EP0228095B1 - Verfahren zur Herstellung von Silanen und Siloxanen - Google Patents
Verfahren zur Herstellung von Silanen und Siloxanen Download PDFInfo
- Publication number
- EP0228095B1 EP0228095B1 EP86118123A EP86118123A EP0228095B1 EP 0228095 B1 EP0228095 B1 EP 0228095B1 EP 86118123 A EP86118123 A EP 86118123A EP 86118123 A EP86118123 A EP 86118123A EP 0228095 B1 EP0228095 B1 EP 0228095B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- reaction
- catalyst
- olefin
- dimethylamino
- silane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 18
- -1 siloxanes Chemical class 0.000 title claims description 17
- 238000002360 preparation method Methods 0.000 title claims description 4
- 150000004756 silanes Chemical class 0.000 title description 8
- 239000003054 catalyst Substances 0.000 claims description 45
- 150000001336 alkenes Chemical class 0.000 claims description 43
- 239000000203 mixture Substances 0.000 claims description 27
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 229910052710 silicon Inorganic materials 0.000 claims description 21
- 239000010703 silicon Substances 0.000 claims description 21
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 15
- 239000010948 rhodium Substances 0.000 claims description 14
- 229910052703 rhodium Inorganic materials 0.000 claims description 13
- 239000008096 xylene Substances 0.000 claims description 13
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 12
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 12
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 11
- 229910052707 ruthenium Inorganic materials 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 8
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 7
- WBVXRXLWILVPMX-UHFFFAOYSA-N n-[bis(dimethylamino)-ethenylsilyl]-n-methylmethanamine Chemical compound CN(C)[Si](C=C)(N(C)C)N(C)C WBVXRXLWILVPMX-UHFFFAOYSA-N 0.000 claims description 7
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical group [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims description 7
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 claims description 6
- 101100030361 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) pph-3 gene Proteins 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 5
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 claims description 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- NQZFAUXPNWSLBI-UHFFFAOYSA-N carbon monoxide;ruthenium Chemical group [Ru].[Ru].[Ru].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] NQZFAUXPNWSLBI-UHFFFAOYSA-N 0.000 claims description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 claims description 2
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- VUMCUSHVMYIRMB-UHFFFAOYSA-N 1,3,5-tri(propan-2-yl)benzene Chemical compound CC(C)C1=CC(C(C)C)=CC(C(C)C)=C1 VUMCUSHVMYIRMB-UHFFFAOYSA-N 0.000 claims 1
- PXURRFCLQDNZOY-UHFFFAOYSA-L carbon monoxide;dichlororuthenium;triphenylphosphane Chemical compound [Cl-].[Cl-].[Ru+2].[O+]#[C-].[O+]#[C-].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 PXURRFCLQDNZOY-UHFFFAOYSA-L 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 54
- 239000000047 product Substances 0.000 description 39
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 17
- GIRKRMUMWJFNRI-UHFFFAOYSA-N tris(dimethylamino)silicon Chemical compound CN(C)[Si](N(C)C)N(C)C GIRKRMUMWJFNRI-UHFFFAOYSA-N 0.000 description 11
- 238000006459 hydrosilylation reaction Methods 0.000 description 9
- ZZHNUBIHHLQNHX-UHFFFAOYSA-N butoxysilane Chemical compound CCCCO[SiH3] ZZHNUBIHHLQNHX-UHFFFAOYSA-N 0.000 description 8
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 8
- 239000004576 sand Substances 0.000 description 8
