DE69819027T2 - 3D Inspektion elektronischer Pins mit einem optischen Element, welches auf der Oberseite einer transparenten Markenplatte angeordnet ist - Google Patents

3D Inspektion elektronischer Pins mit einem optischen Element, welches auf der Oberseite einer transparenten Markenplatte angeordnet ist Download PDF

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Publication number
DE69819027T2
DE69819027T2 DE69819027T DE69819027T DE69819027T2 DE 69819027 T2 DE69819027 T2 DE 69819027T2 DE 69819027 T DE69819027 T DE 69819027T DE 69819027 T DE69819027 T DE 69819027T DE 69819027 T2 DE69819027 T2 DE 69819027T2
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view
values
image
camera
transparent reticle
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Expired - Fee Related
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DE69819027T
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German (de)
English (en)
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DE69819027D1 (de
Inventor
M. Elwin BEATY
P. David MORK
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Beaty Elwin M Minnetonka
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Beaty Elwin M Minnetonka
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Publication of DE69819027T2 publication Critical patent/DE69819027T2/de
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Expired - Fee Related legal-status Critical Current

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    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • G06T7/0006Industrial image inspection using a design-rule based approach
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/60Analysis of geometric attributes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/08Monitoring manufacture of assemblages
    • H05K13/081Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines
    • H05K13/0818Setup of monitoring devices prior to starting mounting operations; Teaching of monitoring devices for specific products; Compensation of drifts during operation, e.g. due to temperature shifts
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Quality & Reliability (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Geometry (AREA)
  • Operations Research (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
DE69819027T 1997-05-05 1998-05-04 3D Inspektion elektronischer Pins mit einem optischen Element, welches auf der Oberseite einer transparenten Markenplatte angeordnet ist Expired - Fee Related DE69819027T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US850473 1997-05-05
US08/850,473 US6055054A (en) 1997-05-05 1997-05-05 Three dimensional inspection system
PCT/US1998/008950 WO1998050757A2 (en) 1997-05-05 1998-05-04 Three dimensional inspection system

Publications (2)

Publication Number Publication Date
DE69819027D1 DE69819027D1 (de) 2003-11-20
DE69819027T2 true DE69819027T2 (de) 2004-05-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
DE69819027T Expired - Fee Related DE69819027T2 (de) 1997-05-05 1998-05-04 3D Inspektion elektronischer Pins mit einem optischen Element, welches auf der Oberseite einer transparenten Markenplatte angeordnet ist

Country Status (6)

Country Link
US (1) US6055054A (enExample)
EP (1) EP1017962B1 (enExample)
JP (2) JP2002515124A (enExample)
KR (1) KR20010012293A (enExample)
DE (1) DE69819027T2 (enExample)
WO (1) WO1998050757A2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5909285A (en) * 1997-05-05 1999-06-01 Beaty; Elwin M. Three dimensional inspection system
JPH1137731A (ja) * 1997-07-24 1999-02-12 Sumitomo Kinzoku Erekutorodebaisu:Kk 画像取込みシステム
US6072898A (en) 1998-01-16 2000-06-06 Beaty; Elwin M. Method and apparatus for three dimensional inspection of electronic components
US6915006B2 (en) * 1998-01-16 2005-07-05 Elwin M. Beaty Method and apparatus for three dimensional inspection of electronic components
US6915007B2 (en) 1998-01-16 2005-07-05 Elwin M. Beaty Method and apparatus for three dimensional inspection of electronic components
AU5925300A (en) * 1999-07-10 2001-01-30 Tay Bok Her Post-seal inspection system and method
JP2003504607A (ja) * 1999-07-13 2003-02-04 ビーティ エルウィン エム 電子部品の三次元検査装置及び方法
US6445518B1 (en) * 2000-11-28 2002-09-03 Semiconductor Technologies & Instruments, Inc. Three dimensional lead inspection system
EP1220596A1 (en) 2000-12-29 2002-07-03 Icos Vision Systems N.V. A method and an apparatus for measuring positions of contact elements of an electronic component
US6547409B2 (en) * 2001-01-12 2003-04-15 Electroglas, Inc. Method and apparatus for illuminating projecting features on the surface of a semiconductor wafer
US7206080B2 (en) * 2001-07-30 2007-04-17 Topcon Corporation Surface shape measurement apparatus, surface shape measurement method, surface state graphic apparatus
AU2002356548A1 (en) * 2001-10-09 2003-04-22 Dimensional Photonics, Inc. Device for imaging a three-dimensional object
WO2004049267A1 (de) * 2002-11-23 2004-06-10 Odas Gmbh Verfahren zur fotografischen aufnahme eines zylinderförmigen, insbesondere plattenförmigen gegenstandes
US7340085B2 (en) * 2003-09-03 2008-03-04 Microview Technologies Pte Ltd. Rotating prism component inspection system
SG138491A1 (en) * 2006-06-21 2008-01-28 Generic Power Pte Ltd Method and apparatus for 3-dimensional vision and inspection of ball and like protrusions of electronic components
KR101380653B1 (ko) * 2008-06-12 2014-04-04 한미반도체 주식회사 비전검사장비의 비전검사방법
CN102012607B (zh) * 2010-09-29 2011-12-28 卓盈微电子(昆山)有限公司 对柔性线路板成像的装置
JP5854680B2 (ja) * 2011-07-25 2016-02-09 キヤノン株式会社 撮像装置
FR3004571B1 (fr) * 2013-04-11 2015-04-10 Vit Procede de correction d'une image tridimensionnelle d'un circuit electronique
JP2018516371A (ja) * 2015-06-05 2018-06-21 ケーエルエー−テンカー コーポレイション 半導体デバイスの少なくとも側面の検査装置、方法及びコンピュータプログラム製品
EP3341712B1 (en) 2015-08-26 2024-04-03 ABB Schweiz AG Object multi-perspective inspection apparatus and method therefor
CN105588841A (zh) * 2016-01-28 2016-05-18 浙江工业大学 基于机器视觉的针脚倾斜缺陷检测装置
JP7194055B2 (ja) * 2019-03-22 2022-12-21 日立Astemo株式会社 接合部の検査方法及び接合部の検査装置
CN112985275B (zh) * 2021-05-14 2021-08-20 苏州鼎纳自动化技术有限公司 一种产品内壁尺寸检测机构

