GB2261986A - Gaseous radical producing apparatus - Google Patents
Gaseous radical producing apparatusInfo
- Publication number
- GB2261986A GB2261986A GB9221198A GB9221198A GB2261986A GB 2261986 A GB2261986 A GB 2261986A GB 9221198 A GB9221198 A GB 9221198A GB 9221198 A GB9221198 A GB 9221198A GB 2261986 A GB2261986 A GB 2261986A
- Authority
- GB
- United Kingdom
- Prior art keywords
- constriction
- discharge region
- gaseous
- discharge
- discharge tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
Gaseous radical apparatus is provided with a discharge tube having a discharge tube, a magnetic field sufficient for electron confinement within the discharge region, and a constriction downstream of the discharge region. Use of a constriction downstrem of the discharge region lengthens the residence time within the discharge region, and thus enhances the probability of production of gaseous radicals. A preferred embodiment of the invention has a magnetic field sufficient to induce the ECR condition and a constriction giving a ratio of gaseous pressure within the discharge region to gaseous pressure just downstream of the constriction of 5:1 or greater. Other preferred features of the invention include use of a metal yoke, a metal jacket around exposed parts of the apparatus, use of a discharge tube having a low recombination coefficient and use of industrial standard microwave frequencies.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB909009319A GB9009319D0 (en) | 1990-04-25 | 1990-04-25 | Gaseous radical source |
PCT/GB1991/000556 WO1991016723A1 (en) | 1990-04-25 | 1991-04-23 | Gaseous radical producing apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9221198D0 GB9221198D0 (en) | 1993-01-06 |
GB2261986A true GB2261986A (en) | 1993-06-02 |
GB2261986B GB2261986B (en) | 1994-08-24 |
Family
ID=10674987
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB909009319A Pending GB9009319D0 (en) | 1990-04-25 | 1990-04-25 | Gaseous radical source |
GB9221198A Expired - Fee Related GB2261986B (en) | 1990-04-25 | 1992-10-08 | Gaseous radical producing apparatus |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB909009319A Pending GB9009319D0 (en) | 1990-04-25 | 1990-04-25 | Gaseous radical source |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0526491A1 (en) |
JP (1) | JPH05506328A (en) |
GB (2) | GB9009319D0 (en) |
WO (1) | WO1991016723A1 (en) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0127523A1 (en) * | 1983-05-20 | 1984-12-05 | Commissariat A L'energie Atomique | Electron-cyclotron resonance ion source |
EP0164715A2 (en) * | 1984-06-11 | 1985-12-18 | Nippon Telegraph And Telephone Corporation | Microwave ion source |
US4611121A (en) * | 1983-04-19 | 1986-09-09 | Nihon Shinku Gijutsu Kabushiki Kaisha | Magnet apparatus |
US4683838A (en) * | 1984-06-29 | 1987-08-04 | Hitachi, Ltd. | Plasma treatment system |
US4703180A (en) * | 1984-10-30 | 1987-10-27 | Hitachi, Ltd. | Microwave discharge type ion source for ion injection devices |
US4739169A (en) * | 1985-10-04 | 1988-04-19 | Hitachi, Ltd. | Ion source |
US4788473A (en) * | 1986-06-20 | 1988-11-29 | Fujitsu Limited | Plasma generating device with stepped waveguide transition |
DE3915477A1 (en) * | 1988-05-11 | 1989-11-23 | Hitachi Ltd | MICROWAVE PLASMA MANUFACTURING DEVICE |
EP0344969A1 (en) * | 1988-06-03 | 1989-12-06 | Eaton Corporation | Electron cyclotron resonance ion source |
JPH10225041A (en) * | 1997-02-05 | 1998-08-21 | Toshiba Corp | Motor |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01225041A (en) * | 1988-03-03 | 1989-09-07 | Mitsubishi Electric Corp | Ion source device |
