GB2139781B - Mask structure for vacuum ultraviolet lithography - Google Patents

Mask structure for vacuum ultraviolet lithography

Info

Publication number
GB2139781B
GB2139781B GB08411765A GB8411765A GB2139781B GB 2139781 B GB2139781 B GB 2139781B GB 08411765 A GB08411765 A GB 08411765A GB 8411765 A GB8411765 A GB 8411765A GB 2139781 B GB2139781 B GB 2139781B
Authority
GB
United Kingdom
Prior art keywords
vacuum ultraviolet
mask structure
ultraviolet lithography
lithography
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08411765A
Other versions
GB8411765D0 (en
GB2139781A (en
Inventor
Harold Gene Craighead
Richard Edwin Howard
Lawrence David Jackel
Jonathan Curtis White
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of GB8411765D0 publication Critical patent/GB8411765D0/en
Publication of GB2139781A publication Critical patent/GB2139781A/en
Application granted granted Critical
Publication of GB2139781B publication Critical patent/GB2139781B/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
GB08411765A 1983-05-13 1984-05-09 Mask structure for vacuum ultraviolet lithography Expired GB2139781B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US49506483A 1983-05-13 1983-05-13

Publications (3)

Publication Number Publication Date
GB8411765D0 GB8411765D0 (en) 1984-06-13
GB2139781A GB2139781A (en) 1984-11-14
GB2139781B true GB2139781B (en) 1986-09-10

Family

ID=23967113

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08411765A Expired GB2139781B (en) 1983-05-13 1984-05-09 Mask structure for vacuum ultraviolet lithography

Country Status (6)

Country Link
JP (1) JPS59214856A (en)
DE (1) DE3417888A1 (en)
FR (1) FR2545949B1 (en)
GB (1) GB2139781B (en)
IT (1) IT1174089B (en)
NL (1) NL8401525A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2189903A (en) * 1986-04-01 1987-11-04 Plessey Co Plc An etch technique for metal mask definition
US4780175A (en) * 1986-10-27 1988-10-25 Sharp Kabushiki Kaisha Method for the production of an optical phase-shifting board
JPH02166447A (en) * 1988-12-20 1990-06-27 Fujitsu Ltd Mask for exposing and its production
JPH11237503A (en) * 1997-12-03 1999-08-31 Canon Inc Diffraction optical element and optical system having that
DE19808461A1 (en) 1998-03-02 1999-09-09 Zeiss Carl Fa Reticle with crystal carrier material

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2658623C2 (en) * 1976-12-23 1982-07-29 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Recording media and process for its manufacture

Also Published As

Publication number Publication date
FR2545949A1 (en) 1984-11-16
GB8411765D0 (en) 1984-06-13
IT8420877A1 (en) 1985-11-10
IT8420877A0 (en) 1984-05-10
NL8401525A (en) 1984-12-03
IT1174089B (en) 1987-07-01
JPS59214856A (en) 1984-12-04
GB2139781A (en) 1984-11-14
DE3417888A1 (en) 1984-11-15
FR2545949B1 (en) 1986-10-10

Similar Documents

Publication Publication Date Title
DE3365521D1 (en) X-ray lithographic mask
AU550809B2 (en) Lithographic mask
DE3478792D1 (en) Emergency mask
DE3270382D1 (en) Mask structure for x-ray lithography and method for manufacturing the same
GB8412698D0 (en) Electron lithography apparatus
GB2142159B (en) Correction of lithographic masks
DE3479965D1 (en) Emergency mask
DE3563125D1 (en) Adaptive x-ray lithography mask
GB8309539D0 (en) Making photographic mask
GB2152704B (en) Mask ring assembly for x-ray lithography
GB2128365B (en) Photomask
EP0109193A3 (en) X-ray lithographic system
DE3472496D1 (en) Electron lithography apparatus
EP0127919A3 (en) Electron lithography mask manufacture
IL88837A0 (en) Method for the preparation of mask for x-ray lithography
GB2125614B (en) Apparatus for electron beam lithography
GB2134319B (en) Shadow mask
GB2139781B (en) Mask structure for vacuum ultraviolet lithography
EP0103844A3 (en) X-ray mask
DE3173827D1 (en) Dot-enlargement process for photopolymer litho masks
EP0408349A3 (en) Mask for lithography
GB2180351B (en) Capacitive mask aligner
KR820000799Y1 (en) Mask for preventing dust
KR870000197Y1 (en) Mask for gasproof
IL94875A0 (en) Method for the preparation of mask for ion-beam lithography

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19920509