JPS5624343A - Photosensitive heat resistant polymer composition - Google Patents

Photosensitive heat resistant polymer composition

Info

Publication number
JPS5624343A
JPS5624343A JP9942079A JP9942079A JPS5624343A JP S5624343 A JPS5624343 A JP S5624343A JP 9942079 A JP9942079 A JP 9942079A JP 9942079 A JP9942079 A JP 9942079A JP S5624343 A JPS5624343 A JP S5624343A
Authority
JP
Japan
Prior art keywords
kinds
heat resistant
diamines
represented
varnish
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9942079A
Other languages
Japanese (ja)
Inventor
Kazunari Takemoto
Fusaji Shoji
Ataru Yokono
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9942079A priority Critical patent/JPS5624343A/en
Publication of JPS5624343A publication Critical patent/JPS5624343A/en
Pending legal-status Critical Current

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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To obtain varnish having high storage stability, superior heat resistance and superior insulating properties by reacting a polyamic acid, with one or more kinds of specified isocyanates, which is a reaction product of one or more kinds of diamines selected from specified three kinds of diamines and one or more kinds of tetracarboxylic acid dianhydride.
CONSTITUTION: One or more kinds of diamines represented by formulae (1), (2), (3) [where each of R1WR5 is (substituted) hydrocarbon, i is 1W4 and m is 1W 100] and one or more kinds of tetracarboxylic acid dianhydrides represented by formula (4) (where R6 is a tetravalent group contg. ≥2C) are reacted in an org. polar solvent in an anhydrous reaction system to prepare a polyamic acid. This acid is then reacted with one or more kinds of isocyanates represented by formula (5) [where R8 is H, halogen, alkyl or alkoxy, R9 is H or CN, R10 is H or CH3, R11 is H, CH3 or phenyl, n is 1 or 2 and X is (substituted) hydrocarbon] to manufacture photosensitive heat resistant polymer varnish. This varnish has high chemical resistance and superior pattern forming power, so it is suitable for use as a highly heat resistant resist material.
COPYRIGHT: (C)1981,JPO&Japio
JP9942079A 1979-08-06 1979-08-06 Photosensitive heat resistant polymer composition Pending JPS5624343A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9942079A JPS5624343A (en) 1979-08-06 1979-08-06 Photosensitive heat resistant polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9942079A JPS5624343A (en) 1979-08-06 1979-08-06 Photosensitive heat resistant polymer composition

Publications (1)

Publication Number Publication Date
JPS5624343A true JPS5624343A (en) 1981-03-07

Family

ID=14246971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9942079A Pending JPS5624343A (en) 1979-08-06 1979-08-06 Photosensitive heat resistant polymer composition

Country Status (1)

Country Link
JP (1) JPS5624343A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61203132A (en) * 1985-02-01 1986-09-09 ゼネラル・エレクトリツク・カンパニイ Crystal silicone-imide copolymer
JPH02154263A (en) * 1988-12-06 1990-06-13 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element using this photosensitive resin composition
JPH02154265A (en) * 1988-12-06 1990-06-13 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element using this photosensitive resin composition
JPH03100019A (en) * 1989-09-13 1991-04-25 Daicel Chem Ind Ltd Polyamic acid and polyimide
US5026788A (en) * 1988-06-20 1991-06-25 Chisso Corporation Photosensitive polymer having thiol group
US6329494B1 (en) * 1998-10-30 2001-12-11 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive resin composition
US6342333B1 (en) 1999-09-23 2002-01-29 Hitachi Chemical Dupont Microsystems, L.L.C. Photosensitive resin composition, patterning method, and electronic components

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61203132A (en) * 1985-02-01 1986-09-09 ゼネラル・エレクトリツク・カンパニイ Crystal silicone-imide copolymer
US5026788A (en) * 1988-06-20 1991-06-25 Chisso Corporation Photosensitive polymer having thiol group
JPH02154263A (en) * 1988-12-06 1990-06-13 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element using this photosensitive resin composition
JPH02154265A (en) * 1988-12-06 1990-06-13 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element using this photosensitive resin composition
JPH03100019A (en) * 1989-09-13 1991-04-25 Daicel Chem Ind Ltd Polyamic acid and polyimide
US6329494B1 (en) * 1998-10-30 2001-12-11 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive resin composition
US6342333B1 (en) 1999-09-23 2002-01-29 Hitachi Chemical Dupont Microsystems, L.L.C. Photosensitive resin composition, patterning method, and electronic components
US6773866B2 (en) 1999-09-23 2004-08-10 Hitachi Chemical Dupont Microsystems L.L.C. Photosensitive resin composition, patterning method, and electronic components

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