- 239000007983 Tris buffer Substances 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- 239000005977 Ethylene Substances 0.000 description 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 4
- 229910002621 H2PtCl6 Inorganic materials 0.000 description 4
- FHBURLBCXNMPJX-UHFFFAOYSA-N n-[bis(dimethylamino)-ethylsilyl]-n-methylmethanamine Chemical compound CC[Si](N(C)C)(N(C)C)N(C)C FHBURLBCXNMPJX-UHFFFAOYSA-N 0.000 description 4
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 4
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- SNYNNFDVNITLRQ-UHFFFAOYSA-N 2,2,4,4,6,6,8-heptamethyl-1,3,5,7,2,4,6,8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 SNYNNFDVNITLRQ-UHFFFAOYSA-N 0.000 description 3
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- PFSMVBWDIRXMFP-UHFFFAOYSA-N n-[bis(dimethylamino)-(2-phenylethenyl)silyl]-n-methylmethanamine Chemical group CN(C)[Si](N(C)C)(N(C)C)C=CC1=CC=CC=C1 PFSMVBWDIRXMFP-UHFFFAOYSA-N 0.000 description 3
- 150000003961 organosilicon compounds Chemical class 0.000 description 3
- 229950000688 phenothiazine Drugs 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 3
- GGQQNYXPYWCUHG-RMTFUQJTSA-N (3e,6e)-deca-3,6-diene Chemical compound CCC\C=C\C\C=C\CC GGQQNYXPYWCUHG-RMTFUQJTSA-N 0.000 description 2
- LGXAANYJEHLUEM-UHFFFAOYSA-N 1,2,3-tri(propan-2-yl)benzene Chemical compound CC(C)C1=CC=CC(C(C)C)=C1C(C)C LGXAANYJEHLUEM-UHFFFAOYSA-N 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 238000010542 dehydrogenative silylation reaction Methods 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- SWGZAKPJNWCPRY-UHFFFAOYSA-N methyl-bis(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si](C)O[Si](C)(C)C SWGZAKPJNWCPRY-UHFFFAOYSA-N 0.000 description 2
- 150000002908 osmium compounds Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 2
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 2
- PDJQCHVMABBNQW-MIXQCLKLSA-L (1z,5z)-cycloocta-1,5-diene;rhodium;dichloride Chemical compound [Cl-].[Cl-].[Rh].[Rh].C\1C\C=C/CC\C=C/1.C\1C\C=C/CC\C=C/1 PDJQCHVMABBNQW-MIXQCLKLSA-L 0.000 description 1
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- RTZYCRSRNSTRGC-LNTINUHCSA-K (z)-4-oxopent-2-en-2-olate;ruthenium(3+) Chemical compound [Ru+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O RTZYCRSRNSTRGC-LNTINUHCSA-K 0.000 description 1
- ZWXJWBLGVMXLDE-UHFFFAOYSA-N 1-ethylsilyl-N,N-dimethylmethanamine Chemical compound CC[SiH2]CN(C)C ZWXJWBLGVMXLDE-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- LXQPBCHJNIOMQU-UHFFFAOYSA-N 2,4-dimethylpent-1-ene Chemical compound CC(C)CC(C)=C LXQPBCHJNIOMQU-UHFFFAOYSA-N 0.000 description 1
- LTIUDPOSFOYSKA-UHFFFAOYSA-N 2-ethenyl-2,4,4,6,6,8,8-heptamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C=C)O[Si](C)(C)O1 LTIUDPOSFOYSKA-UHFFFAOYSA-N 0.000 description 1
- IWNPVYBZZMDIRA-UHFFFAOYSA-N 2-ethyl-2,4,4,6,6,8,8-heptamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound CC[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 IWNPVYBZZMDIRA-UHFFFAOYSA-N 0.000 description 1
- YINAIHVTJAHJGU-UHFFFAOYSA-N 2-phenylethenyl-tri(propan-2-yloxy)silane Chemical group CC(C)O[Si](OC(C)C)(OC(C)C)C=CC1=CC=CC=C1 YINAIHVTJAHJGU-UHFFFAOYSA-N 0.000 description 1
- BPVLGDGUKDAVDB-UHFFFAOYSA-N 2-phenylethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCC1=CC=CC=C1 BPVLGDGUKDAVDB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- UPCHQOGVQKXCNM-UHFFFAOYSA-N C=1C=CC=CC=1N([SiH](C)C)C1=CC=CC=C1 Chemical compound C=1C=CC=CC=1N([SiH](C)C)C1=CC=CC=C1 UPCHQOGVQKXCNM-UHFFFAOYSA-N 0.000 description 1
- QHMBVEPLSQTWNQ-UHFFFAOYSA-N CCC[SiH2]CCN(CC)CC Chemical compound CCC[SiH2]CCN(CC)CC QHMBVEPLSQTWNQ-UHFFFAOYSA-N 0.000 description 1
- XXEVQQQTHDJAFN-UHFFFAOYSA-N CCN(CC)C(C[SiH3])N(CC)CC Chemical compound CCN(CC)C(C[SiH3])N(CC)CC XXEVQQQTHDJAFN-UHFFFAOYSA-N 0.000 description 1
