DE69910903D1 - Lichtempfindliches Silberhalogenidmaterial mit Träger, Härtungsschicht und lichtempfindlicher Schicht - Google Patents

Lichtempfindliches Silberhalogenidmaterial mit Träger, Härtungsschicht und lichtempfindlicher Schicht

Info

Publication number
DE69910903D1
DE69910903D1 DE69910903T DE69910903T DE69910903D1 DE 69910903 D1 DE69910903 D1 DE 69910903D1 DE 69910903 T DE69910903 T DE 69910903T DE 69910903 T DE69910903 T DE 69910903T DE 69910903 D1 DE69910903 D1 DE 69910903D1
Authority
DE
Germany
Prior art keywords
layer
photosensitive
support
silver halide
halide material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69910903T
Other languages
English (en)
Other versions
DE69910903T2 (de
Inventor
Satoshi Hoshi
Hiromitsu Yanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10185689A external-priority patent/JP2000003045A/ja
Priority claimed from JP25322798A external-priority patent/JP3810041B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69910903D1 publication Critical patent/DE69910903D1/de
Publication of DE69910903T2 publication Critical patent/DE69910903T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285—Silver salts, e.g. a latent silver salt image
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/155—Nonresinous additive to promote interlayer adhesion in element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69910903T 1998-06-16 1999-06-16 Lichtempfindliches Silberhalogenidmaterial mit Träger, Härtungsschicht und lichtempfindlicher Schicht Expired - Lifetime DE69910903T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP18568998 1998-06-16
JP10185689A JP2000003045A (ja) 1998-06-16 1998-06-16 感光材料
JP25322798 1998-08-24
JP25322798A JP3810041B2 (ja) 1998-08-24 1998-08-24 感光材料

Publications (2)

Publication Number Publication Date
DE69910903D1 true DE69910903D1 (de) 2003-10-09
DE69910903T2 DE69910903T2 (de) 2004-07-22

Family

ID=26503267

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69910903T Expired - Lifetime DE69910903T2 (de) 1998-06-16 1999-06-16 Lichtempfindliches Silberhalogenidmaterial mit Träger, Härtungsschicht und lichtempfindlicher Schicht

Country Status (3)

Country Link
US (2) US6066432A (de)
EP (1) EP0965886B1 (de)
DE (1) DE69910903T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6187510B1 (en) * 1999-03-09 2001-02-13 Kodak Polychrome Graphics Llc Digital lithographic printing plate and method of making thereof
KR20010051350A (ko) * 1999-11-01 2001-06-25 이시마루 기미오, 다께우찌 마사아끼 활성 입자, 감광성 수지 조성물 및 패턴 형성 방법
US6593289B1 (en) 2002-01-15 2003-07-15 Milliken & Co. Liquid fabric softener formulations comprising hemicyanine red colorants
US6638903B2 (en) 2002-01-15 2003-10-28 Milliken & Company Non-staining red colorants and liquid fabric softener formulations comprising such non-staining colorants
US7270937B2 (en) * 2003-10-17 2007-09-18 Hynix Semiconductor Inc. Over-coating composition for photoresist and process for forming photoresist pattern using the same
DE102010053763B4 (de) * 2010-12-08 2020-01-02 Carl Freudenberg Kg Anordnung

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4886739A (en) * 1988-08-10 1989-12-12 Eastman Kodak Company Thermally processable imaging element and process
JP2590025B2 (ja) * 1990-11-27 1997-03-12 富士写真フイルム株式会社 感光材料および画像形成方法
US5554482A (en) * 1994-04-25 1996-09-10 Fuji Photo Film Co., Ltd. Silver halide light-sensitive material containing base precursor and polyvinyl alcohol
JPH086255A (ja) * 1994-06-22 1996-01-12 Fuji Photo Film Co Ltd 平版印刷材料
JP3493240B2 (ja) * 1995-01-17 2004-02-03 富士写真フイルム株式会社 感光材料およびその製造方法
JPH08286366A (ja) * 1995-04-18 1996-11-01 Fuji Photo Film Co Ltd 感光材料
JPH1097076A (ja) * 1996-09-20 1998-04-14 Fuji Photo Film Co Ltd 感光材料
JPH10111571A (ja) * 1996-10-03 1998-04-28 Fuji Photo Film Co Ltd 感光材料
JPH1165122A (ja) * 1997-08-19 1999-03-05 Fuji Photo Film Co Ltd 感光材料

Also Published As

Publication number Publication date
DE69910903T2 (de) 2004-07-22
US6132925A (en) 2000-10-17
US6066432A (en) 2000-05-23
EP0965886A1 (de) 1999-12-22
EP0965886B1 (de) 2003-09-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP