DE7235271U - Einrichtung zum kuehlen von werkstuecken,die einer behandlung im vakuum unterworfen werden - Google Patents

Einrichtung zum kuehlen von werkstuecken,die einer behandlung im vakuum unterworfen werden

Info

Publication number
DE7235271U
DE7235271U DE19727235271U DE7235271U DE7235271U DE 7235271 U DE7235271 U DE 7235271U DE 19727235271 U DE19727235271 U DE 19727235271U DE 7235271 U DE7235271 U DE 7235271U DE 7235271 U DE7235271 U DE 7235271U
Authority
DE
Germany
Prior art keywords
vacuum
workpiece
workpieces
heat sink
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19727235271U
Other languages
German (de)
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BALZERS HOCHVAKUUM GmbH
Original Assignee
BALZERS HOCHVAKUUM GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BALZERS HOCHVAKUUM GmbH filed Critical BALZERS HOCHVAKUUM GmbH
Publication of DE7235271U publication Critical patent/DE7235271U/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S165/00—Heat exchange
    • Y10S165/135—Movable heat exchanger
    • Y10S165/139—Fully rotatable
    • Y10S165/156—Hollow cylindrical member, e.g. drum

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE19727235271U 1971-10-27 1972-09-25 Einrichtung zum kuehlen von werkstuecken,die einer behandlung im vakuum unterworfen werden Expired DE7235271U (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1569271A CH544274A (de) 1971-10-27 1971-10-27 Einrichtung zum Kühlen von Werkstücken, die einer Behandlung im Vakuum unterworfen werden

Publications (1)

Publication Number Publication Date
DE7235271U true DE7235271U (de) 1975-09-04

Family

ID=4411143

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19727235271U Expired DE7235271U (de) 1971-10-27 1972-09-25 Einrichtung zum kuehlen von werkstuecken,die einer behandlung im vakuum unterworfen werden
DE2247014A Expired DE2247014C3 (de) 1971-10-27 1972-09-25 Einrichtung zum Kühlen von Werkstücken, die einer Behandlung im Vakuum unterworfen werden

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE2247014A Expired DE2247014C3 (de) 1971-10-27 1972-09-25 Einrichtung zum Kühlen von Werkstücken, die einer Behandlung im Vakuum unterworfen werden

Country Status (6)

