DE69723503D1 - Ultrafeines Partikel, Verfahren seiner Herstellung, Herstellung von Formkörper aus diesen Partikeln und Fullerenes und deren Herstellungsverfahren - Google Patents

Ultrafeines Partikel, Verfahren seiner Herstellung, Herstellung von Formkörper aus diesen Partikeln und Fullerenes und deren Herstellungsverfahren

Info

Publication number
DE69723503D1
DE69723503D1 DE69723503T DE69723503T DE69723503D1 DE 69723503 D1 DE69723503 D1 DE 69723503D1 DE 69723503 T DE69723503 T DE 69723503T DE 69723503 T DE69723503 T DE 69723503T DE 69723503 D1 DE69723503 D1 DE 69723503D1
Authority
DE
Germany
Prior art keywords
production
fullerenes
moldings
particles
ultrafine particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69723503T
Other languages
English (en)
Other versions
DE69723503T2 (de
Inventor
Shun-Ichiro Tanaka
Bingshe Xu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Toshiba Corp
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12664496A external-priority patent/JP3426083B2/ja
Priority claimed from JP12664296A external-priority patent/JP3373357B2/ja
Priority claimed from JP12664396A external-priority patent/JP3445059B2/ja
Application filed by Toshiba Corp, Research Development Corp of Japan filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69723503D1 publication Critical patent/DE69723503D1/de
Publication of DE69723503T2 publication Critical patent/DE69723503T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/081—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing particle radiation or gamma-radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/121—Coherent waves, e.g. laser beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B22F1/054—Nanosized particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/06—Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/152—Fullerenes
    • C01B32/154—Preparation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Carbon And Carbon Compounds (AREA)
DE69723503T 1996-05-22 1997-05-22 Ultrafeines Partikel, Verfahren seiner Herstellung, Herstellung von Formkörper aus diesen Partikeln und Fullerenes und deren Herstellungsverfahren Expired - Lifetime DE69723503T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP12664496 1996-05-22
JP12664296 1996-05-22
JP12664396 1996-05-22
JP12664496A JP3426083B2 (ja) 1996-05-22 1996-05-22 金属超微粒子融合体の製造方法と金属超薄膜の製造方法
JP12664296A JP3373357B2 (ja) 1996-05-22 1996-05-22 超微粒子およびその製造方法
JP12664396A JP3445059B2 (ja) 1996-05-22 1996-05-22 巨大フラーレンの製造方法および膜状巨大フラーレン構造体

Publications (2)

Publication Number Publication Date
DE69723503D1 true DE69723503D1 (de) 2003-08-21
DE69723503T2 DE69723503T2 (de) 2004-06-09

Family

ID=27315372

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69723503T Expired - Lifetime DE69723503T2 (de) 1996-05-22 1997-05-22 Ultrafeines Partikel, Verfahren seiner Herstellung, Herstellung von Formkörper aus diesen Partikeln und Fullerenes und deren Herstellungsverfahren

Country Status (3)

Country Link
US (1) US6017630A (de)
EP (1) EP0808682B1 (de)
DE (1) DE69723503T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3464103B2 (ja) * 1996-09-26 2003-11-05 科学技術振興事業団 超微細構造体の製造方法
JPH10265207A (ja) * 1997-03-24 1998-10-06 Kagaku Gijutsu Shinko Jigyodan フラーレン含有構造体およびその製造方法
TW385544B (en) * 1998-03-02 2000-03-21 Samsung Electronics Co Ltd Apparatus for manufacturing semiconductor device, and method of manufacturing capacitor of semiconductor device thereby
JP3411497B2 (ja) * 1998-03-25 2003-06-03 科学技術振興事業団 Ｗ超微粒子とその製造方法、およびｗナノ結晶薄膜
CA2312140A1 (en) * 1999-06-25 2000-12-25 Matthias Ramm Charge separation type heterojunction structure and manufacturing method therefor
JP3936197B2 (ja) 2000-04-14 2007-06-27 シーゲイト テクノロジー エルエルシー 磁性材料用極薄保護被覆
JP2004503388A (ja) 2000-06-01 2004-02-05 シーゲイト　テクノロジー　エルエルシー 超薄保護オーバコーティングの生成方法
AU2001265215A1 (en) 2000-06-02 2001-12-17 Seagate Technology Llc Process for production of ultrathin protective overcoats
EP1333935A4 (de) * 2000-10-17 2008-04-02 Nanogram Corp Herstellung eines überzugs durch reaktive abscheidung
US6751019B2 (en) * 2001-06-11 2004-06-15 Scram Technologies, Inc. Ultrathin mesh optical panel and a method of making an ultrathin mesh optical panel
JP2004045238A (ja) * 2002-07-12 2004-02-12 Japan Science & Technology Corp フラーレン類の分子回転速度測定方法
CN1922338B (zh) * 2004-02-27 2010-05-05 独立行政法人科学技术振兴机构 碳系薄膜及其制造方法、以及使用该薄膜的构件
US9306167B2 (en) * 2012-01-19 2016-04-05 Technion Research & Development Foundation Limited Field emission device and method of fabricating the same
US10920035B2 (en) 2017-03-16 2021-02-16 Lyten, Inc. Tuning deformation hysteresis in tires using graphene
WO2018169889A1 (en) 2017-03-16 2018-09-20 Lyten, Inc. Carbon and elastomer integration
US9862606B1 (en) 2017-03-27 2018-01-09 Lyten, Inc. Carbon allotropes

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
DE3437657A1 (de) * 1984-10-13 1986-04-17 Basf Ag, 6700 Ludwigshafen Irreversibles optisches medium zur informationsspeicherung und verfahren zu dessen herstellung
JPS6254005A (ja) * 1985-09-02 1987-03-09 Hitachi Ltd 超微粒子の製造方法
US4735877A (en) * 1985-10-07 1988-04-05 Canon Kabushiki Kaisha Lithographic mask structure and lithographic process
JPS63227766A (ja) * 1986-10-27 1988-09-22 Hitachi Ltd 超微粒子膜の形成方法
US5168097A (en) * 1986-10-27 1992-12-01 Hitachi, Ltd. Laser deposition process for forming an ultrafine-particle film
JP2650930B2 (ja) * 1987-11-24 1997-09-10 株式会社日立製作所 超格子構作の素子製作方法
US4985273A (en) * 1988-06-07 1991-01-15 Matsushita Electric Industrial Co., Ltd. Method of producing fine inorganic particles
SE462352B (sv) * 1988-10-25 1990-06-11 Optisk Forskning Inst Vaagledare samt foerfarande foer framstaellning av saadan
JPH02199444A (ja) * 1989-01-30 1990-08-07 Matsushita Electric Ind Co Ltd 透過型スクリーンとその製造方法とそれを用いた透過型プロジェクションテレビ
JPH0823645B2 (ja) * 1989-11-24 1996-03-06 松下電器産業株式会社 非線形光学薄膜及びその製造方法
DE4000690A1 (de) * 1990-01-12 1991-07-18 Philips Patentverwaltung Verfahren zum herstellen von ultrafeinen partikeln und deren verwendung
US5253258A (en) * 1991-10-17 1993-10-12 Intellectual Property Development Associates Of Connecticut, Inc. Optically encoded phase matched second harmonic generation device and self frequency doubling laser material using semiconductor microcrystallite doped glasses
JPH05255842A (ja) * 1992-03-11 1993-10-05 Matsushita Electric Ind Co Ltd レーザ・スパッタリング装置
US5850089A (en) * 1992-03-13 1998-12-15 American Research Corporation Of Virginia Modulated-structure of PZT/PT ferroelectric thin films for non-volatile random access memories
US5320882A (en) * 1992-04-22 1994-06-14 General Electric Company Laser ablative particulate composite
JP3047656B2 (ja) * 1993-01-12 2000-05-29 株式会社村田製作所 ＩｎＳｂ薄膜の製造方法
US5660746A (en) * 1994-10-24 1997-08-26 University Of South Florida Dual-laser process for film deposition
US5683601A (en) * 1994-10-24 1997-11-04 Panasonic Technologies, Inc. Laser ablation forward metal deposition with electrostatic assisted bonding
US5585020A (en) * 1994-11-03 1996-12-17 Becker; Michael F. Process for the production of nanoparticles
JP3402821B2 (ja) * 1995-02-09 2003-05-06 科学技術振興事業団 超微粒子の製造方法と超微粒子配向成長体の製造方法

Also Published As

Publication number Publication date
US6017630A (en) 2000-01-25
DE69723503T2 (de) 2004-06-09
EP0808682B1 (de) 2003-07-16
EP0808682A2 (de) 1997-11-26
EP0808682A3 (de) 2000-03-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: JAPAN SCIENCE AND TECHNOLOGY AGENCY, KAWAGUCHI, JP

Owner name: KABUSHIKI KAISHA TOSHIBA, TOKIO/TOKYO, JP

8328 Change in the person/name/address of the agent

Representative=s name: MARKS & CLERK (LUXEMBOURG) LLP, LUXEMBOURG, LU

8327 Change in the person/name/address of the patent owner

Owner name: JAPAN SCIENCE AND TECHNOLOGY AGENCY, KAWAGUCHI, JP