- DBTKGGFFVHEJDB-UHFFFAOYSA-N CN(C)C(C[SiH3])N(C)C Chemical compound CN(C)C(C[SiH3])N(C)C DBTKGGFFVHEJDB-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 1
- XTFPBSFUWLNVLV-UHFFFAOYSA-N N,N,N',N'-tetrabenzyl-1-silylmethanediamine Chemical compound C=1C=CC=CC=1CN(CC=1C=CC=CC=1)C([SiH3])N(CC=1C=CC=CC=1)CC1=CC=CC=C1 XTFPBSFUWLNVLV-UHFFFAOYSA-N 0.000 description 1
- VLWCZVQPQGWJMD-UHFFFAOYSA-N N,N-dibenzyl-2-phenylsilylethanamine Chemical compound C=1C=CC=CC=1[SiH2]CCN(CC=1C=CC=CC=1)CC1=CC=CC=C1 VLWCZVQPQGWJMD-UHFFFAOYSA-N 0.000 description 1
- BIWZQQBGGVIAMG-UHFFFAOYSA-N N-(ethylsilylmethyl)-N-phenylaniline Chemical compound C=1C=CC=CC=1N(C[SiH2]CC)C1=CC=CC=C1 BIWZQQBGGVIAMG-UHFFFAOYSA-N 0.000 description 1
- KRQLONYHYWKOHL-UHFFFAOYSA-N N-bis(dicyclohexylamino)silyl-N-cyclohexylcyclohexanamine Chemical compound C1CCCCC1N([SiH](N(C1CCCCC1)C1CCCCC1)N(C1CCCCC1)C1CCCCC1)C1CCCCC1 KRQLONYHYWKOHL-UHFFFAOYSA-N 0.000 description 1
- OWNSQELROAOVLF-UHFFFAOYSA-N N-ethyl-N-(ethylsilylmethyl)ethanamine Chemical compound CC[SiH2]CN(CC)CC OWNSQELROAOVLF-UHFFFAOYSA-N 0.000 description 1
- QRCQIXDJHXTUJP-UHFFFAOYSA-N N-phenyl-N-(phenylsilylmethyl)aniline Chemical compound C=1C=CC=CC=1N(C=1C=CC=CC=1)C[SiH2]C1=CC=CC=C1 QRCQIXDJHXTUJP-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- JGVYKIHQSYPOOJ-UHFFFAOYSA-N [ethenylsilyl(trimethylsilyloxy)methoxy]-trimethylsilane Chemical compound C[Si](C)(C)OC(O[Si](C)(C)C)[SiH2]C=C JGVYKIHQSYPOOJ-UHFFFAOYSA-N 0.000 description 1
- MJQJSELFHGBUKS-UHFFFAOYSA-N [ethylsilyl(trimethylsilyloxy)methoxy]-trimethylsilane Chemical compound CC[SiH2]C(O[Si](C)(C)C)O[Si](C)(C)C MJQJSELFHGBUKS-UHFFFAOYSA-N 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- LZDPMWPKENASIX-UHFFFAOYSA-N bis(trimethylsilyloxy)methylsilicon Chemical compound C[Si](C)(C)OC([Si])O[Si](C)(C)C LZDPMWPKENASIX-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- GGRQQHADVSXBQN-FGSKAQBVSA-N carbon monoxide;(z)-4-hydroxypent-3-en-2-one;rhodium Chemical compound [Rh].[O+]#[C-].[O+]#[C-].C\C(O)=C\C(C)=O GGRQQHADVSXBQN-FGSKAQBVSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- WIWBLJMBLGWSIN-UHFFFAOYSA-L dichlorotris(triphenylphosphine)ruthenium(ii) Chemical compound [Cl-].[Cl-].[Ru+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 WIWBLJMBLGWSIN-UHFFFAOYSA-L 0.000 description 1
- KZFNONVXCZVHRD-UHFFFAOYSA-N dimethylamino(dimethyl)silicon Chemical compound CN(C)[Si](C)C KZFNONVXCZVHRD-UHFFFAOYSA-N 0.000 description 1
- HBWGDHDXAMFADB-UHFFFAOYSA-N ethenyl(triethyl)silane Chemical compound CC[Si](CC)(CC)C=C HBWGDHDXAMFADB-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- JEWCZPTVOYXPGG-UHFFFAOYSA-N ethenyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)C=C JEWCZPTVOYXPGG-UHFFFAOYSA-N 0.000 description 1
- NUFVQEIPPHHQCK-UHFFFAOYSA-N ethenyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)C=C NUFVQEIPPHHQCK-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- VMDTXBZDEOAFQF-UHFFFAOYSA-N formaldehyde;ruthenium Chemical compound [Ru].O=C VMDTXBZDEOAFQF-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000006713 insertion reaction Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- NCWQJOGVLLNWEO-UHFFFAOYSA-N methylsilicon Chemical group [Si]C NCWQJOGVLLNWEO-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- NCAKWMZPHTZJOT-UHFFFAOYSA-N n-[bis(diethylamino)silyl]-n-ethylethanamine Chemical compound CCN(CC)[SiH](N(CC)CC)N(CC)CC NCAKWMZPHTZJOT-UHFFFAOYSA-N 0.000 description 1
- SLQLQPWQTFDYNJ-UHFFFAOYSA-N n-[bis(dimethylamino)-(2-triethoxysilylethenyl)silyl]-n-methylmethanamine Chemical group CCO[Si](OCC)(OCC)C=C[Si](N(C)C)(N(C)C)N(C)C SLQLQPWQTFDYNJ-UHFFFAOYSA-N 0.000 description 1