Country Link
US (1) US3818982A (enExample)
CH (1) CH544274A (enExample)
DE (2) DE7235271U (enExample)
FR (1) FR2157895B3 (enExample)
GB (1) GB1364960A (enExample)
NL (1) NL143626B (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4026787A (en) * 1974-01-25 1977-05-31 Coulter Information Systems, Inc. Thin film deposition apparatus using segmented target means
US3885520A (en) * 1974-03-08 1975-05-27 John F Krumme Vapor deposition apparatus with rotatable ring mask
US3892651A (en) * 1974-05-28 1975-07-01 Corning Glass Works Method and apparatus for coating a plurality of cylindrical articles
US4014779A (en) * 1974-11-01 1977-03-29 Coulter Information Systems, Inc. Sputtering apparatus
US4080281A (en) * 1976-04-09 1978-03-21 Tsunehiko Endo Apparatus for making metal films
US4151064A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Apparatus for sputtering cylinders
US4261762A (en) * 1979-09-14 1981-04-14 Eaton Corporation Method for conducting heat to or from an article being treated under vacuum
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
US4680061A (en) * 1979-12-21 1987-07-14 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
US4909314A (en) * 1979-12-21 1990-03-20 Varian Associates, Inc. Apparatus for thermal treatment of a wafer in an evacuated environment
US4743570A (en) * 1979-12-21 1988-05-10 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
EP0043248B1 (en) * 1980-07-01 1984-05-30 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Process for the bulk production of alloys and apparatus therefor
AT368442B (de) * 1981-01-26 1982-10-11 Alber Franz Anschlusstutzen
GB2129018B (en) * 1982-08-30 1986-01-29 Ricoh Kk Vacuum evaporation apparatus
US4576622A (en) * 1983-11-28 1986-03-18 Lothar Jung Manufacture of preforms for energy transmitting fibers
GB8418063D0 (en) * 1984-07-16 1984-08-22 Atomic Energy Authority Uk Temperature control in vacuum
CA1251100A (en) * 1985-05-17 1989-03-14 Richard Cloutier Chemical vapor deposition
WO1987007153A1 (en) * 1986-05-29 1987-12-03 Interface Biomedical Laboratories Corporation Composite hemostatic article including a hemostatic agent onlay and methods for preparing the same
US4938992A (en) * 1988-01-07 1990-07-03 Varian Associates, Inc. Methods for thermal transfer with a semiconductor
US4832781A (en) * 1988-01-07 1989-05-23 Varian Associates, Inc. Methods and apparatus for thermal transfer with a semiconductor wafer in vacuum
US4997606A (en) * 1988-01-07 1991-03-05 Varian Associates, Inc. Methods and apparatus for fabricating a high purity thermally-conductive polymer layer
US4949783A (en) * 1988-05-18 1990-08-21 Veeco Instruments, Inc. Substrate transport and cooling apparatus and method for same
US5182093A (en) * 1990-01-08 1993-01-26 Celestech, Inc. Diamond deposition cell
US6017581A (en) * 1997-04-18 2000-01-25 Semi-Alloys Company Method for coating lenticular articles
US6241005B1 (en) 1999-03-30 2001-06-05 Veeco Instruments, Inc. Thermal interface member
US7000418B2 (en) * 2004-05-14 2006-02-21 Intevac, Inc. Capacitance sensing for substrate cooling
US8468969B2 (en) * 2010-11-30 2013-06-25 United Technologies Corporation Dimensionally stable durable thermal spray masking system
DE202014009343U1 (de) 2014-11-22 2014-12-15 Sav Automation Gmbh Einrichtung zum Kühlen partiell erhitzter Werkstücke nach Schweiß- oder Härtebearbeitungen
US11174552B2 (en) * 2018-06-12 2021-11-16 Applied Materials, Inc. Rotary reactor for uniform particle coating with thin films
JP7260628B2 (ja) 2018-07-19 2023-04-18 アプライド マテリアルズ インコーポレイテッド 粒子をコーティングする方法及び装置
TWI764732B (zh) 2019-04-24 2022-05-11 美商應用材料股份有限公司 用於在具有旋轉槳的固定的腔室中塗覆顆粒的反應器
TWI844842B (zh) 2019-04-24 2024-06-11 美商應用材料股份有限公司 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器
US12220678B2 (en) 2020-07-30 2025-02-11 Applied Materials, Inc. Paddle configuration for a particle coating reactor
EP4419731A1 (en) 2021-10-22 2024-08-28 Applied Materials, Inc. Rotary reactor for deposition of films onto particles
US20240401185A1 (en) * 2023-06-05 2024-12-05 Li-Metal Corp. Coating drum and system for vapor deposition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3185131A (en) * 1960-10-24 1965-05-25 Gen Motors Corp Apparatus for coating articles in a fluidized bed
US3344772A (en) * 1963-04-01 1967-10-03 Possis Machine Corp Spray coater
US3355309A (en) * 1963-07-15 1967-11-28 Gen Electric Method and apparatus for applying coatings onto articles of manufacture
US3498260A (en) * 1963-07-15 1970-03-03 Gen Electric Machine for applying coatings onto articles of manufacture
US3383238A (en) * 1965-05-27 1968-05-14 Unzicker Arlyn Eugene Method and apparatus of controlling thin film deposition in a vacuum
US3638606A (en) * 1969-11-21 1972-02-01 Gen Electric Apparatus for controlling the coating of selected surfaces of an article of manufacture

Also Published As

Publication number Publication date
FR2157895A1 (enExample) 1973-06-08
NL7117137A (enExample) 1973-05-02
NL143626B (nl) 1974-10-15
DE2247014C3 (de) 1975-05-22
GB1364960A (en) 1974-08-29
CH544274A (de) 1973-11-15
DE2247014A1 (de) 1973-05-03
FR2157895B3 (enExample) 1975-11-28
DE2247014B2 (de) 1974-10-10
US3818982A (en) 1974-06-25

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