DE69931353D1 - Farbfilter und sein herstellungsverfahren - Google Patents

Farbfilter und sein herstellungsverfahren

Info

Publication number
DE69931353D1
DE69931353D1 DE69931353T DE69931353T DE69931353D1 DE 69931353 D1 DE69931353 D1 DE 69931353D1 DE 69931353 T DE69931353 T DE 69931353T DE 69931353 T DE69931353 T DE 69931353T DE 69931353 D1 DE69931353 D1 DE 69931353D1
Authority
DE
Germany
Prior art keywords
manufacturing process
color filter
color
filter
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69931353T
Other languages
English (en)
Other versions
DE69931353T2 (de
Inventor
Hiroshi Kiguchi
Natsuo Fujimori
Satoru Katagami
Masaharu Shimizu
Keiji Takizawa
Tadaaki Kuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP36327798A external-priority patent/JP4138117B2/ja
Priority claimed from JP02745099A external-priority patent/JP4138130B2/ja
Priority claimed from JP23692399A external-priority patent/JP3894261B2/ja
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Application granted granted Critical
Publication of DE69931353D1 publication Critical patent/DE69931353D1/de
Publication of DE69931353T2 publication Critical patent/DE69931353T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
DE69931353T 1998-12-21 1999-12-16 Farbfilter und sein herstellungsverfahren Expired - Lifetime DE69931353T2 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP36327798A JP4138117B2 (ja) 1998-12-21 1998-12-21 カラーフィルタ基板の製造方法
JP36327798 1998-12-21
JP2745099 1999-02-04
JP02745099A JP4138130B2 (ja) 1999-02-04 1999-02-04 カラーフィルターの製造方法および液晶表示装置の製造方法
JP23692399 1999-08-24
JP23692399A JP3894261B2 (ja) 1999-08-24 1999-08-24 カラーフィルタおよびその製造方法、電気光学装置、電子機器
PCT/JP1999/007081 WO2000037972A1 (fr) 1998-12-21 1999-12-16 Filtre colore et son procede de fabrication

Publications (2)

Publication Number Publication Date
DE69931353D1 true DE69931353D1 (de) 2006-06-22
DE69931353T2 DE69931353T2 (de) 2007-02-22

Family

ID=27285799

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69931353T Expired - Lifetime DE69931353T2 (de) 1998-12-21 1999-12-16 Farbfilter und sein herstellungsverfahren

Country Status (6)

