DK3084043T3 - Fremgangsmåde til elektrolytisk overflademodifikation af flade metal-arbejdsemne i kobber-sulfat behandlingsvæske indeholdende sulfatmetalater - Google Patents

Fremgangsmåde til elektrolytisk overflademodifikation af flade metal-arbejdsemne i kobber-sulfat behandlingsvæske indeholdende sulfatmetalater Download PDF

Info

Publication number
DK3084043T3
DK3084043T3 DK14823977.5T DK14823977T DK3084043T3 DK 3084043 T3 DK3084043 T3 DK 3084043T3 DK 14823977 T DK14823977 T DK 14823977T DK 3084043 T3 DK3084043 T3 DK 3084043T3
Authority
DK
Denmark
Prior art keywords
metal
workpiece
treatment liquid
copper
metal workpiece
Prior art date
Application number
DK14823977.5T
Other languages
Danish (da)
English (en)
Inventor
Andreas Seidel
Fabian Distelrath
Thomas Booz
Original Assignee
Schlenk Metallfolien Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schlenk Metallfolien Gmbh & Co Kg filed Critical Schlenk Metallfolien Gmbh & Co Kg
Application granted granted Critical
Publication of DK3084043T3 publication Critical patent/DK3084043T3/da

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0628In vertical cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0664Isolating rolls
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0692Regulating the thickness of the coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
DK14823977.5T 2013-12-19 2014-12-18 Fremgangsmåde til elektrolytisk overflademodifikation af flade metal-arbejdsemne i kobber-sulfat behandlingsvæske indeholdende sulfatmetalater DK3084043T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013022030.0A DE102013022030B4 (de) 2013-12-19 2013-12-19 Verfahren zur elektrolytischen Oberflächenmodifizierung von flächigen Metallwerkstücken in sulfatometallhaltigen Kupfersulfat-Behandlungsflüssigkeiten, flächiges Metallwerkstück und dessen Verwendung
PCT/EP2014/078569 WO2015091863A1 (de) 2013-12-19 2014-12-18 Verfahren zur elektrolytischen oberflächenmodifizierung von flächigen metallwerkstücken in sulfatometallathaltigen kupfersulfat-behandlungsflüssigkeiten

Publications (1)

Publication Number Publication Date
DK3084043T3 true DK3084043T3 (da) 2018-06-25

Family

ID=52282713

Family Applications (1)

Application Number Title Priority Date Filing Date
DK14823977.5T DK3084043T3 (da) 2013-12-19 2014-12-18 Fremgangsmåde til elektrolytisk overflademodifikation af flade metal-arbejdsemne i kobber-sulfat behandlingsvæske indeholdende sulfatmetalater

Country Status (7)

Country Link
US (1) US20160319448A1 (de)
EP (1) EP3084043B1 (de)
JP (1) JP2017501308A (de)
KR (1) KR20160100319A (de)
DE (1) DE102013022030B4 (de)
DK (1) DK3084043T3 (de)
WO (1) WO2015091863A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021134524A1 (de) 2021-12-23 2023-06-29 Tdk Electronics Ag Gekoppeltes Ätz- und Abscheideverfahren

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3666636A (en) * 1969-06-19 1972-05-30 Udylite Corp Electrolytic codeposition of fine particles with copper
US4097342A (en) * 1975-05-16 1978-06-27 Alcan Research And Development Limited Electroplating aluminum stock
FR2646174B1 (fr) * 1989-04-25 1992-04-30 Pechiney Aluminium Procede et dispositif de revetement en continu de substrats conducteurs de l'electricite par electrolyse a grande vitesse
AT406385B (de) * 1996-10-25 2000-04-25 Andritz Patentverwaltung Verfahren und vorrichtung zum elektrolytischen beizen von metallischen bändern
DE19951325C2 (de) * 1999-10-20 2003-06-26 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum elektrolytischen Behandeln von elektrisch gegeneinander isolierten, elektrisch leitfähigen Strukturen auf Oberflächen von elektrisch isolierendem Folienmaterial sowie Anwendungen des Verfahrens
JP4799887B2 (ja) * 2005-03-24 2011-10-26 石原薬品株式会社 電気銅メッキ浴、並びに銅メッキ方法
CN101892502B (zh) * 2010-07-27 2012-02-01 华南理工大学 一种铜-铬-钼三元合金镀层及其制备方法

Also Published As

Publication number Publication date
EP3084043A1 (de) 2016-10-26
WO2015091863A1 (de) 2015-06-25
EP3084043B1 (de) 2018-05-30
DE102013022030B4 (de) 2017-10-05
KR20160100319A (ko) 2016-08-23
JP2017501308A (ja) 2017-01-12
DE102013022030A1 (de) 2015-06-25
US20160319448A1 (en) 2016-11-03

Similar Documents

Publication Publication Date Title
CN101622380B (zh) 表面粗化铜板的制造方法和装置、以及表面粗化铜板
CN101748451B (zh) 轴瓦四元合金电镀工艺
EP2803756A1 (de) Verfahren zur Ablagerung dicker Kupferschichten auf gesinterten Materialien
JPS61119699A (ja) 金属または金属合金の箔を製造するシステム並びに方法
WO2017155469A1 (en) Semiconductor device and method of manufacture
WO2000001865A1 (fr) Procede pour traiter la surface d'une preforme en aluminium
DK3084043T3 (da) Fremgangsmåde til elektrolytisk overflademodifikation af flade metal-arbejdsemne i kobber-sulfat behandlingsvæske indeholdende sulfatmetalater
Huynh et al. Electrodeposition of aluminum on cathodes in ionic liquid based choline chloride/urea/AlCl3
US9574283B2 (en) Rinsing and drying for electrochemical processing
JP2001140090A (ja) キャリア箔付電解銅箔及びその製造方法
Wu et al. Investigation into the effects of magnetic agitation and pulsed current on the development of SnCu alloy electrodeposits
CN102312265B (zh) 一种铝或铝合金阳极氧化膜的制备方法
US20160319451A1 (en) Electrically conductive liquids based on metal-diphosphonate complexes
CN105821452A (zh) 一种在铜丝上电镀纯锡的镀液配方及电镀方法
TWI451003B (zh) 鎳ph值調整方法及設備
CN109537010A (zh) 一种电子元器件零件镀镍打底后无氰镀金的工艺
US4552627A (en) Preparation for improving the adhesion properties of metal foils
US2966448A (en) Methods of electroplating aluminum and alloys thereof
Zemanová et al. Pulse nickel electrolytic colouring process of anodised aluminium
WO2003035941A2 (en) Electrolytic processes with reduced cell voltage and gas formation
CN1477237A (zh) 碱性溶液电镀黄铜工艺及其电镀溶液配方
JP2003105581A (ja) スズ合金の電解析出方法及び装置
RU2653515C1 (ru) Способ гальванической металлизации молибденовых сплавов
Zhao et al. The effect of gelatin on the tin electrodeposition
CN107904628B (zh) 一种基于超声辅助苹果酸-甜菜碱低共熔溶剂的电镀锌方法