EP0127523A1 - Elektronzyklotronresonanz-Ionenquelle - Google Patents

Elektronzyklotronresonanz-Ionenquelle Download PDF

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Publication number
EP0127523A1
EP0127523A1 EP84401014A EP84401014A EP0127523A1 EP 0127523 A1 EP0127523 A1 EP 0127523A1 EP 84401014 A EP84401014 A EP 84401014A EP 84401014 A EP84401014 A EP 84401014A EP 0127523 A1 EP0127523 A1 EP 0127523A1
Authority
EP
European Patent Office
Prior art keywords
coils
group
ion source
magnetic field
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP84401014A
Other languages
English (en)
French (fr)
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EP0127523B1 (de
Inventor
Marc Delaunay
René Gualandris
Richard Geller
Claude Jaquot
Paul Ludwig
Jean-Marc Mathonnet
Jean-Claude Rocco
Pierre Sermet
Francois Zadworny
Francois Bourg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Publication of EP0127523A1 publication Critical patent/EP0127523A1/de
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Publication of EP0127523B1 publication Critical patent/EP0127523B1/de
Expired legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the present invention relates to a source of ions with cyclotron resonance of electrons. It finds many applications, depending on the different values of the range of kinetic energy of the extracted ions, in the fields: vaporization (sputtering) of thin layers, microgravure, ion implantation, heating by fast neutrons of the plasma of reactors fusion, tandem accelerators, synchrocyclotron, ... etc.
  • the ions are formed by strongly ionizing a gas or a vapor of a solid material, contained in a microwave cavity, thanks to the combined action of a high frequency electromagnetic field, established in the cavity, and a resulting magnetic field prevailing in said cavity.
  • FIG. 1 represents a diagram showing the curve of the magnetic field as a function of the distance along the central axis of the ion source according to the prior art in superposition with a schematic representation of the location of the main elements constituting this source .
  • the curve of the magnetic field 1 provided by the set of coils has two maxima at the locations of the first group 2 and the third group 4 of coils and a minimum between these two maxima at the location of the second group 3 of coils, the latter group being supplied in counter-field.
  • the maximum values are greater than the value B of the magnetic induction corresponding to the cyclotronic resonance, this resonance being reached between the two maxima.
  • the plasma is therefore created and confined in the region of the ion source, which is between said maxima of the magnetic field.
  • the maximum and minimum values of the magnetic induction of this ion source taken for the example, are 4,200 and 3,200 Gauss respectively.
  • the cyclotron resonance of the electrons is carried out at 3600 Gauss, the frequency of the injected high frequency wave being fixed at approximately 10 GHz.
  • the ions created in the plasma are finally extracted by an extraction system 5, made up of electrodes, which are located downstream of the second maximum of the magnetic field.
  • an extraction system of ions is placed downstream of the second maximum of the magnetic field, and if this is reduced, the current of ions emitted by the source decreases proportionally.
  • the ions are therefore extracted in a magnetic field of the same order of magnitude as the field of cyclotron resonance.
  • the magnetic field must therefore be kept constant throughout the sliding space of the ion beam up to the point of its application or of the transformation of the ions in neutral particles.
  • the field to be kept constant corresponds to an induction of approximately 3,600 Gauss, the electrical energy consumed by the coils 6 creating this magnetic field is of the order of 1 Megawatt.
  • the extraction system does not allow to extract the high densities.
  • the ion beam can be compressed downstream of the ion source.
  • the magnetic field must be increased proportionally.
  • the object of the present invention is to remedy these drawbacks. For this, it provides for a modification of the magnetic configuration of confinement of the plasma in an ion source with cyclotron resonance of the electrons, which allows the extraction of the ions in a magnetic field markedly lower than that of the ion sources. prior art.
  • the present invention specifically relates to a source of electrons with cyclotron resonance of electrons comprising a system for injecting microwave power into a container containing a gas or a vapor of a material intended to form a plasma, the latter is created and confined in a magnetic configuration, and an ion extraction system this source being characterized in that the magnetic configuration consists of two groups of coils, the first group, located in the plane defined by the sealed window of the microwave injector and surrounding it, providing the magnetic field confining the plasma, and the second group, supplied in counter-field compared to the first group, surrounding the ion extraction system.
  • a third group of coils mounted downstream of the ion extraction system and supplied in the same direction as the first group, provides a magnetic field greater than that of the extraction system to compress the beam of extracted ions.
  • the magnetic field provided by all the groups of coils has a maximum value, greater than that of the cyclotron resonance at the location of the first group of coils, and the magnetic field decreases to a minimum value at the location of the second group of coils passing through the value of the magnetic induction B corresponding to the cyclotronic resonance between these two groups of coils.
  • the position of the extraction system in the source is chosen such that the weak magnetic field at the location of the extraction is provided only by the first group of coils.
  • the microwave injection system consists of several microwave injectors and each of these injectors is surrounded by a group of coils, these being located in the planes defined by the watertight windows of each injector.
  • the magnetic configuration of the confinement of the plasma additionally comprises a multipolar magnetic configuration constituted by permanent magnets.
  • the magnetic field corresponding to the cyclotronic resonance is reached at a distance of the order of a few centimeters downstream of the junction between the hyper frequency injector and the cavity of the ion source.
  • the gas is injected upstream of the ion extraction system and in its vicinity.
  • the ion extraction system consists of a single electrode.
  • the gas intended to form a plasma is deuterium and the minimum magnetic field at the location of the second group of coils is of the order of a few hundred Gauss.
  • FIG. 2a shows schematically and in a simplified manner, an example of an embodiment of an ion source with cyclotronic resonance of the electrons in cross section, comprising the central axis of the source.
  • a vacuum cavity 9 of cylindrical shape of revolution for example, one of the ends carries an injector 8 of microwave power and the other end is connected to the place of use of the ions.
  • the cavity 9 can have any shape depending on the character of the ion source.
  • the microwave power injection system 8 can be constituted by several microwave injectors.
  • a gas or a vapor intended to form a plasma is introduced at 17 at a low pressure of some 10 -3 Torr upstream of the ion extraction system and in its vicinity.
  • An axial static magnetic field is applied by means of coils which surround the cavity. It is also conceivable to use permanent magnets surrounding the cavity to provide the confining magnetic field.
  • the plasma is then created.
  • the plasma is created at another location and then injected into the cavity 9.
  • the plasma is confined in the magnetic configuration obtained by means of two groups of coils 11, 12.
  • the first group of coils 11 is located in the plane defined by the sealed window 13 of the microwave injector 8 and surrounds it.
  • the second group of coils 12 is placed at a predetermined distance downstream from the first group of coils and is supplied in counter-field with respect to the first group.
  • the assembly of these two groups of coils provides a magnetic field which has a maximum value at the location of the first group of coils 11. This value is chosen to be greater than the value B, corresponding to the reso - cyclotronic nance of electrons.
  • the magnetic field decreases to a minimum value at the location of the second group of coils 12.
  • the magnetic field reaches the value of the magnetic field B r corresponding to the cyclotronic resonance.
  • the profile of the magnetic field is chosen such that the cyclotronic resonance of the electrons takes place a few centimeters downstream of the junction between the injector of the microwave power and the cavity.
  • the resonance zone is located far enough from the window 13 so that the plasma 10 created at this location hardly diffuses towards it and therefore does not risk damaging it.
  • the resonance is far enough from the walls of the cavity so that the plasma density is not reduced.
  • the number of coils forming a group depends on the magnetic field to be supplied.
  • a multipolar magnetic configuration is installed between the first 11 and the second 12 groups of coils.
  • Figure 3 shows schematically in cross section along section A-A of Figure 2a, a hexapolar configuration of the additional magnetic confinement.
  • the plasma 10 is confined by the stuffing lines of the magnetic field created by permanent magnets 18 distributed in a ring around the cylindrical part of the cavity which surrounds the plasma and whose polarities are alternated.
  • the frequency of the pulse of the microwave field being approximately 10 GHz
  • the maximum value of the induction B max at the location of the first group of coils is preferably chosen around 4,000 Gauss and the value at the location of the second group of coils is preferably of the order of a few hundred of Gauss.
  • the ion extraction system 14 is installed inside the coils forming the second group.
  • this value of the magnetic induction at the location of the extraction system is less than 10% of the value of the induction B r corresponding to the cyclotronic resonance.
  • the extraction system can be produced in the form of a single electrode.
  • the ion current emitted by the ion source according to the invention is double compared to that of a conventional source.
  • the ion current increases.
  • the beam extracted from the ion source can be compressed, downstream of the extraction electrodes, by the application of a magnetic field greater than that applied to the extraction system 14.
  • the density of the ion current increases proportionally applied magnetic field.
  • the energy consumption of these coils is reduced by a factor greater than ten; there is therefore a significant energy saving.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
EP84401014A 1983-05-20 1984-05-17 Elektronzyklotronresonanz-Ionenquelle Expired EP0127523B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8308401 1983-05-20
FR8308401A FR2546358B1 (fr) 1983-05-20 1983-05-20 Source d'ions a resonance cyclotronique des electrons

Publications (2)

Publication Number Publication Date
EP0127523A1 true EP0127523A1 (de) 1984-12-05
EP0127523B1 EP0127523B1 (de) 1988-08-10

Family

ID=9289043

Family Applications (1)

Application Number Title Priority Date Filing Date
EP84401014A Expired EP0127523B1 (de) 1983-05-20 1984-05-17 Elektronzyklotronresonanz-Ionenquelle

Country Status (6)

Country Link
US (1) US4638216A (de)
EP (1) EP0127523B1 (de)
JP (1) JPS6041735A (de)
CA (1) CA1232375A (de)
DE (1) DE3473377D1 (de)
FR (1) FR2546358B1 (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2580427A1 (fr) * 1985-04-11 1986-10-17 Commissariat Energie Atomique Source d'ions negatifs a resonance cyclotronique des electrons
EP0184475B1 (de) * 1984-11-06 1989-05-24 Commissariat A L'energie Atomique Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle
DE3903322A1 (de) * 1989-02-04 1990-08-16 Nmi Naturwissenschaftl U Mediz Verfahren zur erzeugung von ionen
WO1991016723A1 (en) * 1990-04-25 1991-10-31 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Gaseous radical producing apparatus
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source

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US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
DE3834984A1 (de) * 1988-10-14 1990-04-19 Leybold Ag Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen
JPH0618108B2 (ja) * 1989-12-07 1994-03-09 雄一 坂本 電子サイクロトロン型イオン源
DK0585229T3 (da) * 1991-05-21 1995-12-27 Materials Research Corp Blødætsningsmodul til clusterværktøj og tilhørende ECR-plasmagenerator
DE4200235C1 (de) * 1992-01-08 1993-05-06 Hoffmeister, Helmut, Dr., 4400 Muenster, De
US6441569B1 (en) 1998-12-09 2002-08-27 Edward F. Janzow Particle accelerator for inducing contained particle collisions
FR2795906B1 (fr) * 1999-07-01 2001-08-17 Commissariat Energie Atomique Procede et dispositif de depot par plasma a la resonance cyclotron electronique de couches de tissus de nonofibres de carbone et couches de tissus ainsi obtenus
DE19933762C2 (de) * 1999-07-19 2002-10-17 Juergen Andrae Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen
FR2815954B1 (fr) * 2000-10-27 2003-02-21 Commissariat Energie Atomique Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus
AU2002232395A1 (en) * 2000-11-03 2002-05-15 Tokyo Electron Limited Hall effect ion source at high current density
DE10058326C1 (de) * 2000-11-24 2002-06-13 Astrium Gmbh Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen
US6876154B2 (en) * 2002-04-24 2005-04-05 Trikon Holdings Limited Plasma processing apparatus
US6812647B2 (en) * 2003-04-03 2004-11-02 Wayne D. Cornelius Plasma generator useful for ion beam generation
US7742167B2 (en) * 2005-06-17 2010-06-22 Perkinelmer Health Sciences, Inc. Optical emission device with boost device
US8006939B2 (en) 2006-11-22 2011-08-30 Lockheed Martin Corporation Over-wing traveling-wave axial flow plasma accelerator
US7870720B2 (en) * 2006-11-29 2011-01-18 Lockheed Martin Corporation Inlet electromagnetic flow control
EP3905300A3 (de) 2009-05-15 2022-02-23 Alpha Source, Inc. Ecr-partikelstrahl-quellenvorrichtung