- ZABHNYXUMKANSN-UHFFFAOYSA-N n-[bis(dimethylamino)-(2-triethoxysilylethyl)silyl]-n-methylmethanamine Chemical compound CCO[Si](OCC)(OCC)CC[Si](N(C)C)(N(C)C)N(C)C ZABHNYXUMKANSN-UHFFFAOYSA-N 0.000 description 1
- ICADMJLDJIBIQY-UHFFFAOYSA-N n-[bis(dimethylamino)-[2-[tris(dimethylamino)silyl]ethenyl]silyl]-n-methylmethanamine Chemical group CN(C)[Si](N(C)C)(N(C)C)C=C[Si](N(C)C)(N(C)C)N(C)C ICADMJLDJIBIQY-UHFFFAOYSA-N 0.000 description 1
- NQYXALRANHLJAO-UHFFFAOYSA-N n-[bis(dimethylamino)-propylsilyl]-n-methylmethanamine Chemical compound CCC[Si](N(C)C)(N(C)C)N(C)C NQYXALRANHLJAO-UHFFFAOYSA-N 0.000 description 1
- VBYLGQXERITIBP-UHFFFAOYSA-N n-[dimethylamino(methyl)silyl]-n-methylmethanamine Chemical compound CN(C)[SiH](C)N(C)C VBYLGQXERITIBP-UHFFFAOYSA-N 0.000 description 1
- AHJCYBLQMDWLOC-UHFFFAOYSA-N n-methyl-n-silylmethanamine Chemical compound CN(C)[SiH3] AHJCYBLQMDWLOC-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- GTBPUYSGSDIIMM-UHFFFAOYSA-N phosphane;ruthenium Chemical class P.[Ru] GTBPUYSGSDIIMM-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 125000006238 prop-1-en-1-yl group Chemical group [H]\C(*)=C(/[H])C([H])([H])[H] 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- CQDJUAPLVNTUHG-UHFFFAOYSA-N tri(piperidin-1-yl)silane Chemical compound C1CCCCN1[SiH](N1CCCCC1)N1CCCCC1 CQDJUAPLVNTUHG-UHFFFAOYSA-N 0.000 description 1
- GBBZJPBKJSSIDA-UHFFFAOYSA-N tri(propan-2-yloxy)-[2-tri(propan-2-yloxy)silylethenyl]silane Chemical group CC(C)O[Si](OC(C)C)(OC(C)C)C=C[Si](OC(C)C)(OC(C)C)OC(C)C GBBZJPBKJSSIDA-UHFFFAOYSA-N 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- JGABXROLARSPEN-UHFFFAOYSA-N tri(propan-2-yloxy)silane Chemical compound CC(C)O[SiH](OC(C)C)OC(C)C JGABXROLARSPEN-UHFFFAOYSA-N 0.000 description 1
- UUVZTKMMRCCGHN-UHFFFAOYSA-N triethoxy(2-phenylethenyl)silane Chemical group CCO[Si](OCC)(OCC)C=CC1=CC=CC=C1 UUVZTKMMRCCGHN-UHFFFAOYSA-N 0.000 description 1
- VBSUMMHIJNZMRM-UHFFFAOYSA-N triethoxy(2-phenylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=CC=C1 VBSUMMHIJNZMRM-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JDYCKPYEJSVMSS-VAWYXSNFSA-N triethyl-[(e)-hex-1-enyl]silane Chemical compound CCCC\C=C\[Si](CC)(CC)CC JDYCKPYEJSVMSS-VAWYXSNFSA-N 0.000 description 1
- ACAGHYNXLYAHCM-ZHACJKMWSA-N triethyl-[(e)-hex-2-enyl]silane Chemical compound CCC\C=C\C[Si](CC)(CC)CC ACAGHYNXLYAHCM-ZHACJKMWSA-N 0.000 description 1
- PUCGHJGDCZLWIW-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[2-tri(propan-2-yloxy)silylethenyl]silane Chemical group CC(C)O[Si](OC(C)C)(OC(C)C)C=C[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C PUCGHJGDCZLWIW-UHFFFAOYSA-N 0.000 description 1
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N vinyl ethyl ether Natural products CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0801—General processes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0876—Reactions involving the formation of bonds to a Si atom of a Si-O-Si sequence other than a bond of the Si-O-Si linkage
- C07F7/0878—Si-C bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
Definitions
- the present invention relates to a novel process for the preparation of compounds having one of the following formulas (A) or (B): wherein R, R1, R2, R3, R4, R5, and R6 are individually alkyl or aryl groups containing from 1 to 8 carbon atoms, R8 and R9 are individually hydrogen, alkyl, alkeny, aryl, alkoxy, aryloxy, polyether, alkylsilyl, alkoxysilyl or aminosilyl groups having from 1 to 50 carbon atoms, a has a value of 0 to 1, b has a value of 0 to 1, x has a value of 1,2 or 3, y has a value from 0 to 500, z has a value from 0 to 500 and the sum of y and z equals from 0 to 500 with the proviso, that if z has a value of 0, the sum of a and b mustequal at least one.
