BR9909404A - Composição curável com radiação, lìquida, especialmente para produção de artigos curados por estereolitografia tendo altas temperaturas de deflexão térmica - Google Patents

Composição curável com radiação, lìquida, especialmente para produção de artigos curados por estereolitografia tendo altas temperaturas de deflexão térmica

Info

Publication number
BR9909404A
BR9909404A BR9909404-5A BR9909404A BR9909404A BR 9909404 A BR9909404 A BR 9909404A BR 9909404 A BR9909404 A BR 9909404A BR 9909404 A BR9909404 A BR 9909404A
Authority
BR
Brazil
Prior art keywords
stereolithography
production
curable composition
high thermal
liquid curable
Prior art date
Application number
BR9909404-5A
Other languages
English (en)
Inventor
Thomas Hsing Pang
Anastasios Panayioti Melisaris
Renyi Wang
John Wai Fong
Original Assignee
Vantico Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22000442&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR9909404(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vantico Ag filed Critical Vantico Ag
Publication of BR9909404A publication Critical patent/BR9909404A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Civil Engineering (AREA)
  • Composite Materials (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Patente de Invenção; <B>"COMPOSIçãO CURáVEL COM RADIAçãO, LìQUIDA, ESPECIALMENTE PARA PRODUçãO DE ARTIGOS CURADOS POR ESTEREOLITOGRAFIA TENDO ALTAS TEMPERATURAS DE DEFLEXãO TéRMICA". A presente invenção refere-se a novas composições de resina contendo pelo menos uma substância orgânica cationicamente polimerizável e curável com radiação actínica, sólida ou líquida, um iniciador sensível à radiação actínica para polimerização catiónica, uma substância orgânica polimerizável com radical e curável com radiação actínica e um iniciador sensível à radiação actínica para polimerização de radical. A substância orgânica cationicamente polimerizável e curável com radiação actínica é pelo menos um glicidil éter de um álcool alifático, alicíclico ou aromático poliídrico tendo pelo menos três grupos epoxi com peso equivalente epoxi entre 90 e 800 gramas por equivalente, pelo menos um epóxido alicíclico sólido ou líquido com um peso equivalente epoxi entre 90 e 300 gramas por equivalente tendo pelo menos dois grupos epoxi e pureza de monómero maior do que cerca de 90% em peso, ou pelo menos um epoxi cresol novolac ou epoxi fenol novolac sólido ou líquido tendo um peso equivalente epoxi entre 130 e 350, ou suas misturas. O uso dos componentes cationicamente polimerizáveis mencionados acima aumenta sustancialmente a temperatura de deflexão térmica dos artigos curados enquanto mantendo alta fotovelocidade, precisão, novo revestimento - úmido, resistência à água e bom acabamento de parede lateral. A presente invenção ainda refere-se a um processo de produção de um produto curado, particularmente um artigo tridimensional, onde as composições descritas acima são tratadas com radiação actínica.
BR9909404-5A 1998-04-06 1999-03-25 Composição curável com radiação, lìquida, especialmente para produção de artigos curados por estereolitografia tendo altas temperaturas de deflexão térmica BR9909404A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/055,832 US6100007A (en) 1998-04-06 1998-04-06 Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
PCT/EP1999/002033 WO1999052017A1 (en) 1998-04-06 1999-03-25 Liquid, radiation-curable composition, especially for stereolithography

Publications (1)

Publication Number Publication Date
BR9909404A true BR9909404A (pt) 2000-12-19

Family

ID=22000442

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9909404-5A BR9909404A (pt) 1998-04-06 1999-03-25 Composição curável com radiação, lìquida, especialmente para produção de artigos curados por estereolitografia tendo altas temperaturas de deflexão térmica

Country Status (15)

Country Link
US (3) US6100007A (pt)
EP (2) EP1086403B1 (pt)
JP (1) JP4798846B2 (pt)
KR (1) KR100608588B1 (pt)
CN (2) CN1690855B (pt)
AT (1) ATE242890T1 (pt)
AU (1) AU748042B2 (pt)
BR (1) BR9909404A (pt)
CA (1) CA2325716C (pt)
DE (1) DE69908775T2 (pt)
IL (1) IL138449A0 (pt)
MY (1) MY133766A (pt)
TR (1) TR200002895T2 (pt)
TW (1) TW593525B (pt)
WO (1) WO1999052017A1 (pt)

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Publication number Publication date
EP1327911B1 (en) 2014-05-07
WO1999052017A1 (en) 1999-10-14
JP4798846B2 (ja) 2011-10-19
CN1296578A (zh) 2001-05-23
TR200002895T2 (tr) 2001-01-22
AU3599399A (en) 1999-10-25
CN1690855B (zh) 2010-06-16
DE69908775T2 (de) 2004-04-22
JP2002510748A (ja) 2002-04-09
DE69908775D1 (de) 2003-07-17
US6413696B1 (en) 2002-07-02
CN1690855A (zh) 2005-11-02
US6100007A (en) 2000-08-08
EP1086403B1 (en) 2003-06-11
EP1086403A1 (en) 2001-03-28
AU748042B2 (en) 2002-05-30
IL138449A0 (en) 2001-10-31
KR20010042514A (ko) 2001-05-25
CA2325716A1 (en) 1999-10-14
CN1273868C (zh) 2006-09-06
EP1327911A1 (en) 2003-07-16
CA2325716C (en) 2007-05-15
ATE242890T1 (de) 2003-06-15
KR100608588B1 (ko) 2006-08-03
MY133766A (en) 2007-11-30
TW593525B (en) 2004-06-21
US20020160309A1 (en) 2002-10-31

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