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU553069B2 (en) * 1981-07-17 1986-07-03 W.R. Grace & Co.-Conn. Radial scan, pulsed light article inspection ccv system 0
US4731855A (en) * 1984-04-06 1988-03-15 Hitachi, Ltd. Pattern defect inspection apparatus
US4825394A (en) * 1985-05-07 1989-04-25 General Dynamics Corporation Vision metrology system
NL8501665A (nl) * 1985-06-10 1987-01-02 Philips Nv Optische aftasteenheid met positie- en standdetektiestelsel voor een elektromagnetisch gelagerd objektief.
JPS61293657A (ja) * 1985-06-21 1986-12-24 Matsushita Electric Works Ltd 半田付け外観検査方法
GB8622976D0 (en) * 1986-09-24 1986-10-29 Trialsite Ltd Scanning electron microscopes
US4886958A (en) * 1988-03-25 1989-12-12 Texas Instruments Incorporated Autofocus system for scanning laser inspector or writer
US5095447A (en) * 1988-03-25 1992-03-10 Texas Instruments Incorporated Color overlay of scanned and reference images for display
EP0687901B1 (en) * 1988-05-09 2003-08-13 Omron Corporation Apparatus for and method of displaying results of printed circuit board inspection
US5176796A (en) * 1988-12-13 1993-01-05 Jujo Paper Co., Ltd. Avoiding pitch troubles using acylgerol lipase
US5113581A (en) * 1989-12-19 1992-05-19 Matsushita Electric Industrial Co., Ltd. Outer lead bonding head and method of bonding outer lead
US5058178A (en) * 1989-12-21 1991-10-15 At&T Bell Laboratories Method and apparatus for inspection of specular, three-dimensional features
JPH03203399A (ja) * 1989-12-29 1991-09-05 Matsushita Electric Ind Co Ltd 部品装着装置
DE4003983C1 (en) * 1990-02-09 1991-08-29 Abos Automation, Bildverarbeitung, Optische Systeme Gmbh, 8057 Eching, De Automated monitoring of space=shape data for mfg. semiconductors - compares image signals for defined illumination angle range with master signals, to determine defects
US4959898A (en) * 1990-05-22 1990-10-02 Emhart Industries, Inc. Surface mount machine with lead coplanarity verifier
DE4032327A1 (de) * 1990-10-11 1992-04-16 Abos Automation Bildverarbeitu Verfahren und vorrichtung zur automatisierten ueberwachung der herstellung von halbleiterbauteilen
US5420691A (en) * 1991-03-15 1995-05-30 Matsushita Electric Industrial Co., Ltd. Electric component observation system
US5173796A (en) * 1991-05-20 1992-12-22 Palm Steven G Three dimensional scanning system
US5133601A (en) * 1991-06-12 1992-07-28 Wyko Corporation Rough surface profiler and method
US5204734A (en) * 1991-06-12 1993-04-20 Wyko Corporation Rough surface profiler and method
US5563702A (en) * 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
JPH05312549A (ja) * 1992-02-06 1993-11-22 Hitachi Ltd パターン検出方法及びその装置
US5818061A (en) * 1992-06-24 1998-10-06 Robotic Vision Systems, Inc. Apparatus and method for obtaining three-dimensional data from objects in a contiguous array
US5600150A (en) * 1992-06-24 1997-02-04 Robotic Vision Systems, Inc. Method for obtaining three-dimensional data from semiconductor devices in a row/column array and control of manufacturing of same with data to eliminate manufacturing errors
US5420689A (en) * 1993-03-01 1995-05-30 Siu; Bernard High speed illumination system for microelectronics inspection
US5307149A (en) * 1992-08-14 1994-04-26 Elwin M. Beaty Method and apparatus for zero force part placement
