DE69829919D1 - Polierverfahren und Vorrichtung - Google Patents

Polierverfahren und Vorrichtung

Info

Publication number
DE69829919D1
DE69829919D1 DE69829919T DE69829919T DE69829919D1 DE 69829919 D1 DE69829919 D1 DE 69829919D1 DE 69829919 T DE69829919 T DE 69829919T DE 69829919 T DE69829919 T DE 69829919T DE 69829919 D1 DE69829919 D1 DE 69829919D1
Authority
DE
Germany
Prior art keywords
polishing method
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69829919T
Other languages
English (en)
Other versions
DE69829919T2 (de
Inventor
Takayoshi Kawamoto
Norio Kimura
Hozumi Yasuda
Hiroshi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of DE69829919D1 publication Critical patent/DE69829919D1/de
Application granted granted Critical
Publication of DE69829919T2 publication Critical patent/DE69829919T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/015—Temperature control

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
DE69829919T 1997-07-30 1998-07-30 Polierverfahren und Vorrichtung Expired - Fee Related DE69829919T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21914897 1997-07-30
JP21914897A JP3741523B2 (ja) 1997-07-30 1997-07-30 研磨装置

Publications (2)

Publication Number Publication Date
DE69829919D1 true DE69829919D1 (de) 2005-06-02
DE69829919T2 DE69829919T2 (de) 2006-03-02

Family

ID=16730972

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69829919T Expired - Fee Related DE69829919T2 (de) 1997-07-30 1998-07-30 Polierverfahren und Vorrichtung

Country Status (5)

Country Link
US (1) US6416384B1 (de)
EP (1) EP0894570B1 (de)
JP (1) JP3741523B2 (de)
KR (1) KR100538539B1 (de)
DE (1) DE69829919T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3693483B2 (ja) 1998-01-30 2005-09-07 株式会社荏原製作所 研磨装置
JP2000343416A (ja) 1999-05-31 2000-12-12 Ebara Corp ポリッシング装置および方法
EP1602444B1 (de) * 2000-01-31 2008-03-12 Shin-Etsu Handotai Company Limited Polierverfahren
JP2001298008A (ja) * 2000-04-14 2001-10-26 Sony Corp 研磨方法および研磨装置
JP2002093756A (ja) * 2000-07-27 2002-03-29 Agere Systems Guardian Corp 化学的機械的平面化プロセス用研磨面温度調整システム
JP4502168B2 (ja) * 2001-07-06 2010-07-14 ルネサスエレクトロニクス株式会社 化学機械研磨装置および化学機械研磨方法
US6672940B1 (en) * 2002-01-22 2004-01-06 Scratch Off, A Division Of Austin Graham, Inc. Surface polishing slurry cooling system
US6705923B2 (en) * 2002-04-25 2004-03-16 Taiwan Semiconductor Manufacturing Co., Ltd Chemical mechanical polisher equipped with chilled wafer holder and polishing pad and method of using
JP4448297B2 (ja) * 2002-12-27 2010-04-07 株式会社荏原製作所 基板研磨装置及び基板研磨方法
US6942544B2 (en) * 2003-09-30 2005-09-13 Hitachi Global Storage Technologies Netherlands B.V. Method of achieving very high crown-to-camber ratios on magnetic sliders
US6913515B2 (en) * 2003-09-30 2005-07-05 Hitachi Global Storage Technologies Netherlands B.V. System and apparatus for achieving very high crown-to-camber ratios on magnetic sliders
WO2005039824A1 (ja) * 2003-10-27 2005-05-06 Mitsubishi Denki Kabushiki Kaisha マルチワイヤソー
EP2275241B1 (de) * 2005-08-25 2012-10-17 Freiberger Compound Materials GmbH Drahtsäge und Verfahren zum Trennen eines Werkstücks mittels Drahtsägen
JP4531661B2 (ja) * 2005-08-26 2010-08-25 東京エレクトロン株式会社 基板の処理方法及び基板の処理装置
JP5242015B2 (ja) * 2006-03-14 2013-07-24 Ｈｏｙａ株式会社 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
JP5552401B2 (ja) 2010-09-08 2014-07-16 株式会社荏原製作所 研磨装置および方法
US9012337B2 (en) * 2010-10-12 2015-04-21 Varian Semiconductor Equipment Associates, Inc. Platen control
US9550270B2 (en) * 2013-07-31 2017-01-24 Taiwan Semiconductor Manufacturing Company Limited Temperature modification for chemical mechanical polishing
CN103419121B (zh) * 2013-08-09 2015-11-04 厦门大学 一种基于温度可监控的磁悬浮抛光装置
US11103970B2 (en) * 2017-08-15 2021-08-31 Taiwan Semiconductor Manufacturing Co, , Ltd. Chemical-mechanical planarization system
JP7100462B2 (ja) * 2018-02-20 2022-07-13 株式会社ディスコ 水温設定方法
JP7264039B2 (ja) * 2019-12-19 2023-04-25 株式会社Sumco 研磨ヘッド、化学的機械的研磨装置、および、化学的機械的研磨方法
US20230256561A1 (en) * 2022-02-17 2023-08-17 Taiwan Semiconductor Manufacturing Company Ltd. Method of chemical mechanical polish operation and chemical mechanical polishing system
CN115351696B (zh) * 2022-10-20 2023-03-31 江苏圣拉克建材有限公司 一种基于声波介入型电机轴用倾斜振动抛光机

