DE69702291D1 - Beschichtungsvorrichtung - Google Patents

Beschichtungsvorrichtung

Info

Publication number
DE69702291D1
DE69702291D1 DE69702291T DE69702291T DE69702291D1 DE 69702291 D1 DE69702291 D1 DE 69702291D1 DE 69702291 T DE69702291 T DE 69702291T DE 69702291 T DE69702291 T DE 69702291T DE 69702291 D1 DE69702291 D1 DE 69702291D1
Authority
DE
Germany
Prior art keywords
coating device
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69702291T
Other languages
English (en)
Other versions
DE69702291T2 (de
Inventor
Takahiro Kitano
Katsuya Okumura
Shinichi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokyo Electron Ltd
Original Assignee
Toshiba Corp
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Electron Ltd filed Critical Toshiba Corp
Publication of DE69702291D1 publication Critical patent/DE69702291D1/de
Application granted granted Critical
Publication of DE69702291T2 publication Critical patent/DE69702291T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2499—Mixture condition maintaining or sensing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87652—With means to promote mixing or combining of plural fluids
    • Y10T137/8766—With selectively operated flow control means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87652—With means to promote mixing or combining of plural fluids
    • Y10T137/8766—With selectively operated flow control means
    • Y10T137/87668—Single actuator operates plural flow control means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87676—With flow control
    • Y10T137/87684—Valve in each inlet
DE1997602291 1996-12-25 1997-12-24 Beschichtungsvorrichtung Expired - Lifetime DE69702291T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP34607796 1996-12-25
JP27012697A JP3333121B2 (ja) 1996-12-25 1997-10-02 塗布装置

Publications (2)

Publication Number Publication Date
DE69702291D1 true DE69702291D1 (de) 2000-07-20
DE69702291T2 DE69702291T2 (de) 2001-02-08

Family

ID=26549074

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1997602291 Expired - Lifetime DE69702291T2 (de) 1996-12-25 1997-12-24 Beschichtungsvorrichtung

Country Status (7)

Country Link
US (1) US6059880A (de)
EP (1) EP0851302B1 (de)
JP (1) JP3333121B2 (de)
KR (1) KR100375037B1 (de)
DE (1) DE69702291T2 (de)
SG (1) SG75820A1 (de)
TW (1) TW414962B (de)