-
1990
- 1990-04-25 GB GB909009319A patent/GB9009319D0/en active Pending
-
1991
- 1991-04-23 JP JP91506986A patent/JPH05506328A/en active Pending
- 1991-04-23 WO PCT/GB1991/000556 patent/WO1991016723A1/en not_active Application Discontinuation
- 1991-04-23 EP EP19910907769 patent/EP0526491A1/en not_active Withdrawn
-
1992
- 1992-10-08 GB GB9221198A patent/GB2261986B/en not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4611121A (en) * | 1983-04-19 | 1986-09-09 | Nihon Shinku Gijutsu Kabushiki Kaisha | Magnet apparatus |
EP0127523A1 (en) * | 1983-05-20 | 1984-12-05 | Commissariat A L'energie Atomique | Electron-cyclotron resonance ion source |
EP0164715A2 (en) * | 1984-06-11 | 1985-12-18 | Nippon Telegraph And Telephone Corporation | Microwave ion source |
US4683838A (en) * | 1984-06-29 | 1987-08-04 | Hitachi, Ltd. | Plasma treatment system |
US4703180A (en) * | 1984-10-30 | 1987-10-27 | Hitachi, Ltd. | Microwave discharge type ion source for ion injection devices |
US4739169A (en) * | 1985-10-04 | 1988-04-19 | Hitachi, Ltd. | Ion source |
US4788473A (en) * | 1986-06-20 | 1988-11-29 | Fujitsu Limited | Plasma generating device with stepped waveguide transition |
DE3915477A1 (en) * | 1988-05-11 | 1989-11-23 | Hitachi Ltd | MICROWAVE PLASMA MANUFACTURING DEVICE |
EP0344969A1 (en) * | 1988-06-03 | 1989-12-06 | Eaton Corporation | Electron cyclotron resonance ion source |
JPH10225041A (en) * | 1997-02-05 | 1998-08-21 | Toshiba Corp | Motor |
Also Published As
Publication number | Publication date |
---|---|
GB9009319D0 (en) | 1990-06-20 |
JPH05506328A (en) | 1993-09-16 |
GB2261986B (en) | 1994-08-24 |
WO1991016723A1 (en) | 1991-10-31 |
GB9221198D0 (en) | 1993-01-06 |
EP0526491A1 (en) | 1993-02-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4088926A (en) | Plasma cleaning device | |
KR900010952A (en) | Device manufacturing process | |
HUP9701872A2 (en) | Electric lamp assembly including a high intensity electrodeless low pressure light source and method for operating said assembly | |
GB2253144A (en) | Sterilisation using activated charge-free gaseous medium | |
JPS56155535A (en) | Film forming device utilizing plasma | |
EP0486943B1 (en) | Device for the excitation of a uniform microwave field | |
GB2085237B (en) | Electrically shielded conduit | |
JPS57152663A (en) | Micro-wave electric-discharge light source device | |
TW326616B (en) | Plasma processing method and apparatus | |
MX166219B (en) | PROCEDURE TO PREPARE A STRENGTHENING POLYMERIC SURFACE FOR A DIRECT JOINT WITH RUBBER | |
GB2261986A (en) | Gaseous radical producing apparatus | |
ES2049676A1 (en) | Manufacture of hydrofluorocarbons | |
SE9704435L (en) | Process and apparatus in the manufacture of transformer / reactor | |
ZA914567B (en) | Process for the industrial preparation of 4-chloro-3-sulfamoyl-n-(2,3-dihydro-2-methyl-1h-indol-1-yl)benzamide | |
DE3269440D1 (en) | Ion source having a gas ionization chamber with oscillations of electrons | |
HK1004468A1 (en) | Combination of atovaquone with proguanil for the treatment of protozoal infections | |
TW267291B (en) | Plasma treatment device | |
JPS5755057A (en) | Microwave discharge light source | |
EP0468886A3 (en) | Plasma production device | |
JPS5763768A (en) | Non-electrode discharge lamp | |
BR9714618A (en) | implosion resistant cathode ray tube envelope | |
JPS6417399A (en) | Plasma processing equipment | |
JPS5459155A (en) | Production of optical fibers | |
Shannon et al. | Plasma cleaning device | |
JPS6489126A (en) | Vacuum valve |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19950423 |