DE69629119T2 - Topf zum herstellen von silikaglas - Google Patents
Topf zum herstellen von silikaglas Download PDFInfo
- Publication number
- DE69629119T2 DE69629119T2 DE69629119T DE69629119T DE69629119T2 DE 69629119 T2 DE69629119 T2 DE 69629119T2 DE 69629119 T DE69629119 T DE 69629119T DE 69629119 T DE69629119 T DE 69629119T DE 69629119 T2 DE69629119 T2 DE 69629119T2
- Authority
- DE
- Germany
- Prior art keywords
- equal
- blank
- less
- homogeneity
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 36
- 239000011521 glass Substances 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 12
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 239000004071 soot Substances 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 claims description 3
- 239000004576 sand Substances 0.000 claims description 3
- 239000006229 carbon black Substances 0.000 claims 5
- 239000002689 soil Substances 0.000 claims 1
- 239000005350 fused silica glass Substances 0.000 description 12
- 239000012071 phase Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000001393 microlithography Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005286 illumination Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000011819 refractory material Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 206010040925 Skin striae Diseases 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S501/00—Compositions: ceramic
- Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/08—Quartz
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US360895P | 1995-09-12 | 1995-09-12 | |
| US3608P | 1995-09-12 | ||
| PCT/US1996/014428 WO1997010183A1 (en) | 1995-09-12 | 1996-09-11 | Containment vessel for producing fused silica glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69629119D1 DE69629119D1 (de) | 2003-08-21 |
| DE69629119T2 true DE69629119T2 (de) | 2004-04-15 |
Family
ID=21706678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69629119T Expired - Lifetime DE69629119T2 (de) | 1995-09-12 | 1996-09-11 | Topf zum herstellen von silikaglas |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5698484A (https=) |
| EP (1) | EP0850201B1 (https=) |
| JP (1) | JP3850880B2 (https=) |
| DE (1) | DE69629119T2 (https=) |
| WO (1) | WO1997010183A1 (https=) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997010182A1 (en) * | 1995-09-12 | 1997-03-20 | Corning Incorporated | Furnace, method of use, and optical product made by furnace in producing fused silica glass |
| DE59800763D1 (de) * | 1997-03-07 | 2001-06-28 | Schott Ml Gmbh | Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung |
| DE69816758T2 (de) * | 1997-05-20 | 2004-06-03 | Heraeus Quarzglas Gmbh & Co. Kg | Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung |
| US6044664A (en) * | 1997-09-29 | 2000-04-04 | Nikon Corporation | Synthetic silica glass manufacturing apparatus |
| GB9815357D0 (en) * | 1998-07-15 | 1998-09-16 | Tsl Group Plc | Improvements in and relating to the manufacture of synthetic vitreous silica ingot |
| US6574991B1 (en) * | 1998-08-13 | 2003-06-10 | Corning Incorporated | Pure fused silica, furnace and method |
| US6319634B1 (en) | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
| US6782716B2 (en) * | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
| US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
| US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
| WO2001017919A1 (en) * | 1999-09-10 | 2001-03-15 | Corning Incorporated | Pure fused silica, furnace and method |
| US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
| US6176588B1 (en) | 1999-12-14 | 2001-01-23 | Corning Incorporated | Low cost light weight mirror blank |
| US6367288B1 (en) * | 1999-12-29 | 2002-04-09 | Corning Incorporated | Method and apparatus for preventing burner-hole build-up in fused silica processes |
| US6314766B1 (en) | 2000-01-19 | 2001-11-13 | Corning Incorporated | Apparatus for minimizing air infiltration in the production of fused silica glass |
| US6988378B1 (en) | 2000-07-27 | 2006-01-24 | Corning Incorporated | Light weight porous structure |
| US6387511B1 (en) | 2000-07-27 | 2002-05-14 | Corning Incorporated | Light weight porous structure |
| US20020083739A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Hot substrate deposition fiber optic preforms and preform components process and apparatus |
| US20020083740A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application |
| US7797966B2 (en) * | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
| US20020174684A1 (en) * | 2001-05-23 | 2002-11-28 | Danielson Paul S. | Fused silica furnace and method |
| WO2003027033A1 (en) * | 2001-09-27 | 2003-04-03 | Corning Incorporated | Improved methods and furnaces for fused silica production |
| DE10359102A1 (de) * | 2003-12-17 | 2005-07-21 | Carl Zeiss Smt Ag | Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung |
| DE102004015766B4 (de) * | 2004-03-23 | 2016-05-12 | Asahi Glass Co., Ltd. | Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat |
| US20100154474A1 (en) * | 2005-12-21 | 2010-06-24 | Lorrie Foley Beall | Reduced striae low expansion glass and elements, and a method for making same |