Country Link
EP (2) EP1061383B1 (de)
KR (2) KR100506068B1 (de)
CN (1) CN1174265C (de)
DE (1) DE69931353T2 (de)
TW (1) TW484022B (de)
WO (1) WO2000037972A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE324603T1 (de) 2000-06-02 2006-05-15 Canon Kk Herstellungsverfahren für ein optisches element
JP2002207113A (ja) * 2001-01-09 2002-07-26 Canon Inc カラーフィルタ基板の製造方法及び製造装置
CN1229655C (zh) * 2001-06-01 2005-11-30 精工爱普生株式会社 滤色膜层及电光学装置
CN100380202C (zh) * 2001-06-01 2008-04-09 精工爱普生株式会社 滤色片及电光学装置
JP2003084123A (ja) * 2001-06-29 2003-03-19 Seiko Epson Corp カラーフィルタ基板、カラーフィルタ基板の製造方法、液晶表示装置、電気光学装置、電気光学装置の製造方法及び電子機器
JPWO2003030131A1 (ja) * 2001-08-29 2005-01-20 セイコーエプソン株式会社 電気光学装置、並びに電子機器
JP3705264B2 (ja) 2001-12-18 2005-10-12 セイコーエプソン株式会社 表示装置及び電子機器
JP3882794B2 (ja) * 2002-08-07 2007-02-21 セイコーエプソン株式会社 カラーフィルタ基板、電気光学装置、電子機器、およびカラーフィルタ基板の製造方法、ならびに電気光学装置の製造方法
JP2004133420A (ja) * 2002-09-20 2004-04-30 Seiko Epson Corp 光学デバイス及びその製造方法、表示装置、電子機器、並びに検査機器
JP2004184977A (ja) * 2002-11-22 2004-07-02 Seiko Epson Corp カラーフィルタ及びその製造方法及び表示装置並びに電子機器
JP3953053B2 (ja) * 2003-08-28 2007-08-01 セイコーエプソン株式会社 吐出方法、カラーフィルタ基板の製造方法、液晶表示装置の製造方法、および電子機器の製造方法
JP3994994B2 (ja) * 2003-10-23 2007-10-24 セイコーエプソン株式会社 有機ｅｌ装置の製造方法、有機ｅｌ装置、電子機器
KR101111995B1 (ko) 2003-12-02 2012-03-22 가부시키가이샤 한도오따이 에네루기 켄큐쇼 박막 트랜지스터, 디스플레이 장치 및 액정 디스플레이장치, 그리고 그 제조방법
US7223641B2 (en) 2004-03-26 2007-05-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, method for manufacturing the same, liquid crystal television and EL television
CN100383566C (zh) * 2004-05-19 2008-04-23 精工爱普生株式会社 彩色滤光片基板的制法、电光学装置及其制法、电子仪器
US8796583B2 (en) 2004-09-17 2014-08-05 Eastman Kodak Company Method of forming a structured surface using ablatable radiation sensitive material
JP2006201423A (ja) 2005-01-20 2006-08-03 Seiko Epson Corp 色要素付き基板、成膜方法、電気光学装置および電子機器
CN100394221C (zh) * 2005-07-08 2008-06-11 虹创科技股份有限公司 彩色滤光片制造方法
JP4622955B2 (ja) * 2005-08-25 2011-02-02 セイコーエプソン株式会社 カラーフィルタ基板の製造方法、カラーフィルタ基板、表示装置
KR20080051617A (ko) * 2006-12-06 2008-06-11 주식회사 엘지화학 컬러 필터의 제조 방법 및 이에 의해 제조된 컬러 필터
TWI349117B (en) 2007-01-03 2011-09-21 Au Optronics Corp Color filter and manufacturing method thereof
CN100464224C (zh) * 2007-01-18 2009-02-25 友达光电股份有限公司 彩色滤光片及其制作方法
KR100943145B1 (ko) 2007-02-02 2010-02-18 주식회사 엘지화학 컬러필터 및 컬러필터의 제조방법
KR101050138B1 (ko) * 2007-05-29 2011-07-19 주식회사 엘지화학 컬러필터 및 컬러필터의 제조방법
DE102008060279B4 (de) 2007-12-05 2023-09-14 Lg Display Co., Ltd. Multiansicht-Anzeigevorrichtung
KR101612927B1 (ko) * 2009-08-04 2016-04-18 삼성디스플레이 주식회사 디스플레이 패널, 이를 포함하는 칼라 필터 기판 및 이의 제조 방법
KR101407926B1 (ko) * 2010-10-13 2014-06-17 주식회사 엘지화학 블랙매트릭스, 그 형성방법 및 이를 포함하는 컬러필터
CN105324704B (zh) * 2013-06-17 2019-06-11 苹果公司 具有颜色混合防止结构的显示器
CN104658431B (zh) * 2015-03-11 2017-12-15 京东方科技集团股份有限公司 显示面板以及包括该显示面板的显示装置
CN107490894B (zh) * 2017-09-28 2020-07-07 京东方科技集团股份有限公司 彩膜基板及其制造方法、显示面板

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01277802A (ja) * 1988-04-30 1989-11-08 Seiko Epson Corp カラーフィルター
JPH06118217A (ja) * 1992-10-01 1994-04-28 Toray Ind Inc カラーフィルタの製造方法
US5340619A (en) * 1993-10-18 1994-08-23 Brewer Science, Inc. Method of manufacturing a color filter array
TW417034B (en) * 1993-11-24 2001-01-01 Canon Kk Color filter, method for manufacturing it, and liquid crystal panel
JPH0921910A (ja) * 1995-07-07 1997-01-21 Toray Ind Inc カラーフィルタ、カラーフィルタ製造方法、カラー液晶表示素子およびカラーイメージセンサ
JP3234748B2 (ja) * 1995-07-14 2001-12-04 キヤノン株式会社 基板の選択的撥水処理方法、遮光部材形成基板及びこの遮光部材形成基板を用いたカラ−フィルタ−基板の製造方法
JP3996979B2 (ja) * 1996-08-08 2007-10-24 キヤノン株式会社 カラーフィルターの製造方法、カラーフィルター及び液晶表示装置
US5948577A (en) * 1997-06-02 1999-09-07 Canon Kabushiki Kaisha Color filter substrate, liquid crystal display device using the same and method of manufacturing color filter substrate

Also Published As

Publication number Publication date
EP1061383B1 (de) 2006-05-17
DE69931353T2 (de) 2007-02-22
EP1643276A1 (de) 2006-04-05
KR100506068B1 (ko) 2005-08-05
KR100504253B1 (ko) 2005-07-27
KR20010041185A (ko) 2001-05-15
EP1061383A4 (de) 2002-05-08
TW484022B (en) 2002-04-21
CN1174265C (zh) 2004-11-03
WO2000037972A1 (fr) 2000-06-29
EP1061383A1 (de) 2000-12-20
CN1291289A (zh) 2001-04-11
KR20040089749A (ko) 2004-10-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition