DE69932917D1 - Schichtförmige Kondensatorvorrichtung - Google Patents

Schichtförmige Kondensatorvorrichtung

Info

Publication number
DE69932917D1
DE69932917D1 DE69932917T DE69932917T DE69932917D1 DE 69932917 D1 DE69932917 D1 DE 69932917D1 DE 69932917 T DE69932917 T DE 69932917T DE 69932917 T DE69932917 T DE 69932917T DE 69932917 D1 DE69932917 D1 DE 69932917D1
Authority
DE
Germany
Prior art keywords
capacitor device
layered capacitor
realised
layers
tracks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69932917T
Other languages
English (en)
Inventor
Koen Appeltans
Jean Boxho
Damien Luc Francois Macq
Wim Vanderbauwhede
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics NV
Original Assignee
STMicroelectronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics NV filed Critical STMicroelectronics NV
Application granted granted Critical
Publication of DE69932917D1 publication Critical patent/DE69932917D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/38Multiple capacitors, i.e. structural combinations of fixed capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5223Capacitor integral with wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/0805Capacitors only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Power Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Ceramic Capacitors (AREA)
  • Microwave Amplifiers (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Insulated Conductors (AREA)
  • Combinations Of Printed Boards (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
DE69932917T 1999-04-09 1999-04-09 Schichtförmige Kondensatorvorrichtung Expired - Lifetime DE69932917D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP99400876A EP1043740B1 (de) 1999-04-09 1999-04-09 Schichtförmige Kondensatorvorrichtung

Publications (1)

Publication Number Publication Date
DE69932917D1 true DE69932917D1 (de) 2006-10-05

Family

ID=8241941

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69932917T Expired - Lifetime DE69932917D1 (de) 1999-04-09 1999-04-09 Schichtförmige Kondensatorvorrichtung

Country Status (11)

Country Link
US (1) US6178083B1 (de)
EP (1) EP1043740B1 (de)
JP (1) JP2000315625A (de)
KR (1) KR20010014709A (de)
AT (1) ATE337606T1 (de)
AU (1) AU2069000A (de)
CA (1) CA2300704A1 (de)
DE (1) DE69932917D1 (de)
IL (1) IL134960A0 (de)
SG (1) SG92688A1 (de)
TW (1) TW548775B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6822312B2 (en) * 2000-04-07 2004-11-23 Koninklijke Philips Electronics N.V. Interdigitated multilayer capacitor structure for deep sub-micron CMOS
KR100902503B1 (ko) * 2002-08-12 2009-06-15 삼성전자주식회사 다층 수직 구조를 갖는 고용량 커패시터
US6819543B2 (en) * 2002-12-31 2004-11-16 Intel Corporation Multilayer capacitor with multiple plates per layer
US7154734B2 (en) * 2004-09-20 2006-12-26 Lsi Logic Corporation Fully shielded capacitor cell structure
JP2006228828A (ja) * 2005-02-15 2006-08-31 Seiko Npc Corp キャパシタを有する半導体装置
TWI269321B (en) * 2005-07-27 2006-12-21 Ind Tech Res Inst Symmetrical capacitor
US7561407B1 (en) * 2005-11-28 2009-07-14 Altera Corporation Multi-segment capacitor
US7161228B1 (en) 2005-12-28 2007-01-09 Analog Devices, Inc. Three-dimensional integrated capacitance structure
US7511939B2 (en) * 2006-08-24 2009-03-31 Analog Devices, Inc. Layered capacitor architecture and fabrication method
KR100775107B1 (ko) * 2006-11-23 2007-11-08 삼성전자주식회사 커패시터 구조물 및 이의 제조 방법
US8027144B2 (en) * 2009-04-28 2011-09-27 United Microelectronics Corp. Capacitor structure
US8014124B2 (en) * 2009-06-03 2011-09-06 Mediatek Inc. Three-terminal metal-oxide-metal capacitor
JP2016162904A (ja) * 2015-03-03 2016-09-05 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US11659705B2 (en) * 2021-05-21 2023-05-23 Micron Technology, Inc. Thin film transistor deck selection in a memory device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2507379A1 (fr) * 1981-06-05 1982-12-10 Europ Composants Electron Bloc de condensateurs en serie et multiplicateur de tension utilisant un tel bloc de condensateurs
JPS6484616A (en) * 1987-09-28 1989-03-29 Toshiba Corp Condenser
JPH04171804A (ja) * 1990-11-05 1992-06-19 Murata Mfg Co Ltd 電気二重層コンデンサ
US5208725A (en) * 1992-08-19 1993-05-04 Akcasu Osman E High capacitance structure in a semiconductor device
JPH07283076A (ja) * 1994-04-15 1995-10-27 Nippon Telegr & Teleph Corp <Ntt> キャパシタ
US5583359A (en) * 1995-03-03 1996-12-10 Northern Telecom Limited Capacitor structure for an integrated circuit
DE69739191D1 (de) * 1996-05-15 2009-02-12 Hyperion Catalysis Internat In Graphitnanofasern in elektrochemischen kondensatoren
US5745335A (en) * 1996-06-27 1998-04-28 Gennum Corporation Multi-layer film capacitor structures and method
TW297948B (en) 1996-08-16 1997-02-11 United Microelectronics Corp Memory cell structure of DRAM
US5978206A (en) * 1997-09-30 1999-11-02 Hewlett-Packard Company Stacked-fringe integrated circuit capacitors

Also Published As

Publication number Publication date
JP2000315625A (ja) 2000-11-14
SG92688A1 (en) 2002-11-19
IL134960A0 (en) 2001-05-20
TW548775B (en) 2003-08-21
KR20010014709A (ko) 2001-02-26
AU2069000A (en) 2000-10-12
EP1043740B1 (de) 2006-08-23
ATE337606T1 (de) 2006-09-15
US6178083B1 (en) 2001-01-23
CA2300704A1 (en) 2000-10-09
EP1043740A1 (de) 2000-10-11

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Legal Events

Date Code Title Description
8332 No legal effect for de