DE69806666D1 - Abstandsbelichtungsvorrichtung mit Vorrichtung zur Einstellung des Abstandes - Google Patents

Abstandsbelichtungsvorrichtung mit Vorrichtung zur Einstellung des Abstandes

Info

Publication number
DE69806666D1
DE69806666D1 DE69806666T DE69806666T DE69806666D1 DE 69806666 D1 DE69806666 D1 DE 69806666D1 DE 69806666 T DE69806666 T DE 69806666T DE 69806666 T DE69806666 T DE 69806666T DE 69806666 D1 DE69806666 D1 DE 69806666D1
Authority
DE
Germany
Prior art keywords
distance
adjusting
exposure device
exposure
distance exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69806666T
Other languages
English (en)
Other versions
DE69806666T2 (de
Inventor
Shinji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE69806666D1 publication Critical patent/DE69806666D1/de
Application granted granted Critical
Publication of DE69806666T2 publication Critical patent/DE69806666T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Optical Distance (AREA)
  • Optical Radar Systems And Details Thereof (AREA)
DE69806666T 1997-03-27 1998-03-26 Abstandsbelichtungsvorrichtung mit Vorrichtung zur Einstellung des Abstandes Expired - Fee Related DE69806666T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07556497A JP3296239B2 (ja) 1997-03-27 1997-03-27 間隙設定機構を備えたプロキシミティ露光装置

Publications (2)

Publication Number Publication Date
DE69806666D1 true DE69806666D1 (de) 2002-08-29
DE69806666T2 DE69806666T2 (de) 2003-02-13

Family

ID=13579812

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69806666T Expired - Fee Related DE69806666T2 (de) 1997-03-27 1998-03-26 Abstandsbelichtungsvorrichtung mit Vorrichtung zur Einstellung des Abstandes

Country Status (6)

Country Link
US (1) US5999245A (de)
EP (1) EP0867775B1 (de)
JP (1) JP3296239B2 (de)
KR (1) KR100505088B1 (de)
DE (1) DE69806666T2 (de)
TW (1) TW391035B (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3301387B2 (ja) 1998-07-09 2002-07-15 ウシオ電機株式会社 プロキシミティ露光におけるマスクとワークのギャップ制御方法およびプロキシミティ露光装置
JP3540174B2 (ja) * 1998-10-12 2004-07-07 ウシオ電機株式会社 斜めから光を照射するプロキシミティ露光方法
KR100474590B1 (ko) * 1998-12-31 2005-05-24 주식회사 하이닉스반도체 리소그래피정렬오차보정방법
JP3678120B2 (ja) * 2000-06-06 2005-08-03 ウシオ電機株式会社 偏光光照射装置
EP2264522A3 (de) * 2000-07-16 2011-12-14 The Board of Regents of The University of Texas System Verfahren zur Bildung einer Struktur auf einem Substrat
EP2270592B1 (de) 2000-07-17 2015-09-02 Board of Regents, The University of Texas System Verfahren zur Bildung einer Struktur auf einem Substrat
JP2004505273A (ja) * 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
KR100453906B1 (ko) * 2002-05-02 2004-10-20 아남반도체 주식회사 반도체 소자 제조용 노광 장치 및 방법
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
JP2004110473A (ja) 2002-09-19 2004-04-08 Hitachi Ltd 車両用ドライブレコーダ
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
TW200500811A (en) * 2002-12-13 2005-01-01 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
US7333217B2 (en) * 2002-12-20 2008-02-19 Yamatake Corporation System and method for detecting and correcting position deviations of an object having a curved surface
WO2004059245A1 (en) * 2002-12-20 2004-07-15 Yamatake Corporation System and method for detecting and correcting position deviations of an object having a curved surface
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US7906180B2 (en) 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
JP4573873B2 (ja) * 2004-06-03 2010-11-04 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム マイクロリソグラフィにおけるアラインメントとオーバーレイを改善するシステムおよび方法
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US7785526B2 (en) 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US7292326B2 (en) 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
WO2007117524A2 (en) 2006-04-03 2007-10-18 Molecular Imprints, Inc. Method of concurrently patterning a substrate having a plurality of fields and alignment marks
JP5027468B2 (ja) * 2006-09-15 2012-09-19 日本ミクロコーティング株式会社 プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法
JP5097517B2 (ja) * 2007-11-30 2012-12-12 Ｈｏｙａ株式会社 プロキシミティ露光用フォトマスクの検査装置、プロキシミティ露光用フォトマスクの検査方法、プロキシミティ露光用フォトマスクの製造方法及びパターン転写方法
KR101941547B1 (ko) * 2012-01-06 2019-04-15 삼성디스플레이 주식회사 광 배향 방법, 이를 수행하기 위한 노광 장치 및 액정 표시 패널
JP6268798B2 (ja) * 2013-08-05 2018-01-31 セイコーエプソン株式会社 照明装置及びプロジェクター
US11141863B2 (en) * 2018-10-11 2021-10-12 Pixart Imaging Inc. Cleaning robot capable of detecting 2D depth information and operating method thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4932781A (en) * 1983-11-04 1990-06-12 Canon Kabushiki Kaisha Gap measuring apparatus using interference fringes of reflected light
US5155370A (en) * 1988-09-09 1992-10-13 Canon Kabushiki Kaisha Device for detecting the relative position of first and second objects
DE68929314T2 (de) * 1988-09-09 2002-05-02 Canon Kk Vorrichtung zur Detektion der Positionsrelation zwischen zwei Objekten
US5151754A (en) * 1989-10-06 1992-09-29 Kabushiki Kaisha Toshiba Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects
DE4010880C1 (de) * 1990-04-04 1991-05-02 Karl Suess Kg Praezisionsgeraete Fuer Wissenschaft Und Industrie - Gmbh & Co, 8046 Garching, De
US5495336A (en) * 1992-02-04 1996-02-27 Canon Kabushiki Kaisha Position detecting method for detecting a positional relationship between a first object and a second object
JP2828544B2 (ja) * 1992-06-22 1998-11-25 大日本スクリーン製造株式会社 近接露光装置のギャップセンサ
JPH0661115A (ja) * 1992-08-07 1994-03-04 Hitachi Ltd ギャップ検出設定装置
US5306902A (en) * 1992-09-01 1994-04-26 International Business Machines Corporation Confocal method and apparatus for focusing in projection lithography
JPH06151271A (ja) * 1992-11-16 1994-05-31 Toshiba Corp 露光装置
US5777722A (en) * 1994-04-28 1998-07-07 Nikon Corporation Scanning exposure apparatus and method
US5883701A (en) * 1995-09-21 1999-03-16 Canon Kabushiki Kaisha Scanning projection exposure method and apparatus

Also Published As

Publication number Publication date
JPH10268525A (ja) 1998-10-09
JP3296239B2 (ja) 2002-06-24
US5999245A (en) 1999-12-07
TW391035B (en) 2000-05-21
EP0867775A2 (de) 1998-09-30
EP0867775B1 (de) 2002-07-24
KR100505088B1 (ko) 2005-11-08
KR19980080744A (ko) 1998-11-25
EP0867775A3 (de) 2000-08-02
DE69806666T2 (de) 2003-02-13

Similar Documents

Publication Publication Date Title
DE69806666D1 (de) Abstandsbelichtungsvorrichtung mit Vorrichtung zur Einstellung des Abstandes
DE69835300D1 (de) Vorrichtung zur inhalation
DE69735860D1 (de) Vorrichtung zur Lichtregelung
DE69824612D1 (de) Gesichtsmaske mit herabziehbarer vorrichtung
DE69933257D1 (de) Lithographische Vorrichtung
DE69940014D1 (de) Vorrichtung zur verhinderung von autodiebstahl
DE19847106C8 (de) Vorrichtung zur Regelung des Fahrzeugniveaus
DE69615722D1 (de) Vorrichtung zur Korrektur des Kontrastes
DE59509949D1 (de) Vorrichtung zur strahlteilung
DE69723878D1 (de) Vorrichtung zur positionsbestmmung
DE59508039D1 (de) Vorrichtung zur längsverstellung
DE69614253D1 (de) Vorrichtung zur zielerfassung
DE69802008D1 (de) Vorrichtung zur kristallziehung
DE69510969D1 (de) Vorrichtung zur Vergrösserung des Signal-Rauschverhältnisses
DE69922185D1 (de) Vorrichtung zur strahlsteuerung
DE69118551D1 (de) Vorrichtung zur verhinderung des peitschentrieb-effekts
DE29705610U1 (de) Vorrichtung zur Bedienung elektronisch steuerbarer Geräte
DE69534380D1 (de) Vorrichtung zur Bewegungsbestimmung
DE29807777U1 (de) Vorrichtung zur mechanischen Unkrautbekämpfung
DE59706781D1 (de) Vorrichtung zur unterbrechung der kraftstoffversorgung
DE29619277U1 (de) Vorrichtung zur Gerätebedienung
DE59407690D1 (de) Vorrichtung zur änderung der pedalarmlänge
DE60024420D1 (de) Vorrichtung zur verhinderung des peitschentriebeffektes
DE29818391U1 (de) Vorrichtung zur Markierung
DE29710894U1 (de) Vorrichtung zur Verteilung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee