DE69707671D1 - Kurzwelliger gepulster laserabtaster - Google Patents
Kurzwelliger gepulster laserabtasterInfo
- Publication number
- DE69707671D1 DE69707671D1 DE69707671T DE69707671T DE69707671D1 DE 69707671 D1 DE69707671 D1 DE 69707671D1 DE 69707671 T DE69707671 T DE 69707671T DE 69707671 T DE69707671 T DE 69707671T DE 69707671 D1 DE69707671 D1 DE 69707671D1
- Authority
- DE
- Germany
- Prior art keywords
- pulse laser
- laser scanner
- shortwave
- shortwave pulse
- scanner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/40025—Circuits exciting or modulating particular heads for reproducing continuous tone value scales
- H04N1/40037—Circuits exciting or modulating particular heads for reproducing continuous tone value scales the reproducing element being a laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
- B23K26/0821—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head using multifaceted mirrors, e.g. polygonal mirror
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/12—Scanning systems using multifaceted mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/769,169 US6037967A (en) | 1996-12-18 | 1996-12-18 | Short wavelength pulsed laser scanner |
PCT/US1997/022053 WO1998027450A1 (en) | 1996-12-18 | 1997-12-10 | Short wavelength pulsed laser scanner |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69707671D1 true DE69707671D1 (de) | 2001-11-29 |
DE69707671T2 DE69707671T2 (de) | 2002-08-01 |
Family
ID=25084671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69707671T Expired - Fee Related DE69707671T2 (de) | 1996-12-18 | 1997-12-10 | Kurzwelliger gepulster laserabtaster |
Country Status (7)
Country | Link |
---|---|
US (1) | US6037967A (de) |
EP (1) | EP0904559B1 (de) |
JP (1) | JP2000507003A (de) |
KR (1) | KR19990082646A (de) |
CA (1) | CA2244712A1 (de) |
DE (1) | DE69707671T2 (de) |
WO (1) | WO1998027450A1 (de) |
Families Citing this family (69)
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GB9802688D0 (en) * | 1998-02-06 | 1998-07-29 | Marconi Gec Ltd | Improvements in or relating to sound detection |
DE19829986C1 (de) * | 1998-07-04 | 2000-03-30 | Lis Laser Imaging Systems Gmbh | Verfahren zur Direktbelichtung von Leiterplattensubstraten |
WO2000011766A1 (en) | 1998-08-20 | 2000-03-02 | Orbotech Ltd. | Laser repetition rate multiplier |
IL133889A (en) | 2000-01-05 | 2007-03-08 | Orbotech Ltd | Pulse light pattern writer |
US6555781B2 (en) * | 1999-05-10 | 2003-04-29 | Nanyang Technological University | Ultrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation |
US6246706B1 (en) | 1999-05-27 | 2001-06-12 | Spectra Physics Lasers, Inc. | Laser writing method and apparatus |
SE516914C2 (sv) * | 1999-09-09 | 2002-03-19 | Micronic Laser Systems Ab | Metoder och rastrerare för högpresterande mönstergenerering |
JP2001255661A (ja) * | 2000-01-05 | 2001-09-21 | Orbotech Ltd | パルス光パターン書込み装置 |
US6552779B2 (en) * | 2000-05-25 | 2003-04-22 | Ball Semiconductor, Inc. | Flying image of a maskless exposure system |
US6560248B1 (en) | 2000-06-08 | 2003-05-06 | Mania Barco Nv | System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
US6625181B1 (en) * | 2000-10-23 | 2003-09-23 | U.C. Laser Ltd. | Method and apparatus for multi-beam laser machining |
US7062354B2 (en) | 2000-11-08 | 2006-06-13 | Orbotech Ltd. | Multi-layer printed circuit board fabrication system and method |
JP4514317B2 (ja) * | 2000-11-27 | 2010-07-28 | 株式会社ミツトヨ | 露光装置 |
US7453486B2 (en) * | 2000-12-13 | 2008-11-18 | Orbotech Ltd | Pulse light pattern writer |
WO2002057811A2 (en) * | 2000-12-15 | 2002-07-25 | Sloan-Kettering Institute For Cancer Research | Beam-steering of multi-chromatic light using acousto-optical deflectors and dispersion-compensatory optics |
AU2002219478A1 (en) * | 2001-01-04 | 2002-07-16 | Laser Imaging Systems Gmbh And Co. Kg | Direct pattern writer |
US6689985B2 (en) | 2001-01-17 | 2004-02-10 | Orbotech, Ltd. | Laser drill for use in electrical circuit fabrication |
US6680213B2 (en) | 2001-04-02 | 2004-01-20 | Micron Technology, Inc. | Method and system for fabricating contacts on semiconductor components |
US6472239B2 (en) * | 2001-04-02 | 2002-10-29 | Micron Technology, Inc. | Method for fabricating semiconductor components |
US6532097B1 (en) | 2001-10-11 | 2003-03-11 | Applied Materials, Inc. | Image registration apparatus having an adjustable reflective diffraction grating and method |
WO2003033199A1 (en) * | 2001-10-19 | 2003-04-24 | U.C. Laser Ltd. | Method for improved wafer alignment |
US6658315B2 (en) * | 2001-10-31 | 2003-12-02 | Ball Semiconductor, Inc. | Non-synchronous control of pulsed light |
NL1020709C2 (nl) * | 2002-05-29 | 2003-12-02 | Ind Automation Integrators I A | Van een AOD voorziene laserbewerkinrichting. |
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US7483196B2 (en) | 2003-09-23 | 2009-01-27 | Applied Materials, Inc. | Apparatus for multiple beam deflection and intensity stabilization |
KR101188356B1 (ko) * | 2003-12-02 | 2012-10-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 레이저 조사장치, 레이저 조사방법 및 반도체장치의제조방법 |
EP1553643A3 (de) * | 2003-12-26 | 2009-01-21 | Sel Semiconductor Energy Laboratory Co., Ltd. | Laserbestrahlungsmethode une Verfahren zur Herstellung einer kristallinen Halbleiter-Schicht |
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JP6349924B2 (ja) * | 2014-04-28 | 2018-07-04 | 株式会社ニコン | パターン描画装置 |
CN109343214B (zh) * | 2014-04-28 | 2021-05-18 | 株式会社尼康 | 图案描绘装置 |
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CN112091421B (zh) * | 2015-09-09 | 2022-12-23 | 伊雷克托科学工业股份有限公司 | 镭射处理设备、镭射处理工件的方法及相关配置 |
WO2018066286A1 (ja) * | 2016-10-04 | 2018-04-12 | 株式会社ニコン | ビーム走査装置およびパターン描画装置 |
JP6997566B2 (ja) * | 2017-09-14 | 2022-01-17 | 株式会社ディスコ | レーザー加工装置 |
KR102148929B1 (ko) * | 2017-11-24 | 2020-08-28 | 주식회사 이오테크닉스 | 4f 앵글제어 광학계를 포함하는 레이저 가공 장치 |
JP2018045254A (ja) * | 2017-12-11 | 2018-03-22 | 株式会社ニコン | パターン描画装置 |
KR102081199B1 (ko) * | 2018-02-13 | 2020-02-25 | 주식회사 이오테크닉스 | 4f 앵글제어 광학계를 포함하는 레이저 가공 시스템 |
JP6504293B2 (ja) * | 2018-03-23 | 2019-04-24 | 株式会社ニコン | パターン描画装置 |
JP6587026B2 (ja) * | 2018-10-30 | 2019-10-09 | 株式会社ニコン | パターン露光装置 |
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US5327338A (en) * | 1990-01-31 | 1994-07-05 | Etec Systems, Inc. | Scanning laser lithography system alignment apparatus |
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US5386221A (en) * | 1992-11-02 | 1995-01-31 | Etec Systems, Inc. | Laser pattern generation apparatus |
JPH06235944A (ja) * | 1993-02-08 | 1994-08-23 | Dainippon Screen Mfg Co Ltd | 光ビーム走査方法 |
JPH06302491A (ja) * | 1993-04-15 | 1994-10-28 | Nikon Corp | 露光量制御装置 |
US5311321A (en) * | 1993-04-22 | 1994-05-10 | Corporation For Laser Optics Research | Laser video imaging system with pulse backtrack and method |
EP0627643B1 (de) * | 1993-06-03 | 1999-05-06 | Hamamatsu Photonics K.K. | Optisches Laser-Abtastsystem mit Axikon |
US5673134A (en) * | 1994-07-15 | 1997-09-30 | Sony Corporation | Light exposure and illuminating apparatus |
-
1996
- 1996-12-18 US US08/769,169 patent/US6037967A/en not_active Expired - Lifetime
-
1997
- 1997-12-10 WO PCT/US1997/022053 patent/WO1998027450A1/en not_active Application Discontinuation
- 1997-12-10 DE DE69707671T patent/DE69707671T2/de not_active Expired - Fee Related
- 1997-12-10 CA CA002244712A patent/CA2244712A1/en not_active Abandoned
- 1997-12-10 KR KR1019980706388A patent/KR19990082646A/ko not_active Application Discontinuation
- 1997-12-10 EP EP97953077A patent/EP0904559B1/de not_active Expired - Lifetime
- 1997-12-10 JP JP10527749A patent/JP2000507003A/ja not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
JP2000507003A (ja) | 2000-06-06 |
EP0904559B1 (de) | 2001-10-24 |
US6037967A (en) | 2000-03-14 |
WO1998027450A1 (en) | 1998-06-25 |
CA2244712A1 (en) | 1998-06-25 |
EP0904559A1 (de) | 1999-03-31 |
DE69707671T2 (de) | 2002-08-01 |
KR19990082646A (ko) | 1999-11-25 |
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Owner name: APPLIED MATERIALS, INC., SANTA CLARA, CALIF., US |
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8339 | Ceased/non-payment of the annual fee |