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JP3410342B2 (ja) * 1997-01-31 2003-05-26 東京エレクトロン株式会社 塗布装置
JP2000189880A (ja) * 1998-12-28 2000-07-11 Canon Inc 塗布方法および装置ならびにカラ―フィルタの製造方法
JP3697389B2 (ja) 1999-09-27 2005-09-21 株式会社東芝 液膜形成方法及び塗布膜形成方法
US7125584B2 (en) * 1999-09-27 2006-10-24 Kabushiki Kaisha Toshiba Method for forming a liquid film on a substrate
EP1124252A2 (de) * 2000-02-10 2001-08-16 Applied Materials, Inc. Verfahren und Vorrichtung zur Verarbeitung von Substraten
TWI228755B (en) * 2000-02-17 2005-03-01 Toshiba Corp Chemical liquid processing apparatus and the method thereof
JP2001230191A (ja) * 2000-02-18 2001-08-24 Tokyo Electron Ltd 処理液供給方法及び処理液供給装置
US7905653B2 (en) * 2001-07-31 2011-03-15 Mega Fluid Systems, Inc. Method and apparatus for blending process materials
JP2002239434A (ja) * 2001-02-14 2002-08-27 Tokyo Electron Ltd 塗布膜形成装置および塗布膜形成方法
JP3704054B2 (ja) * 2001-05-01 2005-10-05 東京エレクトロン株式会社 処理液の濃度を変更する方法及び処理液供給装置
KR100857972B1 (ko) * 2001-06-07 2008-09-10 도쿄엘렉트론가부시키가이샤 도포막 형성방법 및 도포막 형성장치
JP3869306B2 (ja) * 2001-08-28 2007-01-17 東京エレクトロン株式会社 現像処理方法および現像液塗布装置
US7041172B2 (en) * 2003-02-20 2006-05-09 Asml Holding N.V. Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems
JP3988676B2 (ja) * 2003-05-01 2007-10-10 セイコーエプソン株式会社 塗布装置、薄膜の形成方法、薄膜形成装置及び半導体装置の製造方法
TW569969U (en) * 2003-05-01 2004-01-01 Shi-Tsai Chen Airtight type pressure storage apparatus
US7152815B2 (en) * 2003-06-04 2006-12-26 Nordson Corporation Dispensing system, nozzle and method for independently dispensing and controlling liquid
US7078355B2 (en) * 2003-12-29 2006-07-18 Asml Holding N.V. Method and system of coating polymer solution on surface of a substrate
JP4554236B2 (ja) * 2004-03-08 2010-09-29 東京エレクトロン株式会社 液供給機構および液供給方法
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
US20060130767A1 (en) 2004-12-22 2006-06-22 Applied Materials, Inc. Purged vacuum chuck with proximity pins
JP4523517B2 (ja) * 2005-08-09 2010-08-11 東京エレクトロン株式会社 塗布処理装置および塗布処理方法、ならびにコンピュータ読み取可能な記憶媒体
JP4704228B2 (ja) * 2005-09-06 2011-06-15 東京応化工業株式会社 レジスト液供給装置及び当該レジスト液供給装置を得るための改造キット
JP4514224B2 (ja) * 2005-09-28 2010-07-28 東京エレクトロン株式会社 リンス処理方法、現像処理方法及び現像装置
JP4901191B2 (ja) * 2005-11-18 2012-03-21 東京応化工業株式会社 レジスト希釈システム
US20070187531A1 (en) * 2006-02-14 2007-08-16 The U.S. Of America As Represented By The Secretary Of The Navy Apparatus and method to amalgamate substances
JP5069550B2 (ja) * 2007-05-17 2012-11-07 大日本スクリーン製造株式会社 塗布装置
WO2010144439A2 (en) * 2009-06-10 2010-12-16 Advanced Technology Materials, Inc. Fluid processing systems and methods
MX2012005285A (es) * 2009-11-05 2012-08-03 J Lok Co Sistema de produccion de cartuchos de resina de varias velocidades.
JP4832576B2 (ja) * 2010-04-12 2011-12-07 東京エレクトロン株式会社 塗布処理装置
CN102294317A (zh) * 2010-06-28 2011-12-28 无锡华润上华半导体有限公司 光刻胶喷涂装置及方法
TWI623071B (zh) * 2010-11-25 2018-05-01 山田尖端科技股份有限公司 樹脂模塑裝置與樹脂模塑方法
CN102527574A (zh) * 2010-12-08 2012-07-04 无锡华润上华科技有限公司 光刻胶喷涂装置及其方法
EP3055123B1 (de) * 2013-10-11 2021-06-23 Transitions Optical, Inc. Rotationsbeschichter zum auftragen mehrerer beschichtungen auf einem optischen substrat
JP2015115486A (ja) * 2013-12-12 2015-06-22 東京エレクトロン株式会社 液供給装置
JP6362710B2 (ja) * 2014-05-15 2018-07-25 東京エレクトロン株式会社 フォトレジスト分注システムにおける増加した再循環及び濾過のための方法及び装置
JP7050140B1 (ja) * 2020-12-21 2022-04-07 株式会社デンソーテン 調合装置および調合方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3806037A (en) * 1972-12-01 1974-04-23 Hanson Equipment Co Selective fluid discharge system and control valve means therefor
US5254367A (en) * 1989-07-06 1993-10-19 Tokyo Electron Limited Coating method and apparatus
JPH04209520A (ja) * 1990-12-04 1992-07-30 Mitsubishi Electric Corp 回転塗布装置
US5407267A (en) * 1992-12-30 1995-04-18 Nordson Corporation Method and apparatus for forming and dispensing coating material containing multiple components
DE69428391T2 (de) * 1993-03-25 2002-07-04 Tokyo Electron Ltd Verfahren und Vorrichtung zur Beschichtung eines Filmes
JPH06348023A (ja) * 1993-06-03 1994-12-22 Nippon Kayaku Co Ltd 顔料を含むカラーフィルター用レジストの塗布方法
JP3659668B2 (ja) * 1994-08-25 2005-06-15 オリンパス株式会社 ぶれ補正機能テストモード付カメラ
US5478435A (en) * 1994-12-16 1995-12-26 National Semiconductor Corp. Point of use slurry dispensing system

Also Published As

Publication number Publication date
EP0851302B1 (de) 2000-06-14
JP3333121B2 (ja) 2002-10-07
KR19980064625A (ko) 1998-10-07
JPH10242045A (ja) 1998-09-11
KR100375037B1 (ko) 2003-05-09
TW414962B (en) 2000-12-11
US6059880A (en) 2000-05-09
EP0851302A1 (de) 1998-07-01
DE69702291T2 (de) 2001-02-08
SG75820A1 (en) 2000-10-24

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Legal Events

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