DK3401711T3 - Diffraktivt optisk element og lysbestrålingsapparat - Google Patents

Diffraktivt optisk element og lysbestrålingsapparat Download PDF

Info

Publication number
DK3401711T3
DK3401711T3 DK16883899.3T DK16883899T DK3401711T3 DK 3401711 T3 DK3401711 T3 DK 3401711T3 DK 16883899 T DK16883899 T DK 16883899T DK 3401711 T3 DK3401711 T3 DK 3401711T3
Authority
DK
Denmark
Prior art keywords
optical element
light irradiation
diffractive optical
irradiation apparatus
diffractive
Prior art date
Application number
DK16883899.3T
Other languages
English (en)
Inventor
Yuichi Miyazaki
Nobuhito Toyama
Hidenori Yoshioka
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Printing Co Ltd filed Critical Dainippon Printing Co Ltd
Application granted granted Critical
Publication of DK3401711T3 publication Critical patent/DK3401711T3/da

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/02—Refractors for light sources of prismatic shape
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00—Light-generating elements of semiconductor light sources
    • F21Y2115/10—Light-emitting diodes [LED]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Holo Graphy (AREA)
  • Laser Surgery Devices (AREA)
DK16883899.3T 2016-01-08 2016-12-28 Diffraktivt optisk element og lysbestrålingsapparat DK3401711T3 (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016002984 2016-01-08
JP2016166576 2016-08-29
PCT/JP2016/089132 WO2017119400A1 (ja) 2016-01-08 2016-12-28 回折光学素子、及び光照射装置

Publications (1)

Publication Number Publication Date
DK3401711T3 true DK3401711T3 (da) 2023-04-24

Family

ID=59274379

Family Applications (1)

Application Number Title Priority Date Filing Date
DK16883899.3T DK3401711T3 (da) 2016-01-08 2016-12-28 Diffraktivt optisk element og lysbestrålingsapparat

Country Status (6)

Country Link
US (2) US10704763B2 (da)
EP (1) EP3401711B1 (da)
CN (1) CN108474878B (da)
DK (1) DK3401711T3 (da)
FI (1) FI3401711T3 (da)
WO (1) WO2017119400A1 (da)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI724211B (zh) * 2016-07-22 2021-04-11 日商大日本印刷股份有限公司 繞射光學元件、光照射裝置
JP7196406B2 (ja) * 2017-03-17 2022-12-27 大日本印刷株式会社 回折光学素子
TWI772387B (zh) * 2017-03-17 2022-08-01 日商大日本印刷股份有限公司 繞射光學元件
WO2019004406A1 (ja) * 2017-06-30 2019-01-03 大日本印刷株式会社 回折光学素子及びその製造方法、回折光学素子形成用のアクリル系樹脂組成物、並びに照明装置
JP6977355B2 (ja) * 2017-07-20 2021-12-08 大日本印刷株式会社 検出装置
CA3085459A1 (en) 2018-01-04 2019-07-11 Magic Leap, Inc. Optical elements based on polymeric structures incorporating inorganic materials
WO2019240010A1 (ja) * 2018-06-11 2019-12-19 Ａｇｃ株式会社 回折光学素子、投影装置および計測装置
US10809448B1 (en) * 2019-04-18 2020-10-20 Facebook Technologies, Llc Reducing demolding stress at edges of gratings in nanoimprint lithography
JP7345954B2 (ja) * 2019-08-14 2023-09-19 エルジー・ケム・リミテッド 回折導光板および回折導光板の製造方法
JP6684506B1 (ja) * 2019-08-29 2020-04-22 アイ・エヌ製薬株式会社 動物忌避装置および動物忌避方法
CN112188065B (zh) * 2020-09-30 2022-02-15 维沃移动通信有限公司 摄像装置及电子设备
CN112188066B (zh) * 2020-09-30 2022-08-02 维沃移动通信有限公司 摄像装置及电子设备
CN113325503A (zh) * 2021-05-31 2021-08-31 江西欧迈斯微电子有限公司 衍射光学元件及光学设备
EP4336229A1 (en) * 2022-08-03 2024-03-13 Himax Technologies Limited Optical element and method for manufacturing optical element