US5452080A (en) * 1993-06-04 1995-09-19 Sony Corporation Image inspection apparatus and method
DE69322775T2 (de) * 1993-08-12 1999-07-22 International Business Machines Corp., Armonk, N.Y. Verfahren zur Inspektion vom Verbindungskugel-Satz eines intergrierten Schaltungsmoduls
US5652658A (en) * 1993-10-19 1997-07-29 View Engineering, Inc. Grid array inspection system and method
US5648853A (en) * 1993-12-09 1997-07-15 Robotic Vision Systems, Inc. System for inspecting pin grid arrays
CA2113752C (en) * 1994-01-19 1999-03-02 Stephen Michael Rooks Inspection system for cross-sectional imaging
JPH07253311A (ja) * 1994-03-15 1995-10-03 Fujitsu Ltd パターン検査装置の較正方法、パターン検査方法、パターン位置決定方法、および半導体装置の製造方法
US5581632A (en) * 1994-05-02 1996-12-03 Cognex Corporation Method and apparatus for ball bond inspection system
US5550763A (en) * 1994-05-02 1996-08-27 Michael; David J. Using cone shaped search models to locate ball bonds on wire bonded devices
US5546189A (en) * 1994-05-19 1996-08-13 View Engineering, Inc. Triangulation-based 3D imaging and processing method and system
US5513276A (en) * 1994-06-02 1996-04-30 The Board Of Regents Of The University Of Oklahoma Apparatus and method for three-dimensional perspective imaging of objects
US5465152A (en) * 1994-06-03 1995-11-07 Robotic Vision Systems, Inc. Method for coplanarity inspection of package or substrate warpage for ball grid arrays, column arrays, and similar structures
US5563703A (en) * 1994-06-20 1996-10-08 Motorola, Inc. Lead coplanarity inspection apparatus and method thereof
JP3235008B2 (ja) * 1994-07-16 2001-12-04 株式会社新川 ワイヤボンデイング部のボール検出方法及び検出装置
US5574668A (en) * 1995-02-22 1996-11-12 Beaty; Elwin M. Apparatus and method for measuring ball grid arrays
US5621530A (en) * 1995-04-26 1997-04-15 Texas Instruments Incorporated Apparatus and method for verifying the coplanarity of a ball grid array
US5617209A (en) * 1995-04-27 1997-04-01 View Engineering, Inc. Method and system for triangulation-based, 3-D imaging utilizing an angled scaning beam of radiant energy
US5801966A (en) * 1995-07-24 1998-09-01 Cognex Corporation Machine vision methods and articles of manufacture for determination of convex hull and convex hull angle
US5859924A (en) * 1996-07-12 1999-01-12 Robotic Vision Systems, Inc. Method and system for measuring object features
US5734475A (en) * 1996-10-15 1998-03-31 Ceridian Corporation Process of measuring coplanarity of circuit pads and/or grid arrays
US5828449A (en) * 1997-02-26 1998-10-27 Acuity Imaging, Llc Ring illumination reflective elements on a generally planar surface
US5859698A (en) * 1997-05-07 1999-01-12 Nikon Corporation Method and apparatus for macro defect detection using scattered light

Also Published As

Publication number Publication date
KR20010012293A (ko) 2001-02-15
US6055054A (en) 2000-04-25
JP4901903B2 (ja) 2012-03-21
JP2002515124A (ja) 2002-05-21
EP1017962A2 (en) 2000-07-12
EP1017962B1 (en) 2003-10-15
JP2009156877A (ja) 2009-07-16
WO1998050757A3 (en) 2002-01-03
WO1998050757A2 (en) 1998-11-12
EP1017962A4 (en) 2000-07-26
DE69819027D1 (de) 2003-11-20

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8339 Ceased/non-payment of the annual fee