JPS5624344A - Photosensitive heat-resistant polymer composition - Google Patents

Photosensitive heat-resistant polymer composition

Info

Publication number
JPS5624344A
JPS5624344A JP9942179A JP9942179A JPS5624344A JP S5624344 A JPS5624344 A JP S5624344A JP 9942179 A JP9942179 A JP 9942179A JP 9942179 A JP9942179 A JP 9942179A JP S5624344 A JPS5624344 A JP S5624344A
Authority
JP
Japan
Prior art keywords
represented
formula
varnish
bisazide
reacted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9942179A
Other languages
Japanese (ja)
Inventor
Kazunari Takemoto
Fusaji Shoji
Ataru Yokono
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9942179A priority Critical patent/JPS5624344A/en
Publication of JPS5624344A publication Critical patent/JPS5624344A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain varnish having superior heat resistance and electrical characteristics by reacting a polyamic acid, with a specified unsatd. amine, which is a reaction product of a specified diamine and tetracarboxylic acid dianhydride or a deriv. thereof and adding a bifunctional sensitizer bisazide.
CONSTITUTION: One or more kinds of diamines represented by formulae (1), (2), (3) [where each of R1WR5 is (substituted) hydrocarbon, l is 1W4 and m is 1W 100] and tetracarboxylic acid dianhydride represented by formula (4) (where R6 is a ≥2C tetravalent group) are reacted in an org. polar solvent in an anhydrous reaction system to prepare a polyamic acid soln. This soln. is then reacted with one or more kinds of amines represented by formula (5) (where R7 is a ≥1C group and each of R8WR10 is H, halogen, alkyl or aromatic). To 70W99.9wt% of the resulting solvent-contg. polymer is added 0.1W30wt% bisazide represented by formula (6) [where R12 is (substituted) hydrocarbon] to obtain photosensitive heat resistant varnish. This varnish has superior storage stability, chemical resistance and electrical characteristics, so it is suitable for use as a material for an etching resist and an insulating film.
COPYRIGHT: (C)1981,JPO&Japio
JP9942179A 1979-08-06 1979-08-06 Photosensitive heat-resistant polymer composition Pending JPS5624344A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9942179A JPS5624344A (en) 1979-08-06 1979-08-06 Photosensitive heat-resistant polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9942179A JPS5624344A (en) 1979-08-06 1979-08-06 Photosensitive heat-resistant polymer composition

Publications (1)

Publication Number Publication Date
JPS5624344A true JPS5624344A (en) 1981-03-07

Family

ID=14246997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9942179A Pending JPS5624344A (en) 1979-08-06 1979-08-06 Photosensitive heat-resistant polymer composition

Country Status (1)

Country Link
JP (1) JPS5624344A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
JPS57170929A (en) * 1982-03-19 1982-10-21 Hitachi Ltd Photosensitive polymeric composition
EP0092524A2 (en) * 1982-04-21 1983-10-26 Ciba-Geigy Ag Radiation-sensible coating composition and its use
JPS6195551A (en) * 1984-10-16 1986-05-14 Matsushita Electric Ind Co Ltd Multiwiring structure of integrated circuit
JPS61203132A (en) * 1985-02-01 1986-09-09 ゼネラル・エレクトリツク・カンパニイ Crystal silicone-imide copolymer
JPS62223228A (en) * 1986-03-25 1987-10-01 Sumitomo Bakelite Co Ltd Production of heat-resistant resin
JPS62267358A (en) * 1986-05-14 1987-11-20 Hitachi Chem Co Ltd Photosensiive polymer composition
JPS6423252A (en) * 1987-07-20 1989-01-25 Ube Industries Photosensitive polyimide composition
US4830953A (en) * 1986-08-18 1989-05-16 Ciba-Geigy Corporation Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating
JPH01188528A (en) * 1988-01-22 1989-07-27 Ube Ind Ltd Terminal-modified imide oligomer and elastic molded article produced therefrom

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
JPH0336861B2 (en) * 1982-03-19 1991-06-03 Hitachi Seisakusho Kk
JPS57170929A (en) * 1982-03-19 1982-10-21 Hitachi Ltd Photosensitive polymeric composition
EP0092524A2 (en) * 1982-04-21 1983-10-26 Ciba-Geigy Ag Radiation-sensible coating composition and its use
JPS58191747A (en) * 1982-04-21 1983-11-09 チバ−ガイギ−・アクチエンゲゼルシヤフト Radiation ray sensitive painting agent and use
JPH0553834B2 (en) * 1982-04-21 1993-08-11 Ciba Geigy
JPS6195551A (en) * 1984-10-16 1986-05-14 Matsushita Electric Ind Co Ltd Multiwiring structure of integrated circuit
JPS61203132A (en) * 1985-02-01 1986-09-09 ゼネラル・エレクトリツク・カンパニイ Crystal silicone-imide copolymer
JPS62223228A (en) * 1986-03-25 1987-10-01 Sumitomo Bakelite Co Ltd Production of heat-resistant resin
JPS62267358A (en) * 1986-05-14 1987-11-20 Hitachi Chem Co Ltd Photosensiive polymer composition
US4830953A (en) * 1986-08-18 1989-05-16 Ciba-Geigy Corporation Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating
JPS6423252A (en) * 1987-07-20 1989-01-25 Ube Industries Photosensitive polyimide composition
JPH01188528A (en) * 1988-01-22 1989-07-27 Ube Ind Ltd Terminal-modified imide oligomer and elastic molded article produced therefrom

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