DE69934960D1 - Tetracarbonsäuredianhydrid, Derivat und Herstellung davon, Polyimidvorläufer, Polyimid, Harzzusammensetzung, photoempfindliche Harzzusammensetzung, Verfahren zur Erzeugung von Prägemustern und elektronisches Bauteil - Google Patents

Tetracarbonsäuredianhydrid, Derivat und Herstellung davon, Polyimidvorläufer, Polyimid, Harzzusammensetzung, photoempfindliche Harzzusammensetzung, Verfahren zur Erzeugung von Prägemustern und elektronisches Bauteil

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Publication number
DE69934960D1
DE69934960D1 DE69934960T DE69934960T DE69934960D1 DE 69934960 D1 DE69934960 D1 DE 69934960D1 DE 69934960 T DE69934960 T DE 69934960T DE 69934960 T DE69934960 T DE 69934960T DE 69934960 D1 DE69934960 D1 DE 69934960D1
Authority
DE
Germany
Prior art keywords
resin composition
polyimide
derivative
preparation
electronic component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69934960T
Other languages
English (en)
Other versions
DE69934960T2 (de
Inventor
Noriyoshi Arai
Makoto Kaji
Akihiro Sasaki
Toshiki Hagiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HD MicroSystems Ltd
Original Assignee
Hitachi Chemical DuPont Microsystems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical DuPont Microsystems Ltd filed Critical Hitachi Chemical DuPont Microsystems Ltd
Publication of DE69934960D1 publication Critical patent/DE69934960D1/de
Application granted granted Critical
Publication of DE69934960T2 publication Critical patent/DE69934960T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/87—Benzo [c] furans; Hydrogenated benzo [c] furans
    • C07D307/89—Benzo [c] furans; Hydrogenated benzo [c] furans with two oxygen atoms directly attached in positions 1 and 3
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
DE69934960T 1998-10-30 1999-10-28 Tetracarbonsäuredianhydrid, Derivat und Herstellung davon, Polyimidvorläufer, Polyimid, Harzzusammensetzung, photoempfindliche Harzzusammensetzung, Verfahren zur Erzeugung von Prägemustern und elektronisches Bauteil Expired - Lifetime DE69934960T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP31052298 1998-10-30
JP31052298 1998-10-30
JP33948098 1998-11-30
JP33948098 1998-11-30
JP1839399 1999-01-27
JP1839399 1999-01-27

Publications (2)

Publication Number Publication Date
DE69934960D1 true DE69934960D1 (de) 2007-03-15
DE69934960T2 DE69934960T2 (de) 2007-12-06

Family

ID=27282194

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69934960T Expired - Lifetime DE69934960T2 (de) 1998-10-30 1999-10-28 Tetracarbonsäuredianhydrid, Derivat und Herstellung davon, Polyimidvorläufer, Polyimid, Harzzusammensetzung, photoempfindliche Harzzusammensetzung, Verfahren zur Erzeugung von Prägemustern und elektronisches Bauteil

Country Status (3)

Country Link
US (2) US6329494B1 (de)
EP (1) EP1013650B1 (de)
DE (1) DE69934960T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014084188A1 (ja) * 2012-11-28 2014-06-05 セントラル硝子株式会社 含フッ素重合性単量体およびそれを用いた高分子化合物

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US7842824B2 (en) * 2004-06-28 2010-11-30 Mitsubishi Chemical Corporation Biphenyltetracarboxylic acid dianhydride and process for producing the same, and polyimide formed from the same and process for producing the same
JP4509757B2 (ja) * 2004-12-03 2010-07-21 ソニーケミカル＆インフォメーションデバイス株式会社 多層配線基板の製造方法
KR20080018899A (ko) * 2005-06-03 2008-02-28 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. 전처리 조성물
US7652378B2 (en) * 2006-10-17 2010-01-26 Taiwan Semiconductor Manufacturing Company, Ltd. Aluminum-based interconnection in bond pad layer
KR101620675B1 (ko) * 2011-03-25 2016-05-12 가부시키가이샤 아이.에스.티 폴리이미드 전구체 용액, 폴리이미드 전구체, 폴리이미드 수지, 합제 슬러리, 전극, 합제 슬러리 제조 방법, 및 전극 형성 방법
KR101612159B1 (ko) 2013-06-21 2016-04-12 제일모직주식회사 연속식 고상중합 장치 및 방법
KR101657271B1 (ko) 2013-07-10 2016-09-13 롯데첨단소재(주) 연속식 고상중합 장치 및 방법
KR102074952B1 (ko) 2013-07-19 2020-02-10 삼성전자주식회사 조성물, 고분자 필름 및 표시 장치
JP6663320B2 (ja) * 2016-07-25 2020-03-11 信越化学工業株式会社 テトラカルボン酸ジエステル化合物、ポリイミド前駆体の重合体及びその製造方法、ネガ型感光性樹脂組成物、パターン形成方法、及び硬化被膜形成方法
CN111937500A (zh) * 2018-04-04 2020-11-13 住友电工印刷电路株式会社 柔性印刷线路板用覆膜以及柔性印刷线路板
JP7027541B2 (ja) * 2018-06-11 2022-03-01 富士フイルム株式会社 ジシクロヘキサンジカルボン酸ジエステルの製造方法およびジシクロヘキサンジカルボン酸の製造方法
CN112390725B (zh) * 2019-08-16 2021-10-29 沈阳中化农药化工研发有限公司 一种酰胺类化合物的制备方法

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Also Published As

Publication number Publication date
US6600053B2 (en) 2003-07-29
EP1013650A2 (de) 2000-06-28
US6329494B1 (en) 2001-12-11
EP1013650A3 (de) 2001-10-24
EP1013650B1 (de) 2007-01-24
US20020037991A1 (en) 2002-03-28
DE69934960T2 (de) 2007-12-06

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