JPS57170929A - Photosensitive polymeric composition - Google Patents
Photosensitive polymeric compositionInfo
- Publication number
- JPS57170929A JPS57170929A JP4277982A JP4277982A JPS57170929A JP S57170929 A JPS57170929 A JP S57170929A JP 4277982 A JP4277982 A JP 4277982A JP 4277982 A JP4277982 A JP 4277982A JP S57170929 A JPS57170929 A JP S57170929A
- Authority
- JP
- Japan
- Prior art keywords
- 100pts
- alkylene
- lower alkyl
- polyamic acid
- organic group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: The titled composition, containing a specific polyamic acid, an aromatic bisazide compound and an amine compound containing an unsaturated group, having a high sensitivity and good degree of resolution, and capable of being a heat-resistant polyimide high polymer by the heat treatment after the formation of an image.
CONSTITUTION: A composition consisting of (A) 100pts.wt. polyamic acid containing repeating units of formulaI(R1 is trifunctional or tetrafunctional organic group; R2 is bifunctional organic group; n is 1 or 2) essentially, (B) 0.1W 100pts.wt. aromatic bisazide compound of formula II[W is -OH, -OR3, -R4-OH, -SiR3 3, -COOH, -COOR3, -NR2 3 or -NH2 (R3 is lower alkyl; R4 is alkylene); m is 0 or 1]and (C) 1W400pts.wt. amine compound of formula III (R5, R6, R7 and R9 are H, lower alkyl, phenyl or vinyl; R8 is alkylene) and if necessary (D) a photosensitizer, e.g. anthrone.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4277982A JPS57170929A (en) | 1982-03-19 | 1982-03-19 | Photosensitive polymeric composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4277982A JPS57170929A (en) | 1982-03-19 | 1982-03-19 | Photosensitive polymeric composition |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56054408A Division JPS57168942A (en) | 1981-04-13 | 1981-04-13 | Photosensitive polymer composition |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29534590A Division JPH03179057A (en) | 1990-11-02 | 1990-11-02 | Method for forming pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57170929A true JPS57170929A (en) | 1982-10-21 |
JPH0336861B2 JPH0336861B2 (en) | 1991-06-03 |
Family
ID=12645450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4277982A Granted JPS57170929A (en) | 1982-03-19 | 1982-03-19 | Photosensitive polymeric composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57170929A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62267358A (en) * | 1986-05-14 | 1987-11-20 | Hitachi Chem Co Ltd | Photosensiive polymer composition |
JPS63155141A (en) * | 1986-12-19 | 1988-06-28 | Hitachi Ltd | Photosensitive polymer composition |
JPH02149850A (en) * | 1988-12-01 | 1990-06-08 | Hitachi Chem Co Ltd | Photosensitive polymer composition |
JPH03168214A (en) * | 1989-11-28 | 1991-07-22 | Hitachi Ltd | Semiconductor device, its production, electronic circuit and polyimide resin containing siloxane skeleton |
US7439005B2 (en) | 2004-02-26 | 2008-10-21 | Nec Corporation | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
US8231959B2 (en) | 2004-01-14 | 2012-07-31 | Hitachi Chemical Dupont Microsystems Ltd. | Photosensitive polymer composition, method of producing pattern and electronic parts |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3722155B2 (en) * | 1993-09-03 | 2005-11-30 | 日立化成工業株式会社 | Photosensitive resin composition |
JP3675368B2 (en) * | 1993-09-03 | 2005-07-27 | 日立化成工業株式会社 | Relief pattern, buffer coating film for semiconductor, and method for producing interlayer insulating film of multilayer wiring board |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54145794A (en) * | 1978-04-14 | 1979-11-14 | Toray Ind Inc | Heat-resistant photosensitive material |
JPS5624344A (en) * | 1979-08-06 | 1981-03-07 | Hitachi Ltd | Photosensitive heat-resistant polymer composition |
JPS57168942A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | Photosensitive polymer composition |
-
1982
- 1982-03-19 JP JP4277982A patent/JPS57170929A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54145794A (en) * | 1978-04-14 | 1979-11-14 | Toray Ind Inc | Heat-resistant photosensitive material |
JPS5624344A (en) * | 1979-08-06 | 1981-03-07 | Hitachi Ltd | Photosensitive heat-resistant polymer composition |
JPS57168942A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | Photosensitive polymer composition |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62267358A (en) * | 1986-05-14 | 1987-11-20 | Hitachi Chem Co Ltd | Photosensiive polymer composition |
JPS63155141A (en) * | 1986-12-19 | 1988-06-28 | Hitachi Ltd | Photosensitive polymer composition |
JPH02149850A (en) * | 1988-12-01 | 1990-06-08 | Hitachi Chem Co Ltd | Photosensitive polymer composition |
JPH03168214A (en) * | 1989-11-28 | 1991-07-22 | Hitachi Ltd | Semiconductor device, its production, electronic circuit and polyimide resin containing siloxane skeleton |
US8231959B2 (en) | 2004-01-14 | 2012-07-31 | Hitachi Chemical Dupont Microsystems Ltd. | Photosensitive polymer composition, method of producing pattern and electronic parts |
US8852726B2 (en) | 2004-01-14 | 2014-10-07 | Hitachi Chemical Dupont Microsystems Ltd. | Photosensitive polymer composition, method of producing pattern and electronic parts |
US7439005B2 (en) | 2004-02-26 | 2008-10-21 | Nec Corporation | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
Also Published As
Publication number | Publication date |
---|---|
JPH0336861B2 (en) | 1991-06-03 |
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