- the process provides the dehydrocondensation of a silicon-containing compound with a olefin in the presence of a rhodium or ruthenium catalyst in a one-step process.
- hydrosilation reaction between a silane and an olefin is generally depicted as follows:
- osmium compounds such as chloroosmic acid
- osmium compounds are very expensive and thus other routes have been explored, such as in GB - A - 1,365,431 where nickel complexes are disclosed as catalyzing the reaction of ⁇ SiH compounds with olefins to provide organosilicon compounds having olefinic unsaturation.
- Ru3(CO)12 was reported to catalyze a dehydrocondensation reaction between simple silanes and olefins in Angew. Chem. Int. Ed. Engl. 19 (1980) 928.
- Rhodium catalysts were unexpectedly found to yield E-hex-1-en-1-yl(triethyl)silane and E-hex-2-en-1-yl(triethyl)silane when triethylsilane and hex-1-ene were reacted together in Journal of Molecular Catalysis, 26 (1984) 89-104.
- the objective of the present invention is to provide a one-step process which will synthesize olefinic silanes and/or siloxanes of the given formulas (A) and (B) by a process which has yields that are high enough to be commercially attractive and which minimizes by-products and in particular hydrogenation and hydrosilation products.
- Hindered alkoxysilanes such as tri- tert .butoxysilane and tri- iso propoxysilane have also unexpectedly been shown to undergo dehydrocondensation whereas less hindered alkoxysilanes such as trimethoxysilane and triethoxysilane favor hydrosilation under identical conditions, though some dehydrocondensation products have been observed as reported above.
- Simple siloxanes such as bis(trimethylsiloxy)methylsilane and heptamethylcyclotetrasiloxane and Si-H fluids also undergo dehydrocondensation. This is unexpected in that siloxanes are well known to undergo rapid hydrosilation.
- R, R1 and R2 are either methyl or phenyl and x has a value of 3.
- the secondary aminosilanes may be purchased commercially or prepared from any of a variety of known techniques, such as described in Eaborn, Organosilicon Compounds , Academic Press Inc., New York, 1690, p. 339.
- Suitable secondary aminosilanes include, dimethylaminodimethylsilane, bis(dimethylamino)methylsilane, tris(dimethylamino)silane, dimethylaminomethylethylsilane, diethylaminoethylpropylsilane, diethylaminomethylethylsilane, diphenylaminomethylethylsilane, diphenylaminomethylphenylsilane, dibenzylaminoethylphenylsilane, diphenylaminodimethylsilane, bis(diethylamino)ethylsilane, bis(dimethylamino)ethylsilane, bis(dibenzylamino)methylsilane, tris(diethylamino)silane, tris(piperidino)silane, and tris(dicyclohexylamino)silane. Most preferably the secondary amino
- Siloxanes preferably useful in the dehydrogenative silylation are those represented by the general formula (D) wherein the alkyl group is methyl and the aryl group is phenyl. These siloxanes may be purchased commercially or prepared from any of a variety of known techniques, such as described in Eaborn, Organosilicon Compounds , Academic Press Inc., New York, 1960, p. 228.
- Suitable siloxanes include bis(trimethylsilyloxy)methylsilane, 1,1,3,3-tetramethyldisiloxane, and heptamethylcyclotetrasiloxane. Most other siloxanes are generally mixtures of a variety of siloxanes. Preferably the siloxane is such that R3, R4, R5 and R6 are all methyl groups.
- R8 and R9 are preferably hydrogen or one of the above groups having from 1 to 10 carbon atoms.
- the olefins can be purchased commercially.
- Olefins which are suitable for use in the practice of this invention, are, known compounds and include, the following: ethylene, propylene, iso butylene, styrene, iso prene, butadiene, allylmethoxytriglycol, and vinylsilanes, including vinyltriethylsilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri iso propoxysilane, vinyltri tert butoxysilane, vinyltris(dimethylamino)silane, vinylmethyldiethoxysilane, vinylmethyldimethoxysilane, vinyldimethylmethoxysilane, and vinyldimethylethoxysilane.
- olefins which are suitable include functional olefins such as allylamine, acrylate and methacrylate esters, and unsaturated ketones.
- the reaction takes place in the presence of a rhodium or ruthenium catalyst.
- the rhodium or ruthenium catalyst may be used neat; on a support such as carbon black or alumina; or in a solvent as a soluble compound of rhodium or ruthenium, i.e., chlorodicarbonylrhodium(I) dimer, dodecarbonyltetrarhodium(0), acetylacetonatodicarbonylrhodium(I).
- chloro(1,5-cyclooctadiene)rhodium(I) dimer dodecacarbonyltriruthenium(0) tris(acetylacetonato)ruthenium(III), and complexes of rhodium and ruthenium with phosphines, such as tristriphenylphosphinerhodium(I) chloride, tristriphenylphosphinerhodium(I) carbonylhydride and dichlorotris(triphenylphosphine)ruthenium(II).
- the catalysts are available commercially.
- the concentration of the catalyst is normally between 0.000010-0.05 mole % with respect to the silicon composition, it is preferred however to use no more catalyst than required to obtain the necessary reaction due to the significant costs associated with catalysts of this type. However, impurities common in many olefins may necessitate higher concentrations.
- the dehydrocondensation should be run at temperatures greater than 40°C with the optimum temperature being between 100-200°C. Although the upper temperature limit is not critical, the reaction should be run below the decomposition point of the starting materials or products.
- the reaction can be run at atmospheric pressure. Increasing or decreasing the pressure would not be expected to generate anything other than one skilled in the art would expect, i.e. alter reaction rates.
- the reaction may be carried out with or without a solvent. When a solvent is desirable for reasons such as solubility or temperature control, a solvent may be used. Suitable solvents are hydrocarbons such as octane, toluene, xylene or tri iso propylbenzene.
- the order of the addition of the reactants is not important, although normally, the rhodium or ruthenium catalyst is added to the silicon composition and olefin and then heat is applied. A ratio of 1:2 to 1:5 of the silicon composition to the olefin is preferred. This is done to minimize the reaction of hydrogen generated in the reaction with the olefinic silane or siloxane.
- silanes and siloxanes which can be prepared according to the process of the invention find utility as coupling agents in a variety of applications including mineral filled composites and fiber glass applications; crosslinking agents for polymers; compounding agents for dental impressions; and encapsulated gels to name but a few.
- the reaction was run as described in Example 1 except that a 1 : 1 mole ratio of tris(dimethylamino)silane and ethylene was used.
- the product mixture after the reaction was complete was shown to contain 20.3% tris(dimethylamino)silane, 23,6 % vinyltris(dimethylamino)silane and 51,7 % ethyltris(dimethylamino)silane.
- Example 2 The reaction was run as described in Example 1 except that triisopropoxysilane was used as as the starting silicon composition. After the reaction was complete the product mixture was shown to contain approximately 85% vinyltriisopropoxysilane, 7 % ethyltriisopropoxysilane and 3 % tetraisopropoxysilane.
- the reaction was run as described in Example 1 except that tri-tert.butoxysilane was used as the starting silicon composition.
- the product mixture was shown to contain 96% vinyltri-tert.butoxysilane and 2 % ethyltri-tert.butoxysilane.
- the reaction was run as described in Example 1 except that triethoxysilane was used as the starting silicon composition.
- the product mixture was shown to contain 62% vinyltriethoxysilane, 28 % ethyltriethoxysilane and 6 % tetraethoxysilane.
- the reaction was run as described in Example 1 except that trimethoxysilane was used as the starting silicon composition.
- the product mixture was shown to contain 12% vinyltrimethoxysilane, 78 % ethyltrimethoxysilane and 4 % tetramethoxysilane.
- the reaction was run as described in Example 1 except that bis(trimethylsiloxy)methylsilane was used as the starting silicon composition.
- the product mixture was shown to contain 72% vinylbis(trimethylsiloxy)methylsilane and 25 % ethylbis(trimethylsiloxy)methylsilane.
- the reaction was run as described in Example 1 except that heptamethylcyclotetrasiloxane was used as the starting silicon composition.
- the product mixture was shown to contain 62% vinylheptamethylcyclotetrasiloxane and 36 % ethylheptamethylcyclotetrasiloxane.
- the reaction was run as described in Example 1 except 1000 ppm Ru3CO12 was used as the catalyst.
- the product mixture was shown to contain 57.5% Vinyltris(dimethylamino)silane and 40.2% ethyltris(dimethylamino)silane.
- the reaction was run as described in Example 1 except that 10 ppm Rh/C was used as the catalyst.
- the product mixture contained 80.1% vinyltris(dimethylamino)silane and 9.9% ethyltris(dimethylamino)silane.
- a one liter, 3-necked flask was equipped with a stirring bar, thermometer, 500 ml addition funnel and reflux condenser topped with a nitrogen inlet tube.
- the flask was charged with 200.0 g (1.21 mol) tris(dimethylamino)silane, 2.27 g phenothiazine and 200 ppm Rh2Cl2CO4 (80 mg) as a catalyst.
- the solution was heated to 120°C at which time 228 g (2.24 mol) styrene was added dropwise over a period of 2 hours. There was an initial exotherm reaction to 150°C and the temperature was then maintained between 120-150°C. After the addition was complete the reaction mixture was cooled to room temperature.
- GC and GC/MS confirmed that a single product, 1-tris(dimethylamino)silyl-2-phenylethylene was formed in greater than 90 % yield.
- Example 17 The reaction was run as described in Example 17 except that triisopropoxysilane was used as the starting silicon composition. Two products were formed in a 3 to 1 ratio. The major one was 1-triisopropoxysilyl-2-phenylethylene and the minor one 1-triisopropoxysilyl-2-phenylethane.
- Example 17 The reaction was run as described in Example 17 except that triethoxysilane was used as the starting silicon composition. Two products were formed in a 2 to 1 ratio. The major one was 1-triethoxysilyl-2-phenylethane and the minor one was 1-triethoxysilyl-2-phenylethylene.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Silicon Polymers (AREA)
Claims (7)
- Verfahren zur Herstellung von Verbindungen die einer der beiden folgenden Formeln (A) oder (B) entsprechen:
R, R¹, R², R³, R⁴, R⁵ und R⁶ jeweils für Alkyl- oder Arylgruppen mit 1 bis 8 Kohlenstoffatomen stehen, R⁸ und R⁹ jeweils Wasserstoff, Alkyl-, Alkenyl-, Aryl-, Alkoxy-, Aryloxy-, Polyether-, Alkylsilyl-, Alkoxysilyl- oder Aminosilylgruppen mit 1 bis 50 Kohlenstoffatomen bedeuten,
a einen Wert von 0 bis 1 hat,
b einen Wert von 0 bis 1 hat,
x einen Wert von 1, 2 oder 3 hat,
y einen Wert von 0 bis 500 hat,
z einen Wert von 0 bis 500 hat
und die Summe von y und z gleich 0 bis 500 ist mit der Maßgabe, daß wenn z einen Wert von 0 hat, die Summe von a und b mindestens 1 sein muß,
dadurch gekennzeichnet, daß entweder ein sekundäres Aminosilan der allgemeinen Formel (C):
(C) H-Si(NRR¹)x(R²)3-x
in der R, R¹ , R² und x die angegebene Bedeutung haben, oder ein Siloxan der allgemeinen Formel (D): - Verfahren nach Anspruch 1, worin der Katalysator unter Ru₃(CO)₁₂, [Rhcl(CO)₂]₂, Ru₄(CO)₁₂, RuCl₂(CO)₂(PPh₃)₂, Ru(C₅H₇O₂)₃, RuCl(PPh₃)₃, Rh/C und RhCl(PPh₃)₃ ausgewählt wird.
- Verfahren nach Anspruch 1, worin der Katalysator in einer Konzentration von 0,000010 bis 0,05 mol-%, bezogen auf die Siliciumverbindung, vorhanden ist.
- Verfahren nach Anspruch 1, worin ein Lösungsmittel, vorzugsweise unter Octan, Toluol, Xylol, Chlorbenzol und 1,3,5-Triisopropylbenzol ausgewählt, verwendet wird.
- Verfahren nach Anspruch 1, worin das Verhältnis von Siliciumverbindung zu Olefin 1:2 bis 1:5 beträgt.
- Verfahren nach Anspruch 1, worin das Olefin unter: Vinyltriethoxysilan, Vinyltris(dimethylamino)silan und Vinyltriisopropoxysilan ausgewählt wird.
- Verfahren nach Anspruch 1, worin das Olefin unter Butadien und Isopren ausgewählt wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/815,003 US4668812A (en) | 1985-12-31 | 1985-12-31 | Process for the preparation of olefinic silanes and siloxanes |
US815003 | 1997-03-14 |
Publications (3)
Publication Number | Publication Date |
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EP0228095A2 EP0228095A2 (de) | 1987-07-08 |
EP0228095A3 EP0228095A3 (en) | 1988-08-03 |
EP0228095B1 true EP0228095B1 (de) | 1992-01-22 |
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EP86118123A Expired - Lifetime EP0228095B1 (de) | 1985-12-31 | 1986-12-30 | Verfahren zur Herstellung von Silanen und Siloxanen |
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US (1) | US4668812A (de) |
EP (1) | EP0228095B1 (de) |
JP (1) | JPS62164688A (de) |
AU (1) | AU598780B2 (de) |
BR (1) | BR8606482A (de) |
CA (1) | CA1290762C (de) |
DE (1) | DE3683617D1 (de) |
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US4946818A (en) * | 1988-04-05 | 1990-08-07 | General Electric Company | Rhodium colloid, method of making, and use |
JP2507898B2 (ja) * | 1990-06-13 | 1996-06-19 | 工業技術院長 | アルケニルシラン化合物およびその製造方法 |
US5041595A (en) * | 1990-09-26 | 1991-08-20 | Union Carbide Chemicals And Plastics Technology Corporation | Method for manufacturing vinylalkoxysilanes |
JPH0517486A (ja) * | 1991-07-04 | 1993-01-26 | Shin Etsu Chem Co Ltd | 有機ケイ素化合物及びその製造方法 |
FR2709757B1 (fr) * | 1993-09-07 | 1995-11-17 | Rhone Poulenc Chimie | Procédé de préparation de polyorganosiloxanes à fonctions insaturées par déshydrogénocondensation en présence de complexes de métaux du groupe IV. |
US6492480B1 (en) * | 1999-10-28 | 2002-12-10 | Japan Science And Technology Corporation | Method of polymerizing a silalkylenesiloxane |
PL2076521T3 (pl) * | 2006-08-16 | 2013-06-28 | Univ Adama Mickiewicza | Sposób otrzymywania sililopodstawionych 1,2 alkinów |
US20080312356A1 (en) * | 2007-06-13 | 2008-12-18 | Applied Mcrostructures, Inc. | Vapor-deposited biocompatible coatings which adhere to various plastics and metal |
JP5170834B2 (ja) * | 2008-04-22 | 2013-03-27 | 信越化学工業株式会社 | 脱アルコール型室温硬化性シリコーンゴム組成物の保存安定性付与剤 |
US20100144897A1 (en) * | 2008-12-08 | 2010-06-10 | O'lenick Jr Anthony J | Methicone replacements for cyclomethicone |
JP6125222B2 (ja) * | 2012-08-16 | 2017-05-10 | モメンティブ パフォーマンス マテリアルズ インコーポレイテッド | コバルト触媒を用いる脱水素シリル化および架橋 |
WO2015159569A1 (ja) * | 2014-04-15 | 2015-10-22 | 信越化学工業株式会社 | アルコキシシリル-ビニレン基含有ケイ素化合物 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2682512A (en) * | 1948-08-02 | 1954-06-29 | Minnesota Mining & Mfg | Unsaturated organosilanes and method of making same |
DE1125619B (de) * | 1960-07-08 | |||
US3595733A (en) * | 1969-07-09 | 1971-07-27 | Dow Chemical Co | Method of preparing alpha-unsaturated organosilicon compounds |
BE755943A (fr) * | 1969-09-10 | 1971-03-09 | Rhone Poulenc Sa | Procede de preparation de composes organosiliciques insatures |
GB1365431A (en) * | 1973-01-31 | 1974-09-04 | Dow Corning Ltd | Process for preparing organosilicon products |
JPS5625540A (en) * | 1979-08-08 | 1981-03-11 | Shimizu Construction Co Ltd | Metal panel curtain wall |
JPS57109795A (en) * | 1980-12-26 | 1982-07-08 | Mitsubishi Chem Ind Ltd | Preparation of vinylsilane |
JPS57140788A (en) * | 1981-02-25 | 1982-08-31 | Sagami Chem Res Center | Preparation of vinylsilane having perfluoro group |
-
1985
- 1985-12-31 US US06/815,003 patent/US4668812A/en not_active Expired - Fee Related
-
1986
- 1986-12-19 CA CA000525896A patent/CA1290762C/en not_active Expired - Lifetime
- 1986-12-29 BR BR8606482A patent/BR8606482A/pt unknown
- 1986-12-30 JP JP61315976A patent/JPS62164688A/ja active Granted
- 1986-12-30 AU AU67047/86A patent/AU598780B2/en not_active Ceased
- 1986-12-30 DE DE8686118123T patent/DE3683617D1/de not_active Expired - Lifetime
- 1986-12-30 EP EP86118123A patent/EP0228095B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0228095A3 (en) | 1988-08-03 |
JPH0353317B2 (de) | 1991-08-14 |
US4668812A (en) | 1987-05-26 |
AU6704786A (en) | 1987-07-02 |
EP0228095A2 (de) | 1987-07-08 |
DE3683617D1 (de) | 1992-03-05 |
JPS62164688A (ja) | 1987-07-21 |
AU598780B2 (en) | 1990-07-05 |
BR8606482A (pt) | 1987-10-20 |
CA1290762C (en) | 1991-10-15 |
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