DK460579A - Overtraeksmiddel til fremstilling af bestraalingshaerdelige overtraek - Google Patents
Overtraeksmiddel til fremstilling af bestraalingshaerdelige overtraekInfo
- Publication number
- DK460579A DK460579A DK460579A DK460579A DK460579A DK 460579 A DK460579 A DK 460579A DK 460579 A DK460579 A DK 460579A DK 460579 A DK460579 A DK 460579A DK 460579 A DK460579 A DK 460579A
- Authority
- DK
- Denmark
- Prior art keywords
- coating
- irragular
- preparation
- agent
- coating agent
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB7842748 | 1978-11-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK460579A true DK460579A (da) | 1980-05-02 |
Family
ID=10500726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK460579A DK460579A (da) | 1978-11-01 | 1979-10-31 | Overtraeksmiddel til fremstilling af bestraalingshaerdelige overtraek |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS6032360B2 (no) |
| BR (1) | BR7907098A (no) |
| CH (1) | CH645395A5 (no) |
| DE (1) | DE2944097A1 (no) |
| DK (1) | DK460579A (no) |
| FR (1) | FR2440978B1 (no) |
| HK (1) | HK75587A (no) |
| IT (1) | IT1124219B (no) |
| NO (1) | NO159729C (no) |
| SE (1) | SE445647B (no) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR8103183A (pt) * | 1980-05-27 | 1982-02-09 | Du Pont | Camada foto-sensivel fina;elemento foto-resistor;substrato com uma camada foto-sensivel fina laminada;e processo para aparacao de camada foto-sensivel e de um material polimerico fino |
| JPS62178542A (ja) * | 1986-01-30 | 1987-08-05 | Nippon Kayaku Co Ltd | （メタ）アクリル酸エステル及びコ−テイング又は印刷インキ用反応性化合物 |
| EP0281808B1 (de) * | 1987-03-12 | 1994-07-20 | Siemens Aktiengesellschaft | Strahlungsvernetzbares Polymersystem zur Anwendung als Photoresist und Dielektrikum für Mikroverdrahtungen |
| CA2055833C (en) * | 1990-11-20 | 2001-04-24 | Katsue Nishikawa | Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same |
| WO2009110503A1 (ja) | 2008-03-05 | 2009-09-11 | 株式会社日本触媒 | 重合体、硬化性樹脂組成物、硬化物、及び物品 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1549956A (no) * | 1967-03-02 | 1968-12-13 | ||
| US3661576A (en) * | 1970-02-09 | 1972-05-09 | Brady Co W H | Photopolymerizable compositions and articles |
| US3876432A (en) * | 1972-09-11 | 1975-04-08 | Sun Chemical Corp | Fatty ester modified epoxy resin photopolymerizable compositions |
| DE2326314C2 (de) * | 1973-05-23 | 1983-10-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung von Reliefstrukturen |
| JPS5017827A (no) * | 1973-06-18 | 1975-02-25 | ||
| FR2255629B1 (no) * | 1973-12-20 | 1976-10-22 | Ibm | |
| US4072592A (en) * | 1974-05-20 | 1978-02-07 | Mobil Oil Corporation | Radiation curable coating |
| US4003877A (en) * | 1974-05-24 | 1977-01-18 | Dynachem Corporation | Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions |
| DE2534012C3 (de) * | 1975-07-30 | 1981-05-14 | Bayer Ag, 5090 Leverkusen | Verfahren zur Herstellung von Bindemitteln |
| DE2702660C3 (de) * | 1976-01-27 | 1980-07-10 | Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) | Durch Strahlung härtbare Überzugsmasse und Verfahren zu ihrer Herstellung |
| JPS52117985A (en) * | 1976-03-30 | 1977-10-03 | Hitachi Chem Co Ltd | Photosensitive polymer composition |
| CA1116919A (en) * | 1976-10-27 | 1982-01-26 | Joseph E. Gervay | Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder |
-
1979
- 1979-10-29 NO NO793475A patent/NO159729C/no unknown
- 1979-10-31 DK DK460579A patent/DK460579A/da not_active Application Discontinuation
- 1979-10-31 BR BR7907098A patent/BR7907098A/pt not_active IP Right Cessation
- 1979-10-31 IT IT12796/79A patent/IT1124219B/it active
- 1979-10-31 JP JP54141147A patent/JPS6032360B2/ja not_active Expired
- 1979-10-31 FR FR7927062A patent/FR2440978B1/fr not_active Expired
- 1979-10-31 DE DE19792944097 patent/DE2944097A1/de active Granted
- 1979-10-31 SE SE7909024A patent/SE445647B/sv not_active IP Right Cessation
- 1979-11-02 CH CH983779A patent/CH645395A5/de not_active IP Right Cessation
-
1987
- 1987-10-15 HK HK755/87A patent/HK75587A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| NO159729C (no) | 1989-02-01 |
| HK75587A (en) | 1987-10-23 |
| SE7909024L (sv) | 1980-05-02 |
| NO793475L (no) | 1980-05-05 |
| BR7907098A (pt) | 1980-10-07 |
| FR2440978B1 (fr) | 1985-07-19 |
| SE445647B (sv) | 1986-07-07 |
| JPS5562976A (en) | 1980-05-12 |
| JPS6032360B2 (ja) | 1985-07-27 |
| NO159729B (no) | 1988-10-24 |
| IT7912796A0 (it) | 1979-10-31 |
| DE2944097A1 (de) | 1980-05-14 |
| IT1124219B (it) | 1986-05-07 |
| DE2944097C2 (no) | 1988-07-28 |
| FR2440978A1 (fr) | 1980-06-06 |
| CH645395A5 (en) | 1984-09-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AHS | Application shelved for other reasons than non-payment |