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2221127A (en) * 1938-07-27 1940-11-12 Westinghouse Electric & Mfg Co Temperature control means for gear cutting
DD147518B1 (de) * 1979-11-29 1983-05-25 Klaus Delling Einrichtung zur temperaturstabilisierung in der umhausung von werkzeugmaschinen
US4450652A (en) 1981-09-04 1984-05-29 Monsanto Company Temperature control for wafer polishing
JP2555331B2 (ja) * 1986-12-04 1996-11-20 株式会社井上ジャパックス研究所 精密加工装置
JPH02232168A (ja) * 1989-03-02 1990-09-14 Mitsubishi Electric Corp 研磨装置
US5104828A (en) 1990-03-01 1992-04-14 Intel Corporation Method of planarizing a dielectric formed over a semiconductor substrate
US5127196A (en) 1990-03-01 1992-07-07 Intel Corporation Apparatus for planarizing a dielectric formed over a semiconductor substrate
JPH0472636A (ja) * 1990-07-12 1992-03-06 Nec Corp 片面ポリッシング装置
US5643060A (en) * 1993-08-25 1997-07-01 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including heater
JP3311116B2 (ja) * 1993-10-28 2002-08-05 株式会社東芝 半導体製造装置
US5653623A (en) * 1993-12-14 1997-08-05 Ebara Corporation Polishing apparatus with improved exhaust
JPH07171759A (ja) * 1993-12-20 1995-07-11 Toshiba Mach Co Ltd ポリッシング定盤の温度制御方法
JPH0929620A (ja) * 1995-07-20 1997-02-04 Ebara Corp ポリッシング装置
US5597442A (en) * 1995-10-16 1997-01-28 Taiwan Semiconductor Manufacturing Company Ltd. Chemical/mechanical planarization (CMP) endpoint method using measurement of polishing pad temperature
US5989355A (en) * 1997-02-26 1999-11-23 Eco-Snow Systems, Inc. Apparatus for cleaning and testing precision components of hard drives and the like

Also Published As

Publication number Publication date
EP0894570A2 (de) 1999-02-03
KR100538539B1 (ko) 2006-03-07
EP0894570B1 (de) 2005-04-27
EP0894570A3 (de) 2002-08-28
JP3741523B2 (ja) 2006-02-01
KR19990014294A (ko) 1999-02-25
US6416384B1 (en) 2002-07-09
DE69829919T2 (de) 2006-03-02
JPH1142551A (ja) 1999-02-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee