DE69908775D1 - Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie - Google Patents

Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Info

Publication number
DE69908775D1
DE69908775D1 DE69908775T DE69908775T DE69908775D1 DE 69908775 D1 DE69908775 D1 DE 69908775D1 DE 69908775 T DE69908775 T DE 69908775T DE 69908775 T DE69908775 T DE 69908775T DE 69908775 D1 DE69908775 D1 DE 69908775D1
Authority
DE
Germany
Prior art keywords
stereolithography
radiation
liquid
hardenable composition
provides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69908775T
Other languages
English (en)
Other versions
DE69908775T2 (de
Inventor
Hsing Pang
Panayiotis Melisaris
Renyi Wang
Wai Fong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3D Systems Inc
Original Assignee
Vantico GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22000442&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69908775(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vantico GmbH filed Critical Vantico GmbH
Publication of DE69908775D1 publication Critical patent/DE69908775D1/de
Application granted granted Critical
Publication of DE69908775T2 publication Critical patent/DE69908775T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
DE69908775T 1998-04-06 1999-03-25 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie Expired - Lifetime DE69908775T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US55832 1998-04-06
US09/055,832 US6100007A (en) 1998-04-06 1998-04-06 Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
PCT/EP1999/002033 WO1999052017A1 (en) 1998-04-06 1999-03-25 Liquid, radiation-curable composition, especially for stereolithography

Publications (2)

Publication Number Publication Date
DE69908775D1 true DE69908775D1 (de) 2003-07-17
DE69908775T2 DE69908775T2 (de) 2004-04-22

Family

ID=22000442

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69908775T Expired - Lifetime DE69908775T2 (de) 1998-04-06 1999-03-25 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Country Status (15)

Country Link
US (3) US6100007A (de)
EP (2) EP1086403B1 (de)
JP (1) JP4798846B2 (de)
KR (1) KR100608588B1 (de)
CN (2) CN1273868C (de)
AT (1) ATE242890T1 (de)
AU (1) AU748042B2 (de)
BR (1) BR9909404A (de)
CA (1) CA2325716C (de)
DE (1) DE69908775T2 (de)
IL (1) IL138449A0 (de)
MY (1) MY133766A (de)
TR (1) TR200002895T2 (de)
TW (1) TW593525B (de)
WO (1) WO1999052017A1 (de)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0938026B1 (de) * 1998-02-18 2009-05-27 DSM IP Assets B.V. Fotohärtbare flüssige Harzzusammensetzung
WO1999048945A1 (fr) * 1998-03-20 1999-09-30 Nippon Soda Co., Ltd. Composition photodurcissable contenant un sel d'iodonium
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US20060154175A9 (en) * 1998-07-10 2006-07-13 Lawton John A Solid imaging compositions for preparing polypropylene-like articles
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US6287748B1 (en) 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
US6574523B1 (en) * 2000-05-05 2003-06-03 3D Systems, Inc. Selective control of mechanical properties in stereolithographic build style configuration
US6811937B2 (en) * 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US6833231B2 (en) * 2002-07-31 2004-12-21 3D Systems, Inc. Toughened stereolithographic resin compositions
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US20040087687A1 (en) * 2002-10-30 2004-05-06 Vantico A&T Us Inc. Photocurable compositions with phosphite viscosity stabilizers
US7211368B2 (en) * 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
US20040170923A1 (en) * 2003-02-27 2004-09-02 3D Systems, Inc. Colored stereolithographic resins
US6856283B2 (en) * 2003-02-28 2005-02-15 Raytheon Company Method and apparatus for a power system for phased-array radar
WO2004090646A1 (ja) * 2003-04-09 2004-10-21 Konica Minolta Medical & Graphic, Inc. ホログラフィック記録メディア及びその記録方法
US7354643B2 (en) 2003-06-24 2008-04-08 Cmet Inc. Three-dimensional object and method of producing the same
US20050040562A1 (en) * 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7120512B2 (en) * 2003-08-25 2006-10-10 Hewlett-Packard Development Company, L.P. Method and a system for solid freeform fabricating using non-reactive powder
US7232850B2 (en) 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
US20070149667A1 (en) * 2003-10-16 2007-06-28 Dsm Ip Assets B.V. Curable compositions and rapid prototyping process using the same
DE10349394A1 (de) * 2003-10-21 2005-05-25 Marabuwerke Gmbh & Co. Kg UV-härtendes Bindemittel für Farben oder Lacke zur Bedruckung von Glas und Verfahren zur Bedruckung von Glassubstraten
US20050101684A1 (en) * 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
CN1879058B (zh) * 2003-11-06 2012-05-23 帝斯曼知识产权资产管理有限公司 可固化组合物和利用它的快速成型方法
WO2005054330A1 (en) * 2003-12-02 2005-06-16 Dsm Ip Assets B.V. Flame retardant radiation curable compositions
US20050165127A1 (en) * 2003-12-31 2005-07-28 Dsm Desotech, Inc. Solid imaging compositions for preparing polyethylene-like articles
EP1727663B1 (de) * 2004-03-22 2011-10-05 Huntsman Advanced Materials (Switzerland) GmbH Photohärtbare zusammensetzungen
JP2008514764A (ja) * 2004-09-28 2008-05-08 ブルーワー サイエンス アイ エヌ シー． 光電子用途に用いる硬化性高屈折率樹脂
JP4809006B2 (ja) * 2005-07-05 2011-11-02 太陽ホールディングス株式会社 着色感光性樹脂組成物及びその硬化物
CN101263428A (zh) * 2005-09-13 2008-09-10 亨斯迈先进材料（瑞士）有限公司 用于制备类似abs的制品的可光固化组合物
JP4021915B2 (ja) * 2005-11-25 2007-12-12 株式会社ブリヂストン 光硬化性液状樹脂の製造方法及びその方法により製造された光硬化性液状樹脂
DE102006000867A1 (de) 2006-01-05 2007-07-12 Marabuwerke Gmbh & Co. Kg UV-härtende Glasdruckfarbe und UV-härtender Glasdrucklack sowie Verfahren zum Bedrucken von Glassubstraten
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
US8377623B2 (en) * 2007-11-27 2013-02-19 3D Systems, Inc. Photocurable resin composition for producing three dimensional articles having high clarity
JP5012462B2 (ja) * 2007-12-03 2012-08-29 Ｊｓｒ株式会社 光造形用光硬化性組成物、炭化造形物、及びその製造方法
US20100190881A1 (en) 2009-01-28 2010-07-29 3D Systems, Incorporated Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems
US8492454B2 (en) 2009-10-05 2013-07-23 Creative Nail Design, Inc. Removable color layer for artificial nail coatings and methods therefore
US8263677B2 (en) * 2009-09-08 2012-09-11 Creative Nail Design, Inc. Removable color gel basecoat for artificial nail coatings and methods therefore
US8541482B2 (en) 2009-10-05 2013-09-24 Creative Nail Design, Inc. Removable multilayer nail coating system and methods therefore
JP5872470B2 (ja) * 2010-07-14 2016-03-01 日本化薬株式会社 感光性樹脂組成物及びその硬化物
KR20140016315A (ko) 2011-03-07 2014-02-07 크리에이티브 네일 디자인 인코포레이티드 Uv-경화성 미용 손톱 코팅제를 위한 조성물 및 방법
EP2842980B1 (de) * 2013-08-09 2021-05-05 DSM IP Assets B.V. Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen
TWI561132B (en) * 2013-11-01 2016-12-01 Ind Tech Res Inst Method for forming metal circuit, liquid trigger material for forming metal circuit and metal circuit structure
JP6720092B2 (ja) 2014-06-23 2020-07-08 カーボン，インコーポレイテッド 多様な硬化機構を有する材料からのポリウレタン三次元物体製造方法
DE102014111559B4 (de) * 2014-08-13 2023-06-07 Uwe Brick Verfahren zur Herstellung von Schichtenfolgen und Formkörpern aus einer Anzahl von Schichten
DE102015210346A1 (de) * 2015-06-04 2016-12-08 Tesa Se Verfahren zur Herstellung viskoser Epoxidsirupe und danach erhältliche Epoxidsirupe
JP2018517034A (ja) * 2015-06-08 2018-06-28 ディーエスエム アイピー アセッツ ビー．ブイ． 付加造形用液状ハイブリッドＵＶ／ｖｉｓ線硬化性樹脂組成物
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
JP2018522982A (ja) * 2015-07-14 2018-08-16 ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング ワンドロップフィルシーラント用途のためのモノマーおよびオリゴマー樹脂
US11141919B2 (en) 2015-12-09 2021-10-12 Holo, Inc. Multi-material stereolithographic three dimensional printing
WO2017174545A1 (en) 2016-04-08 2017-10-12 Solvay Specialty Polymers Usa, Llc Photocurable polymers, photocurable polymer compositions and lithographic processes including the same
US11945152B2 (en) * 2017-03-06 2024-04-02 Maxell, Ltd. Model material ink set, support material composition, ink set, three-dimensional shaped object, and method for manufacturing three-dimensional shaped object
US10935891B2 (en) 2017-03-13 2021-03-02 Holo, Inc. Multi wavelength stereolithography hardware configurations
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
GB2564956B (en) 2017-05-15 2020-04-29 Holo Inc Viscous film three-dimensional printing systems and methods
US10245785B2 (en) 2017-06-16 2019-04-02 Holo, Inc. Methods for stereolithography three-dimensional printing
US11633908B2 (en) * 2018-03-02 2023-04-25 Formlabs, Inc. Latent cure resins and related methods
DE102018111926A1 (de) * 2018-05-17 2019-11-21 Osram Opto Semiconductors Gmbh Gemische, Funktionsmaterial, Bauelement und Verfahren zur Herstellung eines Funktionsmaterials und Bauelements
CN113474147A (zh) 2018-12-26 2021-10-01 霍洛公司 用于三维打印系统和方法的传感器
MX2022001851A (es) * 2019-08-14 2022-05-30 Mighty Buildings Inc Compuesto polimerizable de doble mediacion para la fabricacion aditiva.
US11602896B2 (en) * 2019-08-14 2023-03-14 Mighty Buildings, Inc. 3D printing of a composite material via sequential dual-curing polymerization
CN113968966B (zh) * 2021-11-30 2024-02-27 万华化学集团股份有限公司 一种尼龙弹性体的制备方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
DE3369398D1 (en) 1982-05-19 1987-02-26 Ciba Geigy Ag Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use
ATE37242T1 (de) 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
US4717605A (en) * 1984-05-16 1988-01-05 Merck Patent Gesellschaft Mit Beschrankter Haftung Radiation curable adhesives
EP0223587B1 (de) 1985-11-20 1991-02-13 The Mead Corporation Ionische Farbstoffe als Initiatoren enthaltende fotosensitive Materialien
US4751102A (en) 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
US5434196A (en) * 1988-02-19 1995-07-18 Asahi Denka Kogyo K.K. Resin composition for optical molding
MX169037B (es) * 1988-03-29 1993-06-17 Rohm & Haas Procedimiento para preparar revestimientos fotocurados
JP2590230B2 (ja) * 1988-09-13 1997-03-12 旭電化工業株式会社 光学的造形用樹脂組成物
US5236967A (en) * 1990-01-12 1993-08-17 Asahi Denka Kogyo K.K. Optical molding resin composition comprising polythiol-polyene compounds
TW269017B (de) * 1992-12-21 1996-01-21 Ciba Geigy Ag
DE4344125A1 (de) * 1993-12-23 1995-06-29 Basf Lacke & Farben Strahlenhärtbare Schutzlackierung, insbesondere für metallisierte Oberflächen
DE69629809T2 (de) * 1995-05-12 2004-07-15 Asahi Denka Kogyo K.K. Stereolithographisches verfahren und kunststoffharz dazu
JP3921490B2 (ja) * 1995-05-12 2007-05-30 株式会社Ａｄｅｋａ 光学的立体造形用樹脂組成物および光学的立体造形法
JPH08323866A (ja) 1995-06-05 1996-12-10 Takemoto Oil & Fat Co Ltd 光学的立体造形用光硬化性液体及びこれを含有する光学的立体造形用光硬化性組成物
JP3849989B2 (ja) * 1996-04-09 2006-11-22 株式会社Ａｄｅｋａ 光学的立体造形用樹脂組成物および光学的立体造形法
EP0802455B1 (de) 1996-04-15 2002-10-16 Teijin Seiki Co., Ltd. Verwendung einer photohärtbaren Harzzusammensetzung zur Herstellung eines Objektes mittels Stereolithographie
EP0897558B1 (de) * 1996-05-09 2000-09-27 Dsm N.V. Lichtempfindliche harzzusammensetzung für rapid prototyping und ein verfahren zur herstellung von dreidimensionalen objekten
DE59701299D1 (de) * 1996-07-29 2000-04-27 Ciba Sc Holding Ag Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
JP2001527590A (ja) * 1997-02-18 2001-12-25 アライド シグナル インコーポレイテッド ステレオリソグラフィのための耐熱性ポリマー
JP4204113B2 (ja) * 1997-12-04 2009-01-07 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography

Also Published As

Publication number Publication date
EP1086403A1 (de) 2001-03-28
JP4798846B2 (ja) 2011-10-19
KR20010042514A (ko) 2001-05-25
EP1327911B1 (de) 2014-05-07
CN1690855A (zh) 2005-11-02
AU3599399A (en) 1999-10-25
JP2002510748A (ja) 2002-04-09
CA2325716A1 (en) 1999-10-14
KR100608588B1 (ko) 2006-08-03
US6100007A (en) 2000-08-08
US20020160309A1 (en) 2002-10-31
US6413696B1 (en) 2002-07-02
MY133766A (en) 2007-11-30
AU748042B2 (en) 2002-05-30
ATE242890T1 (de) 2003-06-15
IL138449A0 (en) 2001-10-31
EP1086403B1 (de) 2003-06-11
CN1690855B (zh) 2010-06-16
CA2325716C (en) 2007-05-15
TW593525B (en) 2004-06-21
TR200002895T2 (tr) 2001-01-22
EP1327911A1 (de) 2003-07-16
DE69908775T2 (de) 2004-04-22
CN1296578A (zh) 2001-05-23
CN1273868C (zh) 2006-09-06
BR9909404A (pt) 2000-12-19
WO1999052017A1 (en) 1999-10-14

Similar Documents

Publication Publication Date Title
DE69908775D1 (de) Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie
ES2087069T3 (es) Mezclas de resinas epoxi reticulables que contienen polioxialquilenditioles y poliaminas.
ES2090116T3 (es) Resinas epoxi tenaces.
KR960017807A (ko) 카르바메이트 첨가제를 함유하는 경화성 코팅 조성물
CA2014017A1 (en) Cationically electrodepositable resin composition
DE60105682D1 (de) Härtbare Zusammensetzung
DE3561397D1 (en) Chemically curable resins derived from 1-oxa-3-aza-tetralin groups containing compounds and cycloaliphatic epoxy resins, process for their preparation and cure as well as the use of such resins
KR970001407A (ko) 마이크로일렉트로닉스 접착제용 글리시딜옥시페닐기로 종료된 플렉시블 체인으로 구성되는 에폭시수지
BR0002850B1 (pt) composição de revestimento de organopolissiloxano epóxi funcional.
ES2071078T3 (es) Mezclas de materiales, endurecibles, a base de resina epoxi, que contienen un endurecedor latente, una amina y un tiol.
DK1147098T3 (da) Forbindelser omfattende acrylatgrupper og cykliske sekundære amin-rester
ATE203711T1 (de) Flüssigkeitsstrahlaufzeichnungskopf und sein herstellungsverfahren
MX9202065A (es) Composicion moldeadora epoxi para aplicaciones de montaje superficial.
ATE66943T1 (de) Stabilisiertes acrylharz.
KR960017808A (ko) 카르바메이트 수지 및 카르바메이트 첨가제를 함유하는 경화성 코팅 조성물
SG114604A1 (en) Thermosetting resin composition and semiconductor device obtained with the same
DE60204010D1 (de) Addukte von polyalkylenglykolmonoglycidylethern und aminverbindungen
IT1283082B1 (it) Procedimento per la sintesi di resine contenenti insaturazoni di tipo (met)acrilico induribili mediante radiazioni o calore e
KR970042721A (ko) 만니히 염기 경화제
JPS52112698A (en) Curable resin compositions
ATE272662T1 (de) Härtbare zusammensetzungen aus glycidylverbindungen, aminischen härtern und niedrigviskosen härtungsbeschleunigern
EP0138389A3 (en) Epoxy resin compositions
BR0209878A (pt) Composição de resina não-saturada curável
ES2032289T3 (es) Composicion de revestimiento reducible por agua basada en una renina epoxidica.
DE60203313D1 (de) Stabilisierte beschichtungszusammensetzungen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC

R082 Change of representative

Ref document number: 1086403

Country of ref document: EP

Representative=s name: VON KREISLER SELTING WERNER, DE

R081 Change of applicant/patentee

Ref document number: 1086403

Country of ref document: EP

Owner name: 3D SYSTEMS, INC., US

Free format text: FORMER OWNER: VANTICO AG, BASEL, CH

Effective date: 20121217

R082 Change of representative

Ref document number: 1086403

Country of ref document: EP

Representative=s name: VON KREISLER SELTING WERNER, DE

Effective date: 20121217