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GB1020224A (en) * 1962-01-22 1966-02-16 Hitachi Ltd Improvements relating to an electron cyclotron resonance ultra-violet lamp
US3418206A (en) * 1963-04-29 1968-12-24 Boeing Co Particle accelerator
FR2147497A5 (de) * 1971-07-29 1973-03-09 Commissariat Energie Atomique
US4045677A (en) * 1976-06-11 1977-08-30 Cornell Research Foundation, Inc. Intense ion beam generator
US4393333A (en) * 1979-12-10 1983-07-12 Hitachi, Ltd. Microwave plasma ion source
FR2475798A1 (fr) * 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede
JPS5947421B2 (ja) * 1980-03-24 1984-11-19 株式会社日立製作所 マイクロ波イオン源
JPS5779621A (en) * 1980-11-05 1982-05-18 Mitsubishi Electric Corp Plasma processing device

Non-Patent Citations (3)

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Title
JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 11, no. 5, mai 1972, Tokyo (JP) Y. OKAMOTO et al.:"Some features of an electron cyclotron resonance plasma produced by means of a Lisitano-coil", pages 726-731 *
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, vol. 196, no. 2/3, mai 1982, Amsterdam (NL), F. BOURG et al.:"Source d'ions multicharges minimafios. Nouvelles caractéristiques", pages 325-329 *
NUCLEAR INSTRUMENTS AND METHODS, vol. 127, 15 août 1975, North-Holland Publishing Company, Amsterdam (NL) P. BRIAND et al.:"Production and abundance measurements of multicharged xenon ions in ECR produced plasmas", pages 441-443 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184475B1 (de) * 1984-11-06 1989-05-24 Commissariat A L'energie Atomique Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle
FR2580427A1 (fr) * 1985-04-11 1986-10-17 Commissariat Energie Atomique Source d'ions negatifs a resonance cyclotronique des electrons
EP0199625A1 (de) * 1985-04-11 1986-10-29 Commissariat A L'energie Atomique Elektronzyklotronresonanzquelle negativer Ionen
DE3903322A1 (de) * 1989-02-04 1990-08-16 Nmi Naturwissenschaftl U Mediz Verfahren zur erzeugung von ionen
WO1991016723A1 (en) * 1990-04-25 1991-10-31 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Gaseous radical producing apparatus
GB2261986A (en) * 1990-04-25 1993-06-02 Secr Defence Gaseous radical producing apparatus
GB2261986B (en) * 1990-04-25 1994-08-24 Secr Defence Gaseous radical producing apparatus
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source

Also Published As

Publication number Publication date
DE3473377D1 (en) 1988-09-15
JPS6041735A (ja) 1985-03-05
FR2546358B1 (fr) 1985-07-05
FR2546358A1 (fr) 1984-11-23
US4638216A (en) 1987-01-20
EP0127523B1 (de) 1988-08-10
CA1232375A (en) 1988-02-02
JPH046060B2 (de) 1992-02-04

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