DE69937910D1 - Gerät und Verfahren zur Probenuntersuchung mittels Ladungsträgerstrahlen - Google Patents

Gerät und Verfahren zur Probenuntersuchung mittels Ladungsträgerstrahlen

Info

Publication number
DE69937910D1
DE69937910D1 DE69937910T DE69937910T DE69937910D1 DE 69937910 D1 DE69937910 D1 DE 69937910D1 DE 69937910 T DE69937910 T DE 69937910T DE 69937910 T DE69937910 T DE 69937910T DE 69937910 D1 DE69937910 D1 DE 69937910D1
Authority
DE
Germany
Prior art keywords
charged
particle beams
sample examination
examination
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69937910T
Other languages
English (en)
Other versions
DE69937910T2 (de
Inventor
Hans-Peter Feuerbaum
Dieter Winkler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of DE69937910D1 publication Critical patent/DE69937910D1/de
Application granted granted Critical
Publication of DE69937910T2 publication Critical patent/DE69937910T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69937910T 1998-07-03 1999-07-02 Gerät und Verfahren zur Probenuntersuchung mittels Ladungsträgerstrahlen Expired - Lifetime DE69937910T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98112389A EP0969493A1 (de) 1998-07-03 1998-07-03 Gerät und Verfahren zur Probenuntersuchung mittels Ladungsträgerstrahlen
EP98112389 1998-07-03

Publications (2)

Publication Number Publication Date
DE69937910D1 true DE69937910D1 (de) 2008-02-14
DE69937910T2 DE69937910T2 (de) 2009-01-02

Family

ID=8232217

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69937910T Expired - Lifetime DE69937910T2 (de) 1998-07-03 1999-07-02 Gerät und Verfahren zur Probenuntersuchung mittels Ladungsträgerstrahlen

Country Status (3)

Country Link
US (1) US6555815B2 (de)
EP (2) EP0969493A1 (de)
DE (1) DE69937910T2 (de)

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US7728397B2 (en) * 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Coupled nano-resonating energy emitting structures
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US20070258492A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Light-emitting resonant structure driving raman laser
US7710040B2 (en) 2006-05-05 2010-05-04 Virgin Islands Microsystems, Inc. Single layer construction for ultra small devices
US7476907B2 (en) * 2006-05-05 2009-01-13 Virgin Island Microsystems, Inc. Plated multi-faceted reflector
US7557647B2 (en) * 2006-05-05 2009-07-07 Virgin Islands Microsystems, Inc. Heterodyne receiver using resonant structures
US7718977B2 (en) * 2006-05-05 2010-05-18 Virgin Island Microsystems, Inc. Stray charged particle removal device
US7723698B2 (en) * 2006-05-05 2010-05-25 Virgin Islands Microsystems, Inc. Top metal layer shield for ultra-small resonant structures
US7554083B2 (en) * 2006-05-05 2009-06-30 Virgin Islands Microsystems, Inc. Integration of electromagnetic detector on integrated chip
US7443577B2 (en) * 2006-05-05 2008-10-28 Virgin Islands Microsystems, Inc. Reflecting filtering cover
US7728702B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Shielding of integrated circuit package with high-permeability magnetic material
US7359589B2 (en) * 2006-05-05 2008-04-15 Virgin Islands Microsystems, Inc. Coupling electromagnetic wave through microcircuit
US7741934B2 (en) * 2006-05-05 2010-06-22 Virgin Islands Microsystems, Inc. Coupling a signal through a window
US7436177B2 (en) 2006-05-05 2008-10-14 Virgin Islands Microsystems, Inc. SEM test apparatus
US8188431B2 (en) 2006-05-05 2012-05-29 Jonathan Gorrell Integration of vacuum microelectronic device with integrated circuit
US7656094B2 (en) * 2006-05-05 2010-02-02 Virgin Islands Microsystems, Inc. Electron accelerator for ultra-small resonant structures
US7732786B2 (en) 2006-05-05 2010-06-08 Virgin Islands Microsystems, Inc. Coupling energy in a plasmon wave to an electron beam
US20070274365A1 (en) * 2006-05-26 2007-11-29 Virgin Islands Microsystems, Inc. Periodically complex resonant structures
US7679067B2 (en) 2006-05-26 2010-03-16 Virgin Island Microsystems, Inc. Receiver array using shared electron beam
US7655934B2 (en) * 2006-06-28 2010-02-02 Virgin Island Microsystems, Inc. Data on light bulb
US7450794B2 (en) * 2006-09-19 2008-11-11 Virgin Islands Microsystems, Inc. Microcircuit using electromagnetic wave routing
US7560716B2 (en) * 2006-09-22 2009-07-14 Virgin Islands Microsystems, Inc. Free electron oscillator
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US7791053B2 (en) 2007-10-10 2010-09-07 Virgin Islands Microsystems, Inc. Depressed anode with plasmon-enabled devices such as ultra-small resonant structures
US8642959B2 (en) * 2007-10-29 2014-02-04 Micron Technology, Inc. Method and system of performing three-dimensional imaging using an electron microscope
JP5179253B2 (ja) * 2008-05-16 2013-04-10 株式会社日立ハイテクノロジーズ 電極ユニット、及び荷電粒子線装置
DE102008064856B3 (de) * 2008-07-15 2017-07-13 Carl Zeiss Microscopy Gmbh Vorrichtung zur Untersuchung einer Oberfläche eines Objekts
DE102008040426B4 (de) * 2008-07-15 2015-12-24 Carl Zeiss Microscopy Gmbh Verfahren zur Untersuchung einer Oberfläche eines Objekts
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CN104508791B (zh) * 2012-07-30 2017-03-01 Fei 公司 环境扫描电子显微镜气体喷射系统
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DE102015204091B4 (de) 2015-03-06 2023-06-07 Carl Zeiss Microscopy Gmbh Verfahren und Vorrichtungen zur Ladungskompensation
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Also Published As

Publication number Publication date
EP1455379B1 (de) 2008-01-02
US20020053638A1 (en) 2002-05-09
EP1455379A3 (de) 2004-09-15
DE69937910T2 (de) 2009-01-02
US6555815B2 (en) 2003-04-29
EP1455379A2 (de) 2004-09-08
EP0969493A1 (de) 2000-01-05

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