| US20070137252A1 (en) * | 2005-12-21 | 2007-06-21 | Maxon John E | Reduced striae low expansion glass and elements, and a method for making same |
| US20070137253A1 (en) * | 2005-12-21 | 2007-06-21 | Beall Lorrie F | Reduced striae low expansion glass and elements, and a method for making same |
| GB0605461D0 (en) * | 2006-03-17 | 2006-04-26 | Saint Gobain Quartz Plc | Manufacture of large articles in synthetic vitreous silica |
| KR101918360B1 (ko) | 2016-11-25 | 2018-11-13 | 한국수력원자력 주식회사 | 균일한 용융고화체 형성을 위한 몰드 지지장치 및 균일한 용융고화체 형성방법 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1363233A (fr) * | 1963-04-16 | 1964-06-12 | Corning Glass Works | Procédé de fabrication de masses pleines, notamment de verres et céramiques, et appareil de mise en oeuvre |
| US3806570A (en) * | 1972-03-30 | 1974-04-23 | Corning Glass Works | Method for producing high quality fused silica |
| US3859073A (en) * | 1973-10-19 | 1975-01-07 | Corning Glass Works | Method of producing glass by flame hydrolysis |
| US4135901A (en) * | 1974-12-18 | 1979-01-23 | Sumitomo Electric Industries, Ltd. | Method of manufacturing glass for optical waveguide |
| US3930819A (en) * | 1975-02-06 | 1976-01-06 | Fabrication De Maquinas, S.A. | Press molded hot glassware handling apparatus |
| US3966446A (en) * | 1975-10-23 | 1976-06-29 | Bell Telephone Laboratories, Incorporated | Axial fabrication of optical fibers |
| US4017288A (en) * | 1975-12-15 | 1977-04-12 | Bell Telephone Laboratories, Incorporated | Method for making optical fibers with helical gradations in composition |
| US4065280A (en) * | 1976-12-16 | 1977-12-27 | International Telephone And Telegraph Corporation | Continuous process for manufacturing optical fibers |
| US4231774A (en) * | 1978-04-10 | 1980-11-04 | International Telephone And Telegraph Corporation | Method of fabricating large optical preforms |
| US4263031A (en) * | 1978-06-12 | 1981-04-21 | Corning Glass Works | Method of producing glass optical filaments |
| US4203744A (en) * | 1979-01-02 | 1980-05-20 | Corning Glass Works | Method of making nitrogen-doped graded index optical waveguides |
| FR2446264A1 (fr) * | 1979-01-10 | 1980-08-08 | Quartz & Silice | Procede de preparation d'une preforme pour guide d'onde optique |
| US4363647A (en) * | 1981-05-14 | 1982-12-14 | Corning Glass Works | Method of making fused silica-containing material |
| US4568370A (en) * | 1982-09-29 | 1986-02-04 | Corning Glass Works | Optical fiber preform and method |
| DE3240355C1 (de) * | 1982-11-02 | 1983-11-17 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verfahren zur Herstellung eines laenglichen Glaskoerpers mit inhomogener Brechungsindexverteilung |
| US5221309A (en) * | 1984-05-15 | 1993-06-22 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
| JPH0618234B2 (ja) * | 1985-04-19 | 1994-03-09 | 日本電信電話株式会社 | 半導体基板の接合方法 |
| US5028246A (en) * | 1986-02-03 | 1991-07-02 | Ensign-Bickford Optical Technologies, Inc. | Methods of making optical waveguides |
| US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| EP0401845B2 (en) * | 1989-06-09 | 2001-04-11 | Heraeus Quarzglas GmbH & Co. KG | Optical members and blanks of synthetic silica glass and method for their production |
| JPH0825763B2 (ja) * | 1990-04-26 | 1996-03-13 | 信越石英株式会社 | すす状シリカ体の製造方法、その装置及び該シリカ体を用いた合成石英ガラス |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| US5410428A (en) * | 1990-10-30 | 1995-04-25 | Shin-Etsu Quartz Products Co. Ltd. | Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof |
| KR0165695B1 (ko) * | 1991-06-29 | 1998-12-15 | 아이하라 테루히코 | 엑시머레이저용 합성석영유리 광학부재 및 그의 제조방법 |
| JP2566349B2 (ja) * | 1991-10-02 | 1996-12-25 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
| JP2814795B2 (ja) * | 1991-10-25 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
| JPH05273426A (ja) * | 1991-12-06 | 1993-10-22 | Sumitomo Electric Ind Ltd | 光導波膜の作製方法およびこれを用いた光導波路の作製方法 |
| JP2985540B2 (ja) * | 1992-11-27 | 1999-12-06 | 株式会社ニコン | 石英ガラスの製造方法 |
| JP2814866B2 (ja) * | 1993-02-10 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
| JP3656855B2 (ja) * | 1993-04-23 | 2005-06-08 | 株式会社ニコン | 光リソグラフィー用石英ガラス部材 |
| JP2814867B2 (ja) * | 1993-02-10 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
| JP3334219B2 (ja) * | 1993-02-19 | 2002-10-15 | 住友電気工業株式会社 | ガラス母材の製造装置および製造方法 |
| US5332702A (en) * | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
-
1996
- 1996-09-11 US US08/712,296 patent/US5698484A/en not_active Expired - Lifetime
- 1996-09-11 WO PCT/US1996/014428 patent/WO1997010183A1/en not_active Ceased
- 1996-09-11 EP EP96930773A patent/EP0850201B1/en not_active Expired - Lifetime
- 1996-09-11 JP JP51202597A patent/JP3850880B2/ja not_active Expired - Lifetime
- 1996-09-11 DE DE69629119T patent/DE69629119T2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0850201A4 (en) | 1998-12-02 |
| WO1997010183A1 (en) | 1997-03-20 |
| US5698484A (en) | 1997-12-16 |
| EP0850201B1 (en) | 2003-07-16 |
| JPH11512381A (ja) | 1999-10-26 |
| DE69629119D1 (de) | 2003-08-21 |
| JP3850880B2 (ja) | 2006-11-29 |
| EP0850201A1 (en) | 1998-07-01 |
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| US20100154474A1 (en) | Reduced striae low expansion glass and elements, and a method for making same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |