JPS57170929A - Photosensitive polymeric composition - Google Patents

Photosensitive polymeric composition

Info

Publication number
JPS57170929A
JPS57170929A JP4277982A JP4277982A JPS57170929A JP S57170929 A JPS57170929 A JP S57170929A JP 4277982 A JP4277982 A JP 4277982A JP 4277982 A JP4277982 A JP 4277982A JP S57170929 A JPS57170929 A JP S57170929A
Authority
JP
Japan
Prior art keywords
100pts
alkylene
lower alkyl
polyamic acid
organic group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4277982A
Other languages
Japanese (ja)
Other versions
JPH0336861B2 (en
Inventor
Fumio Kataoka
Fusaji Shoji
Isao Obara
Kazunari Takemoto
Ataru Yokono
Tokio Isogai
Mitsumasa Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4277982A priority Critical patent/JPS57170929A/en
Publication of JPS57170929A publication Critical patent/JPS57170929A/en
Publication of JPH0336861B2 publication Critical patent/JPH0336861B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: The titled composition, containing a specific polyamic acid, an aromatic bisazide compound and an amine compound containing an unsaturated group, having a high sensitivity and good degree of resolution, and capable of being a heat-resistant polyimide high polymer by the heat treatment after the formation of an image.
CONSTITUTION: A composition consisting of (A) 100pts.wt. polyamic acid containing repeating units of formulaI(R1 is trifunctional or tetrafunctional organic group; R2 is bifunctional organic group; n is 1 or 2) essentially, (B) 0.1W 100pts.wt. aromatic bisazide compound of formula II[W is -OH, -OR3, -R4-OH, -SiR3 3, -COOH, -COOR3, -NR2 3 or -NH2 (R3 is lower alkyl; R4 is alkylene); m is 0 or 1]and (C) 1W400pts.wt. amine compound of formula III (R5, R6, R7 and R9 are H, lower alkyl, phenyl or vinyl; R8 is alkylene) and if necessary (D) a photosensitizer, e.g. anthrone.
COPYRIGHT: (C)1982,JPO&Japio
JP4277982A 1982-03-19 1982-03-19 Photosensitive polymeric composition Granted JPS57170929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4277982A JPS57170929A (en) 1982-03-19 1982-03-19 Photosensitive polymeric composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4277982A JPS57170929A (en) 1982-03-19 1982-03-19 Photosensitive polymeric composition

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56054408A Division JPS57168942A (en) 1981-04-13 1981-04-13 Photosensitive polymer composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP29534590A Division JPH03179057A (en) 1990-11-02 1990-11-02 Method for forming pattern

Publications (2)

Publication Number Publication Date
JPS57170929A true JPS57170929A (en) 1982-10-21
JPH0336861B2 JPH0336861B2 (en) 1991-06-03

Family

ID=12645450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4277982A Granted JPS57170929A (en) 1982-03-19 1982-03-19 Photosensitive polymeric composition

Country Status (1)

Country Link
JP (1) JPS57170929A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267358A (en) * 1986-05-14 1987-11-20 Hitachi Chem Co Ltd Photosensiive polymer composition
JPS63155141A (en) * 1986-12-19 1988-06-28 Hitachi Ltd Photosensitive polymer composition
JPH02149850A (en) * 1988-12-01 1990-06-08 Hitachi Chem Co Ltd Photosensitive polymer composition
JPH03168214A (en) * 1989-11-28 1991-07-22 Hitachi Ltd Semiconductor device, its production, electronic circuit and polyimide resin containing siloxane skeleton
US7439005B2 (en) 2004-02-26 2008-10-21 Nec Corporation Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern
US8231959B2 (en) 2004-01-14 2012-07-31 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive polymer composition, method of producing pattern and electronic parts

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3722155B2 (en) * 1993-09-03 2005-11-30 日立化成工業株式会社 Photosensitive resin composition
JP3675368B2 (en) * 1993-09-03 2005-07-27 日立化成工業株式会社 Relief pattern, buffer coating film for semiconductor, and method for producing interlayer insulating film of multilayer wiring board

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54145794A (en) * 1978-04-14 1979-11-14 Toray Ind Inc Heat-resistant photosensitive material
JPS5624344A (en) * 1979-08-06 1981-03-07 Hitachi Ltd Photosensitive heat-resistant polymer composition
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54145794A (en) * 1978-04-14 1979-11-14 Toray Ind Inc Heat-resistant photosensitive material
JPS5624344A (en) * 1979-08-06 1981-03-07 Hitachi Ltd Photosensitive heat-resistant polymer composition
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62267358A (en) * 1986-05-14 1987-11-20 Hitachi Chem Co Ltd Photosensiive polymer composition
JPS63155141A (en) * 1986-12-19 1988-06-28 Hitachi Ltd Photosensitive polymer composition
JPH02149850A (en) * 1988-12-01 1990-06-08 Hitachi Chem Co Ltd Photosensitive polymer composition
JPH03168214A (en) * 1989-11-28 1991-07-22 Hitachi Ltd Semiconductor device, its production, electronic circuit and polyimide resin containing siloxane skeleton
US8231959B2 (en) 2004-01-14 2012-07-31 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive polymer composition, method of producing pattern and electronic parts
US8852726B2 (en) 2004-01-14 2014-10-07 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive polymer composition, method of producing pattern and electronic parts
US7439005B2 (en) 2004-02-26 2008-10-21 Nec Corporation Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern

Also Published As

Publication number Publication date
JPH0336861B2 (en) 1991-06-03

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