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6762880B2 (en) * 2001-02-21 2004-07-13 Ibsen Photonics A/S Grating structures and methods of making the grating structures
JP4324374B2 (ja) * 2002-03-29 2009-09-02 大日本印刷株式会社 微細凹凸パターン形成材料、微細凹凸パターン形成方法、転写箔、光学物品及びスタンパー
JP2005084561A (ja) * 2003-09-11 2005-03-31 Dainippon Printing Co Ltd 微細パターン形成体およびその製造方法
NO326468B1 (no) * 2005-12-06 2008-12-08 Ignis Display As Modulator med innstillbart diffraksjonsgitter (TDG) med total intern refleksjon (TIR), fremgangsmate for fremstilling av en elastomer for anvedelse deri samt anvendelse av elastomeren.
JP4412388B2 (ja) * 2007-10-31 2010-02-10 セイコーエプソン株式会社 光学素子、液晶装置及び電子機器
JP2010169722A (ja) * 2009-01-20 2010-08-05 Seiko Epson Corp 光学素子の製造方法及び光学素子
JP2010210824A (ja) 2009-03-09 2010-09-24 Seiko Epson Corp 光学素子及び照明装置
JP5849954B2 (ja) 2010-08-06 2016-02-03 旭硝子株式会社 回折光学素子及び計測装置
WO2012167076A2 (en) * 2011-06-01 2012-12-06 The Regents Of The University Of Michigan Nanochannel-guided patterning for polymeric substrates
JP6201289B2 (ja) 2012-09-28 2017-09-27 凸版印刷株式会社 画像表示体及び情報媒体
JP2014092730A (ja) 2012-11-06 2014-05-19 Canon Inc 回折格子、それを用いた光学装置
JP2014123082A (ja) * 2012-12-22 2014-07-03 Toyota Central R&D Labs Inc 回折格子
TW201439720A (zh) * 2013-04-03 2014-10-16 Wintek Corp 觸控面板
KR102148417B1 (ko) * 2014-01-13 2020-08-27 삼성전자주식회사 인셀 편광자, 이를 포함한 액정 표시장치 및 그 제조 방법
KR102114965B1 (ko) * 2014-02-07 2020-05-26 삼성디스플레이 주식회사 반사형 편광판의 제조방법 및 반사형 편광판을 구비한 표시장치
JP6343972B2 (ja) 2014-03-10 2018-06-20 富士通株式会社 照明装置及び生体認証装置
JP6464895B2 (ja) * 2015-04-03 2019-02-06 住友電気工業株式会社 量子カスケード半導体レーザ
JP6895903B2 (ja) * 2016-02-12 2021-06-30 古河電気工業株式会社 半導体レーザ素子、回折格子構造、および回折格子

Also Published As

Publication number Publication date
US20190346108A1 (en) 2019-11-14
FI3401711T3 (fi) 2023-05-05
US10591133B2 (en) 2020-03-17
CN108474878A (zh) 2018-08-31
EP3401711A4 (en) 2019-09-11
CN108474878B (zh) 2021-07-27
US10704763B2 (en) 2020-07-07
EP3401711A1 (en) 2018-11-14
WO2017119400A1 (ja) 2017-07-13
EP3401711B1 (en) 2023-04-05
US20190178468A1 (en) 2019-06-13

Similar Documents

Publication Publication Date Title
DK3401711T3 (da) Diffraktivt optisk element og lysbestrålingsapparat
IL269317A (en) An eye imaging device that uses optical refractive elements
DK3430378T3 (da) Indretninger og fremgangsmåder til modifikation af optiske egenskaber
DK3576888T3 (da) Apparater og metoder til fremstilling af optiske effektlag
DK3308202T3 (da) Laserbehandlingsapparat og fremgangsmåde og en optisk komponent derfor
DK3142586T3 (da) Kateterindretning til at sende og reflektere lys
DK3221357T3 (da) Fælles letkæder og fremgangsmåder til anvendelse
DK3494423T3 (da) Optisk fiberevalueringsfremgangsmåde og optisk fiber evalueringsindretning
DK3462553T3 (da) Optisk fiber og laserindretning
DK2942847T3 (da) Metode og enhed til oprettelse af superkontinuum-lysimpulser
FR3018691B1 (fr) Appareil de soin avec guide de lumiere
DK3532768T3 (da) Pladslys
DK3227237T3 (da) Indretning og anvendelse deraf til uv-bearbejdning af fluider
DK3468166T3 (da) Indretning til indstilling af en optisk kameraakse og kamera dermed
DK3170037T3 (da) Piezoelektrisk aktiveret optisk linse
SG10201504400XA (en) Diffractive lens and optical device using the same
DK3306759T3 (da) Optisk fiber til forstærkning og laserindretning
FR3041248B1 (fr) Appareil de soin avec guide de lumiere
DK3403138T3 (da) Optisk anordning
DK3309538T3 (da) Optisk system og fremgangsmåde til spektroskopi
IT201700051935A1 (it) Dispositivo laser
DK3687825T3 (da) Optisk sikkerhedselement
DK3178793T3 (da) Fremgangsmåde til fremstilling af en optisk fiberpræform og en optisk fiber
TWI799600B (zh) 紫外線照射裝置
DE112017000574A5 (de) Leuchtvorrichtung