DE69824815D1 - Beugungselement und damit ausgestattetes optisches System - Google Patents

Beugungselement und damit ausgestattetes optisches System

Info

Publication number
DE69824815D1
DE69824815D1 DE69824815T DE69824815T DE69824815D1 DE 69824815 D1 DE69824815 D1 DE 69824815D1 DE 69824815 T DE69824815 T DE 69824815T DE 69824815 T DE69824815 T DE 69824815T DE 69824815 D1 DE69824815 D1 DE 69824815D1
Authority
DE
Germany
Prior art keywords
optical system
diffraction element
system equipped
diffraction
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69824815T
Other languages
English (en)
Inventor
Hideo Kato
Hiroshi Maehara
Kenji Tamamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27480692&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69824815(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69824815D1 publication Critical patent/DE69824815D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69824815T 1997-12-03 1998-12-02 Beugungselement und damit ausgestattetes optisches System Expired - Lifetime DE69824815D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP34859097 1997-12-03
JP34858997 1997-12-03
JP36341297 1997-12-16
JP10356941A JPH11237503A (ja) 1997-12-03 1998-12-01 回折光学素子及びそれを有する光学系

Publications (1)

Publication Number Publication Date
DE69824815D1 true DE69824815D1 (de) 2004-08-05

Family

ID=27480692

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69824815T Expired - Lifetime DE69824815D1 (de) 1997-12-03 1998-12-02 Beugungselement und damit ausgestattetes optisches System

Country Status (4)

Country Link
US (1) US20020030890A1 (de)
EP (1) EP0921418B2 (de)
JP (1) JPH11237503A (de)
DE (1) DE69824815D1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001100017A (ja) 1999-09-29 2001-04-13 Canon Inc 光学素子
US7129982B1 (en) * 1999-12-30 2006-10-31 Intel Corporation Color image sensor with integrated binary optical elements
US20030198260A1 (en) * 2002-04-18 2003-10-23 Hogan Josh N. Method and apparatus for generating multiple wavelength radiation
DE10220045A1 (de) * 2002-05-04 2003-11-13 Zeiss Carl Smt Ag Verfahren zur Herstellung eines optischen Elementes aus Quarzsubstrat
JP4305611B2 (ja) * 2002-07-18 2009-07-29 株式会社ニコン 照明光学装置、露光装置および露光方法
US20050018296A1 (en) * 2003-07-24 2005-01-27 Asml Holding Nv Diffractive optical element and method of making same
JP5036732B2 (ja) 2006-02-17 2012-09-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明システム用の光結合器
TWI545352B (zh) * 2006-02-17 2016-08-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
GB0617945D0 (en) 2006-09-12 2006-10-18 Ucl Business Plc Imaging apparatus and methods
DE102007007907A1 (de) 2007-02-14 2008-08-21 Carl Zeiss Smt Ag Verfahren zur Herstellung eines diffraktiven optischen Elements, nach einem derartigen Verfahren hergestelltes diffraktives optisches Element, Beleuchtungsoptik mit einem derartigen diffratkiven optischen Element, Mikrolithografie-Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik, Verfahren zum Herstellen eines mikroelektronischen Bauelements unter Verwendung einer derartigen Projektionsbelichtungsanlage sowie mit einem solchen Verfahren hergestelltes Bauelement
GB201006679D0 (en) 2010-04-21 2010-06-09 Ucl Business Plc Methods and apparatus to control acousto-optic deflectors
GB201106787D0 (en) 2011-04-20 2011-06-01 Ucl Business Plc Methods and apparatus to control acousto-optic deflectors
JP2014092730A (ja) * 2012-11-06 2014-05-19 Canon Inc 回折格子、それを用いた光学装置
JP2016018049A (ja) 2014-07-07 2016-02-01 キヤノン株式会社 可変形状ミラー及びその製造方法
US10274651B1 (en) * 2018-01-19 2019-04-30 Facebook Technologies, Llc Manufacturing three-dimensional diffraction gratings by selective deposition or selective etching
EP3762778A4 (de) * 2018-03-06 2022-03-09 Applied Materials, Inc. Verfahren zur herstellung einer stapelstruktur eines dreidimensionalen optischen funktionsmaterials

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2139781B (en) * 1983-05-13 1986-09-10 American Telephone & Telegraph Mask structure for vacuum ultraviolet lithography
JP2742683B2 (ja) * 1986-08-08 1998-04-22 東洋通信機株式会社 透過型回折格子の製造方法
US4780175A (en) * 1986-10-27 1988-10-25 Sharp Kabushiki Kaisha Method for the production of an optical phase-shifting board
JP2703930B2 (ja) * 1988-06-29 1998-01-26 日本電気株式会社 複屈折回折格子型偏光子
US5162841A (en) * 1989-10-11 1992-11-10 Fuji Photo Film Co., Ltd. Exposure controlling apparatus
US5257132A (en) * 1990-09-25 1993-10-26 The United States Of America As Represented By The United States Department Of Energy Broadband diffractive lens or imaging element
FR2694131B1 (fr) * 1992-07-21 1996-09-27 Balzers Hochvakuum Procede et installation pour la fabrication d'un composant, notamment d'un composant optique, et composant optique ainsi obtenu.
JPH06324262A (ja) * 1993-05-11 1994-11-25 Olympus Optical Co Ltd 撮像光学系

Also Published As

Publication number Publication date
EP0921418B2 (de) 2008-10-22
EP0921418B1 (de) 2004-06-30
JPH11237503A (ja) 1999-08-31
EP0921418A3 (de) 1999-06-30
EP0921418A2 (de) 1999-06-09
US20020030890A1 (en) 2002-03-14

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Legal Events

Date Code Title Description
8332 No legal effect for de