure
US4064352A (en) * 1976-02-17 1977-12-20 Varian Associates, Inc. Electron beam evaporator having beam spot control
FR2453492A1 (fr) * 1979-04-03 1980-10-31 Cgr Mev Dispositif de deviation magnetique achromatique d'un faisceau de particules chargees et appareil d'irradiation utilisant un tel dispositif
AU8124082A (en) * 1981-03-09 1982-09-16 Unisearch Limited Charged particle beam focussing device
DE3639683A1 (de) * 1986-11-20 1988-05-26 Leybold Ag Verdampferanordnung mit einem rechteckigen verdampfertiegel und mehreren elektronenkanonen
US4804852A (en) * 1987-01-29 1989-02-14 Eaton Corporation Treating work pieces with electro-magnetically scanned ion beams

Also Published As

Publication number Publication date
DE59009711D1 (de) 1995-11-02
DE3929475A1 (de) 1991-03-14
EP0416414A3 (en) 1991-09-18
KR0175922B1 (ko) 1999-03-20
JP3075411B2 (ja) 2000-08-14
KR910007063A (ko) 1991-04-30
JPH03170099A (ja) 1991-07-23
DE3929475C2 (enrdf_load_stackoverflow) 1992-12-10
EP0416414A2 (de) 1991-03-13
ATE128576T1 (de) 1995-10-15
US5038044A (en) 1991-08-06

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