JPS5624344A - Photosensitive heat-resistant polymer composition - Google Patents
Photosensitive heat-resistant polymer compositionInfo
- Publication number
- JPS5624344A JPS5624344A JP9942179A JP9942179A JPS5624344A JP S5624344 A JPS5624344 A JP S5624344A JP 9942179 A JP9942179 A JP 9942179A JP 9942179 A JP9942179 A JP 9942179A JP S5624344 A JPS5624344 A JP S5624344A
- Authority
- JP
- Japan
- Prior art keywords
- represented
- formula
- varnish
- bisazide
- reacted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain varnish having superior heat resistance and electrical characteristics by reacting a polyamic acid, with a specified unsatd. amine, which is a reaction product of a specified diamine and tetracarboxylic acid dianhydride or a deriv. thereof and adding a bifunctional sensitizer bisazide.
CONSTITUTION: One or more kinds of diamines represented by formulae (1), (2), (3) [where each of R1WR5 is (substituted) hydrocarbon, l is 1W4 and m is 1W 100] and tetracarboxylic acid dianhydride represented by formula (4) (where R6 is a ≥2C tetravalent group) are reacted in an org. polar solvent in an anhydrous reaction system to prepare a polyamic acid soln. This soln. is then reacted with one or more kinds of amines represented by formula (5) (where R7 is a ≥1C group and each of R8WR10 is H, halogen, alkyl or aromatic). To 70W99.9wt% of the resulting solvent-contg. polymer is added 0.1W30wt% bisazide represented by formula (6) [where R12 is (substituted) hydrocarbon] to obtain photosensitive heat resistant varnish. This varnish has superior storage stability, chemical resistance and electrical characteristics, so it is suitable for use as a material for an etching resist and an insulating film.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9942179A JPS5624344A (en) | 1979-08-06 | 1979-08-06 | Photosensitive heat-resistant polymer composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9942179A JPS5624344A (en) | 1979-08-06 | 1979-08-06 | Photosensitive heat-resistant polymer composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5624344A true JPS5624344A (en) | 1981-03-07 |
Family
ID=14246997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9942179A Pending JPS5624344A (en) | 1979-08-06 | 1979-08-06 | Photosensitive heat-resistant polymer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5624344A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57168942A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | Photosensitive polymer composition |
JPS57170929A (en) * | 1982-03-19 | 1982-10-21 | Hitachi Ltd | Photosensitive polymeric composition |
EP0092524A2 (en) * | 1982-04-21 | 1983-10-26 | Ciba-Geigy Ag | Radiation-sensible coating composition and its use |
JPS6195551A (en) * | 1984-10-16 | 1986-05-14 | Matsushita Electric Ind Co Ltd | Multiwiring structure of integrated circuit |
JPS61203132A (en) * | 1985-02-01 | 1986-09-09 | ゼネラル・エレクトリツク・カンパニイ | Crystal silicone-imide copolymer |
JPS62223228A (en) * | 1986-03-25 | 1987-10-01 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
JPS62267358A (en) * | 1986-05-14 | 1987-11-20 | Hitachi Chem Co Ltd | Photosensiive polymer composition |
JPS6423252A (en) * | 1987-07-20 | 1989-01-25 | Ube Industries | Photosensitive polyimide composition |
US4830953A (en) * | 1986-08-18 | 1989-05-16 | Ciba-Geigy Corporation | Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating |
JPH01188528A (en) * | 1988-01-22 | 1989-07-27 | Ube Ind Ltd | Terminal-modified imide oligomer and elastic molded article produced therefrom |
-
1979
- 1979-08-06 JP JP9942179A patent/JPS5624344A/en active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57168942A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | Photosensitive polymer composition |
JPH0336861B2 (en) * | 1982-03-19 | 1991-06-03 | Hitachi Seisakusho Kk | |
JPS57170929A (en) * | 1982-03-19 | 1982-10-21 | Hitachi Ltd | Photosensitive polymeric composition |
EP0092524A2 (en) * | 1982-04-21 | 1983-10-26 | Ciba-Geigy Ag | Radiation-sensible coating composition and its use |
JPS58191747A (en) * | 1982-04-21 | 1983-11-09 | チバ−ガイギ−・アクチエンゲゼルシヤフト | Radiation ray sensitive painting agent and use |
JPH0553834B2 (en) * | 1982-04-21 | 1993-08-11 | Ciba Geigy | |
JPS6195551A (en) * | 1984-10-16 | 1986-05-14 | Matsushita Electric Ind Co Ltd | Multiwiring structure of integrated circuit |
JPS61203132A (en) * | 1985-02-01 | 1986-09-09 | ゼネラル・エレクトリツク・カンパニイ | Crystal silicone-imide copolymer |
JPS62223228A (en) * | 1986-03-25 | 1987-10-01 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
JPS62267358A (en) * | 1986-05-14 | 1987-11-20 | Hitachi Chem Co Ltd | Photosensiive polymer composition |
US4830953A (en) * | 1986-08-18 | 1989-05-16 | Ciba-Geigy Corporation | Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating |
JPS6423252A (en) * | 1987-07-20 | 1989-01-25 | Ube Industries | Photosensitive polyimide composition |
JPH01188528A (en) * | 1988-01-22 | 1989-07-27 | Ube Ind Ltd | Terminal-modified imide oligomer and elastic molded article